TWI456731B - 半導體裝置、固體攝像裝置及電子機器 - Google Patents

半導體裝置、固體攝像裝置及電子機器 Download PDF

Info

Publication number
TWI456731B
TWI456731B TW099147359A TW99147359A TWI456731B TW I456731 B TWI456731 B TW I456731B TW 099147359 A TW099147359 A TW 099147359A TW 99147359 A TW99147359 A TW 99147359A TW I456731 B TWI456731 B TW I456731B
Authority
TW
Taiwan
Prior art keywords
wafer
circuit
signal
semiconductor device
wiring
Prior art date
Application number
TW099147359A
Other languages
English (en)
Other versions
TW201143020A (en
Inventor
Shunichi Sukegawa
Noriyuki Fukushima
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Publication of TW201143020A publication Critical patent/TW201143020A/zh
Application granted granted Critical
Publication of TWI456731B publication Critical patent/TWI456731B/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/16Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits
    • H01L25/167Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits comprising optoelectronic devices, e.g. LED, photodiodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/14625Optical elements or arrangements associated with the device
    • H01L27/14627Microlenses
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/14634Assemblies, i.e. Hybrid structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/14636Interconnect structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14643Photodiode arrays; MOS imagers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14643Photodiode arrays; MOS imagers
    • H01L27/14645Colour imagers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14683Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
    • H01L27/1469Assemblies, i.e. hybrid integration
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14683Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
    • H01L27/14698Post-treatment for the devices, e.g. annealing, impurity-gettering, shor-circuit elimination, recrystallisation
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • H04N25/76Addressed sensors, e.g. MOS or CMOS sensors
    • H04N25/77Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • H04N25/76Addressed sensors, e.g. MOS or CMOS sensors
    • H04N25/77Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components
    • H04N25/772Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components comprising A/D, V/T, V/F, I/T or I/F converters
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • H04N25/76Addressed sensors, e.g. MOS or CMOS sensors
    • H04N25/78Readout circuits for addressed sensors, e.g. output amplifiers or A/D converters
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • H04N25/79Arrangements of circuitry being divided between different or multiple substrates, chips or circuit boards, e.g. stacked image sensors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/18Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different subgroups of the same main group of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/14618Containers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/1462Coatings
    • H01L27/14621Colour filter arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Electromagnetism (AREA)
  • Signal Processing (AREA)
  • Multimedia (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
  • Semiconductor Integrated Circuits (AREA)

Claims (18)

  1. 一種半導體裝置,其包含:第1晶圓;及第2晶圓;且具有將上述第1晶圓與上述第2晶圓貼合之積層構造,上述第1晶圓係搭載高耐壓電晶體系統電路,上述第2晶圓係搭載較上述高耐壓電晶體系統電路為低耐壓之低耐壓電晶體系統電路,上述第1晶圓與上述第2晶圓之配線係電性連接。
  2. 如請求項1之半導體裝置,其中上述第1晶圓與上述第2晶圓之配線係使用貫通上述第1晶圓之通孔而電性連接。
  3. 如請求項1之半導體裝置,其中上述第1晶圓係搭載類比系統電路,上述第2晶圓係搭載數位系統電路。
  4. 如請求項1之半導體裝置,其中於上述第2晶圓上配置有接合墊及輸入輸出電路,於上述第1晶圓上形成有用以打線接合於上述第2晶圓之開口部。
  5. 如請求項1之半導體裝置,其中上述第1晶圓係以於所搭載之電路區塊之角部具有電源及信號之端口的方式佈局,信號及電力供給用之通孔係配置於上述電路區塊之角部附近。
  6. 如請求項5之半導體裝置,其中於上述第1晶圓上形成有:電力供給用通孔;及信號用通孔;且自電力供給用通孔供給之電力之電源配線係連接於電路區塊之端口,信號配線係連接於第1晶圓之電路區塊之角部附近之通孔。
  7. 如請求項5之半導體裝置,其中上述第1晶圓中,將電力供給用通孔間之空間以與連接配線層不同之配線層予以配線,並連接於電路區塊。
  8. 如請求項5之半導體裝置,其中於上述第1晶圓中,電力供給用通孔係配置於較信號供給用通孔相對於晶圓之緣部更內側。
  9. 如請求項5之半導體裝置,其中使用上述第2晶圓之配線,強化上述第1晶圓之電源配線。
  10. 如請求項5之半導體裝置,其中將電路區塊分割為複數個,且於電路區塊間配置有上述通孔。
  11. 如請求項10之半導體裝置,其中於上述第2晶圓中,藉由與上述第1晶圓之電源配線平行地配線之電源線作為內襯。
  12. 一種固體攝像裝置,其包含: 像素部,其係將進行光電轉換之複數個像素排列為矩陣狀而成;及像素信號讀出電路,其自上述像素部進行像素信號之讀出;上述像素信號讀出電路包含:比較器,其將讀出信號電位與參照電壓進行比較判定;計數器,其計數上述比較器之比較時間;第1晶圓;及第2晶圓;且具有將上述第1晶圓與上述第2晶圓貼合之積層構造,上述第1晶圓至少搭載上述像素部及比較器,上述第2晶圓至少搭載上述計數器,上述第1晶圓與上述第2晶圓間之配線係電性連接。
  13. 如請求項12之固體攝像裝置,其中上述第1晶圓與上述第2晶圓之配線係藉由貫通上述第1晶圓之通孔而電性連接。
  14. 如請求項12之固體攝像裝置,其中上述第1晶圓係搭載類比系統電路,上述第2晶圓係搭載數位系統電路。
  15. 如請求項12之固體攝像裝置,其中於上述第2晶圓上配置有接合墊及輸入輸出電路,於上述第1晶圓上,在上述像素部之周圍形成有用以打線接合於上述第2晶圓之開口部。
  16. 如請求項12之固體攝像裝置,其中上述第1晶圓係以於所搭載之電路區塊之角部具有電源及信號之端口的方式佈局,信號及電力供給用之通孔係配置於上述電路區塊之角部附近。
  17. 如請求項16之固體攝像裝置,其中於上述第1晶圓上形成有:電力供給用通孔;及信號用通孔;且自電力供給用通孔供給之電力之電源配線係連接於電路區塊之端口,信號配線係連接於第1晶圓之電路區塊之角部附近之通孔。
  18. 一種電子機器,其包含:固體攝像元件;及光學系統,其將被攝體像成像於上述攝像元件;上述固體攝像元件包含:像素部,其係將進行光電轉換之複數個像素排列為矩陣狀而成;及像素信號讀出電路,其自上述像素部進行像素信號之讀出;上述像素信號讀出電路包含:比較器,其將讀出信號電位與參照電壓進行比較判定,並輸出該判定信號; 計數器,其計數上述比較器之比較時間;第1晶圓;及第2晶圓;且具有將上述第1晶圓與上述第2晶圓貼合之積層構造,上述第1晶圓至少搭載上述像素部及上述比較器,上述第2晶圓至少搭載上述計數器,上述第1晶圓與上述第2晶圓間之配線係電性連接。
TW099147359A 2010-01-08 2010-12-31 半導體裝置、固體攝像裝置及電子機器 TWI456731B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2010002979 2010-01-08
JP2010255934A JP5685898B2 (ja) 2010-01-08 2010-11-16 半導体装置、固体撮像装置、およびカメラシステム

Publications (2)

Publication Number Publication Date
TW201143020A TW201143020A (en) 2011-12-01
TWI456731B true TWI456731B (zh) 2014-10-11

Family

ID=44306407

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099147359A TWI456731B (zh) 2010-01-08 2010-12-31 半導體裝置、固體攝像裝置及電子機器

Country Status (8)

Country Link
US (9) US9093363B2 (zh)
EP (4) EP3267480B1 (zh)
JP (1) JP5685898B2 (zh)
KR (3) KR101774725B1 (zh)
CN (1) CN102782840B (zh)
DE (2) DE202010018542U1 (zh)
TW (1) TWI456731B (zh)
WO (1) WO2011083722A1 (zh)

Families Citing this family (108)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010073520A1 (ja) * 2008-12-26 2010-07-01 パナソニック株式会社 固体撮像デバイスおよびその製造方法
JP5685898B2 (ja) 2010-01-08 2015-03-18 ソニー株式会社 半導体装置、固体撮像装置、およびカメラシステム
JP5843475B2 (ja) * 2010-06-30 2016-01-13 キヤノン株式会社 固体撮像装置および固体撮像装置の製造方法
JP6173410B2 (ja) * 2010-06-30 2017-08-02 キヤノン株式会社 固体撮像装置および固体撮像装置の製造方法
JP6091550B2 (ja) * 2011-08-02 2017-03-08 キヤノン株式会社 撮像素子及び撮像装置
JP5791571B2 (ja) 2011-08-02 2015-10-07 キヤノン株式会社 撮像素子及び撮像装置
US8890047B2 (en) * 2011-09-21 2014-11-18 Aptina Imaging Corporation Stacked-chip imaging systems
JP5645786B2 (ja) * 2011-09-22 2014-12-24 富士フイルム株式会社 固体撮像装置及びカメラモジュール
JP2013090305A (ja) 2011-10-21 2013-05-13 Sony Corp 比較器、ad変換器、固体撮像装置、およびカメラシステム
JP6056126B2 (ja) 2011-10-21 2017-01-11 ソニー株式会社 固体撮像装置およびカメラシステム
JP5923929B2 (ja) 2011-10-27 2016-05-25 ソニー株式会社 固体撮像素子およびカメラシステム
JP2014241458A (ja) * 2011-10-28 2014-12-25 ソニー株式会社 固体撮像素子およびカメラシステム
JP6214132B2 (ja) 2012-02-29 2017-10-18 キヤノン株式会社 光電変換装置、撮像システムおよび光電変換装置の製造方法
JP6016378B2 (ja) 2012-02-29 2016-10-26 キヤノン株式会社 光電変換装置、および光電変換装置を用いた撮像システム
US9607971B2 (en) 2012-06-04 2017-03-28 Sony Corporation Semiconductor device and sensing system
TWI583195B (zh) 2012-07-06 2017-05-11 新力股份有限公司 A solid-state imaging device and a solid-state imaging device, and an electronic device
US8710607B2 (en) 2012-07-12 2014-04-29 Taiwan Semiconductor Manufacturing Company, Ltd. Method and apparatus for image sensor packaging
US9343497B2 (en) * 2012-09-20 2016-05-17 Semiconductor Components Industries, Llc Imagers with stacked integrated circuit dies
JP6128787B2 (ja) 2012-09-28 2017-05-17 キヤノン株式会社 半導体装置
JP6415447B2 (ja) 2012-12-19 2018-10-31 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se 1つ以上の物体を光学的に検出するための検出器
JP6037878B2 (ja) * 2013-02-13 2016-12-07 オリンパス株式会社 撮像装置
US8946784B2 (en) * 2013-02-18 2015-02-03 Taiwan Semiconductor Manufacturing Company, Ltd. Method and apparatus for image sensor packaging
JP2014165396A (ja) * 2013-02-26 2014-09-08 Sony Corp 固体撮像装置および電子機器
CN111225161B (zh) 2013-03-14 2023-04-18 株式会社尼康 摄像元件及摄像装置
WO2014198625A1 (en) * 2013-06-13 2014-12-18 Basf Se Optical detector and method for manufacturing the same
AU2014280332B2 (en) 2013-06-13 2017-09-07 Basf Se Detector for optically detecting at least one object
AU2014280335B2 (en) 2013-06-13 2018-03-22 Basf Se Detector for optically detecting an orientation of at least one object
JP6190184B2 (ja) 2013-06-28 2017-08-30 キヤノン株式会社 撮像素子、撮像装置、その制御方法、および制御プログラム
TWI631854B (zh) * 2013-08-05 2018-08-01 日商新力股份有限公司 Conversion device, imaging device, electronic device, conversion method
TWI659652B (zh) * 2013-08-05 2019-05-11 新力股份有限公司 攝像裝置、電子機器
JP6403776B2 (ja) 2013-08-19 2018-10-10 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se 光学検出器
JP6192469B2 (ja) 2013-10-01 2017-09-06 オリンパス株式会社 撮像装置
JP6346740B2 (ja) * 2013-10-08 2018-06-20 オリンパス株式会社 撮像装置
JP6463944B2 (ja) 2013-11-25 2019-02-06 キヤノン株式会社 撮像素子、撮像装置及び携帯電話機
JP6320272B2 (ja) * 2013-11-29 2018-05-09 キヤノン株式会社 撮像素子、撮像装置及び携帯電話機
JP6458114B2 (ja) * 2013-11-29 2019-01-23 キヤノン株式会社 撮像素子、撮像装置及び携帯電話機
JP6278881B2 (ja) 2013-12-06 2018-02-14 キヤノン株式会社 撮像素子、撮像装置及び携帯電話機
JP6314477B2 (ja) 2013-12-26 2018-04-25 ソニー株式会社 電子デバイス
US9536920B2 (en) * 2014-03-28 2017-01-03 Taiwan Semiconductor Manufacturing Company, Ltd. Stacked image sensor having a barrier layer
JP2015195235A (ja) * 2014-03-31 2015-11-05 ソニー株式会社 固体撮像素子、電子機器、および撮像方法
US20150296158A1 (en) * 2014-04-10 2015-10-15 Forza Silicon Corporation Reconfigurable CMOS Image Sensor
TWI648986B (zh) 2014-04-15 2019-01-21 日商新力股份有限公司 攝像元件、電子機器
US10084983B2 (en) 2014-04-29 2018-09-25 Fermi Research Alliance, Llc Wafer-scale pixelated detector system
US9794499B2 (en) * 2014-04-29 2017-10-17 Fermi Research Alliance, Llc Wafer-scale pixelated detector system
CN104092963B (zh) * 2014-06-24 2018-01-02 上海集成电路研发中心有限公司 一种可重构的cmos图像传感器芯片及其形成方法
EP3167304A4 (en) 2014-07-08 2018-02-21 Basf Se Detector for determining a position of at least one object
US9531959B2 (en) * 2014-08-29 2016-12-27 Semiconductor Components Industries, Llc Imaging systems and methods for capturing image data at high scan rates
WO2016046685A1 (en) 2014-09-26 2016-03-31 Semiconductor Energy Laboratory Co., Ltd. Imaging device
JP6578006B2 (ja) 2014-09-29 2019-09-18 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se 少なくとも1個の物体の位置を光学的に求めるための検出器
JP6930556B2 (ja) * 2014-09-30 2021-09-01 株式会社ニコン 撮像素子および撮像装置
US11125880B2 (en) 2014-12-09 2021-09-21 Basf Se Optical detector
JP6218799B2 (ja) 2015-01-05 2017-10-25 キヤノン株式会社 撮像素子及び撮像装置
US10070088B2 (en) * 2015-01-05 2018-09-04 Canon Kabushiki Kaisha Image sensor and image capturing apparatus for simultaneously performing focus detection and image generation
JP6841769B2 (ja) 2015-01-30 2021-03-10 トリナミクス ゲゼルシャフト ミット ベシュレンクテル ハフツング 少なくとも1個の物体を光学的に検出する検出器
US10389961B2 (en) 2015-04-09 2019-08-20 Semiconductor Energy Laboratory Co., Ltd. Imaging device and electronic device
US11153515B2 (en) 2015-04-24 2021-10-19 Sony Corporation Solid state image sensor comprising stacked substrates, semiconductor device, and electronic device
TWI692859B (zh) 2015-05-15 2020-05-01 日商新力股份有限公司 固體攝像裝置及其製造方法、以及電子機器
JP6272387B2 (ja) 2015-05-29 2018-01-31 キヤノン株式会社 撮像素子および撮像装置
JP6608185B2 (ja) * 2015-06-18 2019-11-20 キヤノン株式会社 積層型イメージセンサおよび撮像装置
WO2017012986A1 (en) 2015-07-17 2017-01-26 Trinamix Gmbh Detector for optically detecting at least one object
KR102422224B1 (ko) 2015-07-31 2022-07-18 삼성전자주식회사 적층형 이미지 센서 및 이를 포함하는 시스템
WO2017038403A1 (ja) * 2015-09-01 2017-03-09 ソニー株式会社 積層体
JP6755316B2 (ja) 2015-09-14 2020-09-16 トリナミクス ゲゼルシャフト ミット ベシュレンクテル ハフツング 少なくとも1つの物体の少なくとも1つの画像を記録するカメラ
US11297258B2 (en) * 2015-10-01 2022-04-05 Qualcomm Incorporated High dynamic range solid state image sensor and camera system
JPWO2017077620A1 (ja) * 2015-11-05 2018-09-20 オリンパス株式会社 固体撮像装置
TWI701493B (zh) * 2016-03-15 2020-08-11 大陸商寧波舜宇光電信息有限公司 一體基座組件、基於一體封裝工藝的攝像模組和陣列攝像模組
CN113225498A (zh) 2016-03-24 2021-08-06 株式会社尼康 摄像元件和摄像装置
JPWO2018012143A1 (ja) 2016-07-11 2019-04-25 ソニーセミコンダクタソリューションズ株式会社 撮像素子および撮像装置
KR102492134B1 (ko) 2016-07-29 2023-01-27 트리나미엑스 게엠베하 광학 센서 및 광학적 검출용 검출기
JP2018042139A (ja) * 2016-09-08 2018-03-15 ソニーセミコンダクタソリューションズ株式会社 撮像素子および撮像素子の動作方法、撮像装置、および電子機器
KR102431355B1 (ko) 2016-10-25 2022-08-10 트리나미엑스 게엠베하 적어도 하나의 대상체의 광학적 검출을 위한 검출기
US10890491B2 (en) 2016-10-25 2021-01-12 Trinamix Gmbh Optical detector for an optical detection
JP6979068B2 (ja) 2016-11-17 2021-12-08 トリナミクス ゲゼルシャフト ミット ベシュレンクテル ハフツング 少なくとも1つの物体を光学的に検出するための検出器
US11860292B2 (en) 2016-11-17 2024-01-02 Trinamix Gmbh Detector and methods for authenticating at least one object
EP3570325B1 (en) * 2017-01-12 2020-10-28 Mitsubishi Electric Corporation Infrared sensor substrate and infrared sensor device
EP3612805A1 (en) 2017-04-20 2020-02-26 trinamiX GmbH Optical detector
KR102568462B1 (ko) 2017-06-26 2023-08-21 트리나미엑스 게엠베하 적어도 하나의 대상체의 위치를 결정하는 검출기
US11244980B2 (en) * 2017-06-29 2022-02-08 Sony Semiconductor Solutions Corporation Semiconductor device
JP7102119B2 (ja) 2017-09-29 2022-07-19 キヤノン株式会社 半導体装置および機器
TWI788430B (zh) * 2017-10-30 2023-01-01 日商索尼半導體解決方案公司 背面照射型之固體攝像裝置、背面照射型之固體攝像裝置之製造方法、攝像裝置及電子機器
US10529768B2 (en) 2017-12-15 2020-01-07 Atomera Incorporated Method for making CMOS image sensor including pixels with read circuitry having a superlattice
US10615209B2 (en) 2017-12-15 2020-04-07 Atomera Incorporated CMOS image sensor including stacked semiconductor chips and readout circuitry including a superlattice
US10529757B2 (en) 2017-12-15 2020-01-07 Atomera Incorporated CMOS image sensor including pixels with read circuitry having a superlattice
US10367028B2 (en) 2017-12-15 2019-07-30 Atomera Incorporated CMOS image sensor including stacked semiconductor chips and image processing circuitry including a superlattice
US10608043B2 (en) * 2017-12-15 2020-03-31 Atomera Incorporation Method for making CMOS image sensor including stacked semiconductor chips and readout circuitry including a superlattice
US10608027B2 (en) * 2017-12-15 2020-03-31 Atomera Incorporated Method for making CMOS image sensor including stacked semiconductor chips and image processing circuitry including a superlattice
US10708529B2 (en) * 2017-12-20 2020-07-07 Semiconductor Components Industries, Llc Image sensors with low-voltage transistors
CN108281412B (zh) * 2018-01-23 2020-02-14 德淮半导体有限公司 堆叠式图像传感器、像素管芯及其制造方法
JP2019140237A (ja) * 2018-02-09 2019-08-22 キヤノン株式会社 光電変換装置および撮像システム
JP7080660B2 (ja) * 2018-02-09 2022-06-06 キヤノン株式会社 光電変換装置、撮像システム、および、移動体
JP6575635B2 (ja) * 2018-04-26 2019-09-18 ソニー株式会社 半導体装置、固体撮像装置、およびカメラシステム
US10530380B2 (en) * 2018-04-27 2020-01-07 Raytheon Company Massively parallel three dimensional per pixel single slope analog to digital converter
JP6669196B2 (ja) * 2018-05-28 2020-03-18 株式会社ニコン 撮像素子及び撮像装置
JP6708698B2 (ja) * 2018-05-31 2020-06-10 キヤノン株式会社 光電変換装置、および光電変換装置を用いた撮像システム
US11735614B2 (en) 2018-07-31 2023-08-22 Sony Semiconductor Solutions Corporation Stacked light-receiving sensor and electronic device
WO2020027233A1 (ja) * 2018-07-31 2020-02-06 ソニーセミコンダクタソリューションズ株式会社 撮像装置及び車両制御システム
JP7327916B2 (ja) * 2018-09-11 2023-08-16 キヤノン株式会社 光電変換装置および機器
JP7402606B2 (ja) * 2018-10-31 2023-12-21 ソニーセミコンダクタソリューションズ株式会社 固体撮像装置及び電子機器
WO2020129712A1 (ja) * 2018-12-20 2020-06-25 ソニーセミコンダクタソリューションズ株式会社 撮像装置
JP7488195B2 (ja) 2019-01-25 2024-05-21 ソニーセミコンダクタソリューションズ株式会社 撮像装置及び電子機器
TWI692857B (zh) * 2019-01-25 2020-05-01 世界先進積體電路股份有限公司 半導體裝置與生物辨識裝置
CN109923858B (zh) 2019-01-31 2021-08-13 深圳市汇顶科技股份有限公司 图像传感器及其制造方法和电子设备
KR20200110020A (ko) 2019-03-15 2020-09-23 삼성전자주식회사 디스플레이 드라이버 ic 소자
JP6957559B2 (ja) 2019-06-24 2021-11-02 キヤノン株式会社 半導体装置および機器
JP7279746B2 (ja) * 2019-06-27 2023-05-23 株式会社ニコン 撮像ユニットおよび撮像装置
JP2020096367A (ja) * 2020-02-27 2020-06-18 株式会社ニコン 画像処理装置および撮像装置
JP7171649B2 (ja) * 2020-05-15 2022-11-15 キヤノン株式会社 撮像装置および撮像システム
JP2022158017A (ja) * 2021-04-01 2022-10-14 キヤノン株式会社 信号処理装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6271785B1 (en) * 1998-04-29 2001-08-07 Texas Instruments Incorporated CMOS imager with an A/D per pixel convertor
JP2001339057A (ja) * 2000-05-30 2001-12-07 Mitsumasa Koyanagi 3次元画像処理装置の製造方法
TW200709407A (en) * 2005-06-02 2007-03-01 Sony Corp Semiconductor image sensor module and method for manufacturing the same
TWI279132B (en) * 2002-09-30 2007-04-11 Matsushita Electric Ind Co Ltd Solid state imaging device and equipment using the same
US20090189293A1 (en) * 2008-01-09 2009-07-30 Elpida Memory, Inc. Semiconductor device

Family Cites Families (60)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3432963B2 (ja) * 1995-06-15 2003-08-04 沖電気工業株式会社 半導体集積回路
US7129985B1 (en) * 1998-11-24 2006-10-31 Canon Kabushiki Kaisha Image sensing apparatus arranged on a single substrate
AU2003900746A0 (en) * 2003-02-17 2003-03-06 Silverbrook Research Pty Ltd Methods, systems and apparatus (NPS041)
JP3737333B2 (ja) * 2000-03-17 2006-01-18 沖電気工業株式会社 半導体装置
JP2001289886A (ja) * 2000-04-03 2001-10-19 Sanyo Electric Co Ltd 電池電圧測定装置
US6809769B1 (en) * 2000-06-22 2004-10-26 Pixim, Inc. Designs of digital pixel sensors
US7139024B2 (en) * 2002-07-26 2006-11-21 Xerox Corporation Large-area imager with direct digital pixel output
JP3652676B2 (ja) * 2002-09-17 2005-05-25 松下電器産業株式会社 撮像装置および画像ピックアップシステム
JP2004146816A (ja) 2002-09-30 2004-05-20 Matsushita Electric Ind Co Ltd 固体撮像装置およびこれを用いた機器
JP4414646B2 (ja) * 2002-11-18 2010-02-10 浜松ホトニクス株式会社 光検出装置
KR100494474B1 (ko) * 2003-01-14 2005-06-10 삼성전기주식회사 카메라 모듈 및 그 제조방법
KR100568223B1 (ko) * 2003-06-18 2006-04-07 삼성전자주식회사 고체 촬상용 반도체 장치
US6927432B2 (en) * 2003-08-13 2005-08-09 Motorola, Inc. Vertically integrated photosensor for CMOS imagers
JP4068616B2 (ja) 2003-12-26 2008-03-26 エルピーダメモリ株式会社 半導体装置
US7009287B2 (en) * 2004-03-01 2006-03-07 United Microelectronics Corp. Chip on photosensitive device package structure and electrical connection thereof
JP4387403B2 (ja) * 2004-03-19 2009-12-16 株式会社ルネサステクノロジ 電子回路
US7268369B2 (en) * 2004-07-06 2007-09-11 Fujifilm Corporation Functional device and method for producing the same
JP3979405B2 (ja) * 2004-07-13 2007-09-19 セイコーエプソン株式会社 電気光学装置、実装構造体及び電子機器
US8144227B2 (en) 2004-09-02 2012-03-27 Sony Corporation Image pickup device and image pickup result outputting method
JP4379295B2 (ja) 2004-10-26 2009-12-09 ソニー株式会社 半導体イメージセンサー・モジュール及びその製造方法
CN101065844B (zh) * 2005-01-04 2010-12-15 株式会社映煌 固体摄像装置及其制造方法
US20060186315A1 (en) * 2005-02-22 2006-08-24 Kany-Bok Lee Active pixel image sensors
JP4748648B2 (ja) * 2005-03-31 2011-08-17 ルネサスエレクトロニクス株式会社 半導体装置
KR101070913B1 (ko) 2005-05-19 2011-10-06 삼성테크윈 주식회사 반도체 칩 적층 패키지
JP5194382B2 (ja) * 2005-08-18 2013-05-08 セイコーエプソン株式会社 電気光学装置及び電子機器
JP2007228460A (ja) 2006-02-27 2007-09-06 Mitsumasa Koyanagi 集積センサを搭載した積層型半導体装置
US20080308914A1 (en) * 2006-03-17 2008-12-18 Chipmos Technologies Inc. Chip package
US7902654B2 (en) * 2006-05-10 2011-03-08 Qualcomm Incorporated System and method of silicon switched power delivery using a package
JP4289377B2 (ja) * 2006-08-21 2009-07-01 ソニー株式会社 物理量検出装置及び撮像装置
JP2008053286A (ja) * 2006-08-22 2008-03-06 Matsushita Electric Ind Co Ltd 撮像装置チップセット及び画像ピックアップシステム
EP2079358B1 (en) * 2006-09-27 2011-08-10 University of Connecticut Implantable biosensor and methods of use thereof
JP2008085755A (ja) 2006-09-28 2008-04-10 Toshiba Corp 画像撮像装置
US8049256B2 (en) * 2006-10-05 2011-11-01 Omnivision Technologies, Inc. Active pixel sensor having a sensor wafer connected to a support circuit wafer
JP4893320B2 (ja) * 2007-01-12 2012-03-07 ソニー株式会社 固体撮像装置、撮像装置
JP2008235478A (ja) 2007-03-19 2008-10-02 Nikon Corp 撮像素子
US7488928B2 (en) * 2007-04-20 2009-02-10 Alexander Krymski Image sensor circuits and methods with multiple readout lines per column of pixel circuits
JP4337906B2 (ja) * 2007-05-10 2009-09-30 ソニー株式会社 固体撮像素子およびカメラシステム
JP2009038142A (ja) * 2007-07-31 2009-02-19 Elpida Memory Inc 半導体積層パッケージ
JP4940064B2 (ja) * 2007-08-28 2012-05-30 ルネサスエレクトロニクス株式会社 半導体装置
US8415783B1 (en) * 2007-10-04 2013-04-09 Xilinx, Inc. Apparatus and methodology for testing stacked die
US8564676B2 (en) * 2007-11-28 2013-10-22 Sanyo Semiconductor Co., Ltd. Semiconductor device with anti-shake control function
KR101435522B1 (ko) * 2008-01-23 2014-09-02 삼성전자 주식회사 바이오 칩
JP2009177436A (ja) 2008-01-23 2009-08-06 Sharp Corp 固体撮像装置、信号処理装置、および電子情報機器
US8183510B2 (en) * 2008-02-12 2012-05-22 Omnivision Technologies, Inc. Image sensor with buried self aligned focusing element
JP2009212162A (ja) 2008-02-29 2009-09-17 Fujifilm Corp 放射線検出器
JP5125632B2 (ja) * 2008-03-10 2013-01-23 セイコーエプソン株式会社 実装構造体および電気光学装置
JP4538058B2 (ja) * 2008-03-28 2010-09-08 株式会社東芝 集積半導体装置及び集積3次元半導体装置
US8354742B2 (en) * 2008-03-31 2013-01-15 Stats Chippac, Ltd. Method and apparatus for a package having multiple stacked die
US8362617B2 (en) * 2008-05-01 2013-01-29 Infineon Technologies Ag Semiconductor device
JP4799594B2 (ja) * 2008-08-19 2011-10-26 株式会社東芝 固体撮像装置およびその製造方法
US7795650B2 (en) * 2008-12-09 2010-09-14 Teledyne Scientific & Imaging Llc Method and apparatus for backside illuminated image sensors using capacitively coupled readout integrated circuits
US8711096B1 (en) * 2009-03-27 2014-04-29 Cypress Semiconductor Corporation Dual protocol input device
JP5083272B2 (ja) * 2009-05-07 2012-11-28 ソニー株式会社 半導体モジュール
US8605177B2 (en) * 2009-09-16 2013-12-10 Altasens, Inc. Image sensor with wide dynamic range
JP5442394B2 (ja) 2009-10-29 2014-03-12 ソニー株式会社 固体撮像装置とその製造方法、及び電子機器
US9257467B2 (en) * 2009-12-16 2016-02-09 Samsung Electronics Co., Ltd. Image sensor modules, methods of manufacturing the same, and image processing systems including the image sensor modules
TWI515885B (zh) 2009-12-25 2016-01-01 新力股份有限公司 半導體元件及其製造方法,及電子裝置
JP5685898B2 (ja) 2010-01-08 2015-03-18 ソニー株式会社 半導体装置、固体撮像装置、およびカメラシステム
JP5810493B2 (ja) 2010-09-03 2015-11-11 ソニー株式会社 半導体集積回路、電子機器、固体撮像装置、撮像装置
US8836101B2 (en) * 2010-09-24 2014-09-16 Infineon Technologies Ag Multi-chip semiconductor packages and assembly thereof

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6271785B1 (en) * 1998-04-29 2001-08-07 Texas Instruments Incorporated CMOS imager with an A/D per pixel convertor
JP2001339057A (ja) * 2000-05-30 2001-12-07 Mitsumasa Koyanagi 3次元画像処理装置の製造方法
TWI279132B (en) * 2002-09-30 2007-04-11 Matsushita Electric Ind Co Ltd Solid state imaging device and equipment using the same
TW200709407A (en) * 2005-06-02 2007-03-01 Sony Corp Semiconductor image sensor module and method for manufacturing the same
US20090189293A1 (en) * 2008-01-09 2009-07-30 Elpida Memory, Inc. Semiconductor device

Also Published As

Publication number Publication date
US9762835B2 (en) 2017-09-12
US10615211B2 (en) 2020-04-07
US9641777B2 (en) 2017-05-02
EP3528284A3 (en) 2019-11-27
US20180097031A1 (en) 2018-04-05
DE202010018542U1 (de) 2017-07-27
US9093363B2 (en) 2015-07-28
KR101774725B1 (ko) 2017-09-04
US9634052B2 (en) 2017-04-25
KR101774609B1 (ko) 2017-09-04
US9565383B2 (en) 2017-02-07
US20170012075A1 (en) 2017-01-12
US9954024B2 (en) 2018-04-24
KR20160106784A (ko) 2016-09-12
EP3267480B1 (en) 2019-06-19
EP3267480A1 (en) 2018-01-10
WO2011083722A1 (ja) 2011-07-14
CN102782840B (zh) 2015-06-24
EP3525237A1 (en) 2019-08-14
US20120293698A1 (en) 2012-11-22
EP2528093A4 (en) 2014-03-26
CN102782840A (zh) 2012-11-14
EP2528093A1 (en) 2012-11-28
EP3528284A2 (en) 2019-08-21
US20150312500A1 (en) 2015-10-29
US20190148436A1 (en) 2019-05-16
KR20120111730A (ko) 2012-10-10
JP5685898B2 (ja) 2015-03-18
US20160286150A1 (en) 2016-09-29
EP2528093B1 (en) 2019-05-15
DE202010018564U1 (de) 2017-09-07
US20190341416A1 (en) 2019-11-07
TW201143020A (en) 2011-12-01
US20170180668A1 (en) 2017-06-22
KR101775860B1 (ko) 2017-09-06
KR20160106782A (ko) 2016-09-12
JP2011159958A (ja) 2011-08-18
US10396115B2 (en) 2019-08-27
US10319773B2 (en) 2019-06-11
US20170330912A1 (en) 2017-11-16

Similar Documents

Publication Publication Date Title
TWI456731B (zh) 半導體裝置、固體攝像裝置及電子機器
US20210257397A1 (en) Image pickup device and electronic apparatus
KR102550830B1 (ko) 고체 촬상 장치 및 그 제조 방법 및 전자 기기
KR102678404B1 (ko) 고체 촬상 소자, 고체 촬상 소자의 제조 방법, 및, 전자 기기
JP5794002B2 (ja) 固体撮像装置、電子機器
JP2018082495A5 (ja) 撮像素子、撮像装置、および電子機器
JP2014099582A5 (zh)
JP2018082464A5 (zh)
US20140009651A1 (en) Solid-state image sensor and camera
RU2018130065A (ru) Модуль формирования изображений, устройство формирования изображений и управляющая программа для формирования изображений
JP2009176777A5 (zh)
JP2011198855A5 (zh)
RU2013102310A (ru) Твердотельный датчик изображений
JP2011082768A5 (zh)
JP2014534611A5 (zh)
JP2009141439A5 (zh)
JP2011138841A5 (zh)
JP2011188410A5 (zh)
JP2016033982A5 (zh)
JP2017067830A5 (zh)
TWI709235B (zh) 固體攝像元件、其製造方法及電子機器
JP2012009547A (ja) 固体撮像装置、電子機器
JP2009181986A5 (zh)
JP2015050706A5 (zh)
JP2013145952A5 (zh)