JP4519280B2 - 処理室をドライクリーニングするための装置及び方法 - Google Patents

処理室をドライクリーニングするための装置及び方法 Download PDF

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Publication number
JP4519280B2
JP4519280B2 JP2000212044A JP2000212044A JP4519280B2 JP 4519280 B2 JP4519280 B2 JP 4519280B2 JP 2000212044 A JP2000212044 A JP 2000212044A JP 2000212044 A JP2000212044 A JP 2000212044A JP 4519280 B2 JP4519280 B2 JP 4519280B2
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Japan
Prior art keywords
chamber
gas
metal
cleaning
film
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2000212044A
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English (en)
Japanese (ja)
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JP2001089860A (ja
Inventor
サレール ザキ
エイ、コムナル リチャード
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Publication date
Priority claimed from US09/330,773 external-priority patent/US6290779B1/en
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of JP2001089860A publication Critical patent/JP2001089860A/ja
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Publication of JP4519280B2 publication Critical patent/JP4519280B2/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/12—Gaseous compositions

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Electrodes Of Semiconductors (AREA)
JP2000212044A 1999-06-11 2000-06-08 処理室をドライクリーニングするための装置及び方法 Expired - Fee Related JP4519280B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/330,773 US6290779B1 (en) 1998-06-12 1999-06-11 Systems and methods for dry cleaning process chambers
US330773 2002-12-27

Publications (2)

Publication Number Publication Date
JP2001089860A JP2001089860A (ja) 2001-04-03
JP4519280B2 true JP4519280B2 (ja) 2010-08-04

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000212044A Expired - Fee Related JP4519280B2 (ja) 1999-06-11 2000-06-08 処理室をドライクリーニングするための装置及び方法

Country Status (3)

Country Link
JP (1) JP4519280B2 (ko)
KR (1) KR100739354B1 (ko)
TW (1) TW471083B (ko)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100447284B1 (ko) 2002-07-19 2004-09-07 삼성전자주식회사 화학기상증착 챔버의 세정 방법
US20080271753A1 (en) * 2007-05-03 2008-11-06 L'air Liquide Societe Anonyme Pour I'etude Et I'exploitation Des Procedes Georges Claude Method of cleaninig stannane distribution system
KR101630234B1 (ko) * 2009-11-17 2016-06-15 주성엔지니어링(주) 공정챔버의 세정방법
JP5470149B2 (ja) 2010-04-23 2014-04-16 株式会社日立国際電気 基板処理装置、半導体装置の製造方法およびクリーニング方法
JP5933375B2 (ja) * 2011-09-14 2016-06-08 株式会社日立国際電気 クリーニング方法、半導体装置の製造方法、基板処理装置及びプログラム
JP6823533B2 (ja) * 2017-04-24 2021-02-03 東京エレクトロン株式会社 チタンシリサイド領域を形成する方法
JP6785809B2 (ja) * 2018-02-22 2020-11-18 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 処理容器内の部材をクリーニングする方法、半導体装置の製造方法、基板処理装置、およびプログラム
KR102442451B1 (ko) * 2020-12-08 2022-09-08 주식회사 한화 반도체 제조 설비의 파우더 트랩용 세정장치 및 이를 이용한 파우더 트랩의 세정 방법
CN115612999A (zh) * 2022-10-19 2023-01-17 长鑫存储技术有限公司 一种半导体生产设备及其控制方法及装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0331479A (ja) * 1989-06-29 1991-02-12 Tokyo Electron Ltd クリーニング方法
JPH09289179A (ja) * 1996-04-23 1997-11-04 Tokyo Electron Ltd ＣＶＤ−Ｔｉ成膜チャンバーのクリーニング方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5427621A (en) * 1993-10-29 1995-06-27 Applied Materials, Inc. Method for removing particulate contaminants by magnetic field spiking
JPH07169693A (ja) * 1993-12-16 1995-07-04 Mitsubishi Electric Corp 横型減圧ｃｖｄ装置及びそのクリーニング方法
US5609721A (en) * 1994-03-11 1997-03-11 Fujitsu Limited Semiconductor device manufacturing apparatus and its cleaning method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0331479A (ja) * 1989-06-29 1991-02-12 Tokyo Electron Ltd クリーニング方法
JPH09289179A (ja) * 1996-04-23 1997-11-04 Tokyo Electron Ltd ＣＶＤ−Ｔｉ成膜チャンバーのクリーニング方法

Also Published As

Publication number Publication date
KR20010007317A (ko) 2001-01-26
TW471083B (en) 2002-01-01
JP2001089860A (ja) 2001-04-03
KR100739354B1 (ko) 2007-07-18

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