CN112764319A - 定位装置、曝光装置以及物品的制造方法 - Google Patents

定位装置、曝光装置以及物品的制造方法 Download PDF

Info

Publication number
CN112764319A
CN112764319A CN202011134936.5A CN202011134936A CN112764319A CN 112764319 A CN112764319 A CN 112764319A CN 202011134936 A CN202011134936 A CN 202011134936A CN 112764319 A CN112764319 A CN 112764319A
Authority
CN
China
Prior art keywords
mounting table
positioning device
plate
original plate
wall portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202011134936.5A
Other languages
English (en)
Chinese (zh)
Inventor
本间将人
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN112764319A publication Critical patent/CN112764319A/zh
Pending legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7019—Calibration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
CN202011134936.5A 2019-10-21 2020-10-21 定位装置、曝光装置以及物品的制造方法 Pending CN112764319A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019-192133 2019-10-21
JP2019192133A JP7469864B2 (ja) 2019-10-21 2019-10-21 位置決め装置、露光装置、および物品の製造方法

Publications (1)

Publication Number Publication Date
CN112764319A true CN112764319A (zh) 2021-05-07

Family

ID=75637210

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202011134936.5A Pending CN112764319A (zh) 2019-10-21 2020-10-21 定位装置、曝光装置以及物品的制造方法

Country Status (4)

Country Link
JP (1) JP7469864B2 (ja)
KR (1) KR20210047259A (ja)
CN (1) CN112764319A (ja)
TW (1) TWI811569B (ja)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1137895A (ja) * 1997-07-17 1999-02-12 Nikon Corp 反射率測定センサの検査方法
US20070085990A1 (en) * 2005-10-11 2007-04-19 Canon Kabushiki Kaisha Exposure apparatus
JP2009141190A (ja) * 2007-12-07 2009-06-25 Nikon Corp 露光装置、露光方法及びデバイス製造方法
JP2012164785A (ja) * 2011-02-07 2012-08-30 Canon Inc インプリント装置、および、物品の製造方法
JP2012209401A (ja) * 2011-03-29 2012-10-25 Canon Inc 計測装置、リソグラフィ装置及びデバイスの製造方法。
CN108614392A (zh) * 2016-12-13 2018-10-02 佳能株式会社 平版印刷装置、物品的制造方法以及测量装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3089802B2 (ja) * 1992-04-01 2000-09-18 株式会社ニコン ステージの位置計測装置、投影露光装置及び投影露光方法
JP2001160531A (ja) * 1999-12-01 2001-06-12 Canon Inc ステージ装置
JP2004241478A (ja) 2003-02-04 2004-08-26 Nikon Corp 露光方法及びその装置、並びにデバイス製造方法
JP2010161116A (ja) 2009-01-06 2010-07-22 Canon Inc 位置決め装置、それを用いた露光装置及びデバイスの製造方法
JP5002613B2 (ja) * 2009-03-31 2012-08-15 株式会社東芝 Ｘｙステージ装置
NL2015639A (en) * 2014-11-28 2016-09-20 Asml Netherlands Bv Encoder, position measurement system and lithographic apparatus.
JP2017111243A (ja) 2015-12-15 2017-06-22 キヤノン株式会社 ステージ装置、リソグラフィ装置、及び物品の製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1137895A (ja) * 1997-07-17 1999-02-12 Nikon Corp 反射率測定センサの検査方法
US20070085990A1 (en) * 2005-10-11 2007-04-19 Canon Kabushiki Kaisha Exposure apparatus
JP2009141190A (ja) * 2007-12-07 2009-06-25 Nikon Corp 露光装置、露光方法及びデバイス製造方法
JP2012164785A (ja) * 2011-02-07 2012-08-30 Canon Inc インプリント装置、および、物品の製造方法
JP2012209401A (ja) * 2011-03-29 2012-10-25 Canon Inc 計測装置、リソグラフィ装置及びデバイスの製造方法。
CN108614392A (zh) * 2016-12-13 2018-10-02 佳能株式会社 平版印刷装置、物品的制造方法以及测量装置

Also Published As

Publication number Publication date
JP2021067775A (ja) 2021-04-30
JP7469864B2 (ja) 2024-04-17
TW202117465A (zh) 2021-05-01
TWI811569B (zh) 2023-08-11
KR20210047259A (ko) 2021-04-29

Similar Documents

Publication Publication Date Title
US8964166B2 (en) Stage device, exposure apparatus and method of producing device
JP2000012453A (ja) 露光装置及びその使用方法、露光方法、並びにマスクの製造方法
JP2020112695A (ja) 露光装置、露光方法および、物品製造方法
JP5369443B2 (ja) ステージ装置、露光装置、露光方法、及びデバイス製造方法
US20010006422A1 (en) Stage system in projection exposure apparatus
JP2009021498A (ja) 露光装置、液浸システム、及びデバイス製造方法
JP2008288506A (ja) 調整方法、露光装置、及びデバイス製造方法
CN112764319A (zh) 定位装置、曝光装置以及物品的制造方法
JP2013083655A (ja) 露光装置、及びデバイス製造方法
JP7385421B2 (ja) 露光装置、および物品製造方法
JP2008300770A (ja) 露光装置、露光方法、リソグラフィシステム、デバイス製造システム、デバイスの製造方法、及び基板処理方法
JP2020042255A (ja) 露光装置、および物品の製造方法
WO2002047132A1 (fr) Dispositif et procede d'exposition par projection de rayons x et dispositif a semi-conducteurs
JP5414288B2 (ja) 露光方法及び装置、並びにデバイス製造方法
JP2007299864A (ja) 保持方法及び保持装置、パターン形成方法及びパターン形成装置、デバイス製造方法
JP2019032552A (ja) 露光装置、露光方法、デバイス製造方法
US10725388B2 (en) Exposure apparatus and method of manufacturing article
JP7033168B2 (ja) 露光装置、および物品の製造方法
JP5612810B2 (ja) 露光装置及び露光方法、並びにデバイス製造方法
JP6418281B2 (ja) 露光装置
JP2001230192A (ja) 投影露光装置及びデバイスの製造方法
JP2009238922A (ja) 露光装置、露光方法及びデバイスの製造方法
JP2011124415A (ja) 露光装置、露光方法、及びデバイス製造方法
JP2017015995A (ja) 露光装置及び物品の製造方法
JP2004311773A (ja) 位置検出装置、露光装置およびそれを用いたデバイス製造方法

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination