JP2015210072A - Calcination furnace - Google Patents

Calcination furnace Download PDF

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Publication number
JP2015210072A
JP2015210072A JP2014149593A JP2014149593A JP2015210072A JP 2015210072 A JP2015210072 A JP 2015210072A JP 2014149593 A JP2014149593 A JP 2014149593A JP 2014149593 A JP2014149593 A JP 2014149593A JP 2015210072 A JP2015210072 A JP 2015210072A
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Prior art keywords
partition
firing furnace
thick wall
wall portion
region
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チャ・ベーム・ハ
Berm Ha Cha
イ・チュル・スン
Chul Seung Lee
ハ・ムン・ス
Mun Su Ha
ユン・ビュン・クォン
Byung Kwon Yoon
キム・サン・ヒョク
Sang Hyuk Kim
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Samsung Electro Mechanics Co Ltd
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Samsung Electro Mechanics Co Ltd
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B21/00—Open or uncovered sintering apparatus; Other heat-treatment apparatus of like construction
    • F27B21/06—Endless-strand sintering machines
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/02—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity of multiple-track type; of multiple-chamber type; Combinations of furnaces
    • F27B9/028—Multi-chamber type furnaces
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/06—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated
    • F27B9/10—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated heated by hot air or gas
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/30—Details, accessories, or equipment peculiar to furnaces of these types
    • F27B9/36—Arrangements of heating devices
    • F27B2009/3623—Heaters located under the track

Abstract

PROBLEM TO BE SOLVED: To provide a rapid temperature rise area having a high temperature rise rate, in a calcination furnace where a processed object is moved to constant temperature areas by roller transportation, and while passing through each area having each setting temperature, the processed object is completely calcinated via temperature rising, holding and cooling steps.SOLUTION: A calcination furnace includes: a calcination furnace body 110 that has an inside passage 120 having a constant length from an inlet to an outlet; a transportation roller 130 that is provided at the central part of the inside passage so as to rotate in an outlet side direction by driving means; an upper heater 150 and a lower heater 160 that are respectively provided at the upper part and lower part of the inside passage; and partition walls that are provided so that the inside passage has boundaries for each section. In the calcination furnace, at least one of the partition walls is a thick wall part 250 made thicker than other partition walls.

Description

本発明は、焼成炉に関する。   The present invention relates to a firing furnace.

積層型セラミック電子部品の製造において、内部電極と誘電体は焼成時の焼成温度が異なる。金属である内部電極が低温領域で先に焼成され、その後、高温領域で誘電体が焼成される。   In the production of a multilayer ceramic electronic component, the firing temperature during firing differs between the internal electrode and the dielectric. The metal internal electrode is first fired in the low temperature region, and then the dielectric is fired in the high temperature region.

このように、内部電極と誘電体の焼成温度が異なるため、高温領域での内部電極の過度な焼成により、電極凝集等の不良が発生する。また、焼成時の内部電極（金属）／誘電体（セラミック）間の収縮率差によって応力が一箇所に集中して垂直クラック等の不良も発生する。   As described above, since the firing temperatures of the internal electrode and the dielectric are different, defects such as electrode aggregation occur due to excessive firing of the internal electrode in a high temperature region. In addition, due to the difference in shrinkage between the internal electrode (metal) / dielectric (ceramic) during firing, stress concentrates in one place, and defects such as vertical cracks also occur.

特に、高容量製品の製造のために超微粒粉末を適用するようになってから、このような問題がより多く発生している。   In particular, since the use of ultrafine powder for the production of high-capacity products, such a problem has occurred more frequently.

一方、従来の積層型セラミック電子部品の焼成炉は、焼成する積層型セラミック電子部品をローラー上に位置させて一定温度領域に移動させ、領域毎に温度が設定されている各領域を通過しながら、昇温、保持、冷却過程を経て焼成が完了する。   On the other hand, a conventional firing furnace for multilayer ceramic electronic components moves the multilayer ceramic electronic component to be fired to a certain temperature region by moving it on a roller, while passing through each region where the temperature is set for each region. The firing is completed through the temperature raising, holding and cooling processes.

この際、焼成炉内の昇温領域における昇温速度が低いほど、内部電極と誘電体は異なる温度領域で焼成され、電極凝集等の不良が発生する可能性が高くなる。しかし、従来の焼成炉は、発現可能な最大昇温速度が約３０℃／ｍｉｎと限定的であるため、電極凝集等の不良が発生するという問題があった。   At this time, the lower the rate of temperature rise in the temperature raising region in the firing furnace, the higher the possibility that the internal electrode and the dielectric are fired in different temperature regions and defects such as electrode aggregation occur. However, the conventional firing furnace has a problem that defects such as electrode aggregation occur because the maximum temperature increase rate that can be expressed is limited to about 30 ° C./min.

韓国公開特許第２０１１−０００３１６８号公報Korean Published Patent No. 2011-0003168

本発明の一実施形態の目的は、急速昇温により内部電極と誘電体の同時焼成を誘導し、電極凝集等の不良発生を防止する焼成炉を提供することである。   An object of one embodiment of the present invention is to provide a firing furnace that induces simultaneous firing of an internal electrode and a dielectric by rapid temperature rise and prevents occurrence of defects such as electrode aggregation.

上述した課題を解決すべく、本発明の一実施形態は、入口から出口まで一定長さの内部通路を有する焼成炉本体と、上記内部通路の中央部に駆動手段によって出口側方向に回転するように設けられる搬送ローラーと、上記内部通路の上部と下部にそれぞれ設けられる上部ヒーター及び下部ヒーターと、上記内部通路が区域別に境界を有するように設けられる隔壁と、を含み、上記隔壁のうち少なくとも一つの隔壁は、他の隔壁より厚い厚壁部である焼成炉を提供する。   In order to solve the above-described problems, an embodiment of the present invention is configured so that a firing furnace main body having an internal passage having a certain length from an inlet to an outlet, and rotating in the outlet side direction by a driving means at the center of the internal passage. A transport roller, an upper heater and a lower heater respectively provided at an upper part and a lower part of the internal passage, and a partition provided so that the internal passage has a boundary for each area, and at least one of the partitions One partition provides a firing furnace that is a thicker wall than the other partition.

上記厚壁部の厚さは５０ｍｍ〜１８０ｍｍであってもよく、厚壁部の領域は他の隔壁が設けられた領域に比べて、隔壁の前の領域から隔壁の後の領域への昇温速度が大きい急昇温領域である。   The thickness of the thick wall portion may be 50 mm to 180 mm, and the temperature of the thick wall portion is increased from the region before the partition to the region after the partition as compared with the region where the other partition is provided. This is a rapid temperature rise region where the speed is high.

本発明の一実施形態によると、急速昇温により内部電極と誘電体の同時焼成を容易にし、区域別の雰囲気条件を容易に制御して、電極凝集等の不良発生を防止することができる。   According to an embodiment of the present invention, simultaneous firing of the internal electrode and the dielectric can be facilitated by rapid temperature increase, and the atmospheric conditions for each region can be easily controlled to prevent occurrence of defects such as electrode aggregation.

本発明の一実施形態による焼成炉の構造を示した断面図である。It is sectional drawing which showed the structure of the baking furnace by one Embodiment of this invention. 本発明の他の一実施形態による焼成炉の概略的な構造を示した断面図である。It is sectional drawing which showed the schematic structure of the baking furnace by other one Embodiment of this invention. 本発明の一実施形態による厚壁部の厚さが５０ｍｍのときの昇温速度を説明するためのグラフである。It is a graph for demonstrating the temperature increase rate when the thickness of the thick wall part by one Embodiment of this invention is 50 mm. 本発明の一実施形態による厚壁部の厚さが１８０ｍｍのときの昇温速度を説明するためのグラフである。It is a graph for demonstrating the temperature increase rate when the thickness of the thick wall part by one Embodiment of this invention is 180 mm. 本発明の一実施形態による厚壁部の厚さが２００ｍｍのときの昇温速度を説明するためのグラフである。It is a graph for demonstrating the temperature increase rate when the thickness of the thick wall part by one Embodiment of this invention is 200 mm.

以下では、添付の図面を参照し、本発明の好ましい実施形態について説明する。しかし、本発明の実施形態は様々な他の形態に変形されることができ、本発明の範囲は以下で説明する実施形態に限定されない。また、本発明の実施形態は、当該技術分野で平均的な知識を有する者に本発明をより完全に説明するために提供されるものである。図面における要素の形状及び大きさなどはより明確な説明のために誇張されることがある。   Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings. However, the embodiments of the present invention can be modified in various other forms, and the scope of the present invention is not limited to the embodiments described below. In addition, the embodiments of the present invention are provided to more fully explain the present invention to those skilled in the art. The shape and size of elements in the drawings may be exaggerated for a clearer description.

焼成炉
図１は、本発明の一実施形態による焼成炉の構造を示した断面図である。 Firing Furnace FIG. 1 is a sectional view showing the structure of a firing furnace according to an embodiment of the present invention.

図１を参照すると、本発明の一実施形態による焼成炉には、入口から出口まで一定長さの内部通路１２０を有する焼成炉本体１１０と、上記内部通路１２０の中央部に駆動手段によって出口側方向に回転するように設けられる搬送ローラー１３０と、上記内部通路１２０の上部と下部にそれぞれ設けられる上部ヒーター１５０及び下部ヒーター１６０と、上記内部通路１２０が区域別に境界を有するように設けられる隔壁２１０、２２０と、が備えられる。   Referring to FIG. 1, a firing furnace according to an embodiment of the present invention includes a firing furnace main body 110 having an internal passage 120 having a certain length from an entrance to an exit, and an exit side by a driving unit at the center of the internal passage 120. A transport roller 130 provided to rotate in a direction, an upper heater 150 and a lower heater 160 provided respectively at an upper part and a lower part of the internal passage 120, and a partition wall 210 provided so that the internal passage 120 has a boundary for each area. , 220.

また、上記搬送ローラー１３０の上部に載置されて一定速度で出口側方向に移動するトレイ１４０と、内部通路１２０の内部に雰囲気ガスを供給するために焼成炉本体１１０の下部一側に貫通して設けられるガス供給部１７０と、上記ガス供給部１７０により内部通路１２０に供給された雰囲気ガスが外部に排出されるために焼成炉本体１１０の上部他側に貫通して設けられるガス排出部１８０と、が備えられる。   In addition, the tray 140 is placed on the transport roller 130 and moves toward the outlet side at a constant speed. The tray 140 penetrates to the lower side of the baking furnace main body 110 in order to supply atmospheric gas into the internal passage 120. The gas supply unit 170 provided to the inside of the internal passage 120 by the gas supply unit 170 and the gas discharge unit 180 provided through the other upper side of the firing furnace body 110 in order to be discharged to the outside. And are provided.

上記トレイ１４０に焼成製品が置かれた状態で上記トレイ１４０が搬送ローラー１３０によって出口側方向に移送されるとき、上記搬送ローラー１３０の上部及び下部にそれぞれ設けられている上部ヒーター１５０及び下部ヒーター１６０から供給される熱源と、焼成炉本体１１０の下部に貫通して設けられているガス供給部１７０を介して供給される雰囲気ガスによって焼成製品の焼成が行われる。   When the baked product is placed on the tray 140 and the tray 140 is transported by the transport roller 130 toward the outlet side, the upper heater 150 and the lower heater 160 provided on the upper and lower portions of the transport roller 130, respectively. The fired product is fired by the heat source supplied from the atmosphere and the atmospheric gas supplied through the gas supply unit 170 penetrating the lower part of the firing furnace main body 110.

上記ガス供給部１７０を通じて内部通路１２０の内部に供給された雰囲気ガスは、焼成炉本体１１０の上部他側に固設されているガス排出部１８０を介して焼成炉本体１１０の外部に排出される。   The atmospheric gas supplied to the inside of the internal passage 120 through the gas supply unit 170 is discharged to the outside of the firing furnace body 110 through a gas discharge part 180 fixed on the other upper side of the firing furnace body 110. .

このとき、トレイ１４０に置かれた焼成製品は、上記トレイ１４０が搬送ローラー１３０によって出口側方向に移動しながら、焼成炉内の温度や雰囲気条件の異なる領域を通過することにより、昇温段階、保持段階及び冷却段階を経るようになる。   At this time, the baked product placed on the tray 140 passes through regions having different temperatures and atmospheric conditions in the baking furnace while the tray 140 is moved in the outlet side direction by the transport roller 130, thereby raising the temperature, It goes through a holding stage and a cooling stage.

上記内部通路１２０の各区域の熱交換や雰囲気ガスの流れを制御して各区域別の内部温度及び雰囲気条件が異なるように制御するために、隔壁２１０、２２０が垂直に複数連続して配置される。   In order to control the heat exchange and the flow of atmospheric gas in each area of the internal passage 120 so as to control the internal temperature and atmospheric conditions in each area to be different, a plurality of partition walls 210 and 220 are arranged in succession vertically. The

上記隔壁２１０、２２０は、焼成製品が内部温度や雰囲気条件の異なる段階に搬送される際、前段階の内部通路の空気が焼成製品が搬送された後の段階の内部通路に伝達されないようにするセパレータ（Ｓｅｐａｒａｔｏｒ）の役割を担う。   The partition walls 210 and 220 prevent the air in the internal passage in the previous stage from being transmitted to the internal passage in the stage after the fired product is transported when the fired product is transported to a stage having different internal temperature and atmospheric conditions. It plays the role of a separator.

上記隔壁２１０、２２０は、各区域の熱交換や雰囲気ガスの流れを制御することができるものであれば特に制限されず、例えば、ジルコニア−アルミナ複合体からなってもよい。   The partition walls 210 and 220 are not particularly limited as long as they can control heat exchange and atmospheric gas flow in each zone, and may be made of, for example, a zirconia-alumina composite.

上記隔壁は、内部通路１２０の上部に設けられる上部隔壁２１０と、内部通路１２０の下部に設けられる下部隔壁２２０と、を含む。   The partition includes an upper partition 210 provided at an upper portion of the internal passage 120 and a lower partition 220 provided at a lower portion of the internal passage 120.

上記上部隔壁２１０及び下部隔壁２２０は、一定間隔離隔して設けられる。   The upper partition wall 210 and the lower partition wall 220 are spaced apart from each other.

上記上部隔壁２１０と下部隔壁２２０の間の空間に、搬送ローラー１３０によってトレイ１４０が移動しながらトレイ１４０に置かれた焼成製品が搬送される。   The fired product placed on the tray 140 is transported to the space between the upper partition wall 210 and the lower partition wall 220 while the tray 140 is moved by the transport roller 130.

図２は、本発明の他の一実施形態による焼成炉の概略的な構造を示した断面図である。   FIG. 2 is a cross-sectional view illustrating a schematic structure of a firing furnace according to another embodiment of the present invention.

図２を参照すると、上記上部隔壁２１０と下部隔壁２２０の間隔をＤｗとすると、本発明の一実施形態は、上記Ｄｗが３０ｍｍ以下を満たすように上部隔壁２１０と下部隔壁２２０が備えられる。   Referring to FIG. 2, if the distance between the upper partition wall 210 and the lower partition wall 220 is Dw, an embodiment of the present invention includes the upper partition wall 210 and the lower partition wall 220 so that the Dw satisfies 30 mm or less.

上部隔壁２１０と下部隔壁２２０の間隔Ｄｗが３０ｍｍ以下に備えられることにより、各区域別の温度及び雰囲気をより効果的に制御することができる。   By providing the distance Dw between the upper partition wall 210 and the lower partition wall 220 to be 30 mm or less, the temperature and atmosphere for each area can be controlled more effectively.

各区域別の温度及び雰囲気を制御しながら、搬送ローラー１３０によりトレイ１４０が移動する空間を確保しなければならないため、上部隔壁２１０と下部隔壁２２０の間隔Ｄｗは、２０ｍｍ〜３０ｍｍであることがより好ましい。   Since the space for moving the tray 140 must be secured by the transport roller 130 while controlling the temperature and atmosphere for each area, the distance Dw between the upper partition wall 210 and the lower partition wall 220 is preferably 20 mm to 30 mm. preferable.

上記焼成炉により焼成製品を焼成するとき、昇温段階に該当する区域では、内部温度を上昇させるために、その前段階の区域より高い熱を加える。   When the baked product is baked in the baking furnace, in the zone corresponding to the temperature rising stage, heat higher than that in the previous stage is applied in order to increase the internal temperature.

この際、昇温段階に該当する区域に備えられた隔壁を前後にして温度上昇が起き、昇温速度が低いと、内部電極と誘電体は異なる温度領域で焼成が起きてしまい、電極凝集等の不良が発生する可能性が高くなる。   At this time, the temperature rises before and after the partition provided in the area corresponding to the temperature rising stage, and if the temperature rising rate is low, the internal electrode and the dielectric are baked in different temperature regions, and the electrode aggregation, etc. There is a high possibility that defects will occur.

そこで、本発明の一実施形態は、上記隔壁のうち昇温段階に該当する区域に備えられた隔壁を、他の隔壁２１０、２２０より厚い厚壁部２５０にした。   Therefore, according to an embodiment of the present invention, the partition wall provided in the area corresponding to the temperature rising stage among the partition walls is a thick wall portion 250 thicker than the other partition walls 210 and 220.

上記厚壁部２５０が設けられた領域は、他の隔壁２１０、２２０が設けられた領域に比べて、隔壁の前の領域から隔壁の後の領域への昇温速度が大きい急昇温領域Ｙとなる。   The region where the thick wall portion 250 is provided is a rapid temperature increase region Y where the rate of temperature increase from the region before the partition to the region after the partition is higher than the region where the other partitions 210 and 220 are provided. It becomes.

即ち、本発明の一実施形態は、他の隔壁２１０、２２０より厚い厚壁部２５０を備えることにより、急昇温が可能となり、急昇温を通じて内部電極と誘電体を同時に焼成させることができる。そのため、電極凝集等の不良発生を防止することができる。   That is, according to the embodiment of the present invention, the thick wall portion 250 thicker than the other partition walls 210 and 220 is provided, so that the temperature can be rapidly increased, and the internal electrode and the dielectric can be simultaneously fired through the rapid temperature increase. . Therefore, occurrence of defects such as electrode aggregation can be prevented.

上記厚壁部２５０は、他の隔壁２１０、２２０と同様に、ジルコニア−アルミナ複合体からなることができる。   The thick wall portion 250 can be made of a zirconia-alumina composite, like the other partition walls 210 and 220.

上記厚壁部２５０は、対向する少なくとも一対の上部厚壁部２５１と下部厚壁部２５２を含む。   The thick wall portion 250 includes at least a pair of an upper thick wall portion 251 and a lower thick wall portion 252 that face each other.

昇温段階に該当する区域に備えられた対向する上部隔壁及び下部隔壁をともに、他の隔壁２１０、２２０より厚くして、対向する一対の上部厚壁部２５１及び下部厚壁部２５２にする。   The opposing upper partition wall and lower partition wall provided in the region corresponding to the temperature rising stage are both thicker than the other partition walls 210 and 220 to form a pair of upper thick wall portion 251 and lower thick wall portion 252 facing each other.

対向する一対の上部厚壁部２５１及び下部厚壁部２５２を備えることにより、急昇温をより効果的に具現することができる。   By providing the pair of opposed upper thick wall portions 251 and lower thick wall portions 252, rapid temperature rise can be more effectively realized.

上記厚壁部２５０の厚さは５０ｍｍ以上であってもよい。   The thick wall portion 250 may have a thickness of 50 mm or more.

厚壁部２５０の厚さを５０ｍｍ以上にすることで、昇温速度を向上させて急昇温領域を具現することができ、これにより、内部電極と誘電体の同時焼成を誘導し、電極凝集等の不良発生を防止することができる。   By increasing the thickness of the thick wall portion 250 to 50 mm or more, it is possible to realize a rapid temperature increase region by increasing the temperature increase rate, thereby inducing simultaneous firing of the internal electrode and the dielectric, and electrode aggregation The occurrence of defects such as these can be prevented.

図３は、本発明の一実施形態による厚壁部の厚さが５０ｍｍのときの昇温速度を説明するためのグラフである。   FIG. 3 is a graph for explaining the rate of temperature increase when the thickness of the thick wall portion is 50 mm according to an embodiment of the present invention.

図３を参照すると、厚壁部Ｉの厚さが５０ｍｍの場合であり、厚壁部Ｉの前の区域の設定温度は７００℃で、上記厚壁部Ｉの後の区域の設定温度は１２００℃である。   Referring to FIG. 3, when the thickness of the thick wall portion I is 50 mm, the set temperature in the area before the thick wall portion I is 700 ° C., and the set temperature in the area after the thick wall portion I is 1200 ° C. ° C.

上記厚壁部Ｉを前後にして温度上昇が起きるが、図３の場合は、Ａ地点とＢ地点の間から昇温が始まる。   Although the temperature rises before and after the thick wall portion I, in the case of FIG. 3, the temperature rise starts between the points A and B.

厚壁部Ｉを通りながら継続的に昇温し、Ｄ地点を過ぎた地点で厚壁部Ｉの後の区域の設定温度である１２００℃となり、昇温が終了する。   The temperature rises continuously while passing through the thick wall portion I, reaches 1200 ° C., which is the set temperature of the area after the thick wall portion I, at a point past the point D, and the temperature rise ends.

このとき、測定される昇温速度は、約３５０℃／ｍｉｎである。   At this time, the measured temperature increase rate is about 350 ° C./min.

図４は、本発明の一実施形態による厚壁部の厚さが１８０ｍｍのときの昇温速度を説明するためのグラフである。   FIG. 4 is a graph for explaining the rate of temperature increase when the thickness of the thick wall portion is 180 mm according to an embodiment of the present invention.

図４を参照すると、厚壁部IIの厚さが１８０ｍｍの場合であり、図３と同様に、厚壁部IIの前の区域の設定温度は７００℃で、上記厚壁部IIの後の区域の設定温度は１２００℃である。   Referring to FIG. 4, the thickness of the thick wall portion II is 180 mm. Similarly to FIG. 3, the set temperature in the area before the thick wall portion II is 700 ° C. The set temperature of the zone is 1200 ° C.

上記厚壁部IIを前後にして温度上昇が起きるが、図４の場合は、Ａ地点を過ぎてＢ地点から昇温が始まる。   Although the temperature rises before and after the thick wall portion II, in the case of FIG. 4, the temperature rise starts from the point B past the point A.

図３と同様に、厚壁部IIを通りながら継続的に昇温し、Ｄ地点を過ぎた地点で厚壁部IIの後の区域の設定温度である１２００℃となり、昇温が終了する。   As in FIG. 3, the temperature is continuously increased while passing through the thick wall portion II, and reaches a set temperature of 1200 ° C. in the area after the thick wall portion II at a point past the point D, and the temperature increase ends.

厚さが５０ｍｍの厚壁部Ｉに比べて、厚さが１８０ｍｍの厚壁部IIの場合、厚壁部とより隣接する地点から昇温が始まり、同一地点で昇温が終了するため、厚さが１８０ｍｍとより厚い厚壁部IIのときに昇温速度がさらに向上する。   In the case of the thick wall part II having a thickness of 180 mm as compared with the thick wall part I having a thickness of 50 mm, the temperature rise starts from a point more adjacent to the thick wall part, and the temperature rise ends at the same point. When the thickness is 180 mm and the thicker wall portion II, the rate of temperature rise is further improved.

厚さが１８０ｍｍの厚壁部IIのときに測定される昇温速度は、約５００℃／ｍｉｎである。   The heating rate measured when the thickness of the thick wall part II is 180 mm is about 500 ° C./min.

図５は、本発明の一実施形態による厚壁部の厚さが２００ｍｍのときの昇温速度を説明するためのグラフである。   FIG. 5 is a graph for explaining the rate of temperature increase when the thickness of the thick wall portion is 200 mm according to an embodiment of the present invention.

図５を参照すると、厚壁部IIIの厚さが２００ｍｍの場合であり、図３と同様に、厚壁部IIIの前の区域の設定温度は７００℃で、上記厚壁部IIIの後の区域の設定温度は１２００℃である。   Referring to FIG. 5, the thickness of the thick wall portion III is 200 mm. Similarly to FIG. 3, the set temperature in the area before the thick wall portion III is 700 ° C. The set temperature of the zone is 1200 ° C.

図５の場合、図３及び図４と同様に、Ｄ地点を過ぎた地点で厚壁部IIIの後の区域の設定温度である１２００℃となり、昇温が終了する。   In the case of FIG. 5, similarly to FIGS. 3 and 4, the temperature reaches 1200 ° C., which is the set temperature in the area after the thick wall portion III, at the point after the point D, and the temperature rise ends.

しかし、厚壁部IIIの前のＢ地点からはむしろ温度が下降し、厚壁部IIIを通る領域でも温度降下が起きる。   However, the temperature rather decreases from the point B in front of the thick wall part III, and a temperature drop also occurs in a region passing through the thick wall part III.

この場合、厚壁部IIIの前後の昇温速度を測定すると、昇温速度は向上するが、厚壁部IIIの前のＢ地点から厚壁部IIIを通りながら温度降下が発生するため、焼成には適さない。   In this case, if the temperature increase rate before and after the thick wall part III is measured, the temperature increase rate is improved, but a temperature drop occurs from the point B before the thick wall part III through the thick wall part III. Not suitable for.

即ち、本発明の一実施形態による厚壁部２５０の厚さは、５０ｍｍ〜１８０ｍｍであることがより好ましい。   That is, the thickness of the thick wall portion 250 according to an embodiment of the present invention is more preferably 50 mm to 180 mm.

厚壁部２５０の厚さが５０ｍｍ未満では、昇温速度が低くて、内部電極と誘電体が異なる温度領域で焼成され、電極凝集等の不良が発生する可能性が高くなり、厚壁部２５０の厚さが１８０ｍｍを超えると、厚すぎる厚壁部のために温度下降区間が発生して好ましくない。   When the thickness of the thick wall portion 250 is less than 50 mm, the rate of temperature rise is low, and the internal electrode and the dielectric are fired in different temperature regions, and there is a high possibility that defects such as electrode aggregation occur. If the thickness exceeds 180 mm, a temperature drop section is generated due to an excessively thick wall portion, which is not preferable.

対向する一対の上部厚壁部２５１及び下部厚壁部２５２の厚さはともに５０ｍｍ以上であってもよいが、上部厚壁部２５１及び下部厚壁部２５２の厚さはともに５０ｍｍ〜１８０ｍｍであることがより好ましい。   The thickness of the pair of opposing upper thick wall portion 251 and lower thick wall portion 252 may be 50 mm or more, but the thickness of the upper thick wall portion 251 and the lower thick wall portion 252 are both 50 mm to 180 mm. It is more preferable.

上記厚壁部２５０が設けられた急昇温領域Ｙは、昇温速度が３５０℃／ｍｉｎ以上であることができる。   The rapid temperature increase region Y provided with the thick wall portion 250 may have a temperature increase rate of 350 ° C./min or more.

昇温速度が３５０℃／ｍｉｎ以上に向上することにより、内部電極と誘電体の同時焼成を誘導し、電極凝集等の不良発生を防止することができる。   By increasing the rate of temperature increase to 350 ° C./min or more, simultaneous firing of the internal electrode and the dielectric can be induced, and occurrence of defects such as electrode aggregation can be prevented.

下表１は、昇温速度の向上による内部電極の連結性を観察した結果である。   Table 1 below shows the results of observing the connectivity of the internal electrodes by increasing the temperature rising rate.

焼成製品のサイズ毎に昇温速度による内部電極の連結性を観察し、昇温速度が３０℃／ｍｉｎのときを基準に内部電極の連結性の向上程度を示した。   The connectivity of the internal electrodes due to the heating rate was observed for each size of the baked product, and the degree of improvement in the connectivity of the internal electrodes was shown based on the temperature rising rate of 30 ° C./min.

Figure 2015210072
Figure 2015210072

昇温速度による内部電極の連結性を観察した結果、昇温速度が低いほど、電極の連結性が低下し、昇温速度が３５０℃／ｍｉｎ以上に向上した場合、電極の連結性が約２．０％〜５．０％向上した。   As a result of observing the connectivity of the internal electrode by the temperature rising rate, the lower the temperature rising rate, the lower the electrode connectivity, and when the temperature rising rate is improved to 350 ° C./min or more, the electrode connectivity is about 2 Improved by 0.0% to 5.0%.

以上、本発明の実施形態について詳細に説明したが、本発明の権利範囲はこれに限定されず、請求の範囲に記載された本発明の技術的思想から外れない範囲内で多様な修正及び変形が可能であるということは、当技術分野の通常の知識を有する者には明らかである。   The embodiment of the present invention has been described in detail above, but the scope of the present invention is not limited to this, and various modifications and variations can be made without departing from the technical idea of the present invention described in the claims. It will be apparent to those having ordinary knowledge in the art.

１１０ 焼成炉本体
１２０ 内部通路
１３０ 搬送ローラー
１４０ トレイ
１５０ 上部ヒーター
１６０ 下部ヒーター
１７０ ガス供給部
１８０ ガス排出部
２１０ 上部隔壁
２２０ 下部隔壁
２５０ 厚壁部
２５１ 上部厚壁部
２５２ 下部厚壁部
Ｙ 急昇温領域 110 Baking furnace body 120 Internal passage 130 Transport roller 140 Tray 150 Upper heater 160 Lower heater 170 Gas supply part 180 Gas discharge part 210 Upper partition 220 Lower partition 250 Thick wall part 251 Upper thick wall part 252 Lower thick wall part Y Rapid heating region

Claims (18)

入口から出口まで一定長さの内部通路を有する焼成炉本体と、
前記内部通路の中央部に駆動手段によって出口側方向に回転するように設けられる搬送ローラーと、
前記内部通路の上部と下部にそれぞれ設けられる上部ヒーター及び下部ヒーターと、
前記内部通路が区域別に境界を有するように設けられる隔壁と、を備え、
前記隔壁のうち少なくとも一つの隔壁は、他の隔壁より厚い厚壁部である焼成炉。 A firing furnace body having an internal passage of a certain length from the inlet to the outlet;
A transport roller provided at the center of the internal passage so as to rotate in the direction of the outlet side by a driving means;
An upper heater and a lower heater provided respectively in the upper part and the lower part of the internal passage;
A partition provided so that the internal passage has a boundary for each area, and
A firing furnace in which at least one of the partition walls is a thick wall portion thicker than the other partition walls. 前記厚壁部の厚さが５０ｍｍ以上である、請求項１に記載の焼成炉。   The firing furnace according to claim 1, wherein the thick wall portion has a thickness of 50 mm or more. 前記厚壁部の厚さが５０ｍｍ〜１８０ｍｍである、請求項１に記載の焼成炉。   The firing furnace according to claim 1, wherein the thick wall portion has a thickness of 50 mm to 180 mm. 前記隔壁は、前記内部通路の上部に設けられる上部隔壁と前記内部通路の下部に設けられる下部隔壁を含む、請求項１に記載の焼成炉。   The firing furnace according to claim 1, wherein the partition includes an upper partition provided at an upper portion of the internal passage and a lower partition provided at a lower portion of the internal passage. 前記上部隔壁と下部隔壁は、３０ｍｍ以下の間隔を置いて離隔して設けられる、請求項４に記載の焼成炉。   The firing furnace according to claim 4, wherein the upper partition wall and the lower partition wall are provided to be spaced apart with an interval of 30 mm or less. 前記厚壁部は、対向する少なくとも一対の上部厚壁部と下部厚壁部を含む、請求項１に記載の焼成炉。   The firing furnace according to claim 1, wherein the thick wall portion includes at least a pair of an upper thick wall portion and a lower thick wall portion facing each other. 前記上部厚壁部及び下部厚壁部の厚さはともに５０ｍｍ以上である、請求項６に記載の焼成炉。   The firing furnace according to claim 6, wherein the upper thick wall portion and the lower thick wall portion both have a thickness of 50 mm or more. 前記厚壁部が設けられた領域は、他の隔壁が設けられた領域に比べて、隔壁の前の領域から隔壁の後の領域への昇温速度が大きい急昇温領域である、請求項１に記載の焼成炉。   The region where the thick wall portion is provided is a rapid temperature increase region where the rate of temperature increase from the region before the partition to the region after the partition is larger than the region where the other partition is provided. The firing furnace according to 1. 前記急昇温領域は、昇温速度が３５０℃／ｍｉｎ以上である、請求項８に記載の焼成炉。   The firing furnace according to claim 8, wherein the rapid temperature increase region has a temperature increase rate of 350 ° C./min or more. 前記隔壁は、前記内部通路の各区域の温度と雰囲気条件が異なるように制御するようにする、請求項１に記載の焼成炉。   The firing furnace according to claim 1, wherein the partition wall is controlled so that a temperature and an atmospheric condition of each section of the internal passage are different. 前記隔壁はジルコニア−アルミナ複合体からなる、請求項１に記載の焼成炉。   The firing furnace according to claim 1, wherein the partition wall is made of a zirconia-alumina composite. 入口から出口まで一定長さの内部通路を有する焼成炉本体と、
前記内部通路の中央部に駆動手段によって出口側方向に回転するように設けられる搬送ローラーと、
前記内部通路の上部と下部にそれぞれ設けられる上部ヒーター及び下部ヒーターと、
前記内部通路が区域別に境界を有するように設けられる隔壁と、を備え、
前記隔壁のうち少なくとも一つの隔壁が設けられた領域は、他の隔壁が設けられた領域に比べて、隔壁の前の領域から隔壁の後の領域への昇温速度が大きい急昇温領域である焼成炉。 A firing furnace body having an internal passage of a certain length from the inlet to the outlet;
A transport roller provided at the center of the internal passage so as to rotate in the direction of the outlet side by a driving means;
An upper heater and a lower heater provided respectively in the upper part and the lower part of the internal passage;
A partition provided so that the internal passage has a boundary for each area, and
The region provided with at least one of the partition walls is a rapid heating region where the rate of temperature increase from the region before the partition to the region after the partition is higher than the region provided with the other partition. There is a firing furnace. 前記急昇温領域は昇温速度が３５０℃／ｍｉｎ以上である、請求項１２に記載の焼成炉。   The firing furnace according to claim 12, wherein the rapid temperature increase region has a temperature increase rate of 350 ° C./min or more. 前記急昇温領域に設けられた隔壁は、厚さが５０ｍｍ〜２００ｍｍである、請求項１２に記載の焼成炉。   The firing furnace according to claim 12, wherein the partition wall provided in the rapid temperature rising region has a thickness of 50 mm to 200 mm. 前記隔壁は、前記内部通路の上部に設けられる上部隔壁と前記内部通路の下部に設けられる下部隔壁を含む、請求項１２に記載の焼成炉。   The firing furnace according to claim 12, wherein the partition includes an upper partition provided at an upper portion of the internal passage and a lower partition provided at a lower portion of the internal passage. 前記上部隔壁と下部隔壁は、３０ｍｍ以下の間隔を置いて離隔して設けられる、請求項１２に記載の焼成炉。   The firing furnace according to claim 12, wherein the upper partition wall and the lower partition wall are provided to be spaced apart with an interval of 30 mm or less. 前記急昇温領域は対向する少なくとも一対の上部厚壁部と下部厚壁部を含み、前記上部厚壁部及び下部厚壁部の厚さはともに５０ｍｍ以上である、請求項１２に記載の焼成炉。   The firing according to claim 12, wherein the rapid temperature rising region includes at least a pair of an upper thick wall portion and a lower thick wall portion facing each other, and the thicknesses of the upper thick wall portion and the lower thick wall portion are both 50 mm or more. Furnace. 前記隔壁はジルコニア−アルミナ複合体からなる、請求項１２に記載の焼成炉。   The firing furnace according to claim 12, wherein the partition wall is made of a zirconia-alumina composite.
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