AU6022400A - Exposure method, exposure system, light source, and method of device manufacture - Google Patents

Exposure method, exposure system, light source, and method of device manufacture

Info

Publication number
AU6022400A
AU6022400A AU60224/00A AU6022400A AU6022400A AU 6022400 A AU6022400 A AU 6022400A AU 60224/00 A AU60224/00 A AU 60224/00A AU 6022400 A AU6022400 A AU 6022400A AU 6022400 A AU6022400 A AU 6022400A
Authority
AU
Australia
Prior art keywords
exposure
light source
device manufacture
exposure system
manufacture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU60224/00A
Inventor
Yutaka Hamamura
Kazumasa Hiramatsu
Kenji Nishi
Tatsushi Nomura
Hitoshi Takeuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU6022400A publication Critical patent/AU6022400A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU60224/00A 1999-07-23 2000-07-21 Exposure method, exposure system, light source, and method of device manufacture Abandoned AU6022400A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP11/209785 1999-07-23
JP20978599 1999-07-23
PCT/JP2000/004892 WO2001008205A1 (en) 1999-07-23 2000-07-21 Exposure method, exposure system, light source, and method of device manufacture

Publications (1)

Publication Number Publication Date
AU6022400A true AU6022400A (en) 2001-02-13

Family

ID=16578569

Family Applications (1)

Application Number Title Priority Date Filing Date
AU60224/00A Abandoned AU6022400A (en) 1999-07-23 2000-07-21 Exposure method, exposure system, light source, and method of device manufacture

Country Status (2)

Country Link
AU (1) AU6022400A (en)
WO (1) WO2001008205A1 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10261775A1 (en) 2002-12-20 2004-07-01 Carl Zeiss Smt Ag Device for the optical measurement of an imaging system
TWI263859B (en) 2003-08-29 2006-10-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
CN100490064C (en) * 2003-09-29 2009-05-20 株式会社尼康 Exposing device and exposing method, and device manufacturing method
JP5136566B2 (en) * 2003-09-29 2013-02-06 株式会社ニコン Exposure apparatus, exposure method, and device manufacturing method
EP1670043B1 (en) 2003-09-29 2013-02-27 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US7282701B2 (en) 2005-02-28 2007-10-16 Asml Netherlands B.V. Sensor for use in a lithographic apparatus
JP5895504B2 (en) * 2011-12-15 2016-03-30 ソニー株式会社 Imaging panel and imaging processing system
DE102013219583A1 (en) * 2013-09-27 2015-04-02 Carl Zeiss Smt Gmbh Mirror, in particular for a microlithographic projection exposure apparatus
US9261794B1 (en) * 2014-12-09 2016-02-16 Cymer, Llc Compensation for a disturbance in an optical source
JP7402313B2 (en) 2020-03-27 2023-12-20 ギガフォトン株式会社 Sensor deterioration determination method
CN112200848B (en) * 2020-10-30 2023-02-17 中国科学院自动化研究所 Depth camera vision enhancement method and system under low-illumination weak-contrast complex environment

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0669015B2 (en) * 1986-09-11 1994-08-31 キヤノン株式会社 Projection exposure device
JPH0332016A (en) * 1989-06-28 1991-02-12 Canon Inc Apparatus for controlling amount of projected light
JPH05343287A (en) * 1992-06-11 1993-12-24 Nikon Corp Exposing method
JPH09181350A (en) * 1995-12-21 1997-07-11 Mitsubishi Cable Ind Ltd Method for detecting short wavelength light
JP2000101129A (en) * 1998-09-18 2000-04-07 Mitsubishi Cable Ind Ltd Light detection method and gan semiconductor light reception element

Also Published As

Publication number Publication date
WO2001008205A1 (en) 2001-02-01

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase