JPS52119185A - Electron beam exposure equipment - Google Patents
Electron beam exposure equipmentInfo
- Publication number
- JPS52119185A JPS52119185A JP3647376A JP3647376A JPS52119185A JP S52119185 A JPS52119185 A JP S52119185A JP 3647376 A JP3647376 A JP 3647376A JP 3647376 A JP3647376 A JP 3647376A JP S52119185 A JPS52119185 A JP S52119185A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- beam exposure
- exposure equipment
- masks
- precise
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To enable the simple, precise and rapid exposure by inserting the masks with the different patterns on the different block positions into the channel of the electron beams.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3647376A JPS52119185A (en) | 1976-03-31 | 1976-03-31 | Electron beam exposure equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3647376A JPS52119185A (en) | 1976-03-31 | 1976-03-31 | Electron beam exposure equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52119185A true JPS52119185A (en) | 1977-10-06 |
Family
ID=12470773
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3647376A Pending JPS52119185A (en) | 1976-03-31 | 1976-03-31 | Electron beam exposure equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52119185A (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5316578A (en) * | 1976-07-30 | 1978-02-15 | Toshiba Corp | Electron beam exposure apparatus |
JPS553710U (en) * | 1978-06-21 | 1980-01-11 | ||
US5148033A (en) * | 1989-09-30 | 1992-09-15 | Fujitsu Limited | Electron beam exposure device and exposure method using the same |
US5288567A (en) * | 1990-06-27 | 1994-02-22 | Fujitsu Limited | Stencil mask and charged particle beam exposure method and apparatus using the stencil mask |
US5347592A (en) * | 1991-07-29 | 1994-09-13 | Fujitsu Limited | Pattern judging method and mask producing method using the pattern judging method |
US5393988A (en) * | 1988-11-04 | 1995-02-28 | Fujitsu Limited | Mask and charged particle beam exposure method using the mask |
US5537487A (en) * | 1991-07-29 | 1996-07-16 | Fujitsu Limited | Pattern judging method, mask producing method, and method of dividing block pattern for use in block exposure |
EP0780879A2 (en) | 1995-12-21 | 1997-06-25 | Nec Corporation | Electron beam exposure apparatus |
US5932884A (en) * | 1996-03-28 | 1999-08-03 | Nec Corporation | Charged-beam exposure system and charged-beam exposure method |
-
1976
- 1976-03-31 JP JP3647376A patent/JPS52119185A/en active Pending
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5316578A (en) * | 1976-07-30 | 1978-02-15 | Toshiba Corp | Electron beam exposure apparatus |
JPS54374B2 (en) * | 1976-07-30 | 1979-01-10 | ||
JPS553710U (en) * | 1978-06-21 | 1980-01-11 | ||
US5393988A (en) * | 1988-11-04 | 1995-02-28 | Fujitsu Limited | Mask and charged particle beam exposure method using the mask |
US5148033A (en) * | 1989-09-30 | 1992-09-15 | Fujitsu Limited | Electron beam exposure device and exposure method using the same |
US5288567A (en) * | 1990-06-27 | 1994-02-22 | Fujitsu Limited | Stencil mask and charged particle beam exposure method and apparatus using the stencil mask |
US5376802A (en) * | 1990-06-27 | 1994-12-27 | Fujitsu Limited | Stencil mask and charge particle beam exposure method and apparatus using the stencil mask |
US5347592A (en) * | 1991-07-29 | 1994-09-13 | Fujitsu Limited | Pattern judging method and mask producing method using the pattern judging method |
US5537487A (en) * | 1991-07-29 | 1996-07-16 | Fujitsu Limited | Pattern judging method, mask producing method, and method of dividing block pattern for use in block exposure |
EP0780879A2 (en) | 1995-12-21 | 1997-06-25 | Nec Corporation | Electron beam exposure apparatus |
US5932884A (en) * | 1996-03-28 | 1999-08-03 | Nec Corporation | Charged-beam exposure system and charged-beam exposure method |
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