SG162699A1 - Inline vacuum processing apparatus, method of controlling the same, and information recording medium manufacturing method - Google Patents

Inline vacuum processing apparatus, method of controlling the same, and information recording medium manufacturing method

Info

Publication number
SG162699A1
SG162699A1 SG200908476-5A SG2009084765A SG162699A1 SG 162699 A1 SG162699 A1 SG 162699A1 SG 2009084765 A SG2009084765 A SG 2009084765A SG 162699 A1 SG162699 A1 SG 162699A1
Authority
SG
Singapore
Prior art keywords
deposition
deposition chamber
processing apparatus
vacuum processing
unit
Prior art date
Application number
SG200908476-5A
Other languages
English (en)
Inventor
Masahiro Kawata
Original Assignee
Canon Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Anelva Corp filed Critical Canon Anelva Corp
Publication of SG162699A1 publication Critical patent/SG162699A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Physical Vapour Deposition (AREA)
SG200908476-5A 2008-12-26 2009-12-18 Inline vacuum processing apparatus, method of controlling the same, and information recording medium manufacturing method SG162699A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2008335157 2008-12-26
JP2009284468A JP5431901B2 (ja) 2008-12-26 2009-12-15 インライン真空処理装置、インライン真空処理装置の制御方法、情報記録媒体の製造方法

Publications (1)

Publication Number Publication Date
SG162699A1 true SG162699A1 (en) 2010-07-29

Family

ID=42285292

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200908476-5A SG162699A1 (en) 2008-12-26 2009-12-18 Inline vacuum processing apparatus, method of controlling the same, and information recording medium manufacturing method

Country Status (4)

Country Link
US (1) US8900363B2 (ja)
JP (1) JP5431901B2 (ja)
CN (1) CN101768732B (ja)
SG (1) SG162699A1 (ja)

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* Cited by examiner, † Cited by third party
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CN104950828B (zh) * 2014-03-28 2018-07-06 北京北方华创微电子装备有限公司 工艺控制的方法及***
US20160359080A1 (en) * 2015-06-07 2016-12-08 Solarcity Corporation System, method and apparatus for chemical vapor deposition
CN112126910B (zh) * 2020-08-04 2022-11-18 山西云矽电子科技有限公司 一种基于plc在金刚石生长***中的控制方法

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Also Published As

Publication number Publication date
US8900363B2 (en) 2014-12-02
JP5431901B2 (ja) 2014-03-05
JP2010170652A (ja) 2010-08-05
CN101768732A (zh) 2010-07-07
CN101768732B (zh) 2012-05-30
US20100166980A1 (en) 2010-07-01

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