JPS53120277A - Electron beam exposure device - Google Patents
Electron beam exposure deviceInfo
- Publication number
- JPS53120277A JPS53120277A JP3580377A JP3580377A JPS53120277A JP S53120277 A JPS53120277 A JP S53120277A JP 3580377 A JP3580377 A JP 3580377A JP 3580377 A JP3580377 A JP 3580377A JP S53120277 A JPS53120277 A JP S53120277A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- exposure device
- beam exposure
- scanning
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To ensure an exposure scanning with a high accuracy at the periphery of a rectangle as well as to shorten easily the pattern exposure scanning time, by carrying out both the current amount control and the cross-section area control of the electron beam for an electron beam exposure device according to the scanning position of the electronic beam.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3580377A JPS53120277A (en) | 1977-03-29 | 1977-03-29 | Electron beam exposure device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3580377A JPS53120277A (en) | 1977-03-29 | 1977-03-29 | Electron beam exposure device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53120277A true JPS53120277A (en) | 1978-10-20 |
Family
ID=12452071
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3580377A Pending JPS53120277A (en) | 1977-03-29 | 1977-03-29 | Electron beam exposure device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53120277A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5598830A (en) * | 1979-01-23 | 1980-07-28 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Drawing device for pattern by electron beam |
JPS5793528A (en) * | 1980-11-28 | 1982-06-10 | Ibm | Electron beam device |
US4692579A (en) * | 1984-05-18 | 1987-09-08 | Hitachi, Ltd. | Electron beam lithography apparatus |
-
1977
- 1977-03-29 JP JP3580377A patent/JPS53120277A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5598830A (en) * | 1979-01-23 | 1980-07-28 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Drawing device for pattern by electron beam |
JPS5793528A (en) * | 1980-11-28 | 1982-06-10 | Ibm | Electron beam device |
US4692579A (en) * | 1984-05-18 | 1987-09-08 | Hitachi, Ltd. | Electron beam lithography apparatus |
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