Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
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Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co LtdfiledCriticalNEC Corp
Priority to JP8131277ApriorityCriticalpatent/JPS5416181A/en
Publication of JPS5416181ApublicationCriticalpatent/JPS5416181A/en
PURPOSE: To improve pattern accuracy by increasing electron beam exposure with time and considering reaction which continues after stopping of radiation.