JP6441056B2 - 研削装置 - Google Patents
研削装置 Download PDFInfo
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- JP6441056B2 JP6441056B2 JP2014250114A JP2014250114A JP6441056B2 JP 6441056 B2 JP6441056 B2 JP 6441056B2 JP 2014250114 A JP2014250114 A JP 2014250114A JP 2014250114 A JP2014250114 A JP 2014250114A JP 6441056 B2 JP6441056 B2 JP 6441056B2
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- 238000005259 measurement Methods 0.000 claims description 27
- 238000001514 detection method Methods 0.000 claims description 17
- 238000000034 method Methods 0.000 description 29
- 230000008569 process Effects 0.000 description 22
- 238000003754 machining Methods 0.000 description 15
- 238000005336 cracking Methods 0.000 description 13
- 230000008859 change Effects 0.000 description 10
- 230000006866 deterioration Effects 0.000 description 7
- 238000012545 processing Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 4
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 3
- 229910052594 sapphire Inorganic materials 0.000 description 3
- 239000010980 sapphire Substances 0.000 description 3
- 229910010271 silicon carbide Inorganic materials 0.000 description 3
- 239000006061 abrasive grain Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000007767 bonding agent Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Analytical Chemistry (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Inorganic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
Description
21 チャックテーブル
22 回転手段
41 研削手段
46 研削ホイール
48 研削砥石
51 厚み測定手段(割れ検出手段)
52、72 照射部
53、73 受光部
54 厚み算出部
55、75 判断部
71 高さ測定手段(割れ検出手段)
74 高さ算出部
81 板状ワークの上面
82 板状ワークの下面
83 板状ワークの割れ
W 板状ワーク
Claims (1)
- 板状ワークを保持するチャックテーブルと、該チャックテーブルを連続回転させる回転手段と、該チャックテーブルを該回転手段で連続回転させ保持する板状ワークを研削砥石で研削する研削手段と、を備えた研削装置であって、
該研削手段で研削される該チャックテーブルが保持する板状ワークの割れを検出する割れ検出手段を備え、
該割れ検出手段は、板状ワークの上方から板状ワークの上面に向って測定光を照射する照射部と、該照射部から照射される測定光が板状ワークの該上面で反射した反射光と板状ワークの下面で反射した反射光とを受光する受光部と、板状ワークの該上面及び該下面で反射した反射光から板状ワークの厚みを算出する厚み算出部と、該受光部が受光する該上面で反射した反射光または該下面で反射した反射光の受光量が予め設定した許容範囲を超えた時に割れと判断する判断部と、を備える研削装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014250114A JP6441056B2 (ja) | 2014-12-10 | 2014-12-10 | 研削装置 |
TW104136685A TWI674948B (zh) | 2014-12-10 | 2015-11-06 | 磨削裝置 |
CN201510854878.6A CN105690199B (zh) | 2014-12-10 | 2015-11-30 | 磨削装置 |
KR1020150175039A KR102319943B1 (ko) | 2014-12-10 | 2015-12-09 | 연삭 장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014250114A JP6441056B2 (ja) | 2014-12-10 | 2014-12-10 | 研削装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016107389A JP2016107389A (ja) | 2016-06-20 |
JP6441056B2 true JP6441056B2 (ja) | 2018-12-19 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014250114A Active JP6441056B2 (ja) | 2014-12-10 | 2014-12-10 | 研削装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6441056B2 (ja) |
KR (1) | KR102319943B1 (ja) |
CN (1) | CN105690199B (ja) |
TW (1) | TWI674948B (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6844971B2 (ja) * | 2016-09-02 | 2021-03-17 | 株式会社ディスコ | 研削装置 |
JP6791551B2 (ja) * | 2016-11-01 | 2020-11-25 | 株式会社ディスコ | 研削装置 |
JP6858539B2 (ja) * | 2016-12-08 | 2021-04-14 | 株式会社ディスコ | 研削装置 |
JP6910723B2 (ja) * | 2017-08-22 | 2021-07-28 | 株式会社ディスコ | 研削方法 |
CN107703881B (zh) * | 2017-09-11 | 2023-08-04 | 中国工程物理研究院机械制造工艺研究所 | 一种自动标定磁流变抛光缎带厚度的装置 |
JP2019169608A (ja) * | 2018-03-23 | 2019-10-03 | 株式会社ディスコ | 研削装置 |
JP7121573B2 (ja) * | 2018-07-24 | 2022-08-18 | 株式会社ディスコ | クリープフィード研削方法 |
KR102073767B1 (ko) * | 2018-10-30 | 2020-02-05 | 한국미쯔보시다이아몬드공업(주) | 리브 마크 두께 검사 방법 |
JP7333709B2 (ja) * | 2019-05-17 | 2023-08-25 | 株式会社東京精密 | Cmp装置 |
JP7405563B2 (ja) * | 2019-11-01 | 2023-12-26 | 株式会社ディスコ | クリープフィード研削方法及び研削装置 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4126571B2 (ja) * | 1998-04-01 | 2008-07-30 | 株式会社東京精密 | ウェーハ剥離洗浄装置 |
JP3854056B2 (ja) * | 1999-12-13 | 2006-12-06 | 株式会社荏原製作所 | 基板膜厚測定方法、基板膜厚測定装置、基板処理方法及び基板処理装置 |
JP2005251924A (ja) * | 2004-03-03 | 2005-09-15 | Nikon Corp | ウエハの保持部材からの飛び出し検出方法、ウエハ部分割れ検出方法、及びcmp装置におけるウエハの飛び出し検出方法、cmp装置におけるウエハの部分割れ検出方法、及びウエハの保持部材からの一部飛び出し検出方法 |
JP2009050944A (ja) * | 2007-08-24 | 2009-03-12 | Disco Abrasive Syst Ltd | 基板の厚さ測定方法および基板の加工装置 |
WO2011074615A1 (ja) * | 2009-12-18 | 2011-06-23 | 旭硝子株式会社 | 板状物の研磨方法及び研磨装置 |
JP5654365B2 (ja) * | 2011-01-26 | 2015-01-14 | 株式会社ディスコ | 研削装置 |
JP5656690B2 (ja) * | 2011-03-02 | 2015-01-21 | 株式会社ディスコ | レーザ加工装置 |
JP5681052B2 (ja) * | 2011-06-30 | 2015-03-04 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法及びその基板処理方法を実行させるためのプログラムを記録した記憶媒体 |
CN102513935A (zh) * | 2011-12-13 | 2012-06-27 | 青岛张氏机械有限公司 | 全自动抛光、表面检测设备 |
JP5957220B2 (ja) | 2011-12-20 | 2016-07-27 | 株式会社ディスコ | 板状ワークの割れ判断方法 |
JP2014154708A (ja) | 2013-02-08 | 2014-08-25 | Disco Abrasive Syst Ltd | ウエーハの割れ検出方法及びウエーハの割れ検出装置 |
CN104044069B (zh) * | 2014-07-03 | 2016-12-07 | 上海理工大学 | 基于声发射信号光学工件亚表面损伤深度预测方法 |
-
2014
- 2014-12-10 JP JP2014250114A patent/JP6441056B2/ja active Active
-
2015
- 2015-11-06 TW TW104136685A patent/TWI674948B/zh active
- 2015-11-30 CN CN201510854878.6A patent/CN105690199B/zh active Active
- 2015-12-09 KR KR1020150175039A patent/KR102319943B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
KR20160070704A (ko) | 2016-06-20 |
CN105690199A (zh) | 2016-06-22 |
CN105690199B (zh) | 2019-07-30 |
TW201628789A (zh) | 2016-08-16 |
JP2016107389A (ja) | 2016-06-20 |
KR102319943B1 (ko) | 2021-10-29 |
TWI674948B (zh) | 2019-10-21 |
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