KR101314033B1 - 감광성 수지 조성물, 표시 패널용 스페이서의 형성 방법 - Google Patents

감광성 수지 조성물, 표시 패널용 스페이서의 형성 방법 Download PDF

Info

Publication number: KR101314033B1
Authority: KR; South Korea
Prior art keywords: ether; weight; resin composition; acetate; photosensitive resin
Prior art date: 2005-06-15

Application number

KR1020060053357A

Other languages

English (en)

Korean (ko)

Other versions

KR20060131644A (ko

Inventor

히로유끼 마노

다이고 이찌노헤

도시히로 니시오

도루 가지따

Original Assignee

제이에스알 가부시끼가이샤

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2005-06-15

Filing date

2006-06-14

Publication date

2013-10-01

2006-06-14 Application filed by 제이에스알 가부시끼가이샤 filed Critical 제이에스알 가부시끼가이샤

2006-12-20 Publication of KR20060131644A publication Critical patent/KR20060131644A/ko

2013-10-01 Application granted granted Critical

2013-10-01 Publication of KR101314033B1 publication Critical patent/KR101314033B1/ko

Links

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Materials For Photolithography (AREA)
Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Paints Or Removers (AREA)

KR1020060053357A 2005-06-15 2006-06-14 감광성 수지 조성물, 표시 패널용 스페이서의 형성 방법 KR101314033B1 (ko)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JP2005174802		2005-06-15
JPJP-P-2005-00174802		2005-06-15

Publications (2)

Publication Number	Publication Date
KR20060131644A KR20060131644A (ko)	2006-12-20
KR101314033B1 true KR101314033B1 (ko)	2013-10-01

Family

ID=37519323

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
KR1020060053357A KR101314033B1 (ko)	2005-06-15	2006-06-14	감광성 수지 조성물, 표시 패널용 스페이서의 형성 방법

Country Status (3)

Country	Link
KR (1)	KR101314033B1 (zh)
CN (1)	CN1881080B (zh)
TW (1)	TWI411877B (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP4403174B2 (ja) *	2006-12-25	2010-01-20	Ａｚエレクトロニックマテリアルズ株式会社	パターン形成方法およびそれに用いる感光性樹脂組成物
TWI559079B (zh) *	2008-11-18	2016-11-21	Sumitomo Chemical Co	Photosensitive resin composition and display device
TWI521300B (zh) *	2008-11-18	2016-02-11	Sumitomo Chemical Co	Photosensitive resin composition and display device
JP6175754B2 (ja) *	2011-11-07	2017-08-09	住友化学株式会社	硬化性樹脂組成物

Citations (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
KR20040092550A (ko) *	2003-04-24	2004-11-04	클라리언트 인터내셔널 리미티드	레지스트 조성물 및 레지스트 제거용 유기용제

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS62123444A (ja) *	1985-08-07	1987-06-04	Japan Synthetic Rubber Co Ltd	ポジ型感放射線性樹脂組成物
JP3767552B2 (ja) *	2002-12-26	2006-04-19	Ｊｓｒ株式会社	感放射線性組成物、ブラックマトリクス、カラーフィルタおよびカラー液晶表示装置
JP4016893B2 (ja) *	2003-06-12	2007-12-05	Ｊｓｒ株式会社	表示パネル用スペーサーの形成に使用される感放射線性樹脂組成物および液晶表示素子
TWI342983B (en) *	2003-07-16	2011-06-01	Sumitomo Chemical Co	Coloring photosensitive resin composition

2006
- 2006-06-14 TW TW095121261A patent/TWI411877B/zh active
- 2006-06-14 KR KR1020060053357A patent/KR101314033B1/ko active IP Right Grant
- 2006-06-15 CN CN2006100936939A patent/CN1881080B/zh not_active Expired - Fee Related

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
KR20040092550A (ko) *	2003-04-24	2004-11-04	클라리언트 인터내셔널 리미티드	레지스트 조성물 및 레지스트 제거용 유기용제

Also Published As

Publication number	Publication date
KR20060131644A (ko)	2006-12-20
TW200712761A (en)	2007-04-01
TWI411877B (zh)	2013-10-11
CN1881080A (zh)	2006-12-20
CN1881080B (zh)	2011-06-08

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Date	Code	Title	Description
2011-06-10	A201	Request for examination
2013-08-28	E701	Decision to grant or registration of patent right
2013-09-25	GRNT	Written decision to grant
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