CN101479220A - 高纯度六氟丙烯的制造方法及清洗气 - Google Patents

高纯度六氟丙烯的制造方法及清洗气 Download PDF

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Publication number
CN101479220A
CN101479220A CNA2007800242140A CN200780024214A CN101479220A CN 101479220 A CN101479220 A CN 101479220A CN A2007800242140 A CNA2007800242140 A CN A2007800242140A CN 200780024214 A CN200780024214 A CN 200780024214A CN 101479220 A CN101479220 A CN 101479220A
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CN
China
Prior art keywords
high purity
manufacture method
content
volume
chlorine
Prior art date
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Pending
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CNA2007800242140A
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English (en)
Chinese (zh)
Inventor
大野博基
大井敏夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
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Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Publication of CN101479220A publication Critical patent/CN101479220A/zh
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C17/00—Preparation of halogenated hydrocarbons
    • C07C17/38—Separation; Purification; Stabilisation; Use of additives
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C17/00—Preparation of halogenated hydrocarbons
    • C07C17/38—Separation; Purification; Stabilisation; Use of additives
    • C07C17/383—Separation; Purification; Stabilisation; Use of additives by distillation
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C17/00—Preparation of halogenated hydrocarbons
    • C07C17/38—Separation; Purification; Stabilisation; Use of additives
    • C07C17/389—Separation; Purification; Stabilisation; Use of additives by adsorption on solids

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
CNA2007800242140A 2006-06-30 2007-06-28 高纯度六氟丙烯的制造方法及清洗气 Pending CN101479220A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006181477 2006-06-30
JP181477/2006 2006-06-30

Publications (1)

Publication Number Publication Date
CN101479220A true CN101479220A (zh) 2009-07-08

Family

ID=38845608

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2007800242140A Pending CN101479220A (zh) 2006-06-30 2007-06-28 高纯度六氟丙烯的制造方法及清洗气

Country Status (3)

Country Link
JP (1) JP5132555B2 (fr)
CN (1) CN101479220A (fr)
WO (1) WO2008001844A1 (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102695692A (zh) * 2009-10-15 2012-09-26 墨西哥化学阿玛科股份有限公司 用于纯化（氢）氟烯烃的方法
CN102766016A (zh) * 2012-08-09 2012-11-07 山东东岳高分子材料有限公司 从六氟丙烯生产工艺中回收八氟丙烷的方法
CN104788283A (zh) * 2015-03-12 2015-07-22 福建三农化学农药有限责任公司 一种六氟丙烯生产裂解气的双线精馏方法及精馏设备
CN113784776A (zh) * 2019-08-06 2021-12-10 昭和电工株式会社 气体处理方法和气体处理装置

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* Cited by examiner, † Cited by third party
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FR2933402B1 (fr) * 2008-07-03 2010-07-30 Arkema France Procede de purification de 2,3,3,3-tetrafluoro-1-propene (hfo1234yf)
TW201103972A (en) 2009-04-01 2011-02-01 Solvay Fluor Gmbh Process for the manufacture of etched items
JP5733207B2 (ja) 2009-07-06 2015-06-10 三菱瓦斯化学株式会社 制振フィルム
AU2013204796B2 (en) * 2009-10-15 2014-09-11 Mexichem Amanco Holding S.A. De C.V. Process for purifying (hydro) fluoroalkenes
KR101198351B1 (ko) 2011-04-05 2012-11-06 (주)원익머트리얼즈 고순도 헥사플루오르프로필렌 정제장치
KR101198350B1 (ko) 2011-04-05 2012-11-08 (주)원익머트리얼즈 고순도 헥사플루오르프로필렌 정제용기
KR101198349B1 (ko) 2011-04-05 2012-11-06 (주)원익머트리얼즈 고순도 헥사플루오르프로필렌 정제방법
US8337595B2 (en) * 2011-04-20 2012-12-25 Honeywell International Inc. Purification of trans-1,3,3,3-tetrafluoropropene
JPWO2013151070A1 (ja) * 2012-04-03 2015-12-17 旭硝子株式会社 フルオロオレフィンの精製方法、およびフルオロオレフィンの製造方法
JP2013241390A (ja) * 2012-04-27 2013-12-05 Asahi Glass Co Ltd フルオロオレフィンの精製方法、およびフルオロオレフィンの製造方法
JP2016516042A (ja) 2013-03-15 2016-06-02 ザ ケマーズ カンパニー エフシー リミテッド ライアビリティ カンパニー フルオロオレフィン中のアルキン不純物の低減のための方法
EP2970058B1 (fr) * 2013-03-15 2023-12-13 Honeywell International Inc. Méthode d'élimination d'impuretés d'éthylène halogénées dans une mélange d'oléfines fluorés
US10995047B2 (en) 2013-03-15 2021-05-04 The Chemours Company Fc, Llc Process for the reduction of RƒC≡CX impurities in fluoroolefins
KR101433626B1 (ko) 2013-05-22 2014-09-23 (주)원익머트리얼즈 헥사플루오르플로필렌옥사이드 고순도 정제방법
JP6822763B2 (ja) * 2015-11-16 2021-01-27 セントラル硝子株式会社 ドライエッチング方法
CN111250038B (zh) * 2020-03-09 2023-01-13 临海市利民化工有限公司 一种六氟丙烯二聚体的分离纯化方法及所用吸附剂
WO2024111416A1 (fr) * 2022-11-25 2024-05-30 Ａｇｃ株式会社 Procédé de séparation d'hexafluoropropylène à partir de chlorodifluorométhane

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51128901A (en) * 1975-05-02 1976-11-10 Daikin Ind Ltd Separation method
GB8708618D0 (en) * 1987-04-10 1987-05-13 Ici Plc Production process
JP2542394B2 (ja) * 1987-08-06 1996-10-09 イー・アイ・デユポン・ドウ・ヌムール・アンド・カンパニー ヘキサフロロプロピレンの精製方法
JPH09296271A (ja) * 1996-05-02 1997-11-18 Samuko Internatl Kenkyusho:Kk プラズマｃｖｄ反応室清掃方法及びプラズマエッチング方法
JPH1027781A (ja) * 1996-07-10 1998-01-27 Daikin Ind Ltd エッチングガスおよびクリーニングガス
JP4220318B2 (ja) * 2003-07-01 2009-02-04 大陽日酸株式会社 プロセスチャンバー内のクリーニング方法

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102695692A (zh) * 2009-10-15 2012-09-26 墨西哥化学阿玛科股份有限公司 用于纯化（氢）氟烯烃的方法
CN102695692B (zh) * 2009-10-15 2015-02-25 墨西哥化学阿玛科股份有限公司 用于纯化(氢)氟烯烃的方法
CN104591953A (zh) * 2009-10-15 2015-05-06 墨西哥化学阿玛科股份有限公司 用于纯化氢氟烯烃的方法
US20150191407A1 (en) * 2009-10-15 2015-07-09 Mexichem Amanco Holding S.A. De C.V. Process for Purifying (Hydro)Fluoroalkenes
US9309176B2 (en) * 2009-10-15 2016-04-12 Mexichem Amanco Holding S.A. De C.V. Process for purifying (hydro)fluoroalkenes
CN104591953B (zh) * 2009-10-15 2017-04-12 墨西哥化学阿玛科股份有限公司 用于纯化氢氟烯烃的方法
CN102766016A (zh) * 2012-08-09 2012-11-07 山东东岳高分子材料有限公司 从六氟丙烯生产工艺中回收八氟丙烷的方法
CN104788283A (zh) * 2015-03-12 2015-07-22 福建三农化学农药有限责任公司 一种六氟丙烯生产裂解气的双线精馏方法及精馏设备
CN113784776A (zh) * 2019-08-06 2021-12-10 昭和电工株式会社 气体处理方法和气体处理装置
CN113784776B (zh) * 2019-08-06 2024-03-19 株式会社力森诺科 气体处理方法和气体处理装置

Also Published As

Publication number Publication date
JP5132555B2 (ja) 2013-01-30
JPWO2008001844A1 (ja) 2009-11-26
WO2008001844A1 (fr) 2008-01-03

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Application publication date: 20090708