JPS5627940A - Manufacture of semiconductor elements - Google Patents
Manufacture of semiconductor elementsInfo
- Publication number
- JPS5627940A JPS5627940A JP10345579A JP10345579A JPS5627940A JP S5627940 A JPS5627940 A JP S5627940A JP 10345579 A JP10345579 A JP 10345579A JP 10345579 A JP10345579 A JP 10345579A JP S5627940 A JPS5627940 A JP S5627940A
- Authority
- JP
- Japan
- Prior art keywords
- fault
- elements
- semiconductor elements
- absorbing source
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title abstract 4
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 2
- 229910052760 oxygen Inorganic materials 0.000 abstract 2
- 239000001301 oxygen Substances 0.000 abstract 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 238000002347 injection Methods 0.000 abstract 1
- 239000007924 injection Substances 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Formation Of Insulating Films (AREA)
- Led Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10345579A JPS5627940A (en) | 1979-08-14 | 1979-08-14 | Manufacture of semiconductor elements |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10345579A JPS5627940A (en) | 1979-08-14 | 1979-08-14 | Manufacture of semiconductor elements |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5627940A true JPS5627940A (en) | 1981-03-18 |
Family
ID=14354495
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10345579A Pending JPS5627940A (en) | 1979-08-14 | 1979-08-14 | Manufacture of semiconductor elements |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5627940A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59186331A (ja) * | 1983-04-04 | 1984-10-23 | モンサント・コンパニ− | 半導体基質及び製法 |
JPS6124240A (ja) * | 1984-07-13 | 1986-02-01 | Toshiba Corp | 半導体基板 |
JPS6276714A (ja) * | 1985-09-30 | 1987-04-08 | Mitsubishi Metal Corp | シリコンウエハ |
-
1979
- 1979-08-14 JP JP10345579A patent/JPS5627940A/ja active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59186331A (ja) * | 1983-04-04 | 1984-10-23 | モンサント・コンパニ− | 半導体基質及び製法 |
JPS6124240A (ja) * | 1984-07-13 | 1986-02-01 | Toshiba Corp | 半導体基板 |
JPH0475655B2 (ja) * | 1984-07-13 | 1992-12-01 | Tokyo Shibaura Electric Co | |
JPS6276714A (ja) * | 1985-09-30 | 1987-04-08 | Mitsubishi Metal Corp | シリコンウエハ |
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