FR2425479A1 - Appareil pour le depot par vaporisation du type a reaction d'activation - Google Patents

Appareil pour le depot par vaporisation du type a reaction d'activation

Info

Publication number
FR2425479A1
FR2425479A1 FR7832354A FR7832354A FR2425479A1 FR 2425479 A1 FR2425479 A1 FR 2425479A1 FR 7832354 A FR7832354 A FR 7832354A FR 7832354 A FR7832354 A FR 7832354A FR 2425479 A1 FR2425479 A1 FR 2425479A1
Authority
FR
France
Prior art keywords
reaction gas
hollow cathode
vapour source
metal carbide
gun
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7832354A
Other languages
English (en)
Other versions
FR2425479B1 (fr
Inventor
Soji Komiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Nihon Shinku Gijutsu KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc, Nihon Shinku Gijutsu KK filed Critical Ulvac Inc
Publication of FR2425479A1 publication Critical patent/FR2425479A1/fr
Application granted granted Critical
Publication of FR2425479B1 publication Critical patent/FR2425479B1/fr
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

LA PRESENTE INVENTION CONCERNE UN APPAREIL POUR LE DEPOT PAR VAPORISATION DU TYPE A REACTION D'ACTIVATION. DANS CET APPAREIL DANS LEQUEL UNE CHAMBRE DE TRAITEMENT 1 DONT L'ATMOSPHERE EST CONSTITUEE PAR UN GAZ REACTIONNEL SOUS UNE PRESSION FAIBLE EST MUNIE D'UNE SOURCE D'EVAPORATION 3 CONSTITUEE PAR UN CREUSET 3A CONTENANT LE METAL A IRRADIER PAR LE FAISCEAU D'ELECTRONS PROVENANT D'UN CANON A ELECTRONS 3C DU TYPE A CATHODE CHAUDE CREUSE ET D'UN SUBSTRAT 4 LUI FAISANT FACE CEUX-CI ETANT CONNECTES AU POLE POSITIF ET AU POLE NEGATIF D'UNE SOURCE D'ALIMENTATION ELECTRIQUE, LE GAZ REACTIONNEL EST INTRODUIT DANS LA CHAMBRE DE TRAITEMENT 1 A TRAVERS LE CANON A ELECTRONS 3C DU TYPE A CATHODE CHAUDE CREUSE. CET APPAREIL EST UTILISE POUR FORMER UN FILM DE REVETEMENT SUR UN SUBSTRAT.
FR7832354A 1978-05-10 1978-11-16 Appareil pour le depot par vaporisation du type a reaction d'activation Granted FR2425479A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5439778A JPS54146281A (en) 1978-05-10 1978-05-10 Metallizing apparatus by activation reaction

Publications (2)

Publication Number Publication Date
FR2425479A1 true FR2425479A1 (fr) 1979-12-07
FR2425479B1 FR2425479B1 (fr) 1982-07-09

Family

ID=12969541

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7832354A Granted FR2425479A1 (fr) 1978-05-10 1978-11-16 Appareil pour le depot par vaporisation du type a reaction d'activation

Country Status (2)

Country Link
JP (1) JPS54146281A (fr)
FR (1) FR2425479A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3627151A1 (de) * 1986-08-11 1988-02-18 Leybold Heraeus Gmbh & Co Kg Verfahren und vorrichtung zum reaktiven aufdampfen von metallverbindungen

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3562141A (en) * 1968-02-23 1971-02-09 John R Morley Vacuum vapor deposition utilizing low voltage electron beam
FR2393079A1 (fr) * 1977-06-01 1978-12-29 Balzers Hochvakuum Procede de vaporisation de materiaux dans une installation de depot par evaporation sous vide

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3562141A (en) * 1968-02-23 1971-02-09 John R Morley Vacuum vapor deposition utilizing low voltage electron beam
FR2393079A1 (fr) * 1977-06-01 1978-12-29 Balzers Hochvakuum Procede de vaporisation de materiaux dans une installation de depot par evaporation sous vide

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
EXBK/74 *
EXBK/77 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3627151A1 (de) * 1986-08-11 1988-02-18 Leybold Heraeus Gmbh & Co Kg Verfahren und vorrichtung zum reaktiven aufdampfen von metallverbindungen

Also Published As

Publication number Publication date
FR2425479B1 (fr) 1982-07-09
JPS572271B2 (fr) 1982-01-14
JPS54146281A (en) 1979-11-15

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Legal Events

Date Code Title Description
ST Notification of lapse