TWI242082B - Manufacturing method of optical low-pass filtering lens - Google Patents

Manufacturing method of optical low-pass filtering lens Download PDF

Info

Publication number: TWI242082B
Authority: TW; Taiwan
Prior art keywords: plate; birefringent plate; birefringent; polymer film; manufacturing
Prior art date: 2003-05-02

Application number

TW093110542A

Other languages

English (en)

Chinese (zh)

Other versions

TW200424574A (en

Inventor

Kazuhiro Hara

Daisuke Aruga

Kenichi Mizoguchi

Original Assignee

Seiko Epson Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2003-05-02

Filing date

2004-04-15

Publication date

2005-10-21

2004-04-15 Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp

2004-11-16 Publication of TW200424574A publication Critical patent/TW200424574A/zh

2005-10-21 Application granted granted Critical

2005-10-21 Publication of TWI242082B publication Critical patent/TWI242082B/zh

Links

230000003287 optical effect Effects 0.000 title claims abstract description 63
238000004519 manufacturing process Methods 0.000 title claims abstract description 55
238000001914 filtration Methods 0.000 title abstract 4
238000000034 method Methods 0.000 claims abstract description 102
238000003825 pressing Methods 0.000 claims abstract description 86
230000008569 process Effects 0.000 claims abstract description 64
239000010409 thin film Substances 0.000 claims abstract description 20
229920000642 polymer Polymers 0.000 claims abstract description 9
229920006254 polymer film Polymers 0.000 claims description 99
239000010408 film Substances 0.000 claims description 49
230000006698 induction Effects 0.000 claims description 37
239000000463 material Substances 0.000 claims description 31
238000010030 laminating Methods 0.000 claims description 17
238000010438 heat treatment Methods 0.000 claims description 11
238000003475 lamination Methods 0.000 claims description 2
230000009194 climbing Effects 0.000 claims 1
238000012545 processing Methods 0.000 description 19
239000000853 adhesive Substances 0.000 description 17
230000001070 adhesive effect Effects 0.000 description 17
230000000903 blocking effect Effects 0.000 description 17
239000010410 layer Substances 0.000 description 17
239000012790 adhesive layer Substances 0.000 description 11
239000013078 crystal Substances 0.000 description 10
239000000758 substrate Substances 0.000 description 10
230000015572 biosynthetic process Effects 0.000 description 7
239000002120 nanofilm Substances 0.000 description 7
239000007789 gas Substances 0.000 description 6
238000003384 imaging method Methods 0.000 description 6
230000007423 decrease Effects 0.000 description 5
-1 polypropylene Polymers 0.000 description 5
MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
238000010586 diagram Methods 0.000 description 4
238000002474 experimental method Methods 0.000 description 4
150000002500 ions Chemical class 0.000 description 4
238000001771 vacuum deposition Methods 0.000 description 4
239000011248 coating agent Substances 0.000 description 3
238000000576 coating method Methods 0.000 description 3
238000007733 ion plating Methods 0.000 description 3
239000012788 optical film Substances 0.000 description 3
239000002245 particle Substances 0.000 description 3
230000010287 polarization Effects 0.000 description 3
229920001343 polytetrafluoroethylene Polymers 0.000 description 3
239000004810 polytetrafluoroethylene Substances 0.000 description 3
238000004544 sputter deposition Methods 0.000 description 3
238000005520 cutting process Methods 0.000 description 2
238000013461 design Methods 0.000 description 2
230000000694 effects Effects 0.000 description 2
229920001971 elastomer Polymers 0.000 description 2
230000005684 electric field Effects 0.000 description 2
230000003028 elevating effect Effects 0.000 description 2
229920000840 ethylene tetrafluoroethylene copolymer Polymers 0.000 description 2
239000011521 glass Substances 0.000 description 2
238000010884 ion-beam technique Methods 0.000 description 2
239000011159 matrix material Substances 0.000 description 2
230000000149 penetrating effect Effects 0.000 description 2
239000002985 plastic film Substances 0.000 description 2
229920006255 plastic film Polymers 0.000 description 2
239000004417 polycarbonate Substances 0.000 description 2
229920000515 polycarbonate Polymers 0.000 description 2
230000035945 sensitivity Effects 0.000 description 2
238000003860 storage Methods 0.000 description 2
238000007738 vacuum evaporation Methods 0.000 description 2
PEVRKKOYEFPFMN-UHFFFAOYSA-N 1,1,2,3,3,3-hexafluoroprop-1-ene;1,1,2,2-tetrafluoroethene Chemical group FC(F)=C(F)F.FC(F)=C(F)C(F)(F)F PEVRKKOYEFPFMN-UHFFFAOYSA-N 0.000 description 1
244000146553 Ceiba pentandra Species 0.000 description 1
235000003301 Ceiba pentandra Nutrition 0.000 description 1
JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
239000004677 Nylon Substances 0.000 description 1
240000007643 Phytolacca americana Species 0.000 description 1
239000004698 Polyethylene Substances 0.000 description 1
239000004743 Polypropylene Substances 0.000 description 1
229910004298 SiO 2 Inorganic materials 0.000 description 1
238000003848 UV Light-Curing Methods 0.000 description 1
230000001133 acceleration Effects 0.000 description 1
NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
239000003522 acrylic cement Substances 0.000 description 1
PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
230000003471 anti-radiation Effects 0.000 description 1
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
230000005540 biological transmission Effects 0.000 description 1
238000006243 chemical reaction Methods 0.000 description 1
238000005229 chemical vapour deposition Methods 0.000 description 1
230000006835 compression Effects 0.000 description 1
238000007906 compression Methods 0.000 description 1
238000001723 curing Methods 0.000 description 1
239000003989 dielectric material Substances 0.000 description 1
238000005485 electric heating Methods 0.000 description 1
238000005516 engineering process Methods 0.000 description 1
238000001704 evaporation Methods 0.000 description 1
239000000835 fiber Substances 0.000 description 1
239000012530 fluid Substances 0.000 description 1
230000008570 general process Effects 0.000 description 1
239000011261 inert gas Substances 0.000 description 1
238000007689 inspection Methods 0.000 description 1
239000010985 leather Substances 0.000 description 1
229910001635 magnesium fluoride Inorganic materials 0.000 description 1
230000014759 maintenance of location Effects 0.000 description 1
239000002184 metal Substances 0.000 description 1
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239000001301 oxygen Substances 0.000 description 1
229910052760 oxygen Inorganic materials 0.000 description 1
238000012856 packing Methods 0.000 description 1
229920000573 polyethylene Polymers 0.000 description 1
229920001155 polypropylene Polymers 0.000 description 1
230000001376 precipitating effect Effects 0.000 description 1
239000011347 resin Substances 0.000 description 1
229920005989 resin Polymers 0.000 description 1
238000012552 review Methods 0.000 description 1
238000005070 sampling Methods 0.000 description 1
229920002379 silicone rubber Polymers 0.000 description 1
239000004945 silicone rubber Substances 0.000 description 1
239000002356 single layer Substances 0.000 description 1
230000003595 spectral effect Effects 0.000 description 1
238000004528 spin coating Methods 0.000 description 1
238000005477 sputtering target Methods 0.000 description 1
238000005728 strengthening Methods 0.000 description 1
BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
238000002834 transmittance Methods 0.000 description 1
238000009834 vaporization Methods 0.000 description 1
230000008016 vaporization Effects 0.000 description 1
238000010792 warming Methods 0.000 description 1

Classifications

- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/46—Systems using spatial filters
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/03—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on ceramics or electro-optical crystals, e.g. exhibiting Pockels effect or Kerr effect
- G02F1/0305—Constructional arrangements
- G02F1/0311—Structural association of optical elements, e.g. lenses, polarizers, phase plates, with the crystal

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Optics & Photonics (AREA)
Nonlinear Science (AREA)
Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Ceramic Engineering (AREA)
Crystallography & Structural Chemistry (AREA)
Polarising Elements (AREA)

TW093110542A 2003-05-02 2004-04-15 Manufacturing method of optical low-pass filtering lens TWI242082B (en)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JP2003127322		2003-05-02
JP2004087619A JP4277721B2 (ja)	2003-05-02	2004-03-24	光学ローパスフィルタの製造方法

Publications (2)

Publication Number	Publication Date
TW200424574A TW200424574A (en)	2004-11-16
TWI242082B true TWI242082B (en)	2005-10-21

Family

ID=34066958

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW093110542A TWI242082B (en)	2003-05-02	2004-04-15	Manufacturing method of optical low-pass filtering lens

Country Status (4)

Country	Link
JP (1)	JP4277721B2 (ja)
KR (1)	KR100594672B1 (ja)
CN (1)	CN100420981C (ja)
TW (1)	TWI242082B (ja)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
TWI395978B (zh) *	2004-12-03	2013-05-11	Ohara Kk	光學元件與製造光學元件的方法
JP4760011B2 (ja) *	2004-12-24	2011-08-31	セイコーエプソン株式会社	光学部材
CN100403068C (zh) *	2005-03-28	2008-07-16	精工爱普生株式会社	光学低通滤波器
CN100439973C (zh) *	2005-09-08	2008-12-03	精工爱普生株式会社	光学低通滤波器
JP4973043B2 (ja) *	2005-09-08	2012-07-11	セイコーエプソン株式会社	光学ローパスフィルタおよびカメラ
JP4462197B2 (ja) *	2006-01-23	2010-05-12	ソニー株式会社	光学ローパスフィルタ
JP4356788B2 (ja) *	2007-03-13	2009-11-04	エプソントヨコム株式会社	光学素子、光学ローパスフィルタ、固体撮像装置
US7927687B2 (en)	2007-03-13	2011-04-19	Epson Toyocom Corporation	Optical element, optical lowpass filter, and solid-state imaging device
JP5121443B2 (ja) *	2007-12-28	2013-01-16	キヤノン株式会社	撮像装置及び光学フィルタ
KR101750147B1 (ko) *	2011-10-07	2017-06-22	스미또모 가가꾸 가부시키가이샤	편광판의 제조 방법
CN106990543A (zh) *	2017-03-23	2017-07-28	张家港康得新光电材料有限公司	3d显示装置的制备方法
JP6203978B1 (ja) *	2017-04-17	2017-09-27	株式会社アスカネット	立体像結像装置の製造方法
CN107144897A (zh) *	2017-06-27	2017-09-08	昆山三景科技股份有限公司	制备半反射半透射镜的设备及半反射半透射镜的制备方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US550663A (en) *		1895-12-03		Dynamo-electric machine for plating
JPH08240802A (ja) *	1995-03-03	1996-09-17	Omron Corp	光学素子およびその製造方法
KR100234290B1 (ko) *	1997-08-30	1999-12-15	윤종용	광저역통과필터
JP4419221B2 (ja) *	1999-09-02	2010-02-24	Ｄｉｃ株式会社	高分子製光学的ローパスフィルター、その製造方法及び高分子製光学的ローパスフィルター複合体
JP2001235709A (ja) *	2000-02-21	2001-08-31	Asahi Optical Co Ltd	光学ローパスフィルタとその製造方法
CN2457629Y (zh) *	2000-12-29	2001-10-31	浙江大学	一种光学低通滤波器
JP3982213B2 (ja) *	2001-07-16	2007-09-26	株式会社大真空	光学素子の貼り合わせ装置及び貼り合わせ方法

2004
- 2004-03-24 JP JP2004087619A patent/JP4277721B2/ja not_active Expired - Fee Related
- 2004-04-15 TW TW093110542A patent/TWI242082B/zh not_active IP Right Cessation
- 2004-04-29 CN CNB2004100372388A patent/CN100420981C/zh not_active Expired - Fee Related
- 2004-04-29 KR KR1020040030013A patent/KR100594672B1/ko not_active IP Right Cessation

Also Published As

Publication number	Publication date
JP4277721B2 (ja)	2009-06-10
JP2004354973A (ja)	2004-12-16
CN100420981C (zh)	2008-09-24
TW200424574A (en)	2004-11-16
KR20040094346A (ko)	2004-11-09
CN1542501A (zh)	2004-11-03
KR100594672B1 (ko)	2006-06-30

Legal Events

Date	Code	Title	Description
2017-07-21	MM4A	Annulment or lapse of patent due to non-payment of fees

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