SG10201807320WA - Wire saw apparatus - Google Patents

Wire saw apparatus

Info

Publication number
SG10201807320WA
SG10201807320WA SG10201807320WA SG10201807320WA SG10201807320WA SG 10201807320W A SG10201807320W A SG 10201807320WA SG 10201807320W A SG10201807320W A SG 10201807320WA SG 10201807320W A SG10201807320W A SG 10201807320WA SG 10201807320W A SG10201807320W A SG 10201807320WA
Authority
SG
Singapore
Prior art keywords
wire
saw apparatus
workpiece
nozzle
row
Prior art date
Application number
SG10201807320WA
Other languages
English (en)
Inventor
Koji Kitagawa
Yuichi Shimizu
Original Assignee
Shin Etsu Handotai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Handotai Co Ltd filed Critical Shin Etsu Handotai Co Ltd
Publication of SG10201807320WA publication Critical patent/SG10201807320WA/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00Other grinding machines or devices
    • B24B27/06Grinders for cutting-off
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0076Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for removing dust, e.g. by spraying liquids; for lubricating, cooling or cleaning tool or work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00Other grinding machines or devices
    • B24B27/06Grinders for cutting-off
    • B24B27/0633Grinders for cutting-off using a cutting wire
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B55/00Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
    • B24B55/02Equipment for cooling the grinding surfaces, e.g. devices for feeding coolant
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B24B57/02Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/007Use, recovery or regeneration of abrasive mediums
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/04Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/04Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
    • B28D5/042Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools by cutting with blades or wires mounted in a reciprocating frame
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/10Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
SG10201807320WA 2015-05-01 2016-03-03 Wire saw apparatus SG10201807320WA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015094358A JP6304118B2 (ja) 2015-05-01 2015-05-01 ワイヤソー装置

Publications (1)

Publication Number Publication Date
SG10201807320WA true SG10201807320WA (en) 2018-09-27

Family

ID=57217580

Family Applications (2)

Application Number Title Priority Date Filing Date
SG11201707726YA SG11201707726YA (en) 2015-05-01 2016-03-03 Wire saw apparatus
SG10201807320WA SG10201807320WA (en) 2015-05-01 2016-03-03 Wire saw apparatus

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG11201707726YA SG11201707726YA (en) 2015-05-01 2016-03-03 Wire saw apparatus

Country Status (8)

Country Link
US (1) US10589446B2 (ja)
JP (1) JP6304118B2 (ja)
KR (1) KR102568196B1 (ja)
CN (1) CN107427986B (ja)
DE (1) DE112016001209T5 (ja)
SG (2) SG11201707726YA (ja)
TW (1) TWI692394B (ja)
WO (1) WO2016178297A1 (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110962248A (zh) * 2018-09-28 2020-04-07 胜高股份有限公司 线锯用加工液供给喷嘴及向线锯供给加工液的方法
CN110039673A (zh) * 2019-04-26 2019-07-23 西安奕斯伟硅片技术有限公司 一种切割装置和方法
JP7372097B2 (ja) * 2019-09-20 2023-10-31 コマツNtc株式会社 ワイヤソー及びワイヤソーのワークの搬入出方法
CN111361030B (zh) * 2020-04-24 2021-11-23 西安奕斯伟材料科技有限公司 多线切割装置及多线切割方法
CN113601741B (zh) * 2021-08-09 2023-06-23 西安奕斯伟硅片技术有限公司 为切割硅棒的多条切割线供应砂浆的装置及硅棒切割设备
CN115816664A (zh) * 2022-12-28 2023-03-21 泉州市品河精密科技有限公司 石材切割方法

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US5709593A (en) * 1995-10-27 1998-01-20 Applied Materials, Inc. Apparatus and method for distribution of slurry in a chemical mechanical polishing system
JPH1148119A (ja) 1997-06-05 1999-02-23 Nippei Toyama Corp ワイヤソー
TW383249B (en) * 1998-09-01 2000-03-01 Sumitomo Spec Metals Cutting method for rare earth alloy by annular saw and manufacturing for rare earth alloy board
JP2000153460A (ja) 1998-11-16 2000-06-06 Tokyo Seiko Co Ltd 液体供給装置
JP2000218615A (ja) * 1999-01-29 2000-08-08 Nippei Toyama Corp ワイヤソー及びワークの脱着方法
US6468134B1 (en) * 2000-06-30 2002-10-22 Lam Research Corporation Method and apparatus for slurry distribution
JP3967969B2 (ja) * 2002-06-27 2007-08-29 京セラ株式会社 ワイヤーソー
JP2004195555A (ja) * 2002-12-16 2004-07-15 Komatsu Electronic Metals Co Ltd ワイヤソー用スラリーノズル
JP4083152B2 (ja) 2004-07-29 2008-04-30 日本碍子株式会社 ワイヤーソー装置
JP5072204B2 (ja) * 2005-08-31 2012-11-14 信越半導体株式会社 ウエーハの表面のナノトポグラフィを改善する方法及びワイヤソー装置
JP5080769B2 (ja) * 2006-09-15 2012-11-21 株式会社東京精密 研磨方法及び研磨装置
JP4816511B2 (ja) * 2007-03-06 2011-11-16 信越半導体株式会社 切断方法およびワイヤソー装置
JP5003294B2 (ja) * 2007-06-08 2012-08-15 信越半導体株式会社 切断方法
JP5045378B2 (ja) * 2007-11-08 2012-10-10 信越半導体株式会社 ワイヤソー装置
JP5234010B2 (ja) 2008-02-19 2013-07-10 信越半導体株式会社 ワイヤソーおよびワークの切断方法
JP5056645B2 (ja) 2008-07-23 2012-10-24 信越半導体株式会社 ワークの切断方法及びワイヤソー
JP5540072B2 (ja) * 2009-04-01 2014-07-02 キャボット マイクロエレクトロニクス コーポレイション 自浄式ワイヤソー装置および方法
JP2011143504A (ja) * 2010-01-14 2011-07-28 Mitsubishi Electric Corp ワイヤソー装置
KR101185683B1 (ko) * 2011-02-23 2012-09-24 주식회사 엘지실트론 단결정 잉곳 절단장치
JP5775381B2 (ja) * 2011-06-28 2015-09-09 コマツNtc株式会社 ワイヤソーの加工液ノズル
JP2013129046A (ja) * 2011-12-22 2013-07-04 Shin Etsu Handotai Co Ltd ワークの切断方法
CN202685118U (zh) * 2012-07-03 2013-01-23 浙江昱辉阳光能源有限公司 一种金刚线切片机
DE102014208187B4 (de) * 2014-04-30 2023-07-06 Siltronic Ag Verfahren zum gleichzeitigen Trennen einer Vielzahl von Scheiben mit besonders gleichmäßiger Dicke von einem Werkstück

Also Published As

Publication number Publication date
SG11201707726YA (en) 2017-10-30
JP2016209947A (ja) 2016-12-15
DE112016001209T5 (de) 2017-12-07
TW201639680A (zh) 2016-11-16
US10589446B2 (en) 2020-03-17
US20180079108A1 (en) 2018-03-22
JP6304118B2 (ja) 2018-04-04
CN107427986A (zh) 2017-12-01
KR20180004111A (ko) 2018-01-10
CN107427986B (zh) 2019-07-09
KR102568196B1 (ko) 2023-08-18
WO2016178297A1 (ja) 2016-11-10
TWI692394B (zh) 2020-05-01

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