JP2009521598A5 - - Google Patents
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- JP2009521598A5 JP2009521598A5 JP2008547524A JP2008547524A JP2009521598A5 JP 2009521598 A5 JP2009521598 A5 JP 2009521598A5 JP 2008547524 A JP2008547524 A JP 2008547524A JP 2008547524 A JP2008547524 A JP 2008547524A JP 2009521598 A5 JP2009521598 A5 JP 2009521598A5
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- oxide
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- nanoparticle
- nanoparticles
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- 239000000203 mixture Substances 0.000 claims description 31
- 239000000758 substrate Substances 0.000 claims description 4
- 239000002082 metal nanoparticle Substances 0.000 claims 19
- 239000002105 nanoparticle Substances 0.000 claims 11
- 230000027455 binding Effects 0.000 claims 9
- 239000003446 ligand Substances 0.000 claims 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 8
- 229910052751 metal Inorganic materials 0.000 claims 8
- 239000002184 metal Substances 0.000 claims 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 8
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims 8
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims 8
- CXKCTMHTOKXKQT-UHFFFAOYSA-N Cadmium oxide Chemical compound [Cd]=O CXKCTMHTOKXKQT-UHFFFAOYSA-N 0.000 claims 6
- NDVLTYZPCACLMA-UHFFFAOYSA-N Silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 claims 6
- 229910052802 copper Inorganic materials 0.000 claims 6
- 239000010949 copper Substances 0.000 claims 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 6
- 125000005842 heteroatoms Chemical group 0.000 claims 6
- 150000003839 salts Chemical class 0.000 claims 6
- 239000011780 sodium chloride Substances 0.000 claims 6
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims 6
- 238000000151 deposition Methods 0.000 claims 5
- 239000005092 Ruthenium Substances 0.000 claims 4
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 claims 4
- 229910052793 cadmium Inorganic materials 0.000 claims 4
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims 4
- 229910052803 cobalt Inorganic materials 0.000 claims 4
- 239000010941 cobalt Substances 0.000 claims 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 4
- 229910052737 gold Inorganic materials 0.000 claims 4
- 239000010931 gold Substances 0.000 claims 4
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims 4
- 229910052738 indium Inorganic materials 0.000 claims 4
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims 4
- 229910052741 iridium Inorganic materials 0.000 claims 4
- 229910052742 iron Inorganic materials 0.000 claims 4
- 229910052759 nickel Inorganic materials 0.000 claims 4
- 229910052762 osmium Inorganic materials 0.000 claims 4
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 claims 4
- 229910052763 palladium Inorganic materials 0.000 claims 4
- 229910052697 platinum Inorganic materials 0.000 claims 4
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims 4
- 229910052703 rhodium Inorganic materials 0.000 claims 4
- 239000010948 rhodium Substances 0.000 claims 4
- KJTLSVCANCCWHF-UHFFFAOYSA-N ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims 4
- 229910052707 ruthenium Inorganic materials 0.000 claims 4
- 229910052709 silver Inorganic materials 0.000 claims 4
- 239000004332 silver Substances 0.000 claims 4
- BQCADISMDOOEFD-UHFFFAOYSA-N silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims 4
- 229910052725 zinc Inorganic materials 0.000 claims 4
- 239000011701 zinc Substances 0.000 claims 4
- LBFUKZWYPLNNJC-UHFFFAOYSA-N Cobalt(II,III) oxide Chemical compound [Co]=O.O=[Co]O[Co]=O LBFUKZWYPLNNJC-UHFFFAOYSA-N 0.000 claims 3
- PJXISJQVUVHSOJ-UHFFFAOYSA-N Indium(III) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims 3
- JQPTYAILLJKUCY-UHFFFAOYSA-N Palladium(II) oxide Chemical compound [O-2].[Pd+2] JQPTYAILLJKUCY-UHFFFAOYSA-N 0.000 claims 3
- VUVGYHUDAICLFK-UHFFFAOYSA-N Perosmic oxide Chemical compound O=[Os](=O)(=O)=O VUVGYHUDAICLFK-UHFFFAOYSA-N 0.000 claims 3
- KZNMRPQBBZBTSW-UHFFFAOYSA-N [Au]=O Chemical compound [Au]=O KZNMRPQBBZBTSW-UHFFFAOYSA-N 0.000 claims 3
- YJZATOSJMRIRIW-UHFFFAOYSA-N [Ir]=O Chemical compound [Ir]=O YJZATOSJMRIRIW-UHFFFAOYSA-N 0.000 claims 3
- ROZSPJBPUVWBHW-UHFFFAOYSA-N [Ru]=O Chemical compound [Ru]=O ROZSPJBPUVWBHW-UHFFFAOYSA-N 0.000 claims 3
- 239000003125 aqueous solvent Substances 0.000 claims 3
- 229910000428 cobalt oxide Inorganic materials 0.000 claims 3
- 239000006185 dispersion Substances 0.000 claims 3
- 229910001922 gold oxide Inorganic materials 0.000 claims 3
- 229910003437 indium oxide Inorganic materials 0.000 claims 3
- 229910000457 iridium oxide Inorganic materials 0.000 claims 3
- 229910000460 iron oxide Inorganic materials 0.000 claims 3
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims 3
- 229910000480 nickel oxide Inorganic materials 0.000 claims 3
- 229910000487 osmium oxide Inorganic materials 0.000 claims 3
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 claims 3
- MUMZUERVLWJKNR-UHFFFAOYSA-N oxoplatinum Chemical compound [Pt]=O MUMZUERVLWJKNR-UHFFFAOYSA-N 0.000 claims 3
- SJLOMQIUPFZJAN-UHFFFAOYSA-N oxorhodium Chemical compound [Rh]=O SJLOMQIUPFZJAN-UHFFFAOYSA-N 0.000 claims 3
- 229910003445 palladium oxide Inorganic materials 0.000 claims 3
- 239000002245 particle Substances 0.000 claims 3
- 229910003446 platinum oxide Inorganic materials 0.000 claims 3
- 229910003450 rhodium oxide Inorganic materials 0.000 claims 3
- 229910001925 ruthenium oxide Inorganic materials 0.000 claims 3
- 229910001923 silver oxide Inorganic materials 0.000 claims 3
- 239000011787 zinc oxide Substances 0.000 claims 3
- 230000000875 corresponding Effects 0.000 claims 2
- 239000003638 reducing agent Substances 0.000 claims 2
- 239000005751 Copper oxide Substances 0.000 claims 1
- 238000004220 aggregation Methods 0.000 claims 1
- 230000002776 aggregation Effects 0.000 claims 1
- 125000004432 carbon atoms Chemical group C* 0.000 claims 1
- 150000001768 cations Chemical class 0.000 claims 1
- 230000001427 coherent Effects 0.000 claims 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims 1
- 229910000431 copper oxide Inorganic materials 0.000 claims 1
- 244000144992 flock Species 0.000 claims 1
- 239000006254 rheological additive Substances 0.000 claims 1
- 230000002194 synthesizing Effects 0.000 claims 1
- 239000002923 metal particle Substances 0.000 description 1
Description
さらに、穏やかな加工条件下、大きな金属粒子を導入して導電性構造を形成することは
難しいため、低温のみに耐えられる基質上へ厚い導電性構造を形成する方法に対する必要
性もある。そのような方法に適したあらゆる組成物に対する関連した必要性も存在する。
この出願の発明に関連する先行技術文献情報としては、以下のものがある(国際出願日以降国際段階で引用された文献及び他国に国内移行した際に引用された文献を含む)。
Prior art document information related to the invention of this application includes the following (including documents cited in the international phase after the international filing date and documents cited when entering the country in other countries).
Claims (25)
水性溶媒中に分散した金属ナノ粒子の集団を有し、
前記集団の少なくとも一部は、約1nmから約100nmの範囲の平均断面直径を有するものとして特徴付けされた個々の金属ナノ粒子を有するものであり、
前記各ナノ粒子は、その表面に結合した少なくとも一つのリガンドを有し、前記リガンドは前記ナノ粒子表面に結合したヘテロ原子頭部基及び前記ヘテロ原子頭部基に結合した尾部を有するものである、組成物。 A composition comprising:
It has a population of dispersed metal nanoparticles in an aqueous solvent medium,
At least a portion of the population has individual metal nanoparticles characterized as having an average cross-sectional diameter in the range of about 1 nm to about 100 nm;
Each of the nanoparticles has at least one ligand bonded to the surface thereof, and the ligand has a heteroatom head group bonded to the nanoparticle surface and a tail bonded to the heteroatom head group. ,Composition.
2若しくはそれ以上の個々のナノ粒子、2若しくはそれ以上の個々のナノ粒子を含むナノ粒子フロック、或いはそれらのあらゆる組み合わせを含む粒子凝集体を有するものである。 The composition of claim 1, wherein the population of nanoparticles further comprises:
It has a particle aggregate comprising two or more individual nanoparticles, a nanoparticle flock comprising two or more individual nanoparticles, or any combination thereof.
約140℃を下回る温度で約90秒未満硬化させた後、厚さ約10μm以下の凝集構造を形成する、少なくとも一つの金属ナノ粒子を有する金属ナノ粒子混合物を有し、前記凝集構造は、前記対応する金属のバルク抵抗率の約2倍から約15倍の範囲の抵抗率を有するものである、組成物。 A composition comprising:
Having a metal nanoparticle mixture having at least one metal nanoparticle that forms an aggregated structure having a thickness of about 10 μm or less after curing at a temperature below about 140 ° C. for less than about 90 seconds, the aggregated structure comprising: A composition having a resistivity in the range of about 2 to about 15 times the bulk resistivity of the corresponding metal.
少なくとも1つのリガンドであって、このリガンドは1から約20炭素原子を有する尾部に結合したヘテロ原子頭部基を有するものである、リガンドと、
少なくとも1つの還元剤と、
水性分散溶液中における少なくとも1つの金属塩であって、この金属塩は、前記分散溶液の容積に基づいて約10グラム/リットルから約600グラム/リットルの範囲の濃度で分散して存在するものであり、前記金属塩は、銀、銅、金、亜鉛、カドミウム、パラジウム、イリジウム、ルテニウム、オスミウム、ロジウム、白金、鉄、ニッケル、コバルト、インジウム、或いはそれらのあらゆる組み合わせを含む少なくとも1つのカチオンを有するものである、金属塩と
を水性溶媒において反応させる工程を有する、方法。 A method of synthesizing a metal nanoparticle dispersion comprising:
At least one ligand, the ligand having a heteroatom head group attached to the tail having from 1 to about 20 carbon atoms;
At least one reducing agent;
At least one metal salt in an aqueous dispersion, the metal salt being present at a concentration ranging from about 10 grams / liter to about 600 grams / liter based on the volume of the dispersion. And the metal salt has at least one cation comprising silver, copper, gold, zinc, cadmium, palladium, iridium, ruthenium, osmium, rhodium, platinum, iron, nickel, cobalt, indium, or any combination thereof. those having the step of reacting in an aqueous solvent medium and the metal salts, methods.
約0.1:1から約1:1の範囲の各モル比で前記リガンド及び金属塩を組み合わせる工程を有するものである。 15. The method of claim 14 , further comprising:
Combining the ligand and metal salt in respective molar ratios ranging from about 0.1: 1 to about 1: 1.
約1:10から約4:1の範囲の各モル比で前記金属塩及び還元剤を組み合わせる工程を有するものである。 The method of claim 15 , further comprising:
Combining the metal salt and the reducing agent in respective molar ratios ranging from about 1:10 to about 4: 1.
前記基質に組成物を堆積させる工程であって、前記組成物は、金属ナノ粒子の少なくとも1つの集団を有し、前記集団の少なくとも一部は、約1nmから約30nmの範囲の平均断面直径を有するものとして特徴付けされた個々の金属ナノ粒子を有するものであり、
前記各ナノ粒子は、その表面に結合した少なくとも一つのリガンドを有し、このリガンドは、前記ナノ粒子表面に結合したヘテロ原子頭部基及び前記ヘテロ原子頭部基に結合した尾部を有するものである、堆積させる工程と、
前記堆積させた組成物を硬化させる工程と
を有する、方法。 A way to form a conductive structure on a substrate,
Depositing a composition on the substrate, the composition having at least one population of metal nanoparticles, wherein at least a portion of the population has an average cross-sectional diameter ranging from about 1 nm to about 30 nm. Having individual metal nanoparticles characterized as having
Each nanoparticle has at least one ligand bound to its surface, the ligand having a heteroatom head group bound to the nanoparticle surface and a tail bound to the heteroatom head group. A deposition step;
Curing the deposited composition.
流動学的重合調整剤(rheology modifier)を有するものである。 18. The method of claim 17 , wherein the composition further comprises
It has a rheology modifier .
基質に少なくとも1つの金属ナノ粒子を有する金属ナノ粒子組成物を堆積させる工程であって、前記組成物は、約140℃を下回る温度で約90秒未満硬化させた後、対応する金属のバルク抵抗率の約2倍から約15倍の範囲の抵抗率を有し、さらに約20μm以下の厚さを有する凝集性導電性構造を形成させるものである、前記堆積させる工程と、
前記堆積させた組成物を硬化させる工程と
を有する、方法。 A way to form a conductive structure,
A step of depositing a metal nanoparticle composition having at least one metal nanoparticle to a substrate, the composition, after the temperature in the cure of less than about 90 seconds below about 140 ° C., of the corresponding metal bulk resistance The depositing step, forming a coherent conductive structure having a resistivity in the range of about 2 to about 15 times the rate, and further having a thickness of about 20 μm or less;
Curing the deposited composition.
Applications Claiming Priority (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US75214405P | 2005-12-20 | 2005-12-20 | |
US75214305P | 2005-12-20 | 2005-12-20 | |
US60/752,143 | 2005-12-20 | ||
US60/752,144 | 2005-12-20 | ||
US75262805P | 2005-12-21 | 2005-12-21 | |
US60/752,628 | 2005-12-21 | ||
US11/613,136 | 2006-12-19 | ||
US11/613,136 US20070144305A1 (en) | 2005-12-20 | 2006-12-19 | Synthesis of Metallic Nanoparticle Dispersions |
PCT/US2006/048699 WO2008048316A2 (en) | 2005-12-20 | 2006-12-20 | Synthesis of metallic nanoparticle dispersions |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013140238A Division JP2013254737A (en) | 2005-12-20 | 2013-07-04 | Synthesis of metallic nanoparticle dispersions |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2009521598A JP2009521598A (en) | 2009-06-04 |
JP2009521598A5 true JP2009521598A5 (en) | 2009-12-17 |
JP5394749B2 JP5394749B2 (en) | 2014-01-22 |
Family
ID=38192074
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008547524A Expired - Fee Related JP5394749B2 (en) | 2005-12-20 | 2006-12-20 | Synthesis of metal nanoparticle dispersions |
JP2013140238A Pending JP2013254737A (en) | 2005-12-20 | 2013-07-04 | Synthesis of metallic nanoparticle dispersions |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013140238A Pending JP2013254737A (en) | 2005-12-20 | 2013-07-04 | Synthesis of metallic nanoparticle dispersions |
Country Status (6)
Country | Link |
---|---|
US (1) | US20070144305A1 (en) |
EP (1) | EP1973682A4 (en) |
JP (2) | JP5394749B2 (en) |
AU (1) | AU2006350054B2 (en) |
CA (1) | CA2634457A1 (en) |
WO (1) | WO2008048316A2 (en) |
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- 2006-12-20 JP JP2008547524A patent/JP5394749B2/en not_active Expired - Fee Related
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