CN104488071B - 基板处理装置以及器件制造方法 - Google Patents

基板处理装置以及器件制造方法 Download PDF

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Publication number: CN104488071B
Authority: CN; China
Prior art keywords: substrate; functional layer; pattern; lyophily; lyophobicity
Prior art date: 2012-05-24
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Active

Application number

CN201380038134.6A

Other languages

English (en)

Chinese (zh)

Other versions

CN104488071A (zh

Inventor

奈良圭

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Nikon Corp

Original Assignee

Nikon Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2012-05-24

Filing date

2013-05-23

Publication date

2017-10-13

2013-05-23 Application filed by Nikon Corp filed Critical Nikon Corp

2013-05-23 Priority to CN201710368364.9A priority Critical patent/CN107256824A/zh

2015-04-01 Publication of CN104488071A publication Critical patent/CN104488071A/zh

2017-10-13 Application granted granted Critical

2017-10-13 Publication of CN104488071B publication Critical patent/CN104488071B/zh

Status Active legal-status Critical Current

2033-05-23 Anticipated expiration legal-status Critical

Links

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Classifications

- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02623—Liquid deposition
- H01L21/02628—Liquid deposition using solutions
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02551—Group 12/16 materials
- H01L21/02554—Oxides
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02636—Selective deposition, e.g. simultaneous growth of mono- and non-monocrystalline semiconductor materials
- H01L21/02639—Preparation of substrate for selective deposition
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods

Landscapes

Engineering & Computer Science (AREA)
Physics & Mathematics (AREA)
Manufacturing & Machinery (AREA)
General Physics & Mathematics (AREA)
Power Engineering (AREA)
Condensed Matter Physics & Semiconductors (AREA)
Computer Hardware Design (AREA)
Microelectronics & Electronic Packaging (AREA)
Nonlinear Science (AREA)
Optics & Photonics (AREA)
Crystallography & Structural Chemistry (AREA)
Chemical & Material Sciences (AREA)
Mathematical Physics (AREA)
Thin Film Transistor (AREA)
Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Spray Control Apparatus (AREA)
Other Surface Treatments For Metallic Materials (AREA)
Nozzles (AREA)
Electroluminescent Light Sources (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Special Spraying Apparatus (AREA)
Application Of Or Painting With Fluid Materials (AREA)
Chemically Coating (AREA)
Chemical Vapour Deposition (AREA)
Manufacturing Of Printed Wiring (AREA)
Electrodes Of Semiconductors (AREA)
Formation Of Insulating Films (AREA)

CN201380038134.6A 2012-05-24 2013-05-23 基板处理装置以及器件制造方法 Active CN104488071B (zh)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
CN201710368364.9A CN107256824A (zh)	2012-05-24	2013-05-23	器件制造方法

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
JP2012-118617		2012-05-24
JP2012118617		2012-05-24
PCT/JP2013/064381 WO2013176222A1 (ja)	2012-05-24	2013-05-23	基板処理装置、及びデバイス製造方法

Related Child Applications (1)

Application Number	Title	Priority Date	Filing Date
CN201710368364.9A Division CN107256824A (zh)	2012-05-24	2013-05-23	器件制造方法

Publications (2)

Publication Number	Publication Date
CN104488071A CN104488071A (zh)	2015-04-01
CN104488071B true CN104488071B (zh)	2017-10-13

Family

ID=49623903

Family Applications (2)

Application Number	Title	Priority Date	Filing Date
CN201380038134.6A Active CN104488071B (zh)	2012-05-24	2013-05-23	基板处理装置以及器件制造方法
CN201710368364.9A Pending CN107256824A (zh)	2012-05-24	2013-05-23	器件制造方法

Family Applications After (1)

Application Number	Title	Priority Date	Filing Date
CN201710368364.9A Pending CN107256824A (zh)	2012-05-24	2013-05-23	器件制造方法

Country Status (4)

Country	Link
JP (6)	JP6264285B2 (ko)
KR (5)	KR102057813B1 (ko)
CN (2)	CN104488071B (ko)
WO (1)	WO2013176222A1 (ko)

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TWI762439B (zh) *	2015-02-18	2022-05-01	日商尼康股份有限公司	薄膜製造裝置、及薄膜製造方法
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CN106827786B (zh) *	2017-02-16	2019-04-05	中国科学技术大学	一种非接触式连续辊动装置
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JP2023100212A (ja) *	2022-01-05	2023-07-18	信越化学工業株式会社	成膜装置および成膜方法
CN217181402U (zh) *	2022-01-14	2022-08-12	宁德时代新能源科技股份有限公司	一种基材处理的设备
WO2023234118A1 (ja) *	2022-06-03	2023-12-07	東洋紡株式会社	光電変換素子及びその製造方法

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