JPS5265783A - Equipment for evaporation by electron beam - Google Patents

Equipment for evaporation by electron beam

Info

Publication number
JPS5265783A
JPS5265783A JP14167075A JP14167075A JPS5265783A JP S5265783 A JPS5265783 A JP S5265783A JP 14167075 A JP14167075 A JP 14167075A JP 14167075 A JP14167075 A JP 14167075A JP S5265783 A JPS5265783 A JP S5265783A
Authority
JP
Japan
Prior art keywords
evaporation
electron beam
equipment
x0ray
shutter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14167075A
Other languages
Japanese (ja)
Inventor
Hiroshi Kato
Kazutoshi Ashikawa
Yoichi Nakamura
Hirobumi Yoshida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP14167075A priority Critical patent/JPS5265783A/en
Publication of JPS5265783A publication Critical patent/JPS5265783A/en
Pending legal-status Critical Current

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  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE: To develop equipment for evaporation by electron beam by setting a shield made of specific material, protecting a body to be coated from fluorescent X0ray from the shutter.
COPYRIGHT: (C)1977,JPO&Japio
JP14167075A 1975-11-28 1975-11-28 Equipment for evaporation by electron beam Pending JPS5265783A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14167075A JPS5265783A (en) 1975-11-28 1975-11-28 Equipment for evaporation by electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14167075A JPS5265783A (en) 1975-11-28 1975-11-28 Equipment for evaporation by electron beam

Publications (1)

Publication Number Publication Date
JPS5265783A true JPS5265783A (en) 1977-05-31

Family

ID=15297448

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14167075A Pending JPS5265783A (en) 1975-11-28 1975-11-28 Equipment for evaporation by electron beam

Country Status (1)

Country Link
JP (1) JPS5265783A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4303694A (en) * 1979-05-04 1981-12-01 Daniel Bois Method and device of deposition through vacuum evaporation making use _of a modulated electron beam and a screen
US4942063A (en) * 1989-04-20 1990-07-17 North American Philips Corporation Method for controlling the thickness distribution of an interference filter
US4982695A (en) * 1989-04-20 1991-01-08 North American Philips Corporation Method and apparatus for controlling the thickness distribution of an interference filter
JP2010132991A (en) * 2008-12-08 2010-06-17 Hitachi Zosen Corp Electron beam vapor deposition apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4303694A (en) * 1979-05-04 1981-12-01 Daniel Bois Method and device of deposition through vacuum evaporation making use _of a modulated electron beam and a screen
US4942063A (en) * 1989-04-20 1990-07-17 North American Philips Corporation Method for controlling the thickness distribution of an interference filter
US4982695A (en) * 1989-04-20 1991-01-08 North American Philips Corporation Method and apparatus for controlling the thickness distribution of an interference filter
JP2010132991A (en) * 2008-12-08 2010-06-17 Hitachi Zosen Corp Electron beam vapor deposition apparatus

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