SG131737A1 - Polishing tool and polishing method and apparatus using same - Google Patents

Polishing tool and polishing method and apparatus using same

Info

Publication number
SG131737A1
SG131737A1 SG200201425-6A SG2002014256A SG131737A1 SG 131737 A1 SG131737 A1 SG 131737A1 SG 2002014256 A SG2002014256 A SG 2002014256A SG 131737 A1 SG131737 A1 SG 131737A1
Authority
SG
Singapore
Prior art keywords
polishing
same
tool
polishing tool
felt
Prior art date
Application number
SG200201425-6A
Other languages
English (en)
Inventor
Sinnosuke Sekiya
Setsuo Yamamoto
Yutaka Koma
Masashi Aoki
Naohiro Matsuya
Original Assignee
Disco Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2001093399A external-priority patent/JP4580118B2/ja
Priority claimed from JP2001093398A external-priority patent/JP4594545B2/ja
Priority claimed from JP2001093397A external-priority patent/JP4546659B2/ja
Priority claimed from JP2001311450A external-priority patent/JP2003124164A/ja
Application filed by Disco Corp filed Critical Disco Corp
Publication of SG131737A1 publication Critical patent/SG131737A1/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
    • B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D13/00—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor
    • B24D13/14—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor acting by the front face
    • B24D13/147—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor acting by the front face comprising assemblies of felted or spongy material; comprising pads surrounded by a flexible material

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
SG200201425-6A 2001-03-28 2002-03-13 Polishing tool and polishing method and apparatus using same SG131737A1 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2001093399A JP4580118B2 (ja) 2001-03-28 2001-03-28 研磨方法及び研削・研磨方法
JP2001093398A JP4594545B2 (ja) 2001-03-28 2001-03-28 研磨装置及びこれを含んだ研削・研磨機
JP2001093397A JP4546659B2 (ja) 2001-03-28 2001-03-28 研磨工具
JP2001311450A JP2003124164A (ja) 2001-10-09 2001-10-09 研磨工具

Publications (1)

Publication Number Publication Date
SG131737A1 true SG131737A1 (en) 2007-05-28

Family

ID=27482146

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200201425-6A SG131737A1 (en) 2001-03-28 2002-03-13 Polishing tool and polishing method and apparatus using same

Country Status (7)

Country Link
US (2) US7713107B2 (ko)
KR (1) KR100838028B1 (ko)
CN (1) CN1246885C (ko)
DE (1) DE10211342B4 (ko)
HK (1) HK1054815B (ko)
SG (1) SG131737A1 (ko)
TW (1) TW528656B (ko)

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US7252736B1 (en) * 2004-03-31 2007-08-07 Lam Research Corporation Compliant grinding wheel
US7329174B2 (en) * 2004-05-20 2008-02-12 Jsr Corporation Method of manufacturing chemical mechanical polishing pad
JP2007081322A (ja) * 2005-09-16 2007-03-29 Jsr Corp 化学機械研磨パッドの製造方法
JP2006108428A (ja) * 2004-10-06 2006-04-20 Disco Abrasive Syst Ltd ウェーハの分割方法
US20080220701A1 (en) * 2005-12-30 2008-09-11 Chung-Ching Feng Polishing Pad and Method for Making the Same
JP2008108792A (ja) * 2006-10-23 2008-05-08 Disco Abrasive Syst Ltd ウエーハの加工方法
DE102009048436B4 (de) * 2009-10-07 2012-12-20 Siltronic Ag Verfahren zum Schleifen einer Halbleiterscheibe
CN101885164B (zh) * 2010-06-08 2011-12-14 沈阳理工大学 一种仿生结构的锡固结金刚石磨料抛光垫及制造方法
US8684791B2 (en) * 2011-11-09 2014-04-01 Alvin Gabriel Stern Linear, automated apparatus and method for clean, high purity, simultaneous lapping and polishing of optics, semiconductors and optoelectronic materials
US10090207B2 (en) * 2012-11-28 2018-10-02 Taiwan Semiconductor Manufacturing Company, Ltd. Multi-point chemical mechanical polishing end point detection system and method of using
CN105453234B (zh) * 2013-08-10 2018-11-02 应用材料公司 抛光新的或翻新的静电夹盘的方法
CN103552005A (zh) * 2013-11-08 2014-02-05 谢泽 一种含纤维绳、磨料以及空心微球的抛磨一体轮
CN104130750B (zh) * 2014-08-15 2016-05-04 常州华森医疗器械有限公司 雨花石的新用途
CN104842239A (zh) * 2015-04-28 2015-08-19 深圳青羽机器人自动化有限公司 一种打磨设备
WO2017030874A1 (en) * 2015-08-14 2017-02-23 M Cubed Technologies, Inc. Machine for finishing a work piece, and having a highly controllable treatment tool
KR101658921B1 (ko) 2015-12-03 2016-09-22 이인영 압출용 마그네슘 합금 빌렛의 제조방법
USD866891S1 (en) * 2016-01-22 2019-11-12 3M Innovative Properties Company Scouring article
USD787768S1 (en) * 2016-04-11 2017-05-23 Linda Daoud Sponge
CN205668186U (zh) * 2016-05-12 2016-11-02 东莞市晶研仪器科技有限公司 智能bga芯片维修仪器
USD795518S1 (en) * 2016-06-24 2017-08-22 Un Hwa Chung Rotary mop with durable gear drive unit
CN109202695A (zh) * 2017-06-30 2019-01-15 盖多·瓦伦蒂尼 手持式动力工具的抛光垫和带有这种抛光垫的动力工具
EP3421180B1 (en) * 2017-06-30 2023-07-12 Guido Valentini Polishing pad of a hand-held power tool and power tool with such a polishing pad
USD843672S1 (en) * 2017-07-31 2019-03-19 3M Innovative Properties Company Floor pad
USD854768S1 (en) * 2017-08-09 2019-07-23 3M Innovative Properties Company Floor pad
USD843673S1 (en) * 2017-08-09 2019-03-19 3M Innovtive Properties Company Floor pad
USD844272S1 (en) * 2017-08-09 2019-03-26 3M Innovative Properties Company Floor pad
USD843073S1 (en) * 2017-08-09 2019-03-12 3M Innovative Properties Company Floor pad
CN108044473A (zh) * 2018-01-05 2018-05-18 苏州川鹏塑料有限公司 用于塑品表面光泽处理的设备
KR102053651B1 (ko) * 2018-05-30 2019-12-09 이화다이아몬드공업 주식회사 사파이어, 실리콘카바이드, 유리 및 실리콘 웨이퍼 폴리싱을 위한 고정지립 패드 및 그 패드의 제조방법
CN110877282A (zh) * 2019-12-25 2020-03-13 郝松涛 弯管自动仿形砂光或抛光设备
CN111805413A (zh) * 2020-07-23 2020-10-23 中国科学院微电子研究所 化学机械研磨方法

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US5626509A (en) * 1994-03-16 1997-05-06 Nec Corporation Surface treatment of polishing cloth
WO2000012262A1 (fr) * 1998-08-28 2000-03-09 Toray Industries, Inc. Tampon polisseur
US6126532A (en) * 1997-04-18 2000-10-03 Cabot Corporation Polishing pads for a semiconductor substrate
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JP2000343440A (ja) * 1999-06-04 2000-12-12 Disco Abrasive Syst Ltd 研磨砥石及び研磨砥石の製造方法
EP0842738B1 (en) * 1996-11-15 2001-10-10 Ebara Corporation Method of and apparatus for polishing and cleaning planar workpiece

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AU7480896A (en) * 1995-12-04 1997-06-27 Minnesota Mining And Manufacturing Company Abrasive article back up pad with foam layer
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EP1011919B1 (en) * 1997-08-06 2004-10-20 Rodel Holdings, Inc. Method of manufacturing a polishing pad
JP3076291B2 (ja) 1997-12-02 2000-08-14 日本電気株式会社 研磨装置
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JPH11309653A (ja) * 1998-04-27 1999-11-09 Tokyo Seimitsu Co Ltd ウェーハの平面加工装置
JP2000254857A (ja) 1999-01-06 2000-09-19 Tokyo Seimitsu Co Ltd 平面加工装置及び平面加工方法
US6328634B1 (en) * 1999-05-11 2001-12-11 Rodel Holdings Inc. Method of polishing
TW428306B (en) * 1999-07-01 2001-04-01 Viking Tech Corp Packaging method for thin-film passive device on silicon
JP3675237B2 (ja) * 1999-07-09 2005-07-27 株式会社東京精密 平面加工装置
US6713413B2 (en) * 2000-01-03 2004-03-30 Freudenberg Nonwovens Limited Partnership Nonwoven buffing or polishing material having increased strength and dimensional stability
IT249604Y1 (it) * 2000-04-28 2003-05-20 Cressi Sub Spa Giubbetto equilibratore per sub con valvole di scarico rapido adazionamento sincronizzato
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US7182673B2 (en) * 2004-06-29 2007-02-27 Novellus Systems, Inc. Method and apparatus for post-CMP cleaning of a semiconductor work piece

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5626509A (en) * 1994-03-16 1997-05-06 Nec Corporation Surface treatment of polishing cloth
EP0842738B1 (en) * 1996-11-15 2001-10-10 Ebara Corporation Method of and apparatus for polishing and cleaning planar workpiece
US6126532A (en) * 1997-04-18 2000-10-03 Cabot Corporation Polishing pads for a semiconductor substrate
WO2000012262A1 (fr) * 1998-08-28 2000-03-09 Toray Industries, Inc. Tampon polisseur
EP1108500A1 (en) * 1998-08-28 2001-06-20 Toray Industries, Inc. Polishing pad
JP2000301459A (ja) * 1999-04-19 2000-10-31 Nippei Toyama Corp 砥石およびこれを用いた研磨方法
JP2000343440A (ja) * 1999-06-04 2000-12-12 Disco Abrasive Syst Ltd 研磨砥石及び研磨砥石の製造方法

Also Published As

Publication number Publication date
TW528656B (en) 2003-04-21
DE10211342B4 (de) 2017-06-29
CN1384534A (zh) 2002-12-11
US7736215B2 (en) 2010-06-15
HK1054815B (zh) 2006-11-03
KR20020077190A (ko) 2002-10-11
KR100838028B1 (ko) 2008-06-12
US7713107B2 (en) 2010-05-11
US20020173244A1 (en) 2002-11-21
CN1246885C (zh) 2006-03-22
US20080085662A1 (en) 2008-04-10
HK1054815A1 (en) 2003-12-12
DE10211342A1 (de) 2002-10-24

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