CN100420981C - 光学低通滤波器的制造方法 - Google Patents

光学低通滤波器的制造方法 Download PDF

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Publication number: CN100420981C
Authority: CN; China
Prior art keywords: mentioned; birefringent plate; polymeric membrane; pass filter; optical low
Prior art date: 2003-05-02
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

CNB2004100372388A

Other languages

English (en)

Chinese (zh)

Other versions

CN1542501A (zh

Inventor

原和弘

有贺大助

沟口健一

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Seiko Epson Corp

Original Assignee

Seiko Epson Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2003-05-02

Filing date

2004-04-29

Publication date

2008-09-24

2004-04-29 Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp

2004-11-03 Publication of CN1542501A publication Critical patent/CN1542501A/zh

2008-09-24 Application granted granted Critical

2008-09-24 Publication of CN100420981C publication Critical patent/CN100420981C/zh

2024-04-29 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Links

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Images

Classifications

- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/46—Systems using spatial filters
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/03—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on ceramics or electro-optical crystals, e.g. exhibiting Pockels effect or Kerr effect
- G02F1/0305—Constructional arrangements
- G02F1/0311—Structural association of optical elements, e.g. lenses, polarizers, phase plates, with the crystal

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Optics & Photonics (AREA)
Nonlinear Science (AREA)
Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Ceramic Engineering (AREA)
Crystallography & Structural Chemistry (AREA)
Polarising Elements (AREA)

CNB2004100372388A 2003-05-02 2004-04-29 光学低通滤波器的制造方法 Expired - Fee Related CN100420981C (zh)

Applications Claiming Priority (4)

Application Number	Priority Date	Filing Date	Title
JP127322/2003		2003-05-02
JP2003127322		2003-05-02
JP2004087619A JP4277721B2 (ja)	2003-05-02	2004-03-24	光学ローパスフィルタの製造方法
JP087619/2004		2004-03-24

Publications (2)

Publication Number	Publication Date
CN1542501A CN1542501A (zh)	2004-11-03
CN100420981C true CN100420981C (zh)	2008-09-24

Family

ID=34066958

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CNB2004100372388A Expired - Fee Related CN100420981C (zh)	2003-05-02	2004-04-29	光学低通滤波器的制造方法

Country Status (4)

Country	Link
JP (1)	JP4277721B2 (ja)
KR (1)	KR100594672B1 (ja)
CN (1)	CN100420981C (ja)
TW (1)	TWI242082B (ja)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
TWI395978B (zh) *	2004-12-03	2013-05-11	Ohara Kk	光學元件與製造光學元件的方法
JP4760011B2 (ja) *	2004-12-24	2011-08-31	セイコーエプソン株式会社	光学部材
CN100403068C (zh) *	2005-03-28	2008-07-16	精工爱普生株式会社	光学低通滤波器
CN100439973C (zh) *	2005-09-08	2008-12-03	精工爱普生株式会社	光学低通滤波器
JP4973043B2 (ja) *	2005-09-08	2012-07-11	セイコーエプソン株式会社	光学ローパスフィルタおよびカメラ
JP4462197B2 (ja) *	2006-01-23	2010-05-12	ソニー株式会社	光学ローパスフィルタ
JP4356788B2 (ja) *	2007-03-13	2009-11-04	エプソントヨコム株式会社	光学素子、光学ローパスフィルタ、固体撮像装置
US7927687B2 (en)	2007-03-13	2011-04-19	Epson Toyocom Corporation	Optical element, optical lowpass filter, and solid-state imaging device
JP5121443B2 (ja) *	2007-12-28	2013-01-16	キヤノン株式会社	撮像装置及び光学フィルタ
KR101750147B1 (ko) *	2011-10-07	2017-06-22	스미또모 가가꾸 가부시키가이샤	편광판의 제조 방법
CN106990543A (zh) *	2017-03-23	2017-07-28	张家港康得新光电材料有限公司	3d显示装置的制备方法
JP6203978B1 (ja) *	2017-04-17	2017-09-27	株式会社アスカネット	立体像結像装置の製造方法
CN107144897A (zh) *	2017-06-27	2017-09-08	昆山三景科技股份有限公司	制备半反射半透射镜的设备及半反射半透射镜的制备方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US550663A (en) *		1895-12-03		Dynamo-electric machine for plating
JPH08240802A (ja) *	1995-03-03	1996-09-17	Omron Corp	光学素子およびその製造方法
CN1210273A (zh) *	1997-08-30	1999-03-10	三星电子株式会社	光学低通滤波器
JP2001075054A (ja) *	1999-09-02	2001-03-23	Dainippon Ink & Chem Inc	高分子製光学的ローパスフィルター、その製造方法及び高分子製光学的ローパスフィルター複合体
JP2001235709A (ja) *	2000-02-21	2001-08-31	Asahi Optical Co Ltd	光学ローパスフィルタとその製造方法
CN2457629Y (zh) *	2000-12-29	2001-10-31	浙江大学	一种光学低通滤波器
JP2003029035A (ja) *	2001-07-16	2003-01-29	Daishinku Corp	光学素子の貼り合わせ装置及び貼り合わせ方法

2004
- 2004-03-24 JP JP2004087619A patent/JP4277721B2/ja not_active Expired - Fee Related
- 2004-04-15 TW TW093110542A patent/TWI242082B/zh not_active IP Right Cessation
- 2004-04-29 CN CNB2004100372388A patent/CN100420981C/zh not_active Expired - Fee Related
- 2004-04-29 KR KR1020040030013A patent/KR100594672B1/ko not_active IP Right Cessation

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US550663A (en) *		1895-12-03		Dynamo-electric machine for plating
JPH08240802A (ja) *	1995-03-03	1996-09-17	Omron Corp	光学素子およびその製造方法
CN1210273A (zh) *	1997-08-30	1999-03-10	三星电子株式会社	光学低通滤波器
JP2001075054A (ja) *	1999-09-02	2001-03-23	Dainippon Ink & Chem Inc	高分子製光学的ローパスフィルター、その製造方法及び高分子製光学的ローパスフィルター複合体
JP2001235709A (ja) *	2000-02-21	2001-08-31	Asahi Optical Co Ltd	光学ローパスフィルタとその製造方法
CN2457629Y (zh) *	2000-12-29	2001-10-31	浙江大学	一种光学低通滤波器
JP2003029035A (ja) *	2001-07-16	2003-01-29	Daishinku Corp	光学素子の貼り合わせ装置及び貼り合わせ方法

Also Published As

Publication number	Publication date
JP4277721B2 (ja)	2009-06-10
JP2004354973A (ja)	2004-12-16
TW200424574A (en)	2004-11-16
KR20040094346A (ko)	2004-11-09
CN1542501A (zh)	2004-11-03
TWI242082B (en)	2005-10-21
KR100594672B1 (ko)	2006-06-30

Legal Events

Date	Code	Title	Description
2004-11-03	C06	Publication
2004-11-03	PB01	Publication
2005-01-05	C10	Entry into substantive examination
2005-01-05	SE01	Entry into force of request for substantive examination
2005-04-15	REG	Reference to a national code	Ref country code: HK Ref legal event code: DE Ref document number: 1067715 Country of ref document: HK
2008-09-24	C14	Grant of patent or utility model
2008-09-24	GR01	Patent grant
2010-12-10	REG	Reference to a national code	Ref country code: HK Ref legal event code: WD Ref document number: 1067715 Country of ref document: HK
2017-06-16	CF01	Termination of patent right due to non-payment of annual fee	Granted publication date: 20080924 Termination date: 20160429

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