KR840005887A - 반도체 메모리 장치 - Google Patents
반도체 메모리 장치 Download PDFInfo
- Publication number
- KR840005887A KR840005887A KR1019830003760A KR830003760A KR840005887A KR 840005887 A KR840005887 A KR 840005887A KR 1019830003760 A KR1019830003760 A KR 1019830003760A KR 830003760 A KR830003760 A KR 830003760A KR 840005887 A KR840005887 A KR 840005887A
- Authority
- KR
- South Korea
- Prior art keywords
- memory device
- semiconductor memory
- voltage
- semiconductor region
- semiconductor
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title claims 9
- 229910052581 Si3N4 Inorganic materials 0.000 claims 3
- 239000003990 capacitor Substances 0.000 claims 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical group N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- 229910052814 silicon oxide Inorganic materials 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
- G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
- G11C11/401—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
- G11C11/403—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh
- G11C11/404—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh with one charge-transfer gate, e.g. MOS transistor, per cell
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/10—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Semiconductor Integrated Circuits (AREA)
- Semiconductor Memories (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 의한 메모리 셀의 구조를 도시한 단면도.
제2도는 제1도에 도시한 메모리 셀의 등가 회로도.
제3도는 스트레스 전압 VS와 프랫트 벤드 전압의 변화 △VFB와의 관계를 표시한 도표.
Claims (3)
- 다음과 같은 구성으로 된 반도체 메모리 장치. 스위칭 MISFET와 스토레이지 캐파시터의 직열 연결을 함유한 메모리 셀, 상기 스토레이지 캐파시터는 반도체 기판의 반도체 영역과 상기 반도체 영역의 표면을 덮어서 형성된 실리콘 질화막과 상기 실리콘 질화막을 덮어서 형성된 도전층으로 되며, 그리고, 상기 직열 연결의 일단에 접속되며, 또한 어떤 신호 전압을 공급하기 위한 비트선과, 상기 반도체 영역과 상기 도전충과의 사이에 축적되는 상기 스토레이지 캐파시터의 전압이 상기 비트선에 공급된 상기 신호 전압 보다도 절대치 적으로 작게 되도록 상기 직열 연결의 상기 다른 쪽에 접속된 단자.
- 특허 청구 범위 제1항에 따른 반도체 메모리 장치에 있어서, 상기 실리콘 질화막은 상기 반도체 영역위에 형성된 실리콘 산화막 위에 형성 되여 있다.
- 특허 청구 범위 제1항 또는 제2항의 반도체 메모리 장치에 있어서, 상기 단자에는 상기신호 전압의 반분 전압 혹은 그와 가까운 전압이 인가 된다.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP163888 | 1982-09-22 | ||
JP57163888A JPH0612619B2 (ja) | 1982-09-22 | 1982-09-22 | 半導体メモリ装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR840005887A true KR840005887A (ko) | 1984-11-19 |
KR910009548B1 KR910009548B1 (ko) | 1991-11-21 |
Family
ID=15782701
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019830003760A KR910009548B1 (ko) | 1982-09-22 | 1983-08-11 | 반도체메모리장치 |
Country Status (10)
Country | Link |
---|---|
US (5) | US4638460A (ko) |
JP (1) | JPH0612619B2 (ko) |
KR (1) | KR910009548B1 (ko) |
DE (1) | DE3330046A1 (ko) |
FR (1) | FR2533348B1 (ko) |
GB (1) | GB2128430B (ko) |
HK (1) | HK188A (ko) |
IT (1) | IT1168281B (ko) |
MY (1) | MY102019A (ko) |
SG (1) | SG88687G (ko) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0612619B2 (ja) * | 1982-09-22 | 1994-02-16 | 株式会社日立製作所 | 半導体メモリ装置 |
JPS6018948A (ja) * | 1983-07-12 | 1985-01-31 | Nec Corp | 半導体集積回路装置 |
DE151898T1 (de) * | 1984-01-05 | 1985-11-21 | Mostek Corp., Carrollton, Tex. | Verfahren und anordnung zur ausgleichung einer speicherzelle. |
US5187685A (en) * | 1985-11-22 | 1993-02-16 | Hitachi, Ltd. | Complementary MISFET voltage generating circuit for a semiconductor memory |
JPH0789433B2 (ja) * | 1985-11-22 | 1995-09-27 | 株式会社日立製作所 | ダイナミツク型ram |
JP2610830B2 (ja) * | 1986-07-01 | 1997-05-14 | 株式会社日立製作所 | 半導体記憶装置のメモリセルの極板電圧設定方法 |
JPS6421788A (en) * | 1987-07-16 | 1989-01-25 | Nec Corp | Semiconductor memory device |
JP2606857B2 (ja) * | 1987-12-10 | 1997-05-07 | 株式会社日立製作所 | 半導体記憶装置の製造方法 |
JP2535084B2 (ja) * | 1990-02-19 | 1996-09-18 | シャープ株式会社 | 半導体装置の製造方法 |
JPH04218959A (ja) * | 1990-10-18 | 1992-08-10 | Mitsubishi Electric Corp | 半導体装置およびその制御方法 |
JPH06243678A (ja) * | 1993-02-19 | 1994-09-02 | Hitachi Ltd | ダイナミック型ramとそのプレート電圧設定方法及び情報処理システム |
JPH0794600A (ja) * | 1993-06-29 | 1995-04-07 | Mitsubishi Electric Corp | 半導体装置およびその製造方法 |
US5570317A (en) * | 1994-07-19 | 1996-10-29 | Intel Corporation | Memory circuit with stress circuitry for detecting defects |
JP2000056323A (ja) * | 1998-08-12 | 2000-02-25 | Hitachi Ltd | 液晶表示装置 |
US6552887B1 (en) * | 2000-06-29 | 2003-04-22 | Intel Corporation | Voltage dependent capacitor configuration for higher soft error rate tolerance |
JP2003006041A (ja) * | 2001-06-20 | 2003-01-10 | Hitachi Ltd | 半導体装置 |
US9633710B2 (en) * | 2015-01-23 | 2017-04-25 | Semiconductor Energy Laboratory Co., Ltd. | Method for operating semiconductor device |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3387286A (en) * | 1967-07-14 | 1968-06-04 | Ibm | Field-effect transistor memory |
US3893152A (en) * | 1973-07-25 | 1975-07-01 | Hung Chang Lin | Metal nitride oxide semiconductor integrated circuit structure |
US4240092A (en) * | 1976-09-13 | 1980-12-16 | Texas Instruments Incorporated | Random access memory cell with different capacitor and transistor oxide thickness |
US4094008A (en) * | 1976-06-18 | 1978-06-06 | Ncr Corporation | Alterable capacitor memory array |
JPS5457875A (en) * | 1977-10-17 | 1979-05-10 | Hitachi Ltd | Semiconductor nonvolatile memory device |
JPS607389B2 (ja) * | 1978-12-26 | 1985-02-23 | 超エル・エス・アイ技術研究組合 | 半導体装置の製造方法 |
JPS5666065A (en) * | 1979-11-01 | 1981-06-04 | Mitsubishi Electric Corp | Semiconductor memory unit |
JPS5927102B2 (ja) * | 1979-12-24 | 1984-07-03 | 富士通株式会社 | 半導体記憶装置 |
US4456978A (en) * | 1980-02-12 | 1984-06-26 | General Instrument Corp. | Electrically alterable read only memory semiconductor device made by low pressure chemical vapor deposition process |
US4458336A (en) * | 1980-10-22 | 1984-07-03 | Fujitsu Limited | Semiconductor memory circuit |
US4459684A (en) * | 1981-06-02 | 1984-07-10 | Texas Instruments Incorporated | Nonvolatile JRAM cell using nonvolatile capacitance for information retrieval |
JPS57111879A (en) * | 1980-12-29 | 1982-07-12 | Fujitsu Ltd | Semiconductor storage device |
JPS57186354A (en) * | 1981-05-13 | 1982-11-16 | Hitachi Ltd | Semiconductor memory storage and manufacture thereof |
US4511911A (en) * | 1981-07-22 | 1985-04-16 | International Business Machines Corporation | Dense dynamic memory cell structure and process |
JPH0612619B2 (ja) * | 1982-09-22 | 1994-02-16 | 株式会社日立製作所 | 半導体メモリ装置 |
-
1982
- 1982-09-22 JP JP57163888A patent/JPH0612619B2/ja not_active Expired - Lifetime
-
1983
- 1983-06-29 FR FR838310766A patent/FR2533348B1/fr not_active Expired - Lifetime
- 1983-07-27 GB GB08320218A patent/GB2128430B/en not_active Expired
- 1983-08-11 KR KR1019830003760A patent/KR910009548B1/ko not_active IP Right Cessation
- 1983-08-19 DE DE19833330046 patent/DE3330046A1/de not_active Ceased
- 1983-09-07 US US06/530,079 patent/US4638460A/en not_active Expired - Lifetime
- 1983-09-21 IT IT22951/83A patent/IT1168281B/it active
-
1986
- 1986-10-31 US US06/925,223 patent/US4740920A/en not_active Expired - Lifetime
-
1987
- 1987-09-21 MY MYPI87001790A patent/MY102019A/en unknown
- 1987-10-12 SG SG886/87A patent/SG88687G/en unknown
-
1988
- 1988-01-07 HK HK1/88A patent/HK188A/xx not_active IP Right Cessation
- 1988-03-29 US US07/174,974 patent/US4887237A/en not_active Expired - Lifetime
-
1989
- 1989-12-11 US US07/448,357 patent/US4991137A/en not_active Expired - Fee Related
-
1991
- 1991-02-01 US US07/649,499 patent/US5148392A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US4887237A (en) | 1989-12-12 |
IT1168281B (it) | 1987-05-20 |
GB8320218D0 (en) | 1983-09-01 |
US4740920A (en) | 1988-04-26 |
SG88687G (en) | 1988-06-03 |
HK188A (en) | 1988-01-15 |
JPH0612619B2 (ja) | 1994-02-16 |
DE3330046A1 (de) | 1984-03-22 |
GB2128430A (en) | 1984-04-26 |
US5148392A (en) | 1992-09-15 |
GB2128430B (en) | 1986-11-26 |
JPS5954097A (ja) | 1984-03-28 |
US4991137A (en) | 1991-02-05 |
US4638460A (en) | 1987-01-20 |
MY102019A (en) | 1992-02-29 |
KR910009548B1 (ko) | 1991-11-21 |
IT8322951A0 (it) | 1983-09-21 |
FR2533348B1 (fr) | 1991-10-31 |
FR2533348A1 (fr) | 1984-03-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20021113 Year of fee payment: 12 |
|
EXPY | Expiration of term |