TW327267B - RF induction plasma source for plasma processing - Google Patents

RF induction plasma source for plasma processing

Info

Publication number
TW327267B
TW327267B TW083107894A TW83107894A TW327267B TW 327267 B TW327267 B TW 327267B TW 083107894 A TW083107894 A TW 083107894A TW 83107894 A TW83107894 A TW 83107894A TW 327267 B TW327267 B TW 327267B
Authority
TW
Taiwan
Prior art keywords
plasma
chamber
generating
induction
source
Prior art date
Application number
TW083107894A
Other languages
English (en)
Inventor
P Paranipe Ajit
Original Assignee
Texas Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Texas Instruments Inc filed Critical Texas Instruments Inc
Application granted granted Critical
Publication of TW327267B publication Critical patent/TW327267B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Electron Sources, Ion Sources (AREA)
  • ing And Chemical Polishing (AREA)
TW083107894A 1993-07-30 1994-08-29 RF induction plasma source for plasma processing TW327267B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/100,501 US5430355A (en) 1993-07-30 1993-07-30 RF induction plasma source for plasma processing

Publications (1)

Publication Number Publication Date
TW327267B true TW327267B (en) 1998-02-21

Family

ID=22280081

Family Applications (1)

Application Number Title Priority Date Filing Date
TW083107894A TW327267B (en) 1993-07-30 1994-08-29 RF induction plasma source for plasma processing

Country Status (6)

Country Link
US (1) US5430355A (zh)
EP (1) EP0648069B1 (zh)
JP (2) JP3837171B2 (zh)
KR (1) KR100340164B1 (zh)
DE (1) DE69421033T2 (zh)
TW (1) TW327267B (zh)

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Also Published As

Publication number Publication date
DE69421033T2 (de) 2000-05-31
KR100340164B1 (ko) 2002-11-27
EP0648069A1 (en) 1995-04-12
EP0648069B1 (en) 1999-10-06
DE69421033D1 (de) 1999-11-11
JPH088095A (ja) 1996-01-12
JP3987545B2 (ja) 2007-10-10
JP2005244255A (ja) 2005-09-08
KR950005121A (ko) 1995-02-18
JP3837171B2 (ja) 2006-10-25
US5430355A (en) 1995-07-04

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees