JP4264675B2 - 液晶表示装置とその製造方法 - Google Patents

液晶表示装置とその製造方法 Download PDF

Info

Publication number: JP4264675B2
Authority: JP; Japan
Prior art keywords: liquid crystal; region; effective pixel; active element; video signal
Prior art date: 1998-08-17
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

JP28319498A

Other languages

English (en)

Japanese (ja)

Other versions

JP2000066240A (ja

Inventor

栄田中

Original Assignee

栄田中

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1998-08-17

Filing date

1998-08-17

Publication date

2009-05-20

Family has litigation

First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=17662362&utm_source=***_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JP4264675(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.

1998-08-17 Application filed by 栄田中 filed Critical 栄田中

1998-08-17 Priority to JP28319498A priority Critical patent/JP4264675B2/ja

1999-08-13 Priority to TW88113987A priority patent/TW536655B/zh

2000-03-03 Publication of JP2000066240A publication Critical patent/JP2000066240A/ja

2009-05-20 Application granted granted Critical

2009-05-20 Publication of JP4264675B2 publication Critical patent/JP4264675B2/ja

2018-08-17 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Links

Images

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Liquid Crystal (AREA)
Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Thin Film Transistor (AREA)

JP28319498A 1998-08-17 1998-08-17 液晶表示装置とその製造方法 Expired - Fee Related JP4264675B2 (ja)

Priority Applications (2)

Application Number	Priority Date	Filing Date	Title
JP28319498A JP4264675B2 (ja)	1998-08-17	1998-08-17	液晶表示装置とその製造方法
TW88113987A TW536655B (en)	1998-08-17	1999-08-13	Liquid crystal display device

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP28319498A JP4264675B2 (ja)	1998-08-17	1998-08-17	液晶表示装置とその製造方法

Related Child Applications (3)

Application Number	Title	Priority Date	Filing Date
JP2008316238A Division JP4936257B2 (ja)	2008-10-31	2008-10-31	液晶表示装置とその製造方法
JP2008316237A Division JP5019299B2 (ja)	2008-10-31	2008-10-31	低コスト表示装置を製造するためのホトマスク構造
JP2008336052A Division JP2009111412A (ja)	2008-11-28	2008-11-28	薄膜トランジスタ素子と表示装置

Publications (2)

Publication Number	Publication Date
JP2000066240A JP2000066240A (ja)	2000-03-03
JP4264675B2 true JP4264675B2 (ja)	2009-05-20

Family

ID=17662362

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP28319498A Expired - Fee Related JP4264675B2 (ja)	1998-08-17	1998-08-17	液晶表示装置とその製造方法

Country Status (2)

Country	Link
JP (1)	JP4264675B2 (zh)
TW (1)	TW536655B (zh)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
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US6255130B1 (en) *	1998-11-19	2001-07-03	Samsung Electronics Co., Ltd.	Thin film transistor array panel and a method for manufacturing the same
US6287899B1 (en)	1998-12-31	2001-09-11	Samsung Electronics Co., Ltd.	Thin film transistor array panels for a liquid crystal display and a method for manufacturing the same
US6759281B1 (en)	1999-04-26	2004-07-06	Samsung Electronics Co., Ltd.	Method of making a display switch having a contact hole through a passivation layer and a color filter
US6380559B1 (en) *	1999-06-03	2002-04-30	Samsung Electronics Co., Ltd.	Thin film transistor array substrate for a liquid crystal display
JP2001339072A (ja) *	2000-03-15	2001-12-07	Advanced Display Inc	液晶表示装置
JP4393662B2 (ja)	2000-03-17	2010-01-06	株式会社半導体エネルギー研究所	液晶表示装置の作製方法
JP2001311965A (ja)	2000-04-28	2001-11-09	Nec Corp	アクティブマトリクス基板及びその製造方法
JP2002026333A (ja)	2000-07-11	2002-01-25	Nec Corp	アクティブマトリクス基板の製造方法
JP4582877B2 (ja) *	2000-08-09	2010-11-17	三菱電機株式会社	Ｔｆｔアレイの製造方法
US7223643B2 (en) *	2000-08-11	2007-05-29	Semiconductor Energy Laboratory Co., Ltd.	Method of manufacturing a semiconductor device
JP4565799B2 (ja)	2002-07-01	2010-10-20	大林精工株式会社	横電界方式液晶表示装置、その製造方法、走査露光装置およびミックス走査露光装置
TWI278696B (en)	2002-09-10	2007-04-11	Obayashiseikou Co Ltd	Active matrix type vertically aligned mode liquid crystal display and driving method thereof
TW584908B (en) *	2003-04-15	2004-04-21	Hannstar Display Corp	Method of manufacturing IPS-LCD by using 4-mask process
KR100980020B1 (ko) *	2003-08-28	2010-09-03	삼성전자주식회사	박막 트랜지스터 표시판과 그 제조 방법
TWI382264B (zh)	2004-07-27	2013-01-11	Samsung Display Co Ltd	薄膜電晶體陣列面板及包括此面板之顯示器裝置
KR101048365B1 (ko) *	2004-09-09	2011-07-11	삼성전자주식회사	트랜지스터와 이를 갖는 표시장치
US7704646B2 (en) *	2004-11-08	2010-04-27	Lg Innotek Co., Ltd.	Half tone mask and method for fabricating the same
KR101107246B1 (ko)	2004-12-24	2012-01-25	엘지디스플레이 주식회사	박막 트랜지스터 기판 및 그 제조 방법
KR101107245B1 (ko)	2004-12-24	2012-01-25	엘지디스플레이 주식회사	수평 전계 박막 트랜지스터 기판 및 그 제조 방법
CN100449384C (zh) *	2005-08-03	2009-01-07	友达光电股份有限公司	液晶显示装置基板的制造方法
JP5100997B2 (ja) *	2005-10-18	2012-12-19	三菱電機株式会社	薄膜トランジスタ基板の製造方法
JP2007178649A (ja) *	2005-12-27	2007-07-12	Dainippon Printing Co Ltd	階調マスク
JP2007310334A (ja)	2006-05-19	2007-11-29	Mikuni Denshi Kk	ハーフトーン露光法を用いた液晶表示装置の製造法
JP5673718B2 (ja) *	2006-07-21	2015-02-18	大日本印刷株式会社	階調マスク
JP5228390B2 (ja) *	2006-07-21	2013-07-03	大日本印刷株式会社	階調マスク
JP5458486B2 (ja) *	2006-11-22	2014-04-02	三菱電機株式会社	アレイ基板、表示装置、及びその製造方法
US9645457B2 (en)	2006-11-22	2017-05-09	Mitsubishi Electric Corporation	Array substrate, display device, and method for manufacturing the array substrate
JP5266645B2 (ja) *	2007-01-31	2013-08-21	三菱電機株式会社	薄膜トランジスタと該薄膜トランジスタを用いた表示装置
CN101382728B (zh) *	2007-09-07	2010-07-28	北京京东方光电科技有限公司	灰阶掩膜版结构
CN101387825B (zh) *	2007-09-10	2011-04-06	北京京东方光电科技有限公司	补偿型灰阶掩膜版结构
JP4898749B2 (ja) *	2008-08-04	2012-03-21	大林精工株式会社	走査露光装置および横電界方式液晶表示装置
EP2327069A4 (en)	2008-09-12	2013-03-20	Semiconductor Energy Lab	DISPLAY DEVICE
EP2327070B1 (en)	2008-09-19	2018-10-17	Semiconductor Energy Laboratory Co, Ltd.	Display device
KR101803720B1 (ko) *	2008-10-03	2017-12-01	가부시키가이샤 한도오따이 에네루기 켄큐쇼	표시 장치
JP2010049288A (ja) *	2009-12-02	2010-03-04	Semiconductor Energy Lab Co Ltd	液晶表示装置
CN102655175B (zh) *	2012-04-06	2014-07-02	京东方科技集团股份有限公司	Tft、阵列基板及显示装置、制备该tft的掩模板
JP5668745B2 (ja) *	2012-11-30	2015-02-12	大日本印刷株式会社	階調マスク
CN104155842A (zh)	2014-07-18	2014-11-19	京东方科技集团股份有限公司	一种掩模板
TWI629622B (zh) *	2017-04-17	2018-07-11	承洺股份有限公司	顯示器光學膜貼合應用技術

1998
- 1998-08-17 JP JP28319498A patent/JP4264675B2/ja not_active Expired - Fee Related
1999
- 1999-08-13 TW TW88113987A patent/TW536655B/zh not_active IP Right Cessation

Also Published As

Publication number	Publication date
TW536655B (en)	2003-06-11
JP2000066240A (ja)	2000-03-03

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