FR2380070A1 - Machine d'evaporation sous vide a cycle simplifie - Google Patents
Machine d'evaporation sous vide a cycle simplifieInfo
- Publication number
- FR2380070A1 FR2380070A1 FR7703593A FR7703593A FR2380070A1 FR 2380070 A1 FR2380070 A1 FR 2380070A1 FR 7703593 A FR7703593 A FR 7703593A FR 7703593 A FR7703593 A FR 7703593A FR 2380070 A1 FR2380070 A1 FR 2380070A1
- Authority
- FR
- France
- Prior art keywords
- pump
- substrate
- control means
- timer
- circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Machine d'évaporation sous vide simplifiée comportant une seule vanne, une nacelle d'évaporation, une jauge de mesure et une minuterie. Ladite minuterie commande suivant une séquence pré-établie successivement la mise en service de la jauge de mesure du vide, la durée de chauffage de la nacelle d'évaporation, la durée du blocage de la vanne électromagnétique de mise à l'air. Application au dépôt de couches sur des surfaces optiques ou sur les échantillons de microscopie électronique.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7703593A FR2380070A1 (fr) | 1977-02-09 | 1977-02-09 | Machine d'evaporation sous vide a cycle simplifie |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7703593A FR2380070A1 (fr) | 1977-02-09 | 1977-02-09 | Machine d'evaporation sous vide a cycle simplifie |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2380070A1 true FR2380070A1 (fr) | 1978-09-08 |
FR2380070B3 FR2380070B3 (fr) | 1980-01-04 |
Family
ID=9186502
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7703593A Granted FR2380070A1 (fr) | 1977-02-09 | 1977-02-09 | Machine d'evaporation sous vide a cycle simplifie |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2380070A1 (fr) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0120307A2 (fr) * | 1983-02-25 | 1984-10-03 | Toyota Jidosha Kabushiki Kaisha | Appareil et procédé pour le traitement au plasma d'un matériau en résine |
EP0510656A2 (fr) * | 1991-04-25 | 1992-10-28 | Hitachi, Ltd. | Système et procédé d'évacuation |
FR3025808A1 (fr) * | 2014-09-12 | 2016-03-18 | Essilor Int | Systeme de traitement sous vide configure pour deposer au moins un revetement fonctionnel sur une lentille ophtalmique |
-
1977
- 1977-02-09 FR FR7703593A patent/FR2380070A1/fr active Granted
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0120307A2 (fr) * | 1983-02-25 | 1984-10-03 | Toyota Jidosha Kabushiki Kaisha | Appareil et procédé pour le traitement au plasma d'un matériau en résine |
EP0120307A3 (en) * | 1983-02-25 | 1989-05-03 | Toyota Jidosha Kabushiki Kaisha | Apparatus and method for plasma treatment of resin material |
EP0461683A2 (fr) * | 1983-02-25 | 1991-12-18 | Toyota Jidosha Kabushiki Kaisha | Appareil et procédé pour le traitement par plasma de matière plastique |
EP0461683A3 (en) * | 1983-02-25 | 1993-09-22 | Toyota Jidosha Kabushiki Kaisha | Apparatus and method for plasma treatment of resin material |
EP0510656A2 (fr) * | 1991-04-25 | 1992-10-28 | Hitachi, Ltd. | Système et procédé d'évacuation |
EP0510656A3 (en) * | 1991-04-25 | 1993-08-04 | Hitachi, Ltd. | Evacuation system and method therefor |
US5259735A (en) * | 1991-04-25 | 1993-11-09 | Hitachi, Ltd. | Evacuation system and method therefor |
FR3025808A1 (fr) * | 2014-09-12 | 2016-03-18 | Essilor Int | Systeme de traitement sous vide configure pour deposer au moins un revetement fonctionnel sur une lentille ophtalmique |
Also Published As
Publication number | Publication date |
---|---|
FR2380070B3 (fr) | 1980-01-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US3641973A (en) | Vacuum coating apparatus | |
US4062319A (en) | Vacuum treating apparatus | |
US4632059A (en) | Evaporator device for the evaporation of several materials | |
DE68927920D1 (de) | Magnetronzerstäubungsanlage und -verfahren | |
GB1466790A (en) | Deposition of layers in a vacuum | |
ES2070343T3 (es) | Metodo para revestir sustratos con compuestos a base de silicio. | |
US5538609A (en) | Cathodic sputtering system | |
FR2380070A1 (fr) | Machine d'evaporation sous vide a cycle simplifie | |
US4051010A (en) | Sputtering apparatus | |
GB1089967A (en) | Improvements in or relating to arrangements for the manufacture of electronic components comprising thin films | |
CN108624859A (zh) | 一种双面物理气相沉积镀膜设备及其原理 | |
CN107815659A (zh) | 一种光纤圆柱侧面均匀镀膜装置及其方法 | |
US2463906A (en) | Apparatus and method for making optical devices | |
CN105671510A (zh) | 一种液相基底沉积金属薄膜分离装置 | |
JPH03101206A (ja) | スパッタ装置 | |
US3763821A (en) | Vacuum deposition apparatus | |
US2557584A (en) | Machine for semicontinuous coating of mateiral in strip form | |
JPS5665981A (en) | Sputtering device | |
JPS5585671A (en) | Sputtering apparatus | |
JP4058122B2 (ja) | 光学素子用誘電体多層膜の成膜装置 | |
JPS57160909A (en) | Formation of thin amorphous silicon hydride film | |
CA2281265A1 (fr) | Methode de fabrication de couches minces destinees a l'optique non lineaire | |
JPH0248422Y2 (fr) | ||
JPS6335768A (ja) | 蒸着装置 | |
JPH04210466A (ja) | 真空成膜装置 |