JP3987545B2 - プラズマ処理用高周波誘導プラズマ源装置 - Google Patents
プラズマ処理用高周波誘導プラズマ源装置 Download PDFInfo
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- JP3987545B2 JP3987545B2 JP2005134844A JP2005134844A JP3987545B2 JP 3987545 B2 JP3987545 B2 JP 3987545B2 JP 2005134844 A JP2005134844 A JP 2005134844A JP 2005134844 A JP2005134844 A JP 2005134844A JP 3987545 B2 JP3987545 B2 JP 3987545B2
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- Prior art keywords
- plasma
- coil
- chamber
- plasma source
- source device
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
- H01J37/3211—Antennas, e.g. particular shapes of coils
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
- Drying Of Semiconductors (AREA)
- Electron Sources, Ion Sources (AREA)
- ing And Chemical Polishing (AREA)
Description
ne は1/cm3で表された電子濃度、
f はHzで表された周波数である。
R は電線46からの距離、
l は電線46の長さ、
μ0 は波が走行する媒体の透磁率である。
(〔(40A)(4.7V/cm)〕/(8V/cm))である。
イオン化率=全イオン化率/プラズマ源の容積=6.2 x1015/cm3・s(11)
(数12)
全イオン化率=電力×電離能率/電離しきい値=7.8x (12)
プラズマの損失率は、等式(13)によって表現される。
μo は波が走行する媒体の透磁率であり、かつ
I は電線内の電流、
r は電線からの距離である。
前記プラズマとプロセスガスとを閉じ込めるように動作する室と、
前記室内にホイスラー波を発生するように動作するコイルと、
前記室の外側に配置された少なくとも1組の電磁石であって、前記電磁石が前記室内の前記ホイスラー波の好適伝搬方向を規定するように動作する、前記少なくとも1組の電磁石と
を含み、
前記コイルは前記ホイスラー波を励磁するために前記ホイスラー波に高周波電力を誘導結合しかつ前記プロセスガス中にプラズマ状態を誘導するために前記室内の前記プロセスガスに充分な量のエネルギーを転送するように更に動作する、プラズマ源装置。
前記室の底に沿って前記室の外側を通る第1コイルと、
前記室の外側に配置されかつ前記室の側壁に実質的に平行な複数のコイルであって、前記電磁石と前記室との間に配置された前記複数のコイルと
を更に含む、プラズマ源装置。
前記室の外側に配置された複数の永久多極磁石を有し、該磁石がプラズマを閉じ込めるために前記室の表面に沿って磁界を確立するように動作し、
前記室内にホイスラー波を発生するように動作するコイルを有し、
前記室の外側に配置された1組の電磁石を有し、該電磁石は前記室内の前記ホイスラー波の好適伝搬方向を規定するように動作し、
前記コイルは前記ホイスラー波を励磁するために前記ホイスラー波に高周波電力を誘導結合しかつ前記プロセスガス中にプラズマ状態を誘導するために前記プロセスガスに充分な量のエネルギーを転送するように更に動作する、室。
コイルでホイスラー波を発生し、
前記室内のホイスラー波の好適伝搬方向を規定する可変静電磁界を発生し、
前記コイルで前記ホイスラー波に高周波電力を誘導結合することによって前記ホイスラー波を励磁し、前記励磁されたホイスラー波は前記プロセスガス中にプラズマ状態を誘導するように前記プロセスガスに充分なエネルギーを転送する、ステップを含む方法。
前記プロセスガスのイオンサイクロトロン周波数と電子サイクロトロン周波数との間にあるように前記高周波電力の周波数を選択し、
前記プロセスガスの電子プラズマ周波数より低いように前記イオンサイクロトロン周波数と前記電子サイクロトロン周波数とを選択する、ステップを更に含む方法。
本願は、アジト・プラモード・パランジペ(Ajit Pramod Paranjpe)によって、1992年、4月15日に提出され、かつテキサス・インスツルメント社に譲渡された、「プラズマ源及び製造方法(Plasma Source and Method of Manufacturing)」と題する米国特許出願第07/868,818号、(TI−15886)、現在、米国特許第5,231,334号、1993年7月27日交付に関連している。
12 コイル
14 室
24 接続線路
30 高周波電源
34 複数の永久磁石
36 1組の電磁石
40、42 スペーサ
48 プラズマ源装置
50 室
51、52 コイル
60 高周波電源
64 永久磁石
66 ソレノイド電磁石
80 ドライエッチ処理室
82 半導体ウェーハ
84 高周波又は直流電源
Claims (1)
- プラズマ処理ツールにおいて、
半導体ウエハー収納場所を有する処理室と、
前記処理室に磁界を発生するように動作する磁石と、
前記処理室にホイスラー波を発生するように動作するコイルとを有し
該コイルは少なくとも3つの異なる長さの複数の平行線部分からなる、
プラズマ処理ツール。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/100,501 US5430355A (en) | 1993-07-30 | 1993-07-30 | RF induction plasma source for plasma processing |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21034094A Division JP3837171B2 (ja) | 1993-07-30 | 1994-08-01 | プラズマ処理用高周波誘導プラズマ源装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005244255A JP2005244255A (ja) | 2005-09-08 |
JP3987545B2 true JP3987545B2 (ja) | 2007-10-10 |
Family
ID=22280081
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21034094A Expired - Fee Related JP3837171B2 (ja) | 1993-07-30 | 1994-08-01 | プラズマ処理用高周波誘導プラズマ源装置 |
JP2005134844A Expired - Fee Related JP3987545B2 (ja) | 1993-07-30 | 2005-05-06 | プラズマ処理用高周波誘導プラズマ源装置 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21034094A Expired - Fee Related JP3837171B2 (ja) | 1993-07-30 | 1994-08-01 | プラズマ処理用高周波誘導プラズマ源装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US5430355A (ja) |
EP (1) | EP0648069B1 (ja) |
JP (2) | JP3837171B2 (ja) |
KR (1) | KR100340164B1 (ja) |
DE (1) | DE69421033T2 (ja) |
TW (1) | TW327267B (ja) |
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1994
- 1994-07-29 DE DE69421033T patent/DE69421033T2/de not_active Expired - Fee Related
- 1994-07-29 EP EP94111879A patent/EP0648069B1/en not_active Expired - Lifetime
- 1994-07-30 KR KR1019940018996A patent/KR100340164B1/ko not_active IP Right Cessation
- 1994-08-01 JP JP21034094A patent/JP3837171B2/ja not_active Expired - Fee Related
- 1994-08-29 TW TW083107894A patent/TW327267B/zh not_active IP Right Cessation
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2005
- 2005-05-06 JP JP2005134844A patent/JP3987545B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE69421033T2 (de) | 2000-05-31 |
KR100340164B1 (ko) | 2002-11-27 |
EP0648069A1 (en) | 1995-04-12 |
EP0648069B1 (en) | 1999-10-06 |
TW327267B (en) | 1998-02-21 |
DE69421033D1 (de) | 1999-11-11 |
JPH088095A (ja) | 1996-01-12 |
JP2005244255A (ja) | 2005-09-08 |
KR950005121A (ko) | 1995-02-18 |
JP3837171B2 (ja) | 2006-10-25 |
US5430355A (en) | 1995-07-04 |
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