DE69216277D1 - Evakuierungssystem und -verfahren - Google Patents

Evakuierungssystem und -verfahren

Info

Publication number
DE69216277D1
DE69216277D1 DE69216277T DE69216277T DE69216277D1 DE 69216277 D1 DE69216277 D1 DE 69216277D1 DE 69216277 T DE69216277 T DE 69216277T DE 69216277 T DE69216277 T DE 69216277T DE 69216277 D1 DE69216277 D1 DE 69216277D1
Authority
DE
Germany
Prior art keywords
procedure
evacuation system
evacuation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69216277T
Other languages
English (en)
Other versions
DE69216277T2 (de
Inventor
Kazue Takahashi
Shinjiro Ueda
Manabu Edamura
Naoyuki Tamura
Kazuaki Ichihashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Application granted granted Critical
Publication of DE69216277D1 publication Critical patent/DE69216277D1/de
Publication of DE69216277T2 publication Critical patent/DE69216277T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D8/00—Cold traps; Cold baffles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S417/00—Pumps
    • Y10S417/901—Cryogenic pumps

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Physical Vapour Deposition (AREA)
  • Degasification And Air Bubble Elimination (AREA)
  • Devices For Use In Laboratory Experiments (AREA)
  • Non-Positive Displacement Air Blowers (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
DE69216277T 1991-04-25 1992-04-23 Evakuierungssystem und -verfahren Expired - Fee Related DE69216277T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3095147A JPH04326943A (ja) 1991-04-25 1991-04-25 真空排気システム及び排気方法

Publications (2)

Publication Number Publication Date
DE69216277D1 true DE69216277D1 (de) 1997-02-13
DE69216277T2 DE69216277T2 (de) 1997-07-10

Family

ID=14129691

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69216277T Expired - Fee Related DE69216277T2 (de) 1991-04-25 1992-04-23 Evakuierungssystem und -verfahren

Country Status (5)

Country Link
US (1) US5259735A (de)
EP (1) EP0510656B1 (de)
JP (1) JPH04326943A (de)
KR (1) KR960003788B1 (de)
DE (1) DE69216277T2 (de)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
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US5733104A (en) * 1992-12-24 1998-03-31 Balzers-Pfeiffer Gmbh Vacuum pump system
IL117775A (en) * 1995-04-25 1998-10-30 Ebara Germany Gmbh Inhalation system with gas exhaust cleaner and operating process for it
DE19524609A1 (de) * 1995-07-06 1997-01-09 Leybold Ag Vorrichtung zum raschen Evakuieren einer Vakuumkammer
GB2325707B (en) * 1996-03-20 2000-06-21 Helix Tech Corp Purge and rough cryopump regeneration process, cryopump and controller
JP3555717B2 (ja) 1996-05-09 2004-08-18 シャープ株式会社 半導体製造方法
US6116032A (en) * 1999-01-12 2000-09-12 Applied Materials, Inc. Method for reducing particulate generation from regeneration of cryogenic vacuum pumps
DE19929519A1 (de) * 1999-06-28 2001-01-04 Pfeiffer Vacuum Gmbh Verfahren zum Betrieb einer Mehrkammer-Vakuumanlage
JP4027564B2 (ja) * 2000-04-11 2007-12-26 株式会社荏原製作所 真空排気システム
FR2807951B1 (fr) * 2000-04-20 2003-05-16 Cit Alcatel Procede et systeme de pompage des chambres de transfert d'equipement de semi-conducteur
US6327863B1 (en) 2000-05-05 2001-12-11 Helix Technology Corporation Cryopump with gate valve control
DE10048210B4 (de) * 2000-09-28 2007-02-15 Singulus Technologies Ag Vorrichtung und Verfahren zum Einschleusen eines Werkstücks über eine Vorvakuumkammer in eine Hochvakuumkammer und deren Verwendung
FR2822200B1 (fr) * 2001-03-19 2003-09-26 Cit Alcatel Systeme de pompage pour gaz a faible conductivite thermique
GB0212757D0 (en) 2002-05-31 2002-07-10 Boc Group Plc A vacuum pumping system and method of controlling the same
GB0214273D0 (en) * 2002-06-20 2002-07-31 Boc Group Plc Apparatus for controlling the pressure in a process chamber and method of operating same
DE10348639B4 (de) * 2003-10-15 2009-08-27 Von Ardenne Anlagentechnik Gmbh Schleusensystem für eine Vakuumanlage
US7021888B2 (en) * 2003-12-16 2006-04-04 Universities Research Association, Inc. Ultra-high speed vacuum pump system with first stage turbofan and second stage turbomolecular pump
GB0401396D0 (en) * 2004-01-22 2004-02-25 Boc Group Plc Pressure control method
US20060011829A1 (en) * 2004-03-05 2006-01-19 Oi Corporation Gas chromatograph and mass spectrometer
NZ552386A (en) * 2004-07-13 2010-12-24 Delaval Holding Ab A milking system with a controllable vacuum source
US20070020115A1 (en) * 2005-07-01 2007-01-25 The Boc Group, Inc. Integrated pump apparatus for semiconductor processing
JP4961701B2 (ja) * 2005-09-14 2012-06-27 パナソニック株式会社 プラズマディスプレイパネルの製造方法
KR100833648B1 (ko) * 2007-05-25 2008-05-30 한국표준과학연구원 진공 레저버를 갖는 초고진공 배기시스템
FR2940322B1 (fr) * 2008-12-19 2011-02-11 Alcatel Lucent Procede de descente en pression dans un sas de chargement et de dechargement et equipement associe
JP5495547B2 (ja) * 2008-12-25 2014-05-21 キヤノン株式会社 処理装置、およびデバイス製造方法
ES2731202T3 (es) * 2009-12-24 2019-11-14 Sumitomo Seika Chemicals Aparato de doble bomba de vacío, sistema de purificación de gas dotado de aparato con doble bomba de vacío y dispositivo de supresión de vibraciones del gas de escape en un aparato con doble bomba de vacío
FR2967219B1 (fr) * 2010-11-05 2012-12-07 Centre Nat Rech Scient Installation de pompage pour l'obtention d'un vide pousse et procede de pompage mettant en oeuvre une telle installation
US9506478B2 (en) * 2012-01-13 2016-11-29 Edwards Limited Vacuum system
FR2998010A1 (fr) * 2012-11-09 2014-05-16 Centre Nat Rech Scient Dispositif de pompage, comprenant un ensemble de pompes en series et un element de commutation commun
JP2015074810A (ja) * 2013-10-10 2015-04-20 日東電工株式会社 スパッタ装置およびスパッタ装置のフィルムロールの交換方法
JP6124776B2 (ja) * 2013-12-02 2017-05-10 住友重機械工業株式会社 コールドトラップ
JP6150716B2 (ja) * 2013-12-02 2017-06-21 住友重機械工業株式会社 コールドトラップ
CN103911589A (zh) * 2014-04-18 2014-07-09 芜湖市德宝新材料股份有限公司 一种镀膜机真空冷却装置
GB2579360A (en) * 2018-11-28 2020-06-24 Edwards Ltd Multiple chamber vacuum exhaust system
CN109972099B (zh) * 2019-05-10 2020-11-27 福建农林大学 一种制备片状氧化铁的方法
JP2022061344A (ja) * 2020-10-06 2022-04-18 エドワーズ株式会社 真空排気システム
CN113345979A (zh) * 2021-05-25 2021-09-03 通威太阳能（成都）有限公司 一种真空机台快速复机方法
GB2608365A (en) * 2021-06-25 2023-01-04 Thermo Fisher Scient Bremen Gmbh Improvements relating to Time-of-Flight mass analysers

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL129514C (de) * 1965-10-27
FR2014489A7 (en) * 1968-07-02 1970-04-17 Kernforschung Gmbh Ges Fuer Uhv chamber for vapour deposition
US3536418A (en) * 1969-02-13 1970-10-27 Onezime P Breaux Cryogenic turbo-molecular vacuum pump
US4089185A (en) * 1974-10-31 1978-05-16 Eckhard Kellner High vacuum pump system
FR2380070A1 (fr) * 1977-02-09 1978-09-08 Cit Alcatel Machine d'evaporation sous vide a cycle simplifie
US4285710A (en) * 1978-09-18 1981-08-25 Varian Associates, Inc. Cryogenic device for restricting the pumping speed of selected gases
US4551197A (en) * 1984-07-26 1985-11-05 Guilmette Joseph G Method and apparatus for the recovery and recycling of condensable gas reactants
US4667477A (en) * 1985-03-28 1987-05-26 Hitachi, Ltd. Cryopump and method of operating same
US4679401A (en) * 1985-07-03 1987-07-14 Helix Technology Corporation Temperature control of cryogenic systems
DE3680335D1 (de) * 1986-06-23 1991-08-22 Leybold Ag Kryopumpe und verfahren zum betrieb dieser kryopumpe.
US4722191A (en) * 1986-09-17 1988-02-02 Pennwalt Corporation High vacuum pumping system

Also Published As

Publication number Publication date
EP0510656A2 (de) 1992-10-28
KR960003788B1 (ko) 1996-03-22
EP0510656A3 (en) 1993-08-04
KR920020087A (ko) 1992-11-20
DE69216277T2 (de) 1997-07-10
EP0510656B1 (de) 1997-01-02
JPH04326943A (ja) 1992-11-16
US5259735A (en) 1993-11-09

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee