KR100814567B1 - 액체공급장치 - Google Patents

액체공급장치 Download PDF

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Publication number
KR100814567B1
KR100814567B1 KR1020020011300A KR20020011300A KR100814567B1 KR 100814567 B1 KR100814567 B1 KR 100814567B1 KR 1020020011300 A KR1020020011300 A KR 1020020011300A KR 20020011300 A KR20020011300 A KR 20020011300A KR 100814567 B1 KR100814567 B1 KR 100814567B1
Authority
KR
South Korea
Prior art keywords
substrate
support member
support
plate
liquid supply
Prior art date
Application number
KR1020020011300A
Other languages
English (en)
Korean (ko)
Other versions
KR20020071460A (ko
Inventor
데쓰야 사다
히로시 하시모토
Original Assignee
동경 엘렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 동경 엘렉트론 주식회사 filed Critical 동경 엘렉트론 주식회사
Publication of KR20020071460A publication Critical patent/KR20020071460A/ko
Application granted granted Critical
Publication of KR100814567B1 publication Critical patent/KR100814567B1/ko

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
    • B05C1/02—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to separate articles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Coating Apparatus (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Chemical & Material Sciences (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020020011300A 2001-03-05 2002-03-04 액체공급장치 KR100814567B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2001-00060969 2001-03-05
JP2001060969A JP3740377B2 (ja) 2001-03-05 2001-03-05 液供給装置
JP2001077511A JP4570001B2 (ja) 2001-03-05 2001-03-19 液供給装置
JPJP-P-2001-00077511 2001-03-19

Publications (2)

Publication Number Publication Date
KR20020071460A KR20020071460A (ko) 2002-09-12
KR100814567B1 true KR100814567B1 (ko) 2008-03-17

Family

ID=37489244

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020020011300A KR100814567B1 (ko) 2001-03-05 2002-03-04 액체공급장치

Country Status (2)

Country Link
JP (2) JP3740377B2 (ja)
KR (1) KR100814567B1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180037903A (ko) * 2016-10-05 2018-04-13 램 리서치 아게 에지 링을 포함한 스핀 척

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT500984B1 (de) 2002-06-25 2007-05-15 Sez Ag Vorrichtung zur flüssigkeitsbehandlung von scheibenförmigen gegenständen
KR100803834B1 (ko) * 2006-08-21 2008-02-14 프라임 뷰 인터내셔널 코오포레이션 리미티드 포토레지스트 회전 도포기의 척
KR101388441B1 (ko) * 2008-05-14 2014-04-23 주식회사 케이씨텍 스핀척 장치용 척핀
KR101104848B1 (ko) * 2010-01-12 2012-01-16 현성섭 견지낚시용릴
JP6051919B2 (ja) * 2012-04-11 2016-12-27 東京エレクトロン株式会社 液処理装置
KR102328866B1 (ko) * 2019-12-26 2021-11-19 세메스 주식회사 기판 처리 장치

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06349726A (ja) * 1993-06-11 1994-12-22 Dainippon Screen Mfg Co Ltd 基板処理装置
JPH07106233A (ja) * 1993-10-07 1995-04-21 Dainippon Screen Mfg Co Ltd 回転式基板処理装置
JPH11179264A (ja) * 1997-12-24 1999-07-06 Tokyo Ohka Kogyo Co Ltd 回転塗布装置
KR20000023376A (ko) * 1998-09-24 2000-04-25 히가시 데쓰로 회전컵 및 도포장치 및 도포방법

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08301152A (ja) * 1995-05-12 1996-11-19 Shin Caterpillar Mitsubishi Ltd アイドルホイールの保持構造
JPH0944827A (ja) * 1995-07-25 1997-02-14 Hitachi Ltd 回転磁気ヘッド装置
JP3381017B2 (ja) * 1996-04-15 2003-02-24 東京エレクトロン株式会社 処理装置及び処理方法
JPH11335827A (ja) * 1998-05-20 1999-12-07 Matsushita Electric Ind Co Ltd スパッタリング装置
JP3698398B2 (ja) * 1998-09-24 2005-09-21 東京エレクトロン株式会社 回転カップ及び塗布装置及び塗布方法
JP3277278B2 (ja) * 1999-10-28 2002-04-22 東京エレクトロン株式会社 処理装置及び処理方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06349726A (ja) * 1993-06-11 1994-12-22 Dainippon Screen Mfg Co Ltd 基板処理装置
JPH07106233A (ja) * 1993-10-07 1995-04-21 Dainippon Screen Mfg Co Ltd 回転式基板処理装置
JPH11179264A (ja) * 1997-12-24 1999-07-06 Tokyo Ohka Kogyo Co Ltd 回転塗布装置
KR20000023376A (ko) * 1998-09-24 2000-04-25 히가시 데쓰로 회전컵 및 도포장치 및 도포방법

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180037903A (ko) * 2016-10-05 2018-04-13 램 리서치 아게 에지 링을 포함한 스핀 척
KR102392259B1 (ko) 2016-10-05 2022-04-28 램 리서치 아게 에지 링을 포함한 스핀 척

Also Published As

Publication number Publication date
JP2002273312A (ja) 2002-09-24
JP2002263554A (ja) 2002-09-17
KR20020071460A (ko) 2002-09-12
JP4570001B2 (ja) 2010-10-27
JP3740377B2 (ja) 2006-02-01

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