ATE529901T1 - Piezoelektrischer dünnfilm, verfahren zur herstellung eines piezoelektrischen dünnfilms, piezoelektrisches element und inkjet- aufzeichnungskopf - Google Patents
Piezoelektrischer dünnfilm, verfahren zur herstellung eines piezoelektrischen dünnfilms, piezoelektrisches element und inkjet- aufzeichnungskopfInfo
- Publication number
- ATE529901T1 ATE529901T1 AT05719750T AT05719750T ATE529901T1 AT E529901 T1 ATE529901 T1 AT E529901T1 AT 05719750 T AT05719750 T AT 05719750T AT 05719750 T AT05719750 T AT 05719750T AT E529901 T1 ATE529901 T1 AT E529901T1
- Authority
- AT
- Austria
- Prior art keywords
- thin film
- piezoelectric
- piezoelectric thin
- recording head
- producing
- Prior art date
Links
- 239000010409 thin film Substances 0.000 title abstract 7
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000010408 film Substances 0.000 abstract 2
- 239000013078 crystal Substances 0.000 abstract 1
- 238000003980 solgel method Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/85—Piezoelectric or electrostrictive active materials
- H10N30/853—Ceramic compositions
- H10N30/8548—Lead-based oxides
- H10N30/8554—Lead-zirconium titanate [PZT] based
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/20—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14201—Structure of print heads with piezoelectric elements
- B41J2/14233—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
- H10N30/074—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing
- H10N30/077—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by liquid phase deposition
- H10N30/078—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by liquid phase deposition by sol-gel deposition
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/20—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
- H10N30/204—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators using bending displacement, e.g. unimorph, bimorph or multimorph cantilever or membrane benders
- H10N30/2047—Membrane type
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/704—Piezoelectric or electrostrictive devices based on piezoelectric or electrostrictive films or coatings
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/42—Piezoelectric device making
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Dispersion Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Formation Of Insulating Films (AREA)
- Semiconductor Memories (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004055479 | 2004-02-27 | ||
PCT/JP2005/003435 WO2005083809A1 (en) | 2004-02-27 | 2005-02-23 | Piezoelectric thin film, method of manufacturing piezoelectric thin film, piezoelectric element, and ink jet recording head |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE529901T1 true ATE529901T1 (de) | 2011-11-15 |
Family
ID=34908868
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT05719750T ATE529901T1 (de) | 2004-02-27 | 2005-02-23 | Piezoelektrischer dünnfilm, verfahren zur herstellung eines piezoelektrischen dünnfilms, piezoelektrisches element und inkjet- aufzeichnungskopf |
Country Status (7)
Country | Link |
---|---|
US (3) | US7399067B2 (de) |
EP (1) | EP1726050B1 (de) |
JP (2) | JP4808229B2 (de) |
KR (1) | KR100865798B1 (de) |
CN (2) | CN101515629B (de) |
AT (1) | ATE529901T1 (de) |
WO (1) | WO2005083809A1 (de) |
Families Citing this family (40)
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EP2365553A1 (de) * | 2003-07-28 | 2011-09-14 | Kyocera Corporation | Mehrschichtiges piezoelektrisches Element |
JP2006303425A (ja) * | 2005-03-22 | 2006-11-02 | Seiko Epson Corp | 圧電素子及び液体噴射ヘッド並びに液体噴射装置 |
US20070046153A1 (en) | 2005-08-23 | 2007-03-01 | Canon Kabushiki Kaisha | Piezoelectric substrate, piezoelectric element, liquid discharge head and liquid discharge apparatus |
US20070204756A1 (en) * | 2006-01-17 | 2007-09-06 | Rastegar Jahangir S | Energy harvesting power sources for generating a time-out signal for unexploded munitions |
US7456548B2 (en) * | 2006-05-09 | 2008-11-25 | Canon Kabushiki Kaisha | Piezoelectric element, piezoelectric actuator, and ink jet recording head |
JP5168443B2 (ja) * | 2006-08-08 | 2013-03-21 | セイコーエプソン株式会社 | 圧電素子、アクチュエータ装置、液体噴射ヘッド及び液体噴射装置 |
JP4299360B2 (ja) * | 2007-08-21 | 2009-07-22 | 富士フイルム株式会社 | 圧電素子及びそれを用いた液体吐出装置 |
JP2009255526A (ja) * | 2008-03-17 | 2009-11-05 | Seiko Epson Corp | 液体噴射ヘッドの製造方法、圧電素子の製造方法及び液体噴射装置 |
JP5475272B2 (ja) * | 2008-03-21 | 2014-04-16 | 日本碍子株式会社 | 圧電/電歪膜型素子 |
WO2009145272A1 (ja) * | 2008-05-28 | 2009-12-03 | 三菱マテリアル株式会社 | 強誘電体薄膜形成用組成物、強誘電体薄膜の形成方法並びに該方法により形成された強誘電体薄膜 |
JP5275698B2 (ja) * | 2008-06-17 | 2013-08-28 | 富士フイルム株式会社 | 圧電体膜の分極方法および圧電素子構造体の製造方法 |
JP5670017B2 (ja) * | 2008-10-03 | 2015-02-18 | セイコーエプソン株式会社 | 液体噴射ヘッド及び液体噴射装置並びにアクチュエータ装置 |
US8164234B2 (en) * | 2009-02-26 | 2012-04-24 | Fujifilm Corporation | Sputtered piezoelectric material |
JP5679636B2 (ja) * | 2009-03-26 | 2015-03-04 | セイコーエプソン株式会社 | 液体噴射ヘッド及びアクチュエーター装置 |
EP2328193B1 (de) * | 2009-11-30 | 2015-03-11 | Canon Kabushiki Kaisha | Piezoelektrische Keramik, Verfahren zu ihrer Herstellung, piezoelektrisches Element, Flüssigkeitsausstoßkopf und Ultraschallmotor |
JP5899615B2 (ja) * | 2010-03-18 | 2016-04-06 | 株式会社リコー | 絶縁膜の製造方法及び半導体装置の製造方法 |
US9431242B2 (en) * | 2010-01-21 | 2016-08-30 | Youtec Co., Ltd. | PBNZT ferroelectric film, sol-gel solution, film forming method and method for producing ferroelectric film |
JP5832091B2 (ja) * | 2010-03-02 | 2015-12-16 | キヤノン株式会社 | 圧電材料、圧電素子、液体吐出ヘッドおよび超音波モータ |
JP5435798B2 (ja) * | 2010-03-10 | 2014-03-05 | 富士フイルム株式会社 | 乱流制御装置及び乱流制御用アクチュエータの製造方法 |
JP5892406B2 (ja) | 2011-06-30 | 2016-03-23 | 株式会社リコー | 電気機械変換素子、液滴吐出ヘッド及び液滴吐出装置 |
JP5941646B2 (ja) * | 2011-09-29 | 2016-06-29 | 住友理工株式会社 | 誘電膜の製造方法 |
US9022531B2 (en) * | 2012-02-28 | 2015-05-05 | Canon Kabushiki Kaisha | Piezoelectric element, liquid discharge head and liquid discharge apparatus |
US9324934B2 (en) * | 2012-03-06 | 2016-04-26 | Konica Minolta, Inc. | Piezoelectric thin film, piezoelectric element, ink-jet head, and ink-jet printer |
CN103378286B (zh) * | 2012-04-19 | 2017-12-01 | 新科实业有限公司 | 薄膜压电元件及其制造方法、磁头折片组合及磁盘驱动器 |
US20130279044A1 (en) * | 2012-04-19 | 2013-10-24 | Sae Magnetics (H.K.) Ltd. | Thin film piezoelectric element and manufacturing method thereof, micro-actuator, head gimbal assembly and disk drive unit with the same |
US9318687B2 (en) * | 2012-08-10 | 2016-04-19 | Konica Minolta, Inc. | Piezoelectric element, piezoelectric device, ink-jet head, and ink-jet printer |
CN103023447A (zh) * | 2012-11-20 | 2013-04-03 | 溧阳市生产力促进中心 | 一种用于低损耗声表面波滤波器的压电薄膜 |
JP6102358B2 (ja) * | 2013-03-08 | 2017-03-29 | 三菱マテリアル株式会社 | 誘電体薄膜形成用組成物 |
JP6107268B2 (ja) * | 2013-03-19 | 2017-04-05 | 三菱マテリアル株式会社 | 強誘電体薄膜形成用ゾルゲル液 |
CN103572370B (zh) * | 2013-10-29 | 2016-02-24 | 西安交通大学 | 一种镱酸铋单晶外延薄膜及其制备方法 |
US9437806B2 (en) * | 2013-12-02 | 2016-09-06 | Canon Kabushiki Kaisha | Piezoelectric thin film, method of manufacturing the same, piezoelectric thin film manufacturing apparatus and liquid ejection head |
CN103879147B (zh) * | 2014-03-13 | 2016-05-25 | 武汉大学 | 一种印刷电子专用打印喷头 |
JP5716939B2 (ja) * | 2014-03-13 | 2015-05-13 | セイコーエプソン株式会社 | 液体噴射ヘッド及び液体噴射装置並びにアクチュエーター装置 |
US20170092841A1 (en) * | 2015-09-29 | 2017-03-30 | Canon Kabushiki Kaisha | Substrate for piezoelectric body formation, method for manufacturing the same, piezoelectric substrate, and liquid ejection head |
JP6216808B2 (ja) * | 2016-01-20 | 2017-10-18 | 株式会社ユーテック | 強誘電体結晶膜及びその製造方法 |
US10865311B2 (en) | 2016-05-18 | 2020-12-15 | Canon Kabushiki Kaisha | Coating liquid for forming piezoelectric thin film, method of producing coating liquid for forming piezoelectric thin film, piezoelectric thin film, method of manufacturing piezoelectric thin film, and liquid ejection head |
US10618285B2 (en) | 2016-06-17 | 2020-04-14 | Canon Kabushiki Kaisha | Piezoelectric substrate and method of manufacturing the piezoelectric substrate, and liquid ejection head |
JP6909421B2 (ja) * | 2016-11-09 | 2021-07-28 | 株式会社リコー | 強誘電体膜の製造方法 |
JP6939214B2 (ja) * | 2017-08-01 | 2021-09-22 | 株式会社リコー | 電気−機械変換素子、液体吐出ヘッド及び液体を吐出する装置 |
KR20210150355A (ko) * | 2019-01-15 | 2021-12-10 | 스마트폼, 인크. | 압전 및 마찰 전기 활성화 폼 센서들 및 애플리케이션들 |
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-
2005
- 2005-02-23 CN CN2009100046004A patent/CN101515629B/zh not_active Expired - Fee Related
- 2005-02-23 CN CNB2005800007936A patent/CN100533798C/zh not_active Expired - Fee Related
- 2005-02-23 US US10/561,247 patent/US7399067B2/en active Active
- 2005-02-23 EP EP20050719750 patent/EP1726050B1/de not_active Not-in-force
- 2005-02-23 WO PCT/JP2005/003435 patent/WO2005083809A1/en active Application Filing
- 2005-02-23 KR KR20067017104A patent/KR100865798B1/ko active IP Right Grant
- 2005-02-23 AT AT05719750T patent/ATE529901T1/de not_active IP Right Cessation
-
2008
- 2008-03-24 JP JP2008076361A patent/JP4808229B2/ja active Active
- 2008-06-02 US US12/131,454 patent/US8227021B2/en active Active
-
2011
- 2011-07-11 JP JP2011152883A patent/JP5407094B2/ja active Active
-
2012
- 2012-06-15 US US13/524,249 patent/US8715823B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US7399067B2 (en) | 2008-07-15 |
EP1726050A4 (de) | 2009-11-25 |
WO2005083809A1 (en) | 2005-09-09 |
JP2008214185A (ja) | 2008-09-18 |
CN101515629A (zh) | 2009-08-26 |
US20070097182A1 (en) | 2007-05-03 |
US20080233277A1 (en) | 2008-09-25 |
JP5407094B2 (ja) | 2014-02-05 |
CN101515629B (zh) | 2011-07-20 |
US8227021B2 (en) | 2012-07-24 |
CN1839488A (zh) | 2006-09-27 |
CN100533798C (zh) | 2009-08-26 |
JP2011201773A (ja) | 2011-10-13 |
KR20060116026A (ko) | 2006-11-13 |
EP1726050A1 (de) | 2006-11-29 |
US8715823B2 (en) | 2014-05-06 |
US20120251820A1 (en) | 2012-10-04 |
KR100865798B1 (ko) | 2008-10-28 |
EP1726050B1 (de) | 2011-10-19 |
JP4808229B2 (ja) | 2011-11-02 |
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