WO2020230359A1 - 蒸着ユニット及びこの蒸着ユニットを備える真空蒸着装置 - Google Patents
蒸着ユニット及びこの蒸着ユニットを備える真空蒸着装置 Download PDFInfo
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- WO2020230359A1 WO2020230359A1 PCT/JP2019/051373 JP2019051373W WO2020230359A1 WO 2020230359 A1 WO2020230359 A1 WO 2020230359A1 JP 2019051373 W JP2019051373 W JP 2019051373W WO 2020230359 A1 WO2020230359 A1 WO 2020230359A1
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- vapor deposition
- storage box
- deposition unit
- inner container
- chamber
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- the present invention includes a storage box in which the vapor-deposited substance is stored and a heating means for heating the vapor-deposited substance in the storage box, and a release opening for discharging the vapor-deposited substance sublimated or vaporized by heating is formed on one surface of the storage box.
- Patent Document 1 a thin-film deposition unit that moves (runs) at a predetermined speed and forms a film on a relatively wide sheet-like substrate or substrate to be deposited is known in Patent Document 1, for example.
- This includes a storage box for accommodating the vapor-deposited material and a heating means for heating the vapor-deposited material in the storage box.
- a heating means for heating the vapor-deposited material in the storage box.
- tubular discharge openings are arranged in a row at intervals in the width direction of the base material (so-called line source).
- the sublimated or vaporized vaporized material is discharged from each discharge opening and spreads in a dome shape from the discharge opening according to a predetermined cosine rule. It scatters toward the object to be deposited and is deposited.
- the storage box of such a vapor deposition unit is usually fixedly arranged in a vacuum chamber. Therefore, when designing a vacuum vapor deposition apparatus by assembling a thin film deposition unit, consider the type of vapor deposition material used and the scattering distribution of the vapor deposition material according to the amount of heating from the heating means per unit time for the storage box. Therefore, it is common to set the distance between the discharge opening and the object to be deposited. However, depending on the heating amount (heating temperature) of the same vapor-deposited substance, the amount of the vapor-deposited substance that sublimates or vaporizes in the storage box changes, and the scattering distribution also changes.
- the storage box Even if the amount of the vaporized substance that sublimates or vaporizes in the storage box is matched by appropriate control, the scattering distribution changes depending on the type. Therefore, if the storage box is fixedly arranged in the vacuum chamber, it is not versatile. Moreover, at the time of vapor deposition, the vapor-deposited substance adheres to and accumulates on the storage box including the discharge opening, so maintenance including cleaning of the storage box is regularly performed, and a plurality of parts are provided for this. If it is performed in a vacuum chamber, the workability of maintenance is poor.
- an object of the present invention is to provide a thin-film deposition unit having high versatility and excellent maintainability, and a vacuum vapor deposition apparatus including the thin-film deposition unit.
- a storage box for storing the vapor-deposited material and a heating means for heating the vapor-deposited material in the storage box are provided, and the vaporized material that is sublimated or vaporized by heating is released onto one surface of the storage box.
- the vapor deposition unit of the present invention in which an opening is formed is provided in a storage chamber having an open surface, and further includes a moving means for moving the vapor deposition unit forward and backward in the storage chamber.
- the vacuum vapor deposition apparatus of the present invention provided with the vapor deposition unit includes a vacuum chamber having a can roller, and the storage chamber is mounted from the opening side in a mounting opening opened in the vacuum chamber.
- the vapor deposition unit is set so that the discharge opening of the storage box is orthogonal to the axis of the can roller.
- the distance between the discharge opening and the sheet-shaped base material wound around the can roller is changed within the range of the vertical movement stroke of the vapor deposition unit by the moving means to sublimate or vaporize in the storage box. It is possible to adopt a configuration in which the scattering distribution of the vaporized material is adjustable.
- the storage chamber is provided with a thin-film deposition unit and is modularized, for example, a can roller is provided, and a film can be formed on a sheet-like base material portion wound around the can roller.
- the vapor deposition unit is set in a posture in which the discharge opening of the storage box is orthogonal to the axis of the can roller by simply mounting the storage chamber from the opening side to the mounting opening opened in the main chamber (vacuum chamber) to be implemented. can do. Then, when the vapor deposition unit is moved in the vertical direction by the moving means, the discharge opening is close to or separated from the can roller (and thus the portion of the sheet-like base material wrapped around the can roller), that is, the discharge opening and the discharge opening.
- the distance to the object to be deposited can be arbitrarily changed within the range of the vertical movement stroke of the vapor deposition unit. As a result, for example, it becomes possible to adjust the scattering distribution of the sublimated or vaporized vaporized material according to the type of the vaporized material and the heating temperature. Moreover, at the time of maintenance, the vapor deposition unit can be removed from the mounting opening of the main chamber together with the storage chamber, so that the workability of maintenance can be improved as compared with the conventional example.
- the storage box includes an outer container having an open upper surface, a support frame fixed to the inner wall surface of the outer container, and an inner container arranged inside the support frame to store the vapor deposition material. It is provided with a lid on which a discharge opening is formed, which covers the opening on the upper surface of the outer container and the inner container, and a plurality of support pins projecting inward are arranged at predetermined positions of the support frame, and the outer container is provided. It is preferable that the inner container is supported by each support pin when the inner container is stored inside. According to this, since the inner container is supported by the support pin, the heat loss due to heat transfer is reduced and the inner container can be heated efficiently.
- the inner surface of the outer container is mirror-finished by, for example, electrolytic polishing, when the inner container is heated by the heating means, the inner surface of the outer container acts as a reflector that reflects heat, and radiant heat is applied. It is advantageous because the inner container can be heated even more efficiently.
- the lid on which the discharge opening is formed may be cooled.
- a temperature gradient is generated in the storage box (inner container), and heating from the heating means per unit time is performed.
- the heating means is composed of a plurality of sheath heaters held by the support frame and arranged to face the outer wall surface of the inner container, and the outer wall of the inner container is divided into a plurality of regions. It is preferable that each sheath heater arranged to face each other in the region can be energized at a predetermined current value. According to this, if the current value is appropriately set for each region and the amount of heating from the sheath heater is adjusted, it is possible to suppress the occurrence of a temperature gradient in the storage box (inner container) as much as possible, which is advantageous.
- FIG. 2 is a partial cross-sectional view taken along the line III-III of FIG.
- FIG. 4 is a cross-sectional view taken along the line VV of FIG. A partially disassembled perspective view showing a mechanism for moving the second partition wall at its shielding position.
- the vapor deposition unit according to the embodiment of the present invention and the vacuum vapor deposition apparatus including the vapor deposition unit will be described with reference to the drawings, taking as an example when applied to a so-called take-up type vacuum vapor deposition apparatus.
- the can roller is housed in the main chamber as a vacuum chamber in a posture in which the axial direction of the can roller coincides with the horizontal direction, and the axial direction is X-axis direction, X in the same horizontal plane.
- the direction orthogonal to the axis is the Y-axis direction
- the vertical direction orthogonal to the X-axis and the Y-axis is the Z-axis direction
- the directions such as “up” and “down” are based on FIG.
- the vacuum vapor deposition apparatus Cm of the present embodiment includes a main chamber 1.
- a vacuum pump composed of a turbo molecular pump, a rotary pump, or the like (not shown) is connected to the main chamber 1, and a vacuum atmosphere can be formed (for example, 10 to 5 Pa).
- a protruding portion 11 having a semi-regular hexagonal contour in the cross-sectional view shown in FIG. 1 and projecting downward is formed.
- the sheet-shaped base material Sw transferred from the feeding roller (not shown) is guided to the can roller 2, and the sheet-shaped base material Sw that orbits the can roller 2 is wound (not shown).
- a plurality of guide rollers Gr are arranged for transfer to the take-up roller.
- an upstream chamber and a downstream chamber are connected to each other in the main chamber 1, and a sheet-shaped base material Sw is wound around the upstream chamber at a constant speed.
- a feeding roller is provided to feed out the sheet-shaped base material Sw, and the sheet-shaped base material Sw formed by orbiting the can roller 2 in the main chamber 1 is wound around the downstream chamber.
- a take-up roller is provided.
- As a mechanism for feeding out and winding up the sheet-shaped base material Sw a known one can be used, and thus a detailed description thereof will be omitted.
- the can roller 2 includes a rotating shaft 21, and the rotating shaft 21 is pivotally supported by two bearing devices Bm arranged at intervals in the X-axis direction (axis direction) in the main chamber 1 and outside the main chamber 1.
- the motor M1 arranged is rotationally driven at a predetermined rotational speed.
- the bearing device Bm is a frame body in which an inner bearing on the inner side in the radial direction and an outer bearing on the outer side in the radial direction are integrally assembled, and the inner bearing pivotally supports the rotating shaft 21.
- the outer bearing rotatably supports the rotating arm of the second partition wall described later.
- the can roller 2 has a built-in mechanism for heating or cooling the sheet-shaped base material Sw by a known method.
- Each vapor deposition unit VU has the same structure and includes a storage chamber 30 having an opening on one side so as to form a communication opening 30a, and the storage chamber 30 surrounds the mounting opening 13 so that the main chamber 1 is flat. It is attached to the surface 12 from the outside, respectively.
- the storage chamber 30 is provided with a storage box 3 in which the communication opening 30a is stored in a posture in which the phase of the discharge opening 34c, which will be described later, is matched, and the storage box 3 is a heating means for heating the vapor-deposited substance Vm inside the storage box 3. 4 is assembled integrally.
- the vapor-deposited substance Vm a metal material or an organic material is used depending on the thin film to be formed on the sheet-shaped base material Sw.
- two thin-film deposition units are formed on one flat surface 12 (right side in FIG. 1) located downward in the vertical direction and the other flat surface 12 (left side in FIG. 1) inclined with respect to the horizontal plane.
- VUs are mounted, but the present invention is not limited to this.
- the vapor deposition unit VUs are mounted on all flat surfaces 12 or flat surfaces 12 located vertically downward. Only the vapor deposition unit VU can be mounted. In this case, a lid (which is omitted in FIGS. 1 and 2) for closing the attachment opening 13 to which the vapor deposition unit VU is not attached is attached.
- the storage box 3 is made of, for example, stainless steel, and has an upper surface (a surface facing the can roller 2). ) Is opened, and the support frame 32 fixed to the outer container 31 in which the plate-shaped members 32a and 32b are assembled in a grid pattern so as to cover the inner wall surface of the outer container 31 excluding the upper surface, and the support frame 32. It is composed of an inner container 33 that is arranged inside the container and stores the vapor-deposited substance Vm, and a lid 34 that covers the openings on the upper surfaces of the outer container 31 and the inner container 33.
- the outer container 31 and the inner container 33 have bottomed rectangular parallelepiped contours that are similar to each other in the cross-sectional view shown in FIG. 1, and the lengths of the outer container 31 and the inner container 33 in the X-axis direction are those of the can roller 2. It is set to be equal to or longer than the bus length (in the X-axis direction) (see FIG. 3).
- the length (width) of the outer container 31 and the inner container 33 in the Y-axis direction takes into consideration the width of the sheet-shaped base material Sw (specifically, the vapor deposition range in the X-axis direction with respect to the base material Sw), the vapor deposition rate, and the like. Is set as appropriate.
- bolts 35 as a plurality of support pins projecting inward are erected at predetermined positions of the support frame 32, and when the inner container 33 is inserted inside the outer container 31, each bolt 35
- the inner container 33 is supported only by the head.
- the lid 34 facing the outer peripheral surface of the can roller 2 is formed by bending a plate material having two horizontal sides 34a and vertical sides 34b, which are parallel to each other, with a curvature matching the outer peripheral surface of the can roller 2.
- a single discharge opening 34c that matches the opening on the upper surface of the inner container 33 is opened.
- the inner edge of the discharge opening 34c is fixed to the upper end of the inner container 33, and the inner container 33 and the lid 34 are integrated.
- a moving means 5 composed of a linear motor and an air cylinder is provided on the outer wall surface of the storage chamber 30, and a drive shaft 51 of the moving means 5 that penetrates the outer wall surface and extends inside the moving means 5 is housed in the storage box 3. Is connected to.
- the moving means 5 moves the storage box 3 of the vapor deposition unit VU in the vertical direction (that is, the direction in which the hole axis of the discharge opening 34c of the lid 34 is orthogonal to the axis of the can roller 2).
- the heating means 4 is composed of a plurality of sheath heaters 41 arranged so as to cover the entire outer wall surfaces of the inner container 33 in the X-axis direction, both outer wall surfaces in the Y-axis direction, and the lower outer wall of the inner container 33, and support the inner container 33. It is fixed by the frame 32. Then, when the inner container 33 in which the vapor-deposited substance Vm is stored is inserted into the outer container 31 and heated by each sheath heater 41 of the heating means 4, the vapor-deposited substance Vm is sublimated or vaporized in the inner container 33. This sublimated or vaporized vaporized material is released from the release opening 34c.
- the lid 34 is cooled by radiative cooling, so that the temperature in the inner container 33 in the vertical direction is reached. There is a risk of a gradient.
- the upper portions of both outer walls of the inner container 33 in the Y-axis direction, the central portions of both outer walls of the inner container 33 in the Y-axis direction, and the Y-axis of the inner container 33 are included in the present embodiment.
- the lower outer walls of both outer walls in the direction and the lower outer wall of the inner container 33, and the outer walls of both outer walls in the X-axis direction of the inner container 33 are divided into four regions, and the sheath heaters facing each region are the first to fourth sheath heaters.
- 41a, 41b, 41c, 41d, and the first to fourth sheath heaters 41a, 41b, 41c, 41d were connected to the first to fourth power supply devices Ps1, Ps2, Ps3, Ps4, respectively. Then, when the first to fourth power supply devices Ps1, Ps2, Ps3, and Ps4 energize the first to fourth sheath heaters 41a, 41b, 41c, and 41d, the sheath heaters can be energized with different current values.
- the storage chamber 30 is provided with the vapor deposition unit VU and is modularized, the vapor deposition unit VU can be moved to the discharge opening 34c by simply mounting the storage chamber 30 in the mounting opening 13 of the main chamber 1. Is set in a posture toward the sheet-shaped base material Sw wound around the can roller 2. Further, since the inner container 33 is supported by the head of each bolt 35, the heat loss due to heat transfer is reduced and the inner container 33 can be heated efficiently. In this case, if the inner surface of the outer container 31 is mirror-finished by, for example, electrolytic polishing, the inner surface of the outer container 31 serves as a reflector that reflects heat when the inner container 33 is heated by each sheath heater 41.
- the inner container 33 can be heated more efficiently by applying radiant heat.
- the filling rate of the vapor-deposited substance Vm with respect to the inner container 33 of the storage box 3 is, for example, the type of the vapor-deposited substance Vm and the filling rate of the inner container 33 until all of the vapor-deposited substance Vm filled in the storage box 3 is sublimated or vaporized. It is appropriately set in the range of 20 to 40% in consideration of the amount of change in the vapor deposition rate due to the fluctuation of the internal pressure.
- the moving means 5 since the moving means 5 is provided on the outer wall surface of the storage chamber 30, after the storage chamber 30 is mounted on the mounting opening 13, the moving means 5 causes the storage box 3 of the vapor deposition unit VU to have a lid as shown in FIG. A gap in which 34 is separated from the outer peripheral surface of the can roller 2 and a gap in which the lid 34 is curved with the above curvature on the outer peripheral surface of the can roller 2 (hereinafter, this is referred to as "second gap Gp2"). ), And the distance between the discharge opening 34c and the sheet-like base material Sw wound around the can roller 2 within the stroke range of the moving means 5 (). That is, the size of the second gap Gp2) can be changed arbitrarily.
- the second gap Gp2 is a vapor deposition space partitioned by the lid 34 and the portion of the can roller 2 facing the lid 34.
- vapor deposition chambers Vs in which the vapor deposition unit VU is stored which are connected to the storage chamber 30, are partitioned by the 6b, 6c, and 6d in the main chamber 1, respectively.
- second partition walls 7a and 7b are provided, respectively, which cover the outer cylinder portion of the can roller 2 with a gap curved with the above curvature (hereinafter, this is referred to as "first gap Gp1").
- first gap Gp1 a gap curved with the above curvature
- the vapor deposition chamber Vs and the adjacent chamber As in the main chamber 1 adjacent to the vapor deposition chamber Vs communicate with each other with the first gap Gp1 as a boundary.
- the second partition walls 7a and 7b are configured so that the conductance value between the vapor deposition chamber Vs and the adjacent chamber As is determined.
- the second partition walls 7a and 7b are formed by, for example, bending a stainless steel plate with the above curvature, and are outside the bearing devices Bm arranged at intervals in the X-axis direction. It is erected between the tips of the rotating arms 71 and 72, which are rotatably supported by bearings (not shown). Teeth 73a and 73b are formed on the outer peripheral surface of each bearing device Bm at a predetermined pitch, and racks 74a and 74b driven by a motor (see FIG. 3) are meshed with the teeth 73a and 73b. ).
- the second partition walls 7a and 7b rotate in opposite directions along the outer peripheral surface of the can roller 2.
- counterbore processing is performed on the surfaces of the rotating arms 71 and 72 facing each other, and the counterbore processing surfaces 71a and 71b are overlapped with the first gap portion S1 so that both second partition walls 7a and 7b can be canned.
- Each roller 2 can be moved while holding the first gap Gp1 around the roller 2.
- the second partition walls 7a and 7b of the can roller 2 are located between the shielding position where the discharge opening 34a of the lid 34 faces the portion of the can roller 2 and the retracting position which is separated from the vapor deposition unit VU in the circumferential direction. It becomes rotatable around the rotation shaft 21 as the center of rotation.
- a second gap S2 is formed between the inner wall surface of the main chamber 1 facing each other, and a third gap S3 is formed between the outer peripheral surfaces of the second partition walls 7a and 7b and the inner wall surface of the main chamber 1.
- the inner wall surface of the main chamber 1 is formed so as to be formed.
- the thin-film deposition unit VU When the thin-film deposition unit VU is in the separated position and the second partition walls 7a and 7b are in the shielded positions shown in FIG. 1, the thin-film deposition chamber Vs and the adjacent chamber As are communicated with each other only through the first gap portion S1 to the third gap portion S3. However (see FIG.
- the vapor deposition chamber Vs and the adjacent chamber As are in addition to the first gap portion S1 to the third gap portion S3.
- the second gap Gp2 as the vapor deposition space is in a state where the atmosphere is separated from the adjacent chamber As.
- a refrigerant circulation path for circulating the refrigerant is formed in the second partition walls 7a and 7b, and after moving the second partition walls 7a and 7b to the shielding position, the refrigerant device Bm is used. It is also possible to circulate the refrigerant in the refrigerant circulation path so that the second partition walls 7a and 7b can be cooled to a predetermined temperature.
- partition plates 75a, 75b, 75c, 75d having a length equal to or longer than the length in the generatrix direction of the can roller 2 are attached to the end faces of the second partition walls 7a, 7b in the circumferential direction, respectively.
- the partition wall plates 75a, 75b, 75c and 75d are in contact with the radial inner end surfaces of the fixed partition walls 6a, 6b and 6c, respectively, while the second partition walls 7a, At the retracted positions of the second partition walls 7a and 7b shown in FIG.
- the partition wall plate 75b of one second partition wall 7a is attached to the fixed partition wall 6a and the other second partition wall 7b.
- the partition plate 75c comes into contact with the fixed partition 6c, respectively.
- the storage box 3 of the vapor deposition unit VU is brought into the vapor deposition position at the retracted position of the second partition walls 7a and 7b
- the lateral sides 34a and 34a of the lid 34 become the partition walls of the second partition walls 7a and 7b.
- the plates 75a and 75d are in contact with each other, and the first gap Gp1 and the second gap Gp2 communicate with each other around the can roller 2 (see FIG. 2).
- the vaporized substance Vm is sublimated or vaporized in the storage box 3, and the vapor deposition amount is gradually stabilized according to the heating amount of the heating means 4, but until then, the vaporized substance Vm sublimated or vaporized in the storage box 3 is sublimated or vaporized.
- the vapor deposition amount of the vapor-deposited substance Vm in the storage box 3 becomes stable, the second partition walls 7a and 7b are moved to the retracted positions, respectively, and then the storage box 3 of the vapor deposition unit VU is moved to the vapor deposition position. ..
- a vapor deposition space is formed in the main chamber 1, and when the sheet-shaped base material Sw is run by the base material traveling means, a discharge opening is opened in the portion of the sheet-shaped base material Sw wound around the can roller 2.
- the thin-film deposition material released from 34c adheres and accumulates, and is continuously deposited.
- the atmosphere of the vapor deposition chamber Vs and the adjacent chamber As are separated, so that the degree of sealing of the path from the discharge opening 34c to the adjacent space As through the second gap Gp2 as the vapor deposition space and the first gap Gp1 is increased. Be done. As a result, even if the opening area of the discharge opening 34c is set to be relatively large in order to obtain an extremely high film formation rate, the vapor-deposited material discharged from the discharge opening 34c passes through the second gap Gp2 before spreading over a wide area.
- the vapor-deposited substances released from the discharge opening 34c into the second gap Gp2 that do not contribute to the vapor deposition on the base material Sw are the inner container 33. Will return to. As a result, it is suppressed as much as possible that the film wraps around in the main chamber 1 including the adjacent chamber As and adheres to a portion (part) other than the sheet-like base material Sw, and as a result, the vapor-deposited substance Vm is wasted. Can be prevented. Finally, at the time of maintenance, maintenance is performed with the storage chamber 30 removed from the mounting opening 13 of the main chamber 1.
- the storage box 3 of the vapor deposition unit VU is directly moved back and forth with respect to the outer peripheral surface of the can roller 2 by a moving means 5 such as a linear motor or an air cylinder, but a known guide mechanism for guiding the movement. May be provided in the storage chamber 30.
- the storage box 3 of the vapor deposition unit VU advances and retreats in the vertical direction, that is, in the direction in which the hole axis of the discharge opening 34c of the lid 34 is orthogonal to the axis of the can roller 2, but the present invention is limited to this. Instead, for example, it can be appropriately changed in consideration of the scattering distribution of the vapor-deposited substance Vm discharged from the discharge opening 34c.
- each tubular discharge opening is provided in the width direction of the sheet-shaped base material Sw. It may be arranged in a row at predetermined intervals.
- each discharge opening may be formed on the lid so as to be inclined at a predetermined angle. According to this, the posture of the vapor deposition unit in the storage chamber and the moving direction of the vapor deposition unit in the storage chamber can be appropriately changed.
- the present invention is not limited to this, and the present invention can be applied to, for example, a vacuum vapor deposition apparatus having a rectangular substrate as a vapor deposition object and a transport mechanism for sequentially transporting a plurality of substrates.
- the vapor deposition unit is set in the storage chamber so that the discharge opening of the storage box is orthogonal to the film formation surface of the substrate.
- the storage box 3 of the vapor deposition unit VU is moved to the vapor deposition position, the vapor deposition substance Vm is discharged from the discharge opening 34c, and the sheet-like base material Sw wound around the can roller 2 is used.
- the lid 34 itself also serves as a mask that defines the vapor deposition range for the sheet-shaped base material Sw portion.
- the lid 34 may be thermally deformed (expanded) because it is fixed and integrated with the upper end of the inner container 33 to be heated.
- the lid 34 is long in the X-axis direction because it is set equal to or longer than the bus length (X-axis direction) of the can roller 2, it is more remarkable than the Y-axis direction depending on the temperature conditions at that time. Thermally deforms in the X-axis direction.
- the lid 34 is allowed to be displaced in the Y-axis direction (thermal deformation) and rotated around the Z-axis, but the deformation in the X-axis direction and the Z-axis direction is allowed. Regulatory measures are in place to disallow it.
- the regulating means are, for example, both the first and second regulating portions 8a and 8b provided so as to face the outer edge portion of the discharge opening 34 in the central region in the X-axis direction, and the outer edge portions of the discharge opening 34 at both ends in the X-axis direction.
- a pair of a third regulation unit 8c provided in the above is provided.
- the first and second regulating portions 8a are fixed to the main chamber (not shown) corresponding to the columnar projecting pieces 81a and 82a provided at predetermined positions on the upper surface of the discharge opening 34 and the projecting pieces 81a and 82a. It is provided with receiving members 82a and 82b having receiving holes 821 and 822 for receiving the respective projecting pieces 81a and 82a, respectively.
- the projecting pieces 81a and 81b are fitted and inserted into the receiving holes 821 and 822, respectively.
- the receiving hole 821 has an elliptical contour long in the Y-axis direction so as to allow displacement in the Y-axis direction but not deformation in the X-axis direction
- the receiving hole 821 has an elliptical contour in the Y-axis direction.
- the receiving hole 82a has a circular contour so that the 822 allows rotation about the Z-axis but not displacement in the Z-axis direction.
- the third regulating portion 8c is composed of a pressing piece curved with a curvature corresponding to the lid body 34, and when the storage box 3 of the vapor deposition unit VU is moved to the vapor deposition position by the moving means 5, it comes into contact with the lid body 34.
- the displacement of the lid 34 in the Z-axis direction is regulated.
- the regulating means may be provided between the lower surface of the lid 34 and the support frame 32 and the upper surface.
- Sw Sheet-like substrate (deposited material), Vm ... Deposited material, VU ... Deposited unit, 1 ... Main chamber (vacuum chamber), 13 ... Mounting opening, 3 ... Storage box, 30 ... Storage chamber, 30a ... Communication Opening, 31 ... outer container, 32 support frame, 33 ... inner container, 34 ... lid, 34c ... discharge opening, 35 ... bolt (support pin), 4 ... heating means, 41a, 41b, 41c, 41d ... sheath heater, 5 ...transportation.
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Abstract
Description
Claims (5)
- 蒸着物質が収納される収容箱と収容箱内の蒸着物質を加熱する加熱手段とを備え、収容箱の一面に、加熱により昇華または気化した蒸着物質を放出する放出開口が形成される蒸着ユニットにおいて、
蒸着ユニットが、一面を開口した格納チャンバ内に設けられ、格納チャンバの開口を向く方向を上として、格納チャンバ内で蒸着ユニットを上下方向に進退する移動手段を更に備えることを特徴とする蒸着ユニット。 - 前記収容箱は、上面を開口した外容器と、外容器の内壁面に固定の支持枠と、支持枠の内側に配置されて蒸着物質が収納される内容器と、外容器と内容器との上面の開口を覆う、放出開口が形成される蓋体とを備え、支持枠の所定位置にその内方に向けて突出する複数本の支持ピンが配置され、外容器内に内容器を格納したとき各支持ピンで内容器が支持されるように構成したことを特徴とする請求項1記載の蒸着ユニット。
- 前記加熱手段は、前記支持枠で保持されて前記内容器の外壁面に対向配置される複数本のシースヒータで構成され、前記内容器の外壁を複数の領域に分け、各領域に夫々対向配置されるシースヒータ毎に、所定電流値で通電可能としたことを特徴とする請求項1及び請求項2記載の蒸着ユニット。
- 請求項1~請求項3記載の蒸着ユニットを備える真空蒸着装置において、
キャンローラを有する真空チャンバを備え、真空チャンバに開設された取付開口に前記格納チャンバがその開口側から装着され、前記収容箱の前記放出開口がキャンローラの軸線に対して直交する姿勢で前記蒸着ユニットがセットされるように構成したことを特徴とする真空蒸着装置。 - 前記放出開口と、前記キャンローラに巻き掛けられるシート状の基材との距離を前記移動手段により蒸着ユニットの上下動のストロークの範囲内で変化させて前記収容箱内で昇華または気化した蒸着物質の飛散分布を調整自在としたことを特徴とする請求項4記載の真空蒸着装置。
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JP2011168805A (ja) * | 2010-02-16 | 2011-09-01 | Hitachi High-Technologies Corp | 蒸発源及びこれを用いた真空蒸着装置 |
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