KR960024559A - 활성 매트릭스 액정 디스플레이 및 반사방지 블랙 매트릭스의 제조방법 - Google Patents

활성 매트릭스 액정 디스플레이 및 반사방지 블랙 매트릭스의 제조방법 Download PDF

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KR960024559A
KR960024559A KR1019950047386A KR19950047386A KR960024559A KR 960024559 A KR960024559 A KR 960024559A KR 1019950047386 A KR1019950047386 A KR 1019950047386A KR 19950047386 A KR19950047386 A KR 19950047386A KR 960024559 A KR960024559 A KR 960024559A
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chromium
chromium oxide
liquid crystal
layer
crystal display
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루이스 스타이거발드 마이클
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엘리 웨이스
에이티앤드티 코포레이션
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133502—Antiglare, refractive index matching layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Liquid Crystal (AREA)
  • Optical Filters (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Surface Treatment Of Optical Elements (AREA)

Abstract

본 발명은 활성 매트릭스 액정 디스플레이에서 사용하기에 적절한 블랙 매트릭스 구조에 관한 것이다. 신규한 반사방지 블랙 매트릭스는 산화 크롬의 연속적인 층, 크롬으로 부터 선택된 금속, 텅스텐, 몰리브덴, 바나듐, 철 및 니오븀, 제2산화 크롬층 및 크로 미러를 포함하며, 이들 모두는 글래스 기판 부재의 전면상에 침착된다. 다른 구조는 크롬 미러의 후면상에 층을 이루는 동일한 시퀀스를 포함한다. 설명된 블랙 매트릭스는 0.5%미만까지 입사광의 반사율을 감소시킨다.
본 발명에는 음극 스퍼터링을 포함하는 전술한 구조의 마련을 위한 기법이 또한 설명된다.

Description

활성 매트릭스 액정 디스플레이 및 반사방지 블랙 매트릭스의 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 따라 마련된 4중층 블랙 매트릭스 구조의 단면을 도시하는 정면도, 제2도는 본 발명에 따라 마련된 7중층 블랙 매트릭스 구조의 단면을 도시하는 정면도, 제3도는 박막 트랜지스터 액정 디스플레이에서 사용하기 위해 정해진 바와 같이 본 발명의 블랙 매트릭스를 포함하는 컬러 필터의 단면을 도시하는 정면도.

Claims (11)

  1. 제1산화 크롬층, 금속층, 제2산화 크롬층 및 크롬 미러를 연속적으로 포함하는 글래스 기판 부재의 후측상에 침착된 반사방지 블랙 매트릭스를 포함하는 활성 매트릭스 액정 디스플레이.
  2. 제1항에 있어서, 상기 금속층은 텅스텐, 바나듐, 철, 크롬, 몰리브덴 및 니오븀으로 이루어진 원자단으로부터 선택된 금속을 포함하는 활성 매트릭스 액정 디스플레이.
  3. 제1항에 있어서, 상기 금속층은 10∼30나노미터의 두께 범위를 갖는 활성 매트릭스 액정 디스플레이.
  4. 제1항에 있어서, 상기 제1산화 크롬층은 35∼41나노미터의 두께 범위를 갖는 활성 매트릭스 액정 디스플레이.
  5. 제1항에 있어서, 상기 제2산화 크롬층은 37∼42나노미터의 두께 범위를 갖는 활성 매트릭스 액정 디스플레이.
  6. 제1항에 있어서, 제1산화 크롬층, 금속 및 상기 크롬 미러의 상기 후면상의제2산화 크롬층을 더 포함하는 활성 매트릭스 액정 디스플레이.
  7. 제1산화 크롬층, 몰리브덴 층, 제2산화 크롬층 및 크롬미러를 연속적으로 포함하는 전면 글래스 기판 부재의 후측상에 침착된 반사방지 블랙 매트릭스를 포함하는 활성 매트릭스 액정 디스플레이.
  8. 제7항에 있어서, 상기 몰리브덴 층의 상기 두께는 10.72나노미터이고, 제1 및 제2산화 크롬층의 상기 두께는 각각 35.61 및 42.1나노미터인 활성 매트릭스 액정 디스플레이.
  9. 박막 트랜지스터 액정 디스플레이에서 사용하기 위한 반사방지 블랙 매트릭스의 제조를 위한 방법에 있어서, 상기 방법은: (a) 산소의 존재시 크롬의 반응성 스퍼터링에 의해 35 내지 41나노미터 범위의 두께를 갖는 전면 글래스 기판의 후측면상에 제1산화 크롬층을 침착시키는 단계와; (b) 음극 스퍼터링에 의해 10∼30나노미터 범위의 두께를 갖는 상기 제1산화 크롬층상에 텅스텐, 바나듐, 철, 크롬, 몰리브덴 및 니오븀으로 구성된 원자단으로부터 선택된 금속의 층을 침착시키는 단계와; (c) 산소의 존재시 크롬의 반응성 스퍼터링에 의해 37∼42나노미터 범위의 두께를 갖는 상기 금속층상에 제2산화 크롬층을 침착하는 단계와; (d) 상기 제2산화 크롬층상에 크롬 미러를 침착하는 단계를 포함하는 반사방지 블랙 매트릭스의 제조방법.
  10. 제9항에 있어서, 상기 금속 몰리브덴인 반사방지 블랙 매트릭스의 제조방법.
  11. 제10항에 있어서, 상기 몰리브덴 층의 상기 두께는 10.72나노미터이고, 제1 및 제2산화 크롬층의 상기 두께는 각각 35.61 및 42.1나노미터인 반사방지 블랙 매틀릭스의 제조방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019950047386A 1994-12-08 1995-12-07 활성 매트릭스 액정 디스플레이 및 반사방지 블랙 매트릭스의 제조 방법 KR100284474B1 (ko)

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US8/351,969 1994-12-08
US08/351,969 1994-12-08
US08/351,969 US5566011A (en) 1994-12-08 1994-12-08 Antiflector black matrix having successively a chromium oxide layer, a molybdenum layer and a second chromium oxide layer

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KR960024559A true KR960024559A (ko) 1996-07-20
KR100284474B1 KR100284474B1 (ko) 2001-03-02

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US (2) US5566011A (ko)
EP (1) EP0716334A3 (ko)
JP (1) JPH08234674A (ko)
KR (1) KR100284474B1 (ko)
CA (1) CA2160613C (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990024917A (ko) * 1997-09-09 1999-04-06 윤종용 액정 표시 장치의 블랙 매트릭스 및 제조 방법
KR100499204B1 (ko) * 2000-08-07 2005-07-07 세이코 엡슨 가부시키가이샤 전기 광학 장치 및 전자 기기

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5808714A (en) * 1993-09-30 1998-09-15 Optical Coating Laboratory, Inc. Low reflection shadow mask
US6076932A (en) * 1996-09-26 2000-06-20 Matsushita Electric Industrial Co., Ltd. Light absorber and optical equipment
US20010043175A1 (en) * 1996-10-22 2001-11-22 Masahiro Yasukawa Liquid crystal panel substrate, liquid crystal panel, and electronic equipment and projection type display device both using the same
US6285424B1 (en) * 1997-11-07 2001-09-04 Sumitomo Chemical Company, Limited Black mask, color filter and liquid crystal display
FR2772141B1 (fr) 1997-12-08 2001-10-05 Commissariat Energie Atomique Revetement absorbeur de lumiere a haut pouvoir absorbant
TWI226470B (en) 1998-01-19 2005-01-11 Hitachi Ltd LCD device
US6157426A (en) * 1998-02-13 2000-12-05 Ois Optical Imaging Systems, Inc. Liquid crystal display with SiOx Ny inclusive multilayer black matrix
US6452652B1 (en) * 1998-06-12 2002-09-17 National Semiconductor Corporation Light absorbing thin film stack in a light valve structure
JP3792485B2 (ja) * 2000-06-02 2006-07-05 Ｎｅｃ液晶テクノロジー株式会社 アクティブマトリクス型液晶表示装置
FR2806479A1 (fr) * 2000-07-03 2001-09-21 Commissariat Energie Atomique Procede et dispositif de detection de couches minces
DE60116371T3 (de) * 2000-11-23 2016-11-17 Bavarian Nordic A/S Variante des modifizierten vaccinia ankara virus
CA2419121A1 (en) * 2002-05-03 2003-11-03 Luxell Technologies, Inc. Dark layer for an electroluminescent device
US20040247906A1 (en) * 2002-05-24 2004-12-09 Optical Coating Laboratory, Inc., A Jds Uniphase Company Coating for forming a high definition aperture
JP2004263240A (ja) * 2003-02-28 2004-09-24 Nitto Seiko Co Ltd 黒色六価クロムフリー鍍金処理システム
CN100403063C (zh) * 2003-04-25 2008-07-16 鸿富锦精密工业（深圳）有限公司 黑色矩阵、彩色滤光片和液晶显示装置
KR101002648B1 (ko) * 2003-11-26 2010-12-20 삼성에스디아이 주식회사 평판 디스플레이 장치 및 그 제조방법
TWI322917B (en) * 2004-03-02 2010-04-01 Innolux Display Corp Active matrix type liquid crystal display
US7459095B2 (en) * 2004-10-21 2008-12-02 Corning Incorporated Opaque chrome coating suitable for etching
CN101401340B (zh) * 2005-11-29 2015-12-16 联邦国家预算委员会“军事特殊两用知识产权事务法律保护联邦机构” 可控光分插复用器
KR100907255B1 (ko) * 2007-09-18 2009-07-10 한국전자통신연구원 유기 박막 트랜지스터를 구비하는 표시 장치
GB201101910D0 (en) * 2011-02-04 2011-03-23 Pilkington Group Ltd Growth layer for the photovol taic applications
CN104020603A (zh) * 2014-06-11 2014-09-03 京东方科技集团股份有限公司 一种彩膜基板及其制作方法、显示装置
EP2977202A1 (fr) * 2014-07-25 2016-01-27 AGC Glass Europe Vitrage chauffant
US10550034B2 (en) * 2014-07-25 2020-02-04 Agc Glass Europe Decorative glass panel
KR20180028084A (ko) * 2016-09-07 2018-03-16 삼성디스플레이 주식회사 표시 장치
CN112764260B (zh) * 2021-01-15 2023-10-17 Tcl华星光电技术有限公司 液晶显示面板和液晶显示装置

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5323277A (en) * 1976-08-14 1978-03-03 Konishiroku Photo Ind Co Ltd Photomasking material and photomask
JPS5340281A (en) * 1976-09-27 1978-04-12 Konishiroku Photo Ind Co Ltd Photo mask material and manufacturtof it
US4178403A (en) * 1977-08-04 1979-12-11 Konishiroku Photo Industry Co., Ltd. Mask blank and mask
JPS54106229A (en) * 1978-02-08 1979-08-21 Fuji Photo Film Co Ltd Image forming material and image formation using the same
JPS57104141A (en) * 1980-12-22 1982-06-29 Dainippon Printing Co Ltd Photomask and photomask substrate
US4657648A (en) * 1981-03-17 1987-04-14 Osamu Nagarekawa Method of manufacturing a mask blank including a modified chromium compound
JPS57151945A (en) * 1981-03-17 1982-09-20 Hoya Corp Photomask blank and its manufacture
US4563407A (en) * 1982-11-16 1986-01-07 Hoya Corporation Photo-mask blank comprising a shading layer having a variable etch rate
US4692653A (en) * 1984-03-23 1987-09-08 Hitachi, Ltd. Acoustic transducers utilizing ZnO thin film
JPS61272746A (ja) * 1985-05-28 1986-12-03 Asahi Glass Co Ltd フオトマスクブランクおよびフオトマスク
FR2593953B1 (fr) * 1986-01-24 1988-04-29 Commissariat Energie Atomique Procede de fabrication d'un dispositif de visualisation par cathodoluminescence excitee par emission de champ
DE3879819T2 (de) * 1987-09-02 1993-07-08 Moltech Invent Sa Schmelzflusselektrolyse mit sich nicht aufbrauchender anode.
US4906840A (en) * 1988-01-27 1990-03-06 The Board Of Trustees Of Leland Stanford Jr., University Integrated scanning tunneling microscope
FR2653588B1 (fr) * 1989-10-20 1992-02-07 Electro Resistance Resistance electrique sous forme de puce a montage de surface et son procede de fabrication.
DE3940748A1 (de) * 1989-12-09 1991-06-13 Ver Glaswerke Gmbh Elektrisch beheizbare autoglasscheibe aus verbundglas
JP2566048B2 (ja) * 1990-04-19 1996-12-25 シャープ株式会社 光露光用マスク及びその製造方法
JPH041725A (ja) * 1990-04-19 1992-01-07 Matsushita Electric Ind Co Ltd 液晶表示装置
JPH041727A (ja) * 1990-04-19 1992-01-07 Matsushita Electric Ind Co Ltd 液晶表示装置
US5419969A (en) * 1990-07-05 1995-05-30 Asahi Glass Company Ltd. Low emissivity film
SG43266A1 (en) * 1990-07-05 1997-10-17 Asahi Glass Co Ltd A low emissivity film
US5407733A (en) * 1990-08-10 1995-04-18 Viratec Thin Films, Inc. Electrically-conductive, light-attenuating antireflection coating
JP2808483B2 (ja) * 1990-08-30 1998-10-08 キヤノン株式会社 液晶素子
JP2661392B2 (ja) * 1991-03-28 1997-10-08 三菱電機株式会社 ホトマスク
JP2952075B2 (ja) * 1991-06-12 1999-09-20 キヤノン株式会社 液晶素子の製造法
JPH0545643A (ja) * 1991-08-09 1993-02-26 Sharp Corp アクテイブマトリクス表示素子
JP2974520B2 (ja) * 1991-10-25 1999-11-10 キヤノン株式会社 電極基板及び液晶素子
JPH05127014A (ja) * 1991-11-06 1993-05-25 Fujitsu Ltd カラーフイルタ用ブラツクマスク
DE4242802A1 (ko) * 1991-12-17 1993-07-08 Fuji Photo Film Co Ltd

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990024917A (ko) * 1997-09-09 1999-04-06 윤종용 액정 표시 장치의 블랙 매트릭스 및 제조 방법
KR100499204B1 (ko) * 2000-08-07 2005-07-07 세이코 엡슨 가부시키가이샤 전기 광학 장치 및 전자 기기

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EP0716334A2 (en) 1996-06-12
CA2160613A1 (en) 1996-06-09
US5566011A (en) 1996-10-15
EP0716334A3 (en) 1997-05-14
JPH08234674A (ja) 1996-09-13
KR100284474B1 (ko) 2001-03-02
CA2160613C (en) 1999-12-14
US5570212A (en) 1996-10-29

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