JPS52117578A - Electron beam exposing method - Google Patents
Electron beam exposing methodInfo
- Publication number
- JPS52117578A JPS52117578A JP3485976A JP3485976A JPS52117578A JP S52117578 A JPS52117578 A JP S52117578A JP 3485976 A JP3485976 A JP 3485976A JP 3485976 A JP3485976 A JP 3485976A JP S52117578 A JPS52117578 A JP S52117578A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- exposing method
- beam exposing
- pattern
- scanning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To enable accurate pattern drawing and short exposing time, by scanning with electron beam having small diameter for near the edge of pattern and with that having great diameter for the internal the pattern.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3485976A JPS52117578A (en) | 1976-03-30 | 1976-03-30 | Electron beam exposing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3485976A JPS52117578A (en) | 1976-03-30 | 1976-03-30 | Electron beam exposing method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52117578A true JPS52117578A (en) | 1977-10-03 |
Family
ID=12425888
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3485976A Pending JPS52117578A (en) | 1976-03-30 | 1976-03-30 | Electron beam exposing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52117578A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54179142U (en) * | 1978-06-08 | 1979-12-18 | ||
JPS5598830A (en) * | 1979-01-23 | 1980-07-28 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Drawing device for pattern by electron beam |
JPS59208720A (en) * | 1983-05-13 | 1984-11-27 | Hitachi Ltd | Drawing method and apparatus |
-
1976
- 1976-03-30 JP JP3485976A patent/JPS52117578A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54179142U (en) * | 1978-06-08 | 1979-12-18 | ||
JPS5598830A (en) * | 1979-01-23 | 1980-07-28 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Drawing device for pattern by electron beam |
JPS59208720A (en) * | 1983-05-13 | 1984-11-27 | Hitachi Ltd | Drawing method and apparatus |
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