DE602006000357D1 - Sensor zur Verwendung in einer lithografischen Vorrichtung - Google Patents

Sensor zur Verwendung in einer lithografischen Vorrichtung

Info

Publication number
DE602006000357D1
DE602006000357D1 DE602006000357T DE602006000357T DE602006000357D1 DE 602006000357 D1 DE602006000357 D1 DE 602006000357D1 DE 602006000357 T DE602006000357 T DE 602006000357T DE 602006000357 T DE602006000357 T DE 602006000357T DE 602006000357 D1 DE602006000357 D1 DE 602006000357D1
Authority
DE
Germany
Prior art keywords
sensor
lithographic device
lithographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006000357T
Other languages
English (en)
Other versions
DE602006000357T2 (de
Inventor
Haico Victor Kok
De Kerkhof Marcus Adrianus Van
Borgert Kruizinga
Timotheus Franciscus Sengers
Bearrach Moest
Marc Antonius Maria Haast
Peter Werner Weissbrodt
Manfred Helmut Gustav Schrenk
Torsten Harzendorf
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE602006000357D1 publication Critical patent/DE602006000357D1/de
Application granted granted Critical
Publication of DE602006000357T2 publication Critical patent/DE602006000357T2/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09B—EDUCATIONAL OR DEMONSTRATION APPLIANCES; APPLIANCES FOR TEACHING, OR COMMUNICATING WITH, THE BLIND, DEAF OR MUTE; MODELS; PLANETARIA; GLOBES; MAPS; DIAGRAMS
    • G09B17/00—Teaching reading
    • G09B17/04—Teaching reading for increasing the rate of reading; Reading rate control
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09B—EDUCATIONAL OR DEMONSTRATION APPLIANCES; APPLIANCES FOR TEACHING, OR COMMUNICATING WITH, THE BLIND, DEAF OR MUTE; MODELS; PLANETARIA; GLOBES; MAPS; DIAGRAMS
    • G09B19/00—Teaching not covered by other main groups of this subclass
    • G09B19/06—Foreign languages
    • G09B19/08—Printed or written appliances, e.g. text books, bilingual letter assemblies, charts

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Business, Economics & Management (AREA)
  • Environmental & Geological Engineering (AREA)
  • Educational Technology (AREA)
  • Theoretical Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Educational Administration (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Computational Linguistics (AREA)
  • Entrepreneurship & Innovation (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Optical Couplings Of Light Guides (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE602006000357T 2005-02-28 2006-02-17 Sensor zur Verwendung in einer lithografischen Vorrichtung Active DE602006000357T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US67491 2005-02-28
US11/067,491 US7282701B2 (en) 2005-02-28 2005-02-28 Sensor for use in a lithographic apparatus

Publications (2)

Publication Number Publication Date
DE602006000357D1 true DE602006000357D1 (de) 2008-02-07
DE602006000357T2 DE602006000357T2 (de) 2008-12-11

Family

ID=36582003

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006000357T Active DE602006000357T2 (de) 2005-02-28 2006-02-17 Sensor zur Verwendung in einer lithografischen Vorrichtung

Country Status (8)

Country Link
US (3) US7282701B2 (de)
EP (1) EP1696272B1 (de)
JP (1) JP4373987B2 (de)
KR (1) KR100706926B1 (de)
CN (1) CN1862382A (de)
DE (1) DE602006000357T2 (de)
SG (1) SG125238A1 (de)
TW (1) TWI328719B (de)

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CN1862382A (zh) 2006-11-15
EP1696272A2 (de) 2006-08-30
SG125238A1 (en) 2006-09-29
TW200641546A (en) 2006-12-01
US20070108377A1 (en) 2007-05-17
JP4373987B2 (ja) 2009-11-25
JP2006245571A (ja) 2006-09-14
KR20060095468A (ko) 2006-08-31
TWI328719B (en) 2010-08-11
US7282701B2 (en) 2007-10-16
US7453078B2 (en) 2008-11-18
EP1696272B1 (de) 2007-12-26
EP1696272A3 (de) 2006-09-27
US8629418B2 (en) 2014-01-14
KR100706926B1 (ko) 2007-04-12
US20080007844A1 (en) 2008-01-10
DE602006000357T2 (de) 2008-12-11
US20060192093A1 (en) 2006-08-31

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