FR2393079B1 - Procede de vaporisation de materiaux dans une installation de depot par evaporation sous vide - Google Patents

Procede de vaporisation de materiaux dans une installation de depot par evaporation sous vide

Info

Publication number
FR2393079B1
FR2393079B1 FR7816221A FR7816221A FR2393079B1 FR 2393079 B1 FR2393079 B1 FR 2393079B1 FR 7816221 A FR7816221 A FR 7816221A FR 7816221 A FR7816221 A FR 7816221A FR 2393079 B1 FR2393079 B1 FR 2393079B1
Authority
FR
France
Prior art keywords
vacuum evaporation
deposit system
evaporation deposit
vaporizing materials
vaporizing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7816221A
Other languages
English (en)
Other versions
FR2393079A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OC Oerlikon Balzers AG
Original Assignee
Balzers AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers AG filed Critical Balzers AG
Publication of FR2393079A1 publication Critical patent/FR2393079A1/fr
Application granted granted Critical
Publication of FR2393079B1 publication Critical patent/FR2393079B1/fr
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/28Vacuum evaporation by wave energy or particle radiation
    • C23C14/30Vacuum evaporation by wave energy or particle radiation by electron bombardment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
FR7816221A 1977-06-01 1978-05-31 Procede de vaporisation de materiaux dans une installation de depot par evaporation sous vide Expired FR2393079B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH668877A CH631743A5 (de) 1977-06-01 1977-06-01 Verfahren zum aufdampfen von material in einer vakuumaufdampfanlage.

Publications (2)

Publication Number Publication Date
FR2393079A1 FR2393079A1 (fr) 1978-12-29
FR2393079B1 true FR2393079B1 (fr) 1985-06-14

Family

ID=4313470

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7816221A Expired FR2393079B1 (fr) 1977-06-01 1978-05-31 Procede de vaporisation de materiaux dans une installation de depot par evaporation sous vide

Country Status (6)

Country Link
US (1) US4197175A (fr)
CH (1) CH631743A5 (fr)
DE (1) DE2823876C2 (fr)
FR (1) FR2393079B1 (fr)
GB (1) GB1589160A (fr)
NL (1) NL179660C (fr)

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JPS581067A (ja) * 1981-06-26 1983-01-06 Toshiba Corp 装飾用金属窒化物皮膜の形成法
US4407712A (en) * 1982-06-01 1983-10-04 The United States Of America As Represented By The Secretary Of The Army Hollow cathode discharge source of metal vapor
CH658545A5 (de) * 1982-09-10 1986-11-14 Balzers Hochvakuum Verfahren zum gleichmaessigen erwaermen von heizgut in einem vakuumrezipienten.
DE3406953C2 (de) * 1983-04-19 1986-03-13 Balzers Hochvakuum Gmbh, 6200 Wiesbaden Verfahren zum Erwärmen von Heizgut in einem Vakuumrezipienten
US4420386A (en) * 1983-04-22 1983-12-13 White Engineering Corporation Method for pure ion plating using magnetic fields
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US4559121A (en) * 1983-09-12 1985-12-17 Vac-Tec Systems, Inc. Method and apparatus for evaporation arc stabilization for permeable targets
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JPS6137960A (ja) * 1984-07-28 1986-02-22 Tadanobu Okubo 金属表面加工方法
US4566937A (en) * 1984-10-10 1986-01-28 The United States Of America As Represented By The United States Department Of Energy Electron beam enhanced surface modification for making highly resolved structures
CH664163A5 (de) * 1985-03-01 1988-02-15 Balzers Hochvakuum Verfahren zum reaktiven aufdampfen von schichten aus oxiden, nitriden, oxynitriden und karbiden.
US4895765A (en) * 1985-09-30 1990-01-23 Union Carbide Corporation Titanium nitride and zirconium nitride coating compositions, coated articles and methods of manufacture
US4929322A (en) * 1985-09-30 1990-05-29 Union Carbide Corporation Apparatus and process for arc vapor depositing a coating in an evacuated chamber
US4839245A (en) * 1985-09-30 1989-06-13 Union Carbide Corporation Zirconium nitride coated article and method for making same
US5084151A (en) * 1985-11-26 1992-01-28 Sorin Biomedica S.P.A. Method and apparatus for forming prosthetic device having a biocompatible carbon film thereon
DE3615361C2 (de) * 1986-05-06 1994-09-01 Santos Pereira Ribeiro Car Dos Vorrichtung zur Oberflächenbehandlung von Werkstücken
ES2022946T5 (es) * 1987-08-26 1996-04-16 Balzers Hochvakuum Procedimiento para la aportacion de capas sobre sustratos.
DE3832693A1 (de) * 1988-09-27 1990-03-29 Leybold Ag Vorrichtung zum aufbringen dielektrischer oder metallischer werkstoffe
DE58907191D1 (de) * 1989-02-09 1994-04-14 Balzers Hochvakuum Verfahren zum Zentrieren eines Elektronenstrahles.
US5234560A (en) * 1989-08-14 1993-08-10 Hauzer Holdings Bv Method and device for sputtering of films
EP0430873A3 (en) * 1989-11-22 1991-11-06 Balzers Aktiengesellschaft Roller with a friction- and wear-reducing hard coating and process for producing the coating
CH680369A5 (fr) * 1989-11-22 1992-08-14 Balzers Hochvakuum
ATE120807T1 (de) * 1989-11-22 1995-04-15 Balzers Hochvakuum Werkzeug oder instrument mit einer verschleissresistenten hartschicht zum be- oder verarbeiten von organischem material.
EP0430874A1 (fr) * 1989-11-22 1991-06-05 Balzers Aktiengesellschaft Objet pourvu d'une couche décorative
US5246787A (en) * 1989-11-22 1993-09-21 Balzers Aktiengesellschaft Tool or instrument with a wear-resistant hard coating for working or processing organic materials
DE4006457C2 (de) * 1990-03-01 1993-09-30 Balzers Hochvakuum Verfahren zum Verdampfen von Material in einer Vakuumaufdampfanlage sowie Anlage derselben
US5238546A (en) * 1990-03-01 1993-08-24 Balzers Aktiengesellschaft Method and apparatus for vaporizing materials by plasma arc discharge
DE4035131C2 (de) * 1990-11-05 1995-09-21 Balzers Hochvakuum Verfahren und Vorrichtung zum gleichmäßigen Erwärmen von Heizgut, insbes. von zu beschichtenden Substraten, in einer Vakuumkammer
US5250779A (en) * 1990-11-05 1993-10-05 Balzers Aktiengesellschaft Method and apparatus for heating-up a substrate by means of a low voltage arc discharge and variable magnetic field
FR2670218B1 (fr) * 1990-12-06 1993-02-05 Innovatique Sa Procede de traitement de metaux par depot de matiere, et pour la mise en óoeuvre dudit procede.
CA2065581C (fr) 1991-04-22 2002-03-12 Andal Corp. Methode de deposition physique en phase vapeur activee par plasma, et appareil connexe
US5490910A (en) * 1992-03-09 1996-02-13 Tulip Memory Systems, Inc. Circularly symmetric sputtering apparatus with hollow-cathode plasma devices
CH687111A5 (de) * 1992-05-26 1996-09-13 Balzers Hochvakuum Verfahren zum Erzeugen einer Niederspannungsentladung, Vakuumbehandlungsanlage hierfuer sowie Anwendung des Verfahrens.
US5346600A (en) * 1992-08-14 1994-09-13 Hughes Aircraft Company Plasma-enhanced magnetron-sputtered deposition of materials
JP2607055B2 (ja) * 1992-08-14 1997-05-07 ヒューズ・エアクラフト・カンパニー 炭素質材料上に窒化チタンを形成するための表面処理および蒸着方法
WO1994014996A1 (fr) * 1992-12-23 1994-07-07 Balzers Aktiengesellschaft Procede et installation de depot de couche
EP0616050B1 (fr) * 1993-03-16 1997-08-13 Balzers Aktiengesellschaft Procédé d'augmentation de résistance des outils et outils avec revêtement anti-usure
US5457298A (en) * 1993-07-27 1995-10-10 Tulip Memory Systems, Inc. Coldwall hollow-cathode plasma device for support of gas discharges
DE4336680C2 (de) * 1993-10-27 1998-05-14 Fraunhofer Ges Forschung Verfahren zum Elektronenstrahlverdampfen
DE4409761B4 (de) * 1994-03-22 2007-12-27 Vtd Vakuumtechnik Dresden Gmbh Einrichtung zur plasmagestützten Verdampfung in einem Bogenentladungsplasma
US5656091A (en) * 1995-11-02 1997-08-12 Vacuum Plating Technology Corporation Electric arc vapor deposition apparatus and method
DE19623701A1 (de) * 1996-06-14 1997-12-18 Leybold Systems Gmbh Vorrichtung und Verfahren zum Elektronenstrahlverdampfen
DE19724996C1 (de) * 1997-06-13 1998-09-03 Fraunhofer Ges Forschung Verfahren zum plasmaaktivierten Elektronenstrahlverdampfen und Einrichtung zur Durchführung des Verfahrens
DE19725930C2 (de) * 1997-06-16 2002-07-18 Eberhard Moll Gmbh Dr Verfahren und Anlage zum Behandeln von Substraten mittels Ionen aus einer Niedervoltbogenentladung
US6012830A (en) * 1998-06-23 2000-01-11 Valeo Sylvania L.L.C. Light shield for a vehicle headlamp
DE50115410D1 (de) 2000-09-05 2010-05-12 Oerlikon Trading Ag Vakuumanlage mit koppelbarem Werkstückträger
US7033679B2 (en) * 2001-01-25 2006-04-25 Kyocera Optec Co., Ltd. Metal film and metal film-coated member, metal oxide film and metal oxide film-coated member, thin film forming apparatus and thin film forming method for producing metal film and metal oxide film
KR100962104B1 (ko) * 2005-03-31 2010-06-10 시티즌 홀딩스 가부시키가이샤 금색 장식품 및 그 제조 방법
CA2686445C (fr) * 2007-05-25 2015-01-27 Oerlikon Trading Ag, Truebbach Installation et procede de traitement sous vide
KR101039638B1 (ko) * 2009-08-10 2011-06-09 휴비트 주식회사 치열교정용 브래킷의 표면 코팅 방법
DE102017106985A1 (de) * 2017-03-31 2018-10-04 Technische Hochschule Wildau (Fh) Vorrichtung zur elektronenunterstützten Beschichtung von Substraten sowie ein entsprechendes Verfahren

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CH551497A (de) * 1971-10-06 1974-07-15 Balzers Patent Beteilig Ag Anordnung zur zerstaeubung von stoffen mittels einer elektrischen niederspannungsentladung.
FR2218652B1 (fr) * 1973-02-20 1976-09-10 Thomson Csf
US3984581A (en) * 1973-02-28 1976-10-05 Carl Zeiss-Stiftung Method for the production of anti-reflection coatings on optical elements made of transparent organic polymers
CH610013A5 (fr) * 1975-11-19 1979-03-30 Battelle Memorial Institute

Also Published As

Publication number Publication date
FR2393079A1 (fr) 1978-12-29
NL179660C (nl) 1986-10-16
US4197175A (en) 1980-04-08
CH631743A5 (de) 1982-08-31
DE2823876C2 (de) 1984-04-19
GB1589160A (en) 1981-05-07
NL179660B (nl) 1986-05-16
NL7707659A (nl) 1978-12-05
DE2823876A1 (de) 1979-01-04

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