TW200712761A - Photosensitive resin composition, spacer for display panel and display panel - Google Patents
Photosensitive resin composition, spacer for display panel and display panelInfo
- Publication number
- TW200712761A TW200712761A TW095121261A TW95121261A TW200712761A TW 200712761 A TW200712761 A TW 200712761A TW 095121261 A TW095121261 A TW 095121261A TW 95121261 A TW95121261 A TW 95121261A TW 200712761 A TW200712761 A TW 200712761A
- Authority
- TW
- Taiwan
- Prior art keywords
- display panel
- photosensitive resin
- resin composition
- spacer
- die coater
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Paints Or Removers (AREA)
Abstract
Disclosed is a photosensitive resin composition, using a mixed solvent containing 2-20 wt.% of a compound represented by formula (1) as a solvent, wherein R1-R5 are each independently hydrogen atom or a 1C-6C alkyl and n is an integer of 1-6, and the composition is applied on a substrate by a slit die coater. The photosensitive resin composition solution has good storage stability of the resin, requires a short time of a reduced-pressure drying step, makes a slit nozzle less liable to dry, gives a good film surface, and is suitable for a slit die coater process.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005174802 | 2005-06-15 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200712761A true TW200712761A (en) | 2007-04-01 |
TWI411877B TWI411877B (en) | 2013-10-11 |
Family
ID=37519323
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095121261A TWI411877B (en) | 2005-06-15 | 2006-06-14 | A photosensitive resin composition, a display panel spacer, and a display panel |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR101314033B1 (en) |
CN (1) | CN1881080B (en) |
TW (1) | TWI411877B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4403174B2 (en) * | 2006-12-25 | 2010-01-20 | Azエレクトロニックマテリアルズ株式会社 | Pattern forming method and photosensitive resin composition used therefor |
TWI559079B (en) * | 2008-11-18 | 2016-11-21 | Sumitomo Chemical Co | Photosensitive resin composition and display device |
TWI521300B (en) * | 2008-11-18 | 2016-02-11 | Sumitomo Chemical Co | Photosensitive resin composition and display device |
JP6175754B2 (en) * | 2011-11-07 | 2017-08-09 | 住友化学株式会社 | Curable resin composition |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62123444A (en) * | 1985-08-07 | 1987-06-04 | Japan Synthetic Rubber Co Ltd | Radiation sensitive resinous composition |
JP3767552B2 (en) * | 2002-12-26 | 2006-04-19 | Jsr株式会社 | Radiation-sensitive composition, black matrix, color filter, and color liquid crystal display device |
KR20040092550A (en) * | 2003-04-24 | 2004-11-04 | 클라리언트 인터내셔널 리미티드 | Resist composition and organic solvent for removing resist |
JP4016893B2 (en) * | 2003-06-12 | 2007-12-05 | Jsr株式会社 | Radiation sensitive resin composition and liquid crystal display element used for forming spacer for display panel |
TWI342983B (en) * | 2003-07-16 | 2011-06-01 | Sumitomo Chemical Co | Coloring photosensitive resin composition |
-
2006
- 2006-06-14 TW TW095121261A patent/TWI411877B/en active
- 2006-06-14 KR KR1020060053357A patent/KR101314033B1/en active IP Right Grant
- 2006-06-15 CN CN2006100936939A patent/CN1881080B/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR20060131644A (en) | 2006-12-20 |
KR101314033B1 (en) | 2013-10-01 |
TWI411877B (en) | 2013-10-11 |
CN1881080A (en) | 2006-12-20 |
CN1881080B (en) | 2011-06-08 |
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