DE3650012D1 - Halbleitervorrichtung. - Google Patents
Halbleitervorrichtung.Info
- Publication number
- DE3650012D1 DE3650012D1 DE3650012T DE3650012T DE3650012D1 DE 3650012 D1 DE3650012 D1 DE 3650012D1 DE 3650012 T DE3650012 T DE 3650012T DE 3650012 T DE3650012 T DE 3650012T DE 3650012 D1 DE3650012 D1 DE 3650012D1
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor device
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Revoked
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/075—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PIN type, e.g. amorphous silicon PIN solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
- H01L31/202—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials including only elements of Group IV of the Periodic Table
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
- H01L31/202—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials including only elements of Group IV of the Periodic Table
- H01L31/204—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials including only elements of Group IV of the Periodic Table including AIVBIV alloys, e.g. SiGe, SiC
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Photovoltaic Devices (AREA)
- Electrodes Of Semiconductors (AREA)
- Bipolar Transistors (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60247463A JPS62106670A (ja) | 1985-11-05 | 1985-11-05 | 半導体素子 |
JP60255681A JP2545066B2 (ja) | 1985-11-14 | 1985-11-14 | 半導体装置 |
JP61099939A JPS62256481A (ja) | 1986-04-30 | 1986-04-30 | 半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3650012D1 true DE3650012D1 (de) | 1994-09-08 |
DE3650012T2 DE3650012T2 (de) | 1994-11-24 |
Family
ID=27309089
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE3650012T Revoked DE3650012T2 (de) | 1985-11-05 | 1986-11-01 | Halbleitervorrichtung. |
DE3650712T Expired - Lifetime DE3650712T2 (de) | 1985-11-05 | 1986-11-01 | Fotovoltaische Vorrichtung |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE3650712T Expired - Lifetime DE3650712T2 (de) | 1985-11-05 | 1986-11-01 | Fotovoltaische Vorrichtung |
Country Status (7)
Country | Link |
---|---|
US (1) | US5032884A (de) |
EP (3) | EP0221523B1 (de) |
KR (1) | KR870005477A (de) |
CN (1) | CN1036817C (de) |
AU (2) | AU600453B2 (de) |
CA (1) | CA1321660C (de) |
DE (2) | DE3650012T2 (de) |
Families Citing this family (45)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6384075A (ja) * | 1986-09-26 | 1988-04-14 | Sanyo Electric Co Ltd | 光起電力装置 |
US5091764A (en) * | 1988-09-30 | 1992-02-25 | Kanegafuchi Kagaku Kogyo Kabushiki Kaisha | Semiconductor device having a transparent electrode and amorphous semiconductor layers |
JP3099957B2 (ja) * | 1990-01-17 | 2000-10-16 | 株式会社リコー | 光導電部材 |
US5155567A (en) * | 1990-01-17 | 1992-10-13 | Ricoh Company, Ltd. | Amorphous photoconductive material and photosensor employing the photoconductive material |
US5158896A (en) * | 1991-07-03 | 1992-10-27 | International Business Machines Corporation | Method for fabricating group III-V heterostructure devices having self-aligned graded contact diffusion regions |
US5162891A (en) * | 1991-07-03 | 1992-11-10 | International Business Machines Corporation | Group III-V heterostructure devices having self-aligned graded contact diffusion regions and method for fabricating same |
US5256887A (en) * | 1991-07-19 | 1993-10-26 | Solarex Corporation | Photovoltaic device including a boron doping profile in an i-type layer |
AU743048C (en) * | 1997-03-10 | 2003-01-16 | Canon Kabushiki Kaisha | Deposited film forming process, deposited film forming apparatus and process for manufacturing semiconductor element |
JP3869952B2 (ja) * | 1998-09-21 | 2007-01-17 | キヤノン株式会社 | 光電変換装置とそれを用いたx線撮像装置 |
EP1056139A3 (de) * | 1999-05-28 | 2007-09-19 | Sharp Kabushiki Kaisha | Photoelektrische Umwandlungsvorrichtung und Herstellungsverfahren |
US6566594B2 (en) * | 2000-04-05 | 2003-05-20 | Tdk Corporation | Photovoltaic element |
US7202102B2 (en) * | 2001-11-27 | 2007-04-10 | Jds Uniphase Corporation | Doped absorption for enhanced responsivity for high speed photodiodes |
US20030111675A1 (en) * | 2001-11-27 | 2003-06-19 | Jds Uniphase Corporation | Doped absorption for enhanced responsivity for high speed photodiodes |
US7344909B2 (en) * | 2002-10-25 | 2008-03-18 | Oc Oerlikon Balzers Ag | Method for producing semi-conducting devices and devices obtained with this method |
JP2006508253A (ja) * | 2002-11-27 | 2006-03-09 | ザ・ユニバーシティ・オブ・トレド | 液状電解物を有した集積型光電気化学とそのシステム |
JP4171428B2 (ja) * | 2003-03-20 | 2008-10-22 | 三洋電機株式会社 | 光起電力装置 |
US7667133B2 (en) * | 2003-10-29 | 2010-02-23 | The University Of Toledo | Hybrid window layer for photovoltaic cells |
WO2006110613A2 (en) * | 2005-04-11 | 2006-10-19 | The University Of Toledo | Integrated photovoltaic-electrolysis cell |
EP1724844A2 (de) | 2005-05-20 | 2006-11-22 | Semiconductor Energy Laboratory Co., Ltd. | Photoelektrische Umwandlungsvorrichtung, Herstellungsverfahren und Halbleitervorrichtung |
US7906723B2 (en) | 2008-04-30 | 2011-03-15 | General Electric Company | Compositionally-graded and structurally-graded photovoltaic devices and methods of fabricating such devices |
US20070023081A1 (en) * | 2005-07-28 | 2007-02-01 | General Electric Company | Compositionally-graded photovoltaic device and fabrication method, and related articles |
US7655542B2 (en) * | 2006-06-23 | 2010-02-02 | Applied Materials, Inc. | Methods and apparatus for depositing a microcrystalline silicon film for photovoltaic device |
US20080223440A1 (en) * | 2007-01-18 | 2008-09-18 | Shuran Sheng | Multi-junction solar cells and methods and apparatuses for forming the same |
US7582515B2 (en) * | 2007-01-18 | 2009-09-01 | Applied Materials, Inc. | Multi-junction solar cells and methods and apparatuses for forming the same |
US20080173350A1 (en) * | 2007-01-18 | 2008-07-24 | Applied Materials, Inc. | Multi-junction solar cells and methods and apparatuses for forming the same |
US8203071B2 (en) * | 2007-01-18 | 2012-06-19 | Applied Materials, Inc. | Multi-junction solar cells and methods and apparatuses for forming the same |
JP2008181965A (ja) * | 2007-01-23 | 2008-08-07 | Sharp Corp | 積層型光電変換装置及びその製造方法 |
US20080245414A1 (en) * | 2007-04-09 | 2008-10-09 | Shuran Sheng | Methods for forming a photovoltaic device with low contact resistance |
US7875486B2 (en) * | 2007-07-10 | 2011-01-25 | Applied Materials, Inc. | Solar cells and methods and apparatuses for forming the same including I-layer and N-layer chamber cleaning |
US20090104733A1 (en) * | 2007-10-22 | 2009-04-23 | Yong Kee Chae | Microcrystalline silicon deposition for thin film solar applications |
US20090130827A1 (en) * | 2007-11-02 | 2009-05-21 | Soo Young Choi | Intrinsic amorphous silicon layer |
KR20100095426A (ko) * | 2007-11-02 | 2010-08-30 | 어플라이드 머티어리얼스, 인코포레이티드 | 증착 공정들 간의 플라즈마 처리 |
EP2216826A4 (de) * | 2007-11-30 | 2016-10-12 | Kaneka Corp | Photoelektrische siliciumdünnfilm-umwandlungsvorrichtung |
US8895842B2 (en) * | 2008-08-29 | 2014-11-25 | Applied Materials, Inc. | High quality TCO-silicon interface contact structure for high efficiency thin film silicon solar cells |
US20100059110A1 (en) * | 2008-09-11 | 2010-03-11 | Applied Materials, Inc. | Microcrystalline silicon alloys for thin film and wafer based solar applications |
US20110114177A1 (en) * | 2009-07-23 | 2011-05-19 | Applied Materials, Inc. | Mixed silicon phase film for high efficiency thin film silicon solar cells |
WO2011046664A2 (en) * | 2009-10-15 | 2011-04-21 | Applied Materials, Inc. | A barrier layer disposed between a substrate and a transparent conductive oxide layer for thin film silicon solar cells |
US20110126875A1 (en) * | 2009-12-01 | 2011-06-02 | Hien-Minh Huu Le | Conductive contact layer formed on a transparent conductive layer by a reactive sputter deposition |
US20110232753A1 (en) * | 2010-03-23 | 2011-09-29 | Applied Materials, Inc. | Methods of forming a thin-film solar energy device |
WO2012040013A2 (en) * | 2010-09-22 | 2012-03-29 | First Solar, Inc. | Photovoltaic device containing an n-type dopant source |
KR20120034965A (ko) * | 2010-10-04 | 2012-04-13 | 삼성전자주식회사 | 태양 전지 |
JP5583196B2 (ja) * | 2011-12-21 | 2014-09-03 | パナソニック株式会社 | 薄膜太陽電池およびその製造方法 |
US11201253B2 (en) * | 2016-11-15 | 2021-12-14 | Shin-Etsu Chemical Co., Ltd. | High photovoltaic-conversion efficiency solar cell, method for manufacturing the same, solar cell module, and photovoltaic power generation system |
DE112018000012B4 (de) * | 2017-03-31 | 2019-11-07 | Ngk Insulators, Ltd. | Verbundene Körper und Akustikwellenvorrichtungen |
TWI791099B (zh) * | 2018-03-29 | 2023-02-01 | 日商日本碍子股份有限公司 | 接合體及彈性波元件 |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2323592C2 (de) * | 1972-06-09 | 1981-09-17 | BBC AG Brown, Boveri & Cie., Baden, Aargau | Thyristor |
JPS5252593A (en) * | 1975-10-27 | 1977-04-27 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor light receiving diode |
US4117506A (en) * | 1977-07-28 | 1978-09-26 | Rca Corporation | Amorphous silicon photovoltaic device having an insulating layer |
US4200473A (en) * | 1979-03-12 | 1980-04-29 | Rca Corporation | Amorphous silicon Schottky barrier solar cells incorporating a thin insulating layer and a thin doped layer |
US4251287A (en) * | 1979-10-01 | 1981-02-17 | The University Of Delaware | Amorphous semiconductor solar cell |
US4255211A (en) * | 1979-12-31 | 1981-03-10 | Chevron Research Company | Multilayer photovoltaic solar cell with semiconductor layer at shorting junction interface |
SE8105278L (sv) * | 1980-09-09 | 1982-03-10 | Energy Conversion Devices Inc | Fotokensligt don, fotokenslig amorf legering och sett att framstella denna |
IE52206B1 (en) * | 1980-09-09 | 1987-08-05 | Energy Conversion Devices Inc | Method of making photoresponsive amorphous germanium alloys and devices |
US4522663A (en) * | 1980-09-09 | 1985-06-11 | Sovonics Solar Systems | Method for optimizing photoresponsive amorphous alloys and devices |
US4490208A (en) * | 1981-07-08 | 1984-12-25 | Agency Of Industrial Science And Technology | Method of producing thin films of silicon |
EP0070509B2 (de) * | 1981-07-17 | 1993-05-19 | Kanegafuchi Kagaku Kogyo Kabushiki Kaisha | Amorpher Halbleiter und photovoltaische Einrichtung aus amorphem Silizium |
JPS5864070A (ja) * | 1981-10-13 | 1983-04-16 | Kanegafuchi Chem Ind Co Ltd | フツ素を含むアモルフアスシリコン太陽電池 |
US4379943A (en) * | 1981-12-14 | 1983-04-12 | Energy Conversion Devices, Inc. | Current enhanced photovoltaic device |
US4398054A (en) * | 1982-04-12 | 1983-08-09 | Chevron Research Company | Compensated amorphous silicon solar cell incorporating an insulating layer |
US4415760A (en) * | 1982-04-12 | 1983-11-15 | Chevron Research Company | Amorphous silicon solar cells incorporating an insulating layer in the body of amorphous silicon and a method of suppressing the back diffusion of holes into an N-type region |
JPS5914679A (ja) * | 1982-07-16 | 1984-01-25 | Toshiba Corp | 光起電力装置 |
US4633031A (en) * | 1982-09-24 | 1986-12-30 | Todorof William J | Multi-layer thin film, flexible silicon alloy photovoltaic cell |
US4492743A (en) * | 1982-10-15 | 1985-01-08 | Standard Oil Company (Indiana) | Multilayer photoelectrodes and photovoltaic cells |
US4451970A (en) * | 1982-10-21 | 1984-06-05 | Energy Conversion Devices, Inc. | System and method for eliminating short circuit current paths in photovoltaic devices |
JPS5975682A (ja) * | 1982-10-25 | 1984-04-28 | Nippon Denso Co Ltd | 光起電力素子 |
US4485265A (en) * | 1982-11-22 | 1984-11-27 | President And Fellows Of Harvard College | Photovoltaic cell |
GB2137810B (en) * | 1983-03-08 | 1986-10-22 | Agency Ind Science Techn | A solar cell of amorphous silicon |
JPS59229878A (ja) * | 1983-06-11 | 1984-12-24 | Toa Nenryo Kogyo Kk | 新規なアモルフアス半導体素子及びその製造方法、並びにそれを製造するための装置 |
JPS6050972A (ja) * | 1983-08-31 | 1985-03-22 | Agency Of Ind Science & Technol | 薄膜太陽電池 |
US4531015A (en) * | 1984-04-12 | 1985-07-23 | Atlantic Richfield Company | PIN Amorphous silicon solar cell with nitrogen compensation |
US4742012A (en) * | 1984-11-27 | 1988-05-03 | Toa Nenryo Kogyo K.K. | Method of making graded junction containing amorphous semiconductor device |
-
1986
- 1986-10-28 CA CA000521602A patent/CA1321660C/en not_active Expired - Lifetime
- 1986-10-31 AU AU64619/86A patent/AU600453B2/en not_active Expired
- 1986-11-01 EP EP86115170A patent/EP0221523B1/de not_active Revoked
- 1986-11-01 EP EP19920104633 patent/EP0494090A3/de not_active Ceased
- 1986-11-01 DE DE3650012T patent/DE3650012T2/de not_active Revoked
- 1986-11-01 EP EP92104628A patent/EP0494088B1/de not_active Expired - Lifetime
- 1986-11-01 DE DE3650712T patent/DE3650712T2/de not_active Expired - Lifetime
- 1986-11-05 CN CN86106353A patent/CN1036817C/zh not_active Expired - Lifetime
- 1986-11-05 KR KR860009364A patent/KR870005477A/ko not_active Application Discontinuation
-
1990
- 1990-02-07 US US07/477,138 patent/US5032884A/en not_active Expired - Lifetime
- 1990-11-09 AU AU65966/90A patent/AU636677B2/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
EP0494090A3 (de) | 1992-08-05 |
DE3650712D1 (de) | 1999-04-01 |
KR870005477A (ko) | 1987-06-09 |
AU6596690A (en) | 1991-01-24 |
US5032884A (en) | 1991-07-16 |
EP0494090A2 (de) | 1992-07-08 |
AU6461986A (en) | 1987-05-07 |
EP0221523B1 (de) | 1994-08-03 |
DE3650712T2 (de) | 1999-09-30 |
CN86106353A (zh) | 1987-12-02 |
AU600453B2 (en) | 1990-08-16 |
DE3650012T2 (de) | 1994-11-24 |
AU636677B2 (en) | 1993-05-06 |
EP0494088A1 (de) | 1992-07-08 |
EP0221523A2 (de) | 1987-05-13 |
CN1036817C (zh) | 1997-12-24 |
EP0221523A3 (en) | 1989-07-26 |
CA1321660C (en) | 1993-08-24 |
EP0494088B1 (de) | 1999-02-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8363 | Opposition against the patent | ||
8331 | Complete revocation |