ES2022946B3 - Proceso de aplicacion de capas sobre sustratos e instalaciones de recubrimiento en capas al vacio para la realizacion del proceso - Google Patents

Proceso de aplicacion de capas sobre sustratos e instalaciones de recubrimiento en capas al vacio para la realizacion del proceso

Info

Publication number
ES2022946B3
ES2022946B3 ES88106546T ES88106546T ES2022946B3 ES 2022946 B3 ES2022946 B3 ES 2022946B3 ES 88106546 T ES88106546 T ES 88106546T ES 88106546 T ES88106546 T ES 88106546T ES 2022946 B3 ES2022946 B3 ES 2022946B3
Authority
ES
Spain
Prior art keywords
coating
substrates
electric arc
arc discharge
vaporization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES88106546T
Other languages
English (en)
Other versions
ES2022946T5 (es
Inventor
Erich Bergmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OC Oerlikon Balzers AG
Original Assignee
Balzers AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=4252468&utm_source=***_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ES2022946(B3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Balzers AG filed Critical Balzers AG
Publication of ES2022946B3 publication Critical patent/ES2022946B3/es
Application granted granted Critical
Publication of ES2022946T5 publication Critical patent/ES2022946T5/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325Electric arc evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/35Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/354Introduction of auxiliary energy into the plasma
    • C23C14/355Introduction of auxiliary energy into the plasma using electrons, e.g. triode sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Laminated Bodies (AREA)
ES88106546T 1987-08-26 1988-04-23 Procedimiento para la aportacion de capas sobre sustratos. Expired - Lifetime ES2022946T5 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH327587 1987-08-26

Publications (2)

Publication Number Publication Date
ES2022946B3 true ES2022946B3 (es) 1991-12-16
ES2022946T5 ES2022946T5 (es) 1996-04-16

Family

ID=4252468

Family Applications (1)

Application Number Title Priority Date Filing Date
ES88106546T Expired - Lifetime ES2022946T5 (es) 1987-08-26 1988-04-23 Procedimiento para la aportacion de capas sobre sustratos.

Country Status (6)

Country Link
US (1) US4877505A (es)
EP (1) EP0306612B2 (es)
JP (1) JPS6483656A (es)
AT (1) ATE65265T1 (es)
DE (1) DE3863725D1 (es)
ES (1) ES2022946T5 (es)

Families Citing this family (77)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3852500T2 (de) * 1988-08-25 1995-07-27 Hauzer Ind Bv Physikalische dampfniederschlag-doppelbeschichtungsvorrichtung und verfahren.
US5234561A (en) * 1988-08-25 1993-08-10 Hauzer Industries Bv Physical vapor deposition dual coating process
EP0361265A1 (de) * 1988-09-29 1990-04-04 Siemens Aktiengesellschaft Herstellung von dünnen Schichten eines Hochtemperatur-Supraleiters (HTSL) durch ein plasmaaktiviertes PVD-Verfahren
US4992153A (en) * 1989-04-26 1991-02-12 Balzers Aktiengesellschaft Sputter-CVD process for at least partially coating a workpiece
DE59004614D1 (de) * 1989-06-27 1994-03-24 Hauzer Holding Verfahren und vorrichtung zur beschichtung von substraten.
EP0404973A1 (de) * 1989-06-27 1991-01-02 Hauzer Holding B.V. Verfahren und Vorrichtung zur Beschichtung von Substraten
DE58909591D1 (de) * 1989-08-21 1996-03-14 Balzers Hochvakuum Beschichtetes Werkstück mit einer Mischkristallbeschichtung, Verfahren zu dessen Herstellung, sowie Vorrichtung zur Durchführung des Verfahrens
US5250779A (en) * 1990-11-05 1993-10-05 Balzers Aktiengesellschaft Method and apparatus for heating-up a substrate by means of a low voltage arc discharge and variable magnetic field
EP0496053B1 (de) * 1991-01-21 1995-07-26 Balzers Aktiengesellschaft Beschichtetes hochverschleissfestes Werkzeug und physikalisches Beschichtungsverfahren zur Beschichtung von hochverschleissfesten Werkzeugen
JPH04326725A (ja) * 1991-04-26 1992-11-16 Tokyo Electron Ltd プラズマ装置
CH687111A5 (de) * 1992-05-26 1996-09-13 Balzers Hochvakuum Verfahren zum Erzeugen einer Niederspannungsentladung, Vakuumbehandlungsanlage hierfuer sowie Anwendung des Verfahrens.
JPH0673538A (ja) * 1992-05-26 1994-03-15 Kobe Steel Ltd アークイオンプレーティング装置
WO1994000868A1 (en) 1992-06-26 1994-01-06 Materials Research Corporation Transport system for wafer processing line
CH686253A5 (de) * 1992-08-28 1996-02-15 Balzers Hochvakuum Verfahren zur Regelung des Reaktionsgrades sowie Beschichtungsanlage.
US5690796A (en) * 1992-12-23 1997-11-25 Balzers Aktiengesellschaft Method and apparatus for layer depositions
WO1994014996A1 (de) * 1992-12-23 1994-07-07 Balzers Aktiengesellschaft Verfahren und anlage zur schichtabscheidung
EP0616050B1 (de) * 1993-03-16 1997-08-13 Balzers Aktiengesellschaft Verfahren zur Standzeiterhöhung von Werkzeugen und Verschleissschutz-beschichtetes Werkzeug
DE19505258C2 (de) * 1995-02-16 1998-08-06 Samsung Electronics Co Ltd Beschichtungsvorrichtung
CH690857A5 (de) * 1995-07-04 2001-02-15 Erich Bergmann Anlage zur plasmaunterstützten physikalischen Hochvakuumbedampfung von Werkstücken mit verschleissfesten Schichten und Verfahren zur Durchführung in dieser Anlage
CH689558A5 (de) 1995-07-11 1999-06-15 Erich Bergmann Bedampfungsanlage und Verdampfereinheit.
US6040613A (en) * 1996-01-19 2000-03-21 Micron Technology, Inc. Antireflective coating and wiring line stack
WO1997028290A1 (en) * 1996-01-31 1997-08-07 Optical Coating Laboratory, Inc. Multi-chamber continuous sputter coating system
FR2744805B1 (fr) * 1996-02-13 1998-03-20 Pechiney Aluminium Cibles de pulverisation cathodique selectionnees par controle ultrasons pour leur faible taux d'emissions de particules
US5961798A (en) * 1996-02-13 1999-10-05 Diamond Black Technologies, Inc. System and method for vacuum coating of articles having precise and reproducible positioning of articles
DE29615190U1 (de) * 1996-03-11 1996-11-28 Balzers Verschleissschutz GmbH, 55411 Bingen Anlage zur Beschichtung von Werkstücken
US5760474A (en) * 1996-07-09 1998-06-02 Micron Technology, Inc. Capacitor, integrated circuitry, diffusion barriers, and method for forming an electrically conductive diffusion barrier
US5865699A (en) * 1996-10-03 1999-02-02 Sandvik Ab Coated chain saw nose sprocket
US6027619A (en) * 1996-12-19 2000-02-22 Micron Technology, Inc. Fabrication of field emission array with filtered vacuum cathodic arc deposition
DE19725930C2 (de) * 1997-06-16 2002-07-18 Eberhard Moll Gmbh Dr Verfahren und Anlage zum Behandeln von Substraten mittels Ionen aus einer Niedervoltbogenentladung
AU4028297A (en) * 1997-09-12 1999-04-05 Balzers Aktiengesellschaft Tool having a protective layer system
US6090457A (en) * 1997-10-21 2000-07-18 Sanyo Vaccum Industries Co. Ltd. Process of making a thin film
JPH11241158A (ja) * 1998-02-27 1999-09-07 Applied Materials Inc 電子線を用いた真空蒸着装置
TW406851U (en) * 1998-04-01 2000-09-21 Li Jin Ju Radial reciprocal disk cleaning device
US6365016B1 (en) * 1999-03-17 2002-04-02 General Electric Company Method and apparatus for arc plasma deposition with evaporation of reagents
US6485616B1 (en) * 1999-12-29 2002-11-26 Deposition Sciences, Inc. System and method for coating substrates with improved capacity and uniformity
DE10005612A1 (de) * 2000-02-09 2001-08-16 Hauzer Techno Coating Europ B Verfahren zur Herstellung eines Gegenstandes und Gegenstand
US7300559B2 (en) * 2000-04-10 2007-11-27 G & H Technologies Llc Filtered cathodic arc deposition method and apparatus
CA2305938C (en) * 2000-04-10 2007-07-03 Vladimir I. Gorokhovsky Filtered cathodic arc deposition method and apparatus
DE10018143C5 (de) * 2000-04-12 2012-09-06 Oerlikon Trading Ag, Trübbach DLC-Schichtsystem sowie Verfahren und Vorrichtung zur Herstellung eines derartigen Schichtsystems
DE50115410D1 (de) * 2000-09-05 2010-05-12 Oerlikon Trading Ag Vakuumanlage mit koppelbarem Werkstückträger
US20020110700A1 (en) * 2001-02-12 2002-08-15 Hein Gerald F. Process for forming decorative films and resulting products
GB0127251D0 (en) * 2001-11-13 2002-01-02 Nordiko Ltd Apparatus
DE10159907B4 (de) * 2001-12-06 2008-04-24 Interpane Entwicklungs- Und Beratungsgesellschaft Mbh & Co. Beschichtungsverfahren
US7438955B2 (en) * 2002-02-27 2008-10-21 Philippine Council For Advanced Science And Technology Research And Development Titanium nitride thin film formation on metal substrate by chemical vapor deposition in a magnetized sheet plasma source
JP2005025275A (ja) * 2003-06-30 2005-01-27 Ntt Power & Building Facilities Inc 土地建物資産評価システム
KR100770938B1 (ko) * 2003-06-30 2007-10-26 가부시키가이샤 후지코시 다원계 피막의 제조 장치와 방법 및 다원계 피막의 피복공구
EP1524329A1 (de) * 2003-10-17 2005-04-20 Platit AG Modulare Vorrichtung zur Beschichtung von Oberflächen
US7364772B2 (en) * 2004-03-22 2008-04-29 Eastman Kodak Company Method for coating an organic layer onto a substrate in a vacuum chamber
WO2006000846A1 (en) * 2004-06-08 2006-01-05 Epispeed S.A. System for low-energy plasma-enhanced chemical vapor deposition
EP1614655B2 (en) 2004-06-18 2018-08-08 Hitachi Tool Engineering Ltd. Hard coating and its production method
SE0402865L (sv) * 2004-11-04 2006-05-05 Sandvik Intellectual Property Belagd produkt och framställningsmetod för denna
US9997338B2 (en) * 2005-03-24 2018-06-12 Oerlikon Surface Solutions Ag, Pfäffikon Method for operating a pulsed arc source
US20070148457A1 (en) * 2005-09-14 2007-06-28 Naturalnano, Inc. Radiation absorptive composites and methods for production
US20070138003A1 (en) * 2005-12-21 2007-06-21 Annaqin Llc Lamination and conversion process and apparatus
WO2008153915A1 (en) * 2007-06-05 2008-12-18 Deposition Sciences, Inc. Method and apparatus for low cost high rate deposition tooling
CN101368260A (zh) * 2007-09-14 2009-02-18 山特维克知识产权股份有限公司 用于在基底上沉积涂层的方法和设备
WO2009079358A1 (en) * 2007-12-14 2009-06-25 The Regents Of The University Of California Very low pressure high power impulse triggered magnetron sputtering
DE102008019202A1 (de) * 2008-04-17 2009-10-22 Kennametal Inc. Beschichtungsverfahren , Werkstück oder Werkzeug und dessen Verwendung
US8021768B2 (en) * 2009-04-07 2011-09-20 National Material, L.P. Plain copper foodware and metal articles with durable and tarnish free multiplayer ceramic coating and method of making
CN101994090B (zh) * 2009-08-14 2013-06-05 鸿富锦精密工业(深圳)有限公司 溅镀载具及包括该溅镀载具的溅镀装置
CN102031493B (zh) * 2009-09-30 2013-08-21 鸿富锦精密工业(深圳)有限公司 镀膜装置
CN102127740B (zh) * 2010-01-19 2013-12-11 鸿富锦精密工业(深圳)有限公司 溅镀装置
TW201134972A (en) * 2010-04-14 2011-10-16 Hon Hai Prec Ind Co Ltd Coating device
DE102010028558A1 (de) 2010-05-04 2011-11-10 Walter Ag PVD-Hybridverfahren zum Abscheiden von Mischkristallschichten
TWI468538B (zh) * 2011-10-14 2015-01-11 Chenming Mold Ind Corp 屏蔽層製造方法
US8968529B2 (en) * 2012-03-29 2015-03-03 Ever Brite Technology Products Inc. Production method for forming an antibacterial film on the surface of an object
US9412569B2 (en) 2012-09-14 2016-08-09 Vapor Technologies, Inc. Remote arc discharge plasma assisted processes
US9793098B2 (en) 2012-09-14 2017-10-17 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment
US10056237B2 (en) 2012-09-14 2018-08-21 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment
ES2563862T3 (es) * 2013-03-15 2016-03-16 Vapor Technologies, Inc. Depósito en fase de vapor de recubrimiento por inmersión en un plasma de arco a baja presión y tratamiento iónico
DE102013110100A1 (de) * 2013-06-05 2014-12-11 Von Ardenne Gmbh Beschichtungsanordnung und Beschichtungsverfahren
CA2867451C (en) * 2013-10-28 2021-06-29 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment
PT3117907T (pt) * 2015-07-13 2018-01-31 Hec High End Coating Gmbh Processo para produção de substratos revestidos
CN105154819A (zh) * 2015-09-11 2015-12-16 兰州空间技术物理研究所 超轻反射镜表面制备反射膜的方法
CN105132863A (zh) * 2015-09-11 2015-12-09 兰州空间技术物理研究所 一种缓解复合材料表面金属涂层微裂纹扩展的方法
EP3225717A1 (de) 2016-03-30 2017-10-04 HEC High End Coating GmbH Verfahren zur herstellung beschichteter substrate, beschichtete substrate und deren verwendung
WO2020187744A1 (en) 2019-03-15 2020-09-24 Nanofilm Technologies International Pte Ltd Improved coating processes

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2198000B1 (es) * 1972-08-31 1975-01-03 Cit Alcatel
JPS49111880A (es) * 1973-02-26 1974-10-24
US4166018A (en) * 1974-01-31 1979-08-28 Airco, Inc. Sputtering process and apparatus
JPS5214690A (en) * 1975-07-25 1977-02-03 Dai Ichi Kogyo Seiyaku Co Ltd Method to dissolve the polyurethane resin
CH631743A5 (de) * 1977-06-01 1982-08-31 Balzers Hochvakuum Verfahren zum aufdampfen von material in einer vakuumaufdampfanlage.
CH640886A5 (de) * 1979-08-02 1984-01-31 Balzers Hochvakuum Verfahren zum aufbringen harter verschleissfester ueberzuege auf unterlagen.
US4294678A (en) * 1979-11-28 1981-10-13 Coulter Systems Corporation Apparatus and method for preventing contamination of sputtering targets
JPS58153776A (ja) * 1982-03-05 1983-09-12 Citizen Watch Co Ltd 装飾部品の製造方法およびそれに用いるイオンプレ−テイング装置
JPS5940226A (ja) * 1982-08-31 1984-03-05 Matsushita Electric Ind Co Ltd 圧力センサ
AT376460B (de) * 1982-09-17 1984-11-26 Kljuchko Gennady V Plasmalichtbogeneinrichtung zum auftragen von ueberzuegen
US4655893A (en) * 1983-02-07 1987-04-07 Battelle Development Corporation Cubic boron nitride preparation utilizing a boron and nitrogen bearing gas
CH662188A5 (de) * 1983-03-16 1987-09-15 Satis Vacuum Ag Verfahren und einrichtung zur beschichtung optischer substrate mit reversiblen photochromischen eigenschaften.
US4448799A (en) * 1983-04-21 1984-05-15 Multi-Arc Vacuum Systems Inc. Arc-initiating trigger apparatus and method for electric arc vapor deposition coating systems
JPS6011103A (ja) * 1983-06-30 1985-01-21 インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション 遠隔計測装置
CH664163A5 (de) * 1985-03-01 1988-02-15 Balzers Hochvakuum Verfahren zum reaktiven aufdampfen von schichten aus oxiden, nitriden, oxynitriden und karbiden.
DE3641718A1 (de) * 1986-12-06 1988-06-16 Leybold Ag Verfahren zum herstellen von wickeln aus im vakuum leitfaehig beschichteten isolierstoff-folien

Also Published As

Publication number Publication date
JPS6483656A (en) 1989-03-29
EP0306612B1 (de) 1991-07-17
EP0306612A1 (de) 1989-03-15
US4877505A (en) 1989-10-31
EP0306612B2 (de) 1996-02-28
ES2022946T5 (es) 1996-04-16
DE3863725D1 (de) 1991-08-22
ATE65265T1 (de) 1991-08-15

Similar Documents

Publication Publication Date Title
ES2022946B3 (es) Proceso de aplicacion de capas sobre sustratos e instalaciones de recubrimiento en capas al vacio para la realizacion del proceso
US4415421A (en) Process for manufacturing ornamental parts and ion plating apparatus to be used therefor
US4038171A (en) Supported plasma sputtering apparatus for high deposition rate over large area
US3756193A (en) Coating apparatus
GB2331998B (en) Carbon coatings, method and apparatus for applying them, and articles bearing such coatings
MX9304930A (es) Metodo de preparacion de superficie y deposicion para nitruro de titanio sobre materiales carbonaceos.
US5192578A (en) Method of producing coating using negative dc pulses with specified duty factor
Olbrich et al. Superimposed pulse bias voltage used in arc and sputter technology
US4803094A (en) Metallized coating
JPH01129958A (ja) 高密着窒化チタン膜形成方法
Martin et al. Control of film properties during filtered arc deposition
Wolf et al. Ion beam assisted deposition for metal finishing
JPS5489983A (en) Device and method for vacuum deposition compound
Ensinger et al. An apparatus for in-situ or sequential plasma immersion ion beam treatment in combination with rf sputter deposition or triode dc sputter deposition
JPS6324068A (ja) 連続真空蒸着メツキ装置
GB1574677A (en) Method of coating electrically conductive components
Schiller et al. Pretreatment of metallic substrates with the plasmatron
JPS57128437A (en) Manufacture of lanthanum-boride thermionic emission electrode
JPS60131964A (ja) 膜被覆物の製造方法
Bergauer et al. A new sputter-cleaning device for concave surfaces
CA1090485A (en) Supported plasma sputtering apparatus for high deposition rate over large area
KR100193365B1 (ko) 금속표면에 질화티탄막을 형성하는 방법
JPH0428861A (ja) ホロカソード電子銃を用いた成膜装置
KR900005841B1 (ko) 진공도금과 습식도금 연속도금방법에 의한 고경도 도금방법 및 도금체
JPS59226176A (ja) イオンプレ−テイング装置