JPS52117578A - Electron beam exposing method - Google Patents

Electron beam exposing method

Info

Publication number
JPS52117578A
JPS52117578A JP3485976A JP3485976A JPS52117578A JP S52117578 A JPS52117578 A JP S52117578A JP 3485976 A JP3485976 A JP 3485976A JP 3485976 A JP3485976 A JP 3485976A JP S52117578 A JPS52117578 A JP S52117578A
Authority
JP
Japan
Prior art keywords
electron beam
exposing method
beam exposing
pattern
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3485976A
Other languages
Japanese (ja)
Inventor
Noriaki Nakayama
Yasuo Furukawa
Masahiro Okabe
Seigo Igaki
Yushi Inagaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP3485976A priority Critical patent/JPS52117578A/en
Publication of JPS52117578A publication Critical patent/JPS52117578A/en
Pending legal-status Critical Current

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  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To enable accurate pattern drawing and short exposing time, by scanning with electron beam having small diameter for near the edge of pattern and with that having great diameter for the internal the pattern.
COPYRIGHT: (C)1977,JPO&Japio
JP3485976A 1976-03-30 1976-03-30 Electron beam exposing method Pending JPS52117578A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3485976A JPS52117578A (en) 1976-03-30 1976-03-30 Electron beam exposing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3485976A JPS52117578A (en) 1976-03-30 1976-03-30 Electron beam exposing method

Publications (1)

Publication Number Publication Date
JPS52117578A true JPS52117578A (en) 1977-10-03

Family

ID=12425888

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3485976A Pending JPS52117578A (en) 1976-03-30 1976-03-30 Electron beam exposing method

Country Status (1)

Country Link
JP (1) JPS52117578A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54179142U (en) * 1978-06-08 1979-12-18
JPS5598830A (en) * 1979-01-23 1980-07-28 Chiyou Lsi Gijutsu Kenkyu Kumiai Drawing device for pattern by electron beam
JPS59208720A (en) * 1983-05-13 1984-11-27 Hitachi Ltd Drawing method and apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54179142U (en) * 1978-06-08 1979-12-18
JPS5598830A (en) * 1979-01-23 1980-07-28 Chiyou Lsi Gijutsu Kenkyu Kumiai Drawing device for pattern by electron beam
JPS59208720A (en) * 1983-05-13 1984-11-27 Hitachi Ltd Drawing method and apparatus

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