JP2012103269A - 位置計測方法、位置制御方法、計測方法、ロード方法、露光方法及び露光装置、並びにデバイス製造方法 - Google Patents
位置計測方法、位置制御方法、計測方法、ロード方法、露光方法及び露光装置、並びにデバイス製造方法 Download PDFInfo
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Abstract
【解決手段】 所定形状のプレート50が着脱可能に搭載された移動体WSTの位置をその移動座標系を規定する計測装置18等で計測しつつ、プレート50の一部をアライメント系ALGで検出するとともにその検出結果と対応する前記計測装置の計測結果とに基づいてプレート50の外周エッジの位置情報を取得する。このため、その移動体WST上に位置計測用のマーク(基準マーク)などが存在しなくても、プレートの外周エッジの位置情報に基づいて、プレートの位置、すなわち移動体の位置を前記計測装置で規定される移動座標系上で管理することが可能になる。
【選択図】図1
Description
a.最小領域中心法(MZC):開口の輪郭を2つの同心円ではさんだ時、同心円の半径差が最小になる中心、b.最小二乗中心法(LSC):最小二乗平均円(基準円からの偏差の二乗和が最小となる円)の中心、c.最小外接円中心法(MCC):開口の輪郭に最小で外接する円の中心、d.最大内接円中心法(MIC):開口の輪郭に最大で内接する円の中心。
Claims (28)
- 移動体上に着脱可能に搭載された所定形状のプレートの位置情報を計測する位置計測方法であって、
前記移動体の位置をその移動座標系を規定する計測装置で計測しつつ、前記プレートの一部を検出するとともにその検出結果と対応する前記計測装置の計測結果とに基づいて前記プレートの外周エッジの位置情報を取得する外周エッジ位置取得工程を含む位置計測方法。 - 請求項1に記載の位置計測方法において、
前記外周エッジ位置取得工程は、前記プレートの外周エッジ及び該外周エッジとの位置関係が既知の前記プレート上の目印の少なくとも一方を撮像する撮像工程と、前記撮像結果に基づいて画像処理の手法により前記外周エッジの位置情報を取得する画像処理工程とを含むことを特徴とする位置計測方法。 - 請求項2に記載の位置計測方法において、
前記撮像工程では、前記プレートの複数箇所で前記外周エッジ及び前記目印の少なくとも一方を撮像することを特徴とする位置計測方法。 - 請求項3に記載の位置計測方法において、
前記撮像工程では、前記プレートの中心に関して対称な少なくとも2箇所を含む複数箇所で前記外周エッジ及び前記目印の少なくとも一方を撮像することを特徴とする位置計測方法。 - 請求項3に記載の位置計測方法において、
前記プレートの外周は矩形であり、
前記撮像工程では、前記矩形のプレートの一側の外周エッジの1箇所と、その外周エッジと相対する他側の外周エッジの1箇所とを含む前記外周エッジの複数箇所を撮像することを特徴とする位置計測方法。 - プレートが着脱可能に搭載された移動体の位置を制御する位置制御方法であって、
請求項1〜5のいずれか一項に記載の位置計測方法を用いて計測された前記プレートの外周エッジの位置情報に基づいて、前記移動体の位置を制御することを特徴とする位置制御方法。 - 請求項6に記載の位置制御方法を用いる露光装置。
- 請求項7に記載の露光装置を用いるリソグラフィ工程を含むデバイス製造方法。
- 移動体上に着脱可能に搭載され、物体を載置するための開口が形成されたプレートに関する情報を計測する計測方法であって、
前記プレートの一部を検出し、その検出結果に基づいて前記開口の内周エッジの位置情報を取得する内周エッジ位置取得工程を含む計測方法。 - 請求項9に記載の計測方法において、
前記内周エッジの位置情報に基づいて前記開口の位置を算出する位置算出工程をさらに含む計測方法。 - 請求項9に記載の計測方法において、
前記内周エッジ位置取得工程は、前記プレートの前記開口の内周エッジ及び該内周エッジとの位置関係が既知の前記プレート上の目印の少なくとも一方を撮像する撮像工程と、前記撮像結果に基づいて画像処理の手法により前記内周エッジの位置情報を取得する画像処理工程とを含むことを特徴とする計測方法。 - 請求項11に記載の計測方法において、
前記撮像工程では、前記開口の中心に関してほぼ対称な少なくとも2箇所を含む複数箇所で前記内周エッジ及び前記目印の少なくとも一方を撮像することを特徴とする計測方法。 - 物体を載置するための開口を有するプレートが着脱可能に搭載された移動体上に物体をロードするロード方法において、
請求項9〜12のいずれか一項に記載の計測方法を用いて取得された前記プレートの開口の内周エッジの位置情報に基づいて、前記物体を前記移動体上の前記プレートの開口内にロードすることを特徴とするロード方法。 - 請求項13に記載のロード方法において、
前記物体の外周エッジと前記開口の内周エッジとが接触しないように、且つ前記物体の外周エッジと前記開口の内周エッジとの間隔が所定値より小さくなるように、前記プレートの開口の内周エッジの位置情報に基づいて、前記物体を前記移動体上の前記プレートの開口内にロードすることを特徴とするロード方法。 - 物体を露光する露光方法であって、
請求項13に記載のロード方法を用いて、前記移動体上の前記プレートの開口内に前記物体をロードする工程と、
前記移動体上にロードされた前記物体に露光ビームを照射する工程と、
を含む露光方法。 - 請求項15に記載の露光方法を用いるリソグラフィ工程を含むデバイス製造方法。
- 物体上に露光ビームを照射する露光装置であって、
所定形状のプレートが着脱可能に搭載された第1ステージと、
前記第1ステージの位置を計測する位置計測系と、
前記第1ステージの一部を検出可能な検出装置と、
前記第1ステージの位置を前記位置計測系を用いて計測しつつ、前記検出装置を用いて前記プレートの一部を検出するとともに、その検出結果と対応する前記位置計測系の計測結果とに基づいて前記プレートの外周エッジの位置情報を取得する外周エッジ位置取得装置と、を備える露光装置。 - 請求項17に記載の露光装置において、
前記第1ステージは、前記物体を保持する露光ステージを含み、
前記プレートの表面は、前記露光ステージに保持された物体の表面とほぼ面一であることを特徴とする露光装置。 - 請求項17に記載の露光装置において、
前記第1ステージは、少なくとも一つの計測部材を有する計測ステージを含むことを特徴とする露光装置。 - 請求項17に記載の露光装置において、
前記第1ステージとは独立に移動可能な第2ステージと、
前記第1ステージに搭載されたプレートの外周エッジが前記第2ステージと衝突しないように、前記外周エッジの位置情報に基づいて前記第1ステージの位置と前記第2ステージの位置との少なくとも一方を制御する制御装置と、
をさらに備える露光装置。 - 請求項20に記載の露光装置において、
前記制御装置は、前記位置計測系の計測結果と前記外周エッジの位置情報とに基づいて、前記第1ステージの位置を制御することを特徴とする露光装置。 - 請求項17に記載の露光装置において、
前記第1ステージ上に液体を供給して液浸領域を形成するための液浸機構をさらに備え、
前記液浸機構によって供給される液体を介して前記物体に露光ビームが照射され、
前記プレートによって、前記第1ステージの上面に撥液面が形成されることを特徴とする露光装置。 - 物体上に露光ビームを照射する露光装置であって、
開口が形成された所定形状のプレートが搭載され、前記開口内に物体が載置される露光ステージと、
前記露光ステージの位置を計測する位置計測系と、
前記露光ステージの一部を検出可能な検出装置と、
前記露光ステージの位置を前記位置計測系を用いて計測しつつ、前記検出装置を用いて前記プレートの一部を検出するとともに、その検出結果と対応する前記位置計測系の計測結果とに基づいて前記開口の内周エッジの位置情報を取得する内周エッジ位置取得装置と、を備える露光装置。 - 請求項23に記載の露光装置において、
前記内周エッジの位置情報に基づいて、前記位置計測系によって規定される座標系と前記開口との位置関係を決定する決定装置を、更に備える露光装置。 - 請求項23に記載の露光装置において、
前記露光ステージに物体を搬送する搬送系と、
前記搬送系により前記露光ステージに物体を搬送するときに、前記内周エッジの位置情報に基づいて、前記露光ステージと前記搬送系の少なくとも一方を制御するステージ制御装置と、をさらに備える露光装置。 - 請求項25に記載の露光装置において、
前記ステージ制御装置は、前記開口の内周エッジと前記物体の外周エッジとが接触しないように、且つ前記開口の内周エッジと前記物体の外周エッジとの間隔が所定の値より小さくなるように、前記露光ステージと前記搬送系との少なくとも一方を制御することを特徴とする露光装置。 - 請求項23に記載の露光装置において、
前記露光ステージ上に載置された物体の表面と、前記露光ステージに搭載されたプレートの表面とはほぼ面一であることを特徴とする露光装置。 - 請求項17〜27のいずれか一項に記載の露光装置を用いるリソグラフィ工程を含むデバイス製造方法。
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