JP7172328B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP7172328B2 JP7172328B2 JP2018173120A JP2018173120A JP7172328B2 JP 7172328 B2 JP7172328 B2 JP 7172328B2 JP 2018173120 A JP2018173120 A JP 2018173120A JP 2018173120 A JP2018173120 A JP 2018173120A JP 7172328 B2 JP7172328 B2 JP 7172328B2
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- 239000004065 semiconductor Substances 0.000 title claims description 198
- 239000000758 substrate Substances 0.000 claims description 83
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 80
- 229920005591 polysilicon Polymers 0.000 claims description 79
- 230000003071 parasitic effect Effects 0.000 claims description 54
- 239000002184 metal Substances 0.000 claims description 18
- 229910052751 metal Inorganic materials 0.000 claims description 18
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 5
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 71
- 238000005259 measurement Methods 0.000 description 71
- 239000011229 interlayer Substances 0.000 description 15
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 9
- 238000010586 diagram Methods 0.000 description 7
- 238000002161 passivation Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 description 2
- 230000005669 field effect Effects 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
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- H01L29/7393—Insulated gate bipolar mode transistors, i.e. IGBT; IGT; COMFET
- H01L29/7395—Vertical transistors, e.g. vertical IGBT
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- H01L29/7397—Vertical transistors, e.g. vertical IGBT with a non planar surface, e.g. with a non planar gate or with a trench or recess or pillar in the surface of the emitter, base or collector region for improving current density or short circuiting the emitter and base regions and a gate structure lying on a slanted or vertical surface or formed in a groove, e.g. trench gate IGBT
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Description
実施の形態1にかかる半導体装置の構造について、MOSFETを例に説明する。図1は、実施の形態1にかかる半導体装置を半導体基板のおもて面側から見たレイアウトを示す平面図である。図1に示す実施の形態1にかかる半導体装置は、MOSFETと同一の半導体基板(半導体チップ)10上に、ゲートポリシリコン層14からなる内蔵抵抗Rg2(図3参照)を配置した半導体装置である。半導体基板10は例えば炭化珪素(SiC)からなり、チップサイズが例えば3mm2程度と小さい。半導体基板10のおもて面上には、ソースパッド11、ゲートパッド12および第1,2測定パッド15,16が互いに離して配置され、パッシベーション膜28により電気的に絶縁されている。
次に、実施の形態2にかかる半導体装置の構造について説明する。図4A,4B,5A,5B,6A,6Bは、実施の形態2にかかる半導体装置の構造の一例を示す断面図である。図4A,4B,5A,5B,6A,6Bには、ゲートフィンガー13よりも細線でゲートトレンチ21を示す。また、図4A,4B,5A,5B,6A,6Bでは、ゲートフィンガー13よりも外側(半導体基板10の端部側)の部分を図示省略する。実施の形態2にかかる半導体装置は、ゲートフィンガー13の配置が実施の形態1にかかる半導体装置と異なる。ゲートフィンガー13は、ゲートパッド12、ゲートポリシリコン層14、ゲートフィンガー13、ゲート電極23、ゲートフィンガー13および第2測定パッド16の順に電気的に接続されるように配置されればよく、その配置は種々変更可能である。
2 活性領域の有効領域
3 活性領域の無効領域
4 エッジ終端領域
10 半導体基板
11 ソースパッド
12,12' ゲートパッド
13,13a~13f ゲートフィンガー
14 ゲートポリシリコン層
15 測定パッド(第1測定パッド)
16 測定パッド(第2測定パッド)
21,21a ゲートトレンチ
22 ゲート絶縁膜
23,23a ゲート電極
23a' ゲート電極の延在部
24 層間絶縁膜
25 ソース電極
26,32,34 ニッケルめっき膜
27 フィールド酸化膜
28 パッシベーション膜
31,33 金属電極
C1~C5 寄生容量
Rg1 ゲート電極による寄生抵抗
Rg2 ゲートポリシリコン層による内蔵抵抗
Rg3 全体のゲート抵抗
X トレンチが半導体基板のおもて面に平行な方向(第1方向)
Y 半導体基板のおもて面に平行でかつ第1方向と直交する方向(第2方向)
Z 深さ方向
Claims (9)
- 半導体基板の第1主面側に設けられた、金属膜-酸化膜-半導体の3層構造からなる絶縁ゲート構造と、
前記半導体基板の第1主面に絶縁膜を介して設けられたゲートパッドと、
前記半導体基板の第1主面に前記絶縁膜を介して設けられ、前記絶縁ゲート構造の前記金属膜であるゲート電極が電気的に接続されたゲートフィンガーと、
前記半導体基板の第1主面に前記絶縁膜を介して設けられ、前記ゲートパッドと前記ゲートフィンガーとを電気的に接続するゲートポリシリコン層と、
前記半導体基板の第1主面に前記絶縁膜を介して設けられ、前記ゲートフィンガーに電気的に接続された、第1抵抗値を測定するための電極パッドと、
を備え、
前記ゲートフィンガーの、前記ゲートポリシリコン層との接続部から前記電極パッドとの接続部までの間にすべての前記ゲート電極が電気的に接続されていることを特徴とする半導体装置。 - 前記絶縁ゲート構造は、
前記半導体基板の第1主面から所定深さに達するトレンチと、
前記トレンチの内部に、前記酸化膜であるゲート絶縁膜を介して設けられた前記ゲート電極と、を有するトレンチゲート構造であることを特徴とする請求項1に記載の半導体装置。 - 前記半導体基板の第1主面に前記絶縁膜を介して設けられ、前記ゲートポリシリコン層を介して前記ゲートパッドに電気的に接続された、第2抵抗値を測定するための他の電極パッドをさらに備えることを特徴とする請求項1または2に記載の半導体装置。
- 前記ゲートフィンガーとして、
前記ゲートポリシリコン層と前記ゲート電極とを電気的に接続する第1ゲートフィンガーと、
前記ゲート電極と前記電極パッドとを電気的に接続する第2ゲートフィンガーと、を有し、
前記ゲートパッド、前記ゲートポリシリコン層、前記第1ゲートフィンガー、前記ゲート電極、前記第2ゲートフィンガーおよび前記電極パッドの順に接続されていることを特徴とする請求項1~3のいずれか一つに記載の半導体装置。 - 前記絶縁膜の内部に設けられた、前記ゲート電極の電位のポリシリコン層をさらに備え、
前記ポリシリコン層は、前記電極パッドと前記半導体基板との間に配置されていることを特徴とする請求項1~4のいずれか一つに記載の半導体装置。 - 第1導電型の前記半導体基板の、前記トレンチ間に設けられた第2導電型の第1半導体領域と、
前記第1半導体領域の内部に選択的に設けられた第1導電型の第2半導体領域と、
前記半導体基板の第2主面に設けられた第3半導体領域と、
前記第1半導体領域および前記第2半導体領域に電気的に接続された第1電極と、
前記第3半導体領域に電気的に接続された第2電極と、
前記絶縁膜の内部に設けられた、前記第1電極の電位のポリシリコン層と、をさらに備え、
前記ポリシリコン層は、前記電極パッドと前記半導体基板との間に配置されていることを特徴とする請求項2に記載の半導体装置。 - 前記第1抵抗値は、前記ゲート電極による寄生抵抗と、前記ゲートポリシリコン層による内蔵抵抗の抵抗値と、の合成抵抗であることを特徴とする請求項1~6のいずれか一つに記載の半導体装置。
- 前記第2抵抗値は、前記ゲートポリシリコン層による内蔵抵抗の抵抗値であることを特徴とする請求項3に記載の半導体装置。
- 前記半導体基板は炭化珪素からなることを特徴とする請求項1~8のいずれか一つに記載の半導体装置。
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JP2018173120A JP7172328B2 (ja) | 2018-09-14 | 2018-09-14 | 半導体装置 |
US16/519,517 US10833189B2 (en) | 2018-09-14 | 2019-07-23 | Semiconductor device |
US17/034,599 US11430714B2 (en) | 2018-09-14 | 2020-09-28 | Semiconductor device |
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JP2018173120A JP7172328B2 (ja) | 2018-09-14 | 2018-09-14 | 半導体装置 |
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US20130069064A1 (en) | 2011-09-20 | 2013-03-21 | Kabushiki Kaisha Toshiba | Semiconductor device |
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JP2017011007A (ja) | 2015-06-18 | 2017-01-12 | 三菱電機株式会社 | 電力用半導体装置および電力用半導体装置の製造方法 |
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US20130069064A1 (en) | 2011-09-20 | 2013-03-21 | Kabushiki Kaisha Toshiba | Semiconductor device |
JP2013065759A (ja) | 2011-09-20 | 2013-04-11 | Toshiba Corp | 半導体装置 |
WO2015033476A1 (ja) | 2013-09-09 | 2015-03-12 | 三菱電機株式会社 | スイッチング素子、半導体装置、半導体装置の製造方法 |
JP2016012670A (ja) | 2014-06-30 | 2016-01-21 | 株式会社デンソー | 半導体モジュール |
JP2017011007A (ja) | 2015-06-18 | 2017-01-12 | 三菱電機株式会社 | 電力用半導体装置および電力用半導体装置の製造方法 |
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