KR100859524B1 - 박막 트랜지스터 기판 - Google Patents
박막 트랜지스터 기판 Download PDFInfo
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- KR100859524B1 KR100859524B1 KR1020020040169A KR20020040169A KR100859524B1 KR 100859524 B1 KR100859524 B1 KR 100859524B1 KR 1020020040169 A KR1020020040169 A KR 1020020040169A KR 20020040169 A KR20020040169 A KR 20020040169A KR 100859524 B1 KR100859524 B1 KR 100859524B1
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1345—Conductors connecting electrodes to cell terminals
- G02F1/13458—Terminal pads
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136213—Storage capacitors associated with the pixel electrode
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1255—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs integrated with passive devices, e.g. auxiliary capacitors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods
- H01L27/1288—Multistep manufacturing methods employing particular masking sequences or specially adapted masks, e.g. half-tone mask
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136227—Through-hole connection of the pixel electrode to the active element through an insulation layer
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Liquid Crystal (AREA)
- Thin Film Transistor (AREA)
- Electroluminescent Light Sources (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
Description
Claims (8)
- 절연 기판,상기 절연 기판 위에 형성되어 있고, 유지 전극선과 상기 유지 전극선으로부터 뻗어 나온 유지 전극을 포함하며, 각 화소 내에 연결로가 없는 돌출 가지를 1개 이하로 포함하는 유지 전극 배선,상기 절연 기판 위에 형성되어 있는 게이트 배선,상기 게이트 배선과 상기 유지 전극배선 위에 형성되어 있는 게이트 절연막,상기 게이트 절연막 위에 형성되어 있는 반도체층,상기 반도체층 위에 형성되어 있는 데이터 배선,상기 데이터 배선 위에 형성되어 있는 보호막, 그리고상기 보호막 위에 형성되어 있는 화소 전극을 포함하는 박막 트랜지스터 기판.
- 제1항에서,상기 유지 전극 배선은 이웃하는 화소간의 유지 전극을 연결하는 유지 전극선을 2개 이상 포함하는 박막 트랜지스터 기판.
- 제1항에서,상기 보호막 위에 형성되어 있고, 상기 게이트 배선의 양쪽에 위치하는 두 유지 전극 배선을 연결하는 유지 배선 연결 다리를 더 포함하는 박막 트랜지스터 기판.
- 제1항에서,상기 유지 전극 배선의 유지 전극은 복수의 세로 가지부와 사선 가지부를 가지며, 상기 유지 전극과 상기 유지 전극선은 협동하여 적어도 1개의 폐회로를 형성하는 박막 트랜지스터 기판.
- 제1항에서,상기 유지 전극 배선의 유지 전극은 2개의 세로 가지부와 3개의 사선 가지부를 가지며 2개의 폐회로를 형성하는 박막 트랜지스터 기판.
- 제1항에서,상기 유지 전극 배선의 유지 전극은 2개의 세로 가지부와 4개의 사선 가지부를 가지며 3개의 폐회로를 형성하는 박막 트랜지스터 기판.
- 제1항에서,상기 화소 전극은 다수의 절개부를 가지며 상기 절개부는 상기 유지 전극 배선과 중첩하는 박막 트랜지스터 기판.
- 제1항에서,데이터 배선은 상기 반도체층과 채널부를 제외한 영역에서 실질적으로 동일한 패턴을 가지는 박막 트랜지스터 기판.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020020040169A KR100859524B1 (ko) | 2002-07-11 | 2002-07-11 | 박막 트랜지스터 기판 |
JP2003181712A JP4657587B2 (ja) | 2002-07-11 | 2003-06-25 | 薄膜トランジスタ表示板 |
US10/615,798 US7015548B2 (en) | 2002-07-11 | 2003-07-10 | Thin film transistor array panel including storage electrode |
CNB031597327A CN100413077C (zh) | 2002-07-11 | 2003-07-11 | 薄膜晶体管阵列面板 |
TW092119020A TWI284986B (en) | 2002-07-11 | 2003-07-11 | Thin film transistor array panel including storage electrode |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020020040169A KR100859524B1 (ko) | 2002-07-11 | 2002-07-11 | 박막 트랜지스터 기판 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20040006179A KR20040006179A (ko) | 2004-01-24 |
KR100859524B1 true KR100859524B1 (ko) | 2008-09-22 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1020020040169A KR100859524B1 (ko) | 2002-07-11 | 2002-07-11 | 박막 트랜지스터 기판 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7015548B2 (ko) |
JP (1) | JP4657587B2 (ko) |
KR (1) | KR100859524B1 (ko) |
CN (1) | CN100413077C (ko) |
TW (1) | TWI284986B (ko) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100997968B1 (ko) * | 2003-10-13 | 2010-12-02 | 삼성전자주식회사 | 박막 트랜지스터 표시판의 제조 방법 |
KR100620849B1 (ko) * | 2004-03-23 | 2006-09-13 | 엘지전자 주식회사 | 유기 전계 발광 소자 및 그 제조방법 |
KR100699990B1 (ko) | 2004-06-30 | 2007-03-26 | 삼성에스디아이 주식회사 | 능동 구동 유기 전계 발광 소자 및 그 제조 방법 |
TWI273331B (en) * | 2004-07-15 | 2007-02-11 | Au Optronics Corp | Thin film transistor array substrate and repairing method thereof |
KR101112538B1 (ko) * | 2004-07-27 | 2012-03-13 | 삼성전자주식회사 | 박막 트랜지스터 표시판 및 그 제조 방법 |
KR101046927B1 (ko) * | 2004-09-03 | 2011-07-06 | 삼성전자주식회사 | 박막 트랜지스터 표시판 |
KR101066303B1 (ko) * | 2004-09-09 | 2011-09-20 | 엘지디스플레이 주식회사 | 박막 트랜지스터 어레이 기판 및 그 제조 방법 |
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- 2003-07-10 US US10/615,798 patent/US7015548B2/en not_active Expired - Lifetime
- 2003-07-11 TW TW092119020A patent/TWI284986B/zh not_active IP Right Cessation
- 2003-07-11 CN CNB031597327A patent/CN100413077C/zh not_active Expired - Lifetime
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US20040007705A1 (en) | 2004-01-15 |
US7015548B2 (en) | 2006-03-21 |
CN1489217A (zh) | 2004-04-14 |
JP4657587B2 (ja) | 2011-03-23 |
CN100413077C (zh) | 2008-08-20 |
KR20040006179A (ko) | 2004-01-24 |
TWI284986B (en) | 2007-08-01 |
JP2004145266A (ja) | 2004-05-20 |
TW200402887A (en) | 2004-02-16 |
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