CN1764675A - 用于形成精细图形的助剂及其制备方法 - Google Patents
用于形成精细图形的助剂及其制备方法 Download PDFInfo
- Publication number
- CN1764675A CN1764675A CNA2004800077756A CN200480007775A CN1764675A CN 1764675 A CN1764675 A CN 1764675A CN A2004800077756 A CNA2004800077756 A CN A2004800077756A CN 200480007775 A CN200480007775 A CN 200480007775A CN 1764675 A CN1764675 A CN 1764675A
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- CN
- China
- Prior art keywords
- polyvinyl alcohol
- modified polyvinyl
- water
- resist pattern
- blocking group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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Images
Classifications
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F16/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/28—Condensation with aldehydes or ketones
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2810/00—Chemical modification of a polymer
- C08F2810/20—Chemical modification of a polymer leading to a crosslinking, either explicitly or inherently
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/44—Preparation of metal salts or ammonium salts
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- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
聚合物 | 加热温度(℃) | 加热时间(分钟) | 高分子量主体成分的数量 | 可滤性的评价 | |
实施例1 | B | 100 | 180 | 100或更少 | ○ |
实施例2 | C | 100 | 15 | 100或更少 | ○ |
实施例3 | D | 80 | 180 | 300 | ○ |
对比例1 | A | - | - | 2700 | × |
对比例2 | E | 60 | 180 | 2400 | × |
聚合物 | 高分子量主体成分的数量(ppm) | 涂覆后的缺陷数目(个/晶片) | 显影后的缺陷数目(个/晶片) | |
实施例4 | B | 100或更少 | 50 | 65 |
实施例5 | C | 100或更少 | 55 | 72 |
实施例6 | D | 300 | 75 | 84 |
对比例3 | A | 2700 | 160 | 183 |
对比例4 | E | 2400 | 112 | 146 |
贮存前 | 贮存两周后 | 贮存1月后 | |||
5℃贮存 | 25℃贮存 | 5℃贮存 | 25℃贮存 | ||
实施例7 | 100或更少 | 100 | 200 | 200 | 200 |
对比例5 | 100或更少 | 4000 | 5800 | 9900 | 10800 |
Claims (5)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP090376/2003 | 2003-03-28 | ||
JP2003090376A JP4012480B2 (ja) | 2003-03-28 | 2003-03-28 | 微細パターン形成補助剤及びその製造法 |
Publications (2)
Publication Number | Publication Date |
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CN1764675A true CN1764675A (zh) | 2006-04-26 |
CN1328295C CN1328295C (zh) | 2007-07-25 |
Family
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Family Applications (1)
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CNB2004800077756A Expired - Fee Related CN1328295C (zh) | 2003-03-28 | 2004-03-18 | 用于形成精细图形的助剂及其制备方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US7598320B2 (zh) |
JP (1) | JP4012480B2 (zh) |
KR (1) | KR101059378B1 (zh) |
CN (1) | CN1328295C (zh) |
DE (1) | DE112004000774T5 (zh) |
TW (1) | TW200428166A (zh) |
WO (1) | WO2004087773A1 (zh) |
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TWI574982B (zh) * | 2012-03-09 | 2017-03-21 | 馬克專利公司 | 用於移除嵌段共聚物中之金屬之方法及材料 |
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JP4235466B2 (ja) * | 2003-02-24 | 2009-03-11 | Azエレクトロニックマテリアルズ株式会社 | 水溶性樹脂組成物、パターン形成方法及びレジストパターンの検査方法 |
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-
2003
- 2003-03-28 JP JP2003090376A patent/JP4012480B2/ja not_active Expired - Lifetime
-
2004
- 2004-03-18 CN CNB2004800077756A patent/CN1328295C/zh not_active Expired - Fee Related
- 2004-03-18 DE DE112004000774T patent/DE112004000774T5/de not_active Withdrawn
- 2004-03-18 WO PCT/JP2004/003650 patent/WO2004087773A1/ja active Application Filing
- 2004-03-18 KR KR1020057018341A patent/KR101059378B1/ko active IP Right Grant
- 2004-03-18 US US10/550,110 patent/US7598320B2/en not_active Expired - Fee Related
- 2004-03-26 TW TW093108220A patent/TW200428166A/zh unknown
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103258720A (zh) * | 2011-12-31 | 2013-08-21 | 罗门哈斯电子材料有限公司 | 光刻胶图案修整方法 |
CN103258720B (zh) * | 2011-12-31 | 2016-05-18 | 罗门哈斯电子材料有限公司 | 光刻胶图案修整方法 |
TWI574982B (zh) * | 2012-03-09 | 2017-03-21 | 馬克專利公司 | 用於移除嵌段共聚物中之金屬之方法及材料 |
TWI599589B (zh) * | 2012-03-09 | 2017-09-21 | 馬克專利公司 | 形成定向自組裝圖案之方法 |
CN105085722A (zh) * | 2015-08-12 | 2015-11-25 | 内蒙古蒙维科技有限公司 | 一种去除聚乙烯醇水溶液中杂质离子的方法 |
Also Published As
Publication number | Publication date |
---|---|
KR101059378B1 (ko) | 2011-08-26 |
WO2004087773A1 (ja) | 2004-10-14 |
JP4012480B2 (ja) | 2007-11-21 |
US7598320B2 (en) | 2009-10-06 |
DE112004000774T5 (de) | 2011-11-24 |
KR20050119664A (ko) | 2005-12-21 |
JP2004294992A (ja) | 2004-10-21 |
US20060211814A1 (en) | 2006-09-21 |
CN1328295C (zh) | 2007-07-25 |
TW200428166A (en) | 2004-12-16 |
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