WO2008093488A1 - シリコンウエーハの面取り装置およびシリコンウエーハの製造方法ならびにエッチドシリコンウエーハ - Google Patents

シリコンウエーハの面取り装置およびシリコンウエーハの製造方法ならびにエッチドシリコンウエーハ Download PDF

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Publication number
WO2008093488A1
WO2008093488A1 PCT/JP2008/000035 JP2008000035W WO2008093488A1 WO 2008093488 A1 WO2008093488 A1 WO 2008093488A1 JP 2008000035 W JP2008000035 W JP 2008000035W WO 2008093488 A1 WO2008093488 A1 WO 2008093488A1
Authority
WO
WIPO (PCT)
Prior art keywords
silicon wafer
beveling
edge
etched
manufacturing
Prior art date
Application number
PCT/JP2008/000035
Other languages
English (en)
French (fr)
Inventor
Tadahiro Kato
Original Assignee
Shin-Etsu Handotai Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin-Etsu Handotai Co., Ltd. filed Critical Shin-Etsu Handotai Co., Ltd.
Priority to US12/448,892 priority Critical patent/US8454852B2/en
Priority to EP08702776.9A priority patent/EP2107598B1/en
Priority to JP2008556022A priority patent/JP4862896B2/ja
Priority to KR1020097016139A priority patent/KR101460993B1/ko
Publication of WO2008093488A1 publication Critical patent/WO2008093488A1/ja

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02002—Preparing wafers
    • H01L21/02005—Preparing bulk and homogeneous wafers
    • H01L21/02008—Multistep processes
    • H01L21/0201—Specific process step
    • H01L21/02021—Edge treatment, chamfering
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
    • B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
    • B24B9/065—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of thin, brittle parts, e.g. semiconductors, wafers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24777—Edge feature

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Weting (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)

Abstract

　本発明は、面取り砥石を用いてシリコンウエーハの外周部を面取りするシリコンウエーハの面取り装置であって、少なくとも、シリコンウエーハを保持するとともにこれを回転させる保持具と、保持具に保持されたシリコンウエーハの外周部を面取りする面取り砥石と、シリコンウエーハの外周部と面取り砥石の相対位置を数値制御により制御して面取り形状を制御するための制御装置を具備し、制御装置は、前記保持具に保持されたシリコンウエーハの円周方向の位置に応じ、面取りするときのシリコンウエーハの外周部と面取り砥石の相対位置を変更制御するものであるシリコンウエーハの面取り装置、および製造方法ならびにエッチドシリコンウエーハである。これにより、エッチング工程後の面取り部の断面形状寸法のばらつきを抑制することができるシリコンウエーハの面取り装置および製造方法ならびにエッチドシリコンウエーハが提供される。
PCT/JP2008/000035 2007-01-31 2008-01-17 シリコンウエーハの面取り装置およびシリコンウエーハの製造方法ならびにエッチドシリコンウエーハ WO2008093488A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US12/448,892 US8454852B2 (en) 2007-01-31 2008-01-17 Chamfering apparatus for silicon wafer, method for producing silicon wafer, and etched silicon wafer
EP08702776.9A EP2107598B1 (en) 2007-01-31 2008-01-17 Chamfering apparatus for silicon wafer and method for producing silicon wafer
JP2008556022A JP4862896B2 (ja) 2007-01-31 2008-01-17 シリコンウエーハの面取り装置およびシリコンウエーハの製造方法ならびにエッチドシリコンウエーハ
KR1020097016139A KR101460993B1 (ko) 2007-01-31 2008-01-17 실리콘 웨이퍼의 면취 장치 및 실리콘 웨이퍼의 제조방법 그리고 에치드 실리콘 웨이퍼

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007021540 2007-01-31
JP2007-021540 2007-01-31

Publications (1)

Publication Number Publication Date
WO2008093488A1 true WO2008093488A1 (ja) 2008-08-07

Family

ID=39673802

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/000035 WO2008093488A1 (ja) 2007-01-31 2008-01-17 シリコンウエーハの面取り装置およびシリコンウエーハの製造方法ならびにエッチドシリコンウエーハ

Country Status (6)

Country Link
US (1) US8454852B2 (ja)
EP (1) EP2107598B1 (ja)
JP (1) JP4862896B2 (ja)
KR (1) KR101460993B1 (ja)
TW (1) TWI462170B (ja)
WO (1) WO2008093488A1 (ja)

Cited By (14)

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KR20120025448A (ko) * 2009-04-15 2012-03-15 다이토 일렉트론 가부시키가이샤 웨이퍼의 면취 가공방법
JP2014116450A (ja) * 2012-12-10 2014-06-26 Shin Etsu Handotai Co Ltd 円筒研削機および単結晶ウエーハの製造方法
KR20160093615A (ko) 2013-12-03 2016-08-08 신에쯔 한도타이 가부시키가이샤 면취 가공 장치 및 노치리스 웨이퍼의 제조 방법
JP6256576B1 (ja) * 2016-11-17 2018-01-10 株式会社Sumco エピタキシャルウェーハ及びその製造方法
JP2018100216A (ja) * 2013-05-28 2018-06-28 コーニング精密素材株式会社Corning Precision Materials Co., Ltd. 基板の対称面取り方法および装置
WO2019035336A1 (ja) * 2017-08-15 2019-02-21 信越半導体株式会社 シリコンウエーハのエッジ形状の評価方法および評価装置、シリコンウエーハ、ならびにその選別方法および製造方法
JP2019036700A (ja) * 2017-08-15 2019-03-07 信越半導体株式会社 シリコンウエーハのエッジ形状の評価方法および評価装置、シリコンウエーハ、ならびにその選別方法および製造方法
WO2019073687A1 (ja) * 2017-10-11 2019-04-18 株式会社Sumco 半導体ウェーハの評価方法および半導体ウェーハの製造方法
CN109822432A (zh) * 2019-03-14 2019-05-31 成都青洋电子材料有限公司 一种单晶硅片截面打磨用滚磨机
CN110383427A (zh) * 2017-03-13 2019-10-25 信越半导体株式会社 晶圆的制造方法
WO2020158376A1 (ja) * 2019-01-29 2020-08-06 信越半導体株式会社 シリコンウェーハの製造方法およびシリコンウェーハ
JP2020131410A (ja) * 2019-02-25 2020-08-31 株式会社Sumco 貼り合わせウェーハのテラス加工方法及びテラス加工装置
US11056403B2 (en) 2017-11-01 2021-07-06 Sk Siltron Co., Ltd. Wafer with beveled edge region and method for analyzing shape of the same
CN113211235A (zh) * 2021-05-10 2021-08-06 山西光兴光电科技有限公司 研磨设备以及研磨方法

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WO2011105255A1 (ja) * 2010-02-26 2011-09-01 株式会社Sumco 半導体ウェーハの製造方法
DE102010014874A1 (de) * 2010-04-14 2011-10-20 Siltronic Ag Verfahren zur Herstellung einer Halbleiterscheibe
JP2014053510A (ja) * 2012-09-07 2014-03-20 Toshiba Corp 端面加工方法及び端面加工装置
US8860040B2 (en) 2012-09-11 2014-10-14 Dow Corning Corporation High voltage power semiconductor devices on SiC
US9018639B2 (en) 2012-10-26 2015-04-28 Dow Corning Corporation Flat SiC semiconductor substrate
US9738991B2 (en) 2013-02-05 2017-08-22 Dow Corning Corporation Method for growing a SiC crystal by vapor deposition onto a seed crystal provided on a supporting shelf which permits thermal expansion
US9797064B2 (en) 2013-02-05 2017-10-24 Dow Corning Corporation Method for growing a SiC crystal by vapor deposition onto a seed crystal provided on a support shelf which permits thermal expansion
US9017804B2 (en) 2013-02-05 2015-04-28 Dow Corning Corporation Method to reduce dislocations in SiC crystal growth
US8940614B2 (en) 2013-03-15 2015-01-27 Dow Corning Corporation SiC substrate with SiC epitaxial film
JP6244962B2 (ja) * 2014-02-17 2017-12-13 株式会社Sumco 半導体ウェーハの製造方法
US9279192B2 (en) 2014-07-29 2016-03-08 Dow Corning Corporation Method for manufacturing SiC wafer fit for integration with power device manufacturing technology

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KR20120025448A (ko) * 2009-04-15 2012-03-15 다이토 일렉트론 가부시키가이샤 웨이퍼의 면취 가공방법
US20120100785A1 (en) * 2009-04-15 2012-04-26 Shin-Etsu Handotai Co., Ltd. Method for chamfering wafer
TWI496205B (zh) * 2009-04-15 2015-08-11 Daito Electron Co Ltd 晶圓斜角加工方法
KR101707252B1 (ko) * 2009-04-15 2017-02-15 다이토 일렉트론 가부시키가이샤 웨이퍼의 면취 가공방법
JP2014116450A (ja) * 2012-12-10 2014-06-26 Shin Etsu Handotai Co Ltd 円筒研削機および単結晶ウエーハの製造方法
JP2018100216A (ja) * 2013-05-28 2018-06-28 コーニング精密素材株式会社Corning Precision Materials Co., Ltd. 基板の対称面取り方法および装置
KR20160093615A (ko) 2013-12-03 2016-08-08 신에쯔 한도타이 가부시키가이샤 면취 가공 장치 및 노치리스 웨이퍼의 제조 방법
US10002753B2 (en) 2013-12-03 2018-06-19 Shin-Etsu Handotai Co., Ltd. Chamfering apparatus and method for manufacturing notchless wafer
JP6256576B1 (ja) * 2016-11-17 2018-01-10 株式会社Sumco エピタキシャルウェーハ及びその製造方法
JP2018082072A (ja) * 2016-11-17 2018-05-24 株式会社Sumco エピタキシャルウェーハ及びその製造方法
KR20190124728A (ko) 2017-03-13 2019-11-05 신에쯔 한도타이 가부시키가이샤 웨이퍼의 제조방법
CN110383427A (zh) * 2017-03-13 2019-10-25 信越半导体株式会社 晶圆的制造方法
CN110383427B (zh) * 2017-03-13 2023-01-03 信越半导体株式会社 晶圆的制造方法
US11361959B2 (en) 2017-03-13 2022-06-14 Shin-Etsu Handotai Co., Ltd. Method for manufacturing wafer
KR20200035407A (ko) * 2017-08-15 2020-04-03 신에쯔 한도타이 가부시키가이샤 실리콘 웨이퍼의 엣지 형상의 평가 방법 및 평가 장치, 실리콘 웨이퍼, 그리고 그의 선별 방법 및 제조 방법
CN111033707B (zh) * 2017-08-15 2023-09-05 信越半导体株式会社 硅晶圆的边缘形状的评价方法及评价装置、硅晶圆、及其筛选方法及制造方法
WO2019035336A1 (ja) * 2017-08-15 2019-02-21 信越半導体株式会社 シリコンウエーハのエッジ形状の評価方法および評価装置、シリコンウエーハ、ならびにその選別方法および製造方法
CN111033707A (zh) * 2017-08-15 2020-04-17 信越半导体株式会社 硅晶圆的边缘形状的评价方法及评价装置、硅晶圆、及其筛选方法及制造方法
KR102520902B1 (ko) 2017-08-15 2023-04-13 신에쯔 한도타이 가부시키가이샤 실리콘 웨이퍼의 엣지 형상의 평가 방법 및 평가 장치, 실리콘 웨이퍼, 그리고 그의 선별 방법 및 제조 방법
JP2019036700A (ja) * 2017-08-15 2019-03-07 信越半導体株式会社 シリコンウエーハのエッジ形状の評価方法および評価装置、シリコンウエーハ、ならびにその選別方法および製造方法
US11486833B2 (en) 2017-08-15 2022-11-01 Shin-Etsu Handotai Co., Ltd. Method for evaluating edge shape of silicon wafer, apparatus for evaluating thereof, silicon wafer, method for selecting and method for manufacturing thereof
JP2019071375A (ja) * 2017-10-11 2019-05-09 株式会社Sumco 半導体ウェーハの評価方法および半導体ウェーハの製造方法
KR20200051734A (ko) * 2017-10-11 2020-05-13 가부시키가이샤 사무코 반도체 웨이퍼의 평가 방법 및 반도체 웨이퍼의 제조 방법
WO2019073687A1 (ja) * 2017-10-11 2019-04-18 株式会社Sumco 半導体ウェーハの評価方法および半導体ウェーハの製造方法
KR102350245B1 (ko) * 2017-10-11 2022-01-11 가부시키가이샤 사무코 반도체 웨이퍼의 평가 방법 및 반도체 웨이퍼의 제조 방법
US11056403B2 (en) 2017-11-01 2021-07-06 Sk Siltron Co., Ltd. Wafer with beveled edge region and method for analyzing shape of the same
JP2020123610A (ja) * 2019-01-29 2020-08-13 信越半導体株式会社 シリコンウェーハの製造方法およびシリコンウェーハ
JP7153578B2 (ja) 2019-01-29 2022-10-14 信越半導体株式会社 シリコンウェーハの製造方法
WO2020158376A1 (ja) * 2019-01-29 2020-08-06 信越半導体株式会社 シリコンウェーハの製造方法およびシリコンウェーハ
JP7047797B2 (ja) 2019-02-25 2022-04-05 株式会社Sumco 貼り合わせウェーハのテラス加工方法及びテラス加工装置
JP2020131410A (ja) * 2019-02-25 2020-08-31 株式会社Sumco 貼り合わせウェーハのテラス加工方法及びテラス加工装置
CN109822432A (zh) * 2019-03-14 2019-05-31 成都青洋电子材料有限公司 一种单晶硅片截面打磨用滚磨机
CN113211235A (zh) * 2021-05-10 2021-08-06 山西光兴光电科技有限公司 研磨设备以及研磨方法

Also Published As

Publication number Publication date
EP2107598A4 (en) 2011-11-16
KR20090115717A (ko) 2009-11-05
EP2107598A1 (en) 2009-10-07
US20090324896A1 (en) 2009-12-31
TWI462170B (zh) 2014-11-21
KR101460993B1 (ko) 2014-11-13
US8454852B2 (en) 2013-06-04
JPWO2008093488A1 (ja) 2010-05-20
JP4862896B2 (ja) 2012-01-25
EP2107598B1 (en) 2016-09-07
TW200849363A (en) 2008-12-16

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