DE3686944D1 - Halbleiteranordnung. - Google Patents
Halbleiteranordnung.Info
- Publication number
- DE3686944D1 DE3686944D1 DE8686904403T DE3686944T DE3686944D1 DE 3686944 D1 DE3686944 D1 DE 3686944D1 DE 8686904403 T DE8686904403 T DE 8686904403T DE 3686944 T DE3686944 T DE 3686944T DE 3686944 D1 DE3686944 D1 DE 3686944D1
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor arrangement
- semiconductor
- arrangement
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/73—Bipolar junction transistors
- H01L29/737—Hetero-junction transistors
- H01L29/7371—Vertical transistors
- H01L29/7376—Resonant tunnelling transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/0605—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits made of compound material, e.g. AIIIBV
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/73—Bipolar junction transistors
- H01L29/737—Hetero-junction transistors
- H01L29/7371—Vertical transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/73—Bipolar junction transistors
- H01L29/737—Hetero-junction transistors
- H01L29/7371—Vertical transistors
- H01L29/7373—Vertical transistors having a two-dimensional base, e.g. modulation-doped base, inversion layer base, delta-doped base
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Bipolar Transistors (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16412885A JPH0738393B2 (ja) | 1985-07-26 | 1985-07-26 | 半導体装置 |
JP16412685A JPH0738392B2 (ja) | 1985-07-26 | 1985-07-26 | 半導体装置 |
JP61040244A JPH0763051B2 (ja) | 1986-02-27 | 1986-02-27 | 半導体装置 |
PCT/JP1986/000391 WO1987000692A1 (en) | 1985-07-26 | 1986-07-23 | Semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3686944D1 true DE3686944D1 (de) | 1992-11-12 |
DE3686944T2 DE3686944T2 (de) | 1993-04-01 |
Family
ID=27290408
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8686904403T Expired - Fee Related DE3686944T2 (de) | 1985-07-26 | 1986-07-23 | Halbleiteranordnung. |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0240567B1 (de) |
DE (1) | DE3686944T2 (de) |
WO (1) | WO1987000692A1 (de) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR910006751B1 (ko) * | 1987-01-27 | 1991-09-02 | 후지쓰 가부시끼가이샤 | 반도체 집적회로장치 및 그의 제조방법 |
US5162877A (en) * | 1987-01-27 | 1992-11-10 | Fujitsu Limited | Semiconductor integrated circuit device and method of producing same |
JP2675039B2 (ja) * | 1988-02-03 | 1997-11-12 | 株式会社日立製作所 | 半導体装置 |
US5099299A (en) * | 1990-06-15 | 1992-03-24 | International Business Machines Corporation | Modulation doped base heterojunction bipolar transistor |
EP0505942A1 (de) * | 1991-03-28 | 1992-09-30 | Texas Instruments Incorporated | Integrationsverfahren für Heterobipolartransistoren mit Hetero-FETS und PIN-Dioden |
US5213987A (en) * | 1991-03-28 | 1993-05-25 | Texas Instruments Incorporated | Method of integrating heterojunction bipolar transistors with PIN diodes |
CN103137666B (zh) * | 2011-11-23 | 2015-12-09 | 上海华虹宏力半导体制造有限公司 | 一种纵向pnp双极晶体管及其制造方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5946106B2 (ja) * | 1981-12-10 | 1984-11-10 | 工業技術院長 | 超高速トランジスタ |
EP0133342B1 (de) * | 1983-06-24 | 1989-11-29 | Nec Corporation | Halbleiterstruktur mit Übergitter hoher Trägerdichte |
JPH0626242B2 (ja) * | 1983-12-05 | 1994-04-06 | 富士通株式会社 | 半導体集積回路装置 |
CA1237824A (en) * | 1984-04-17 | 1988-06-07 | Takashi Mimura | Resonant tunneling semiconductor device |
JPS61102775A (ja) * | 1984-10-26 | 1986-05-21 | Agency Of Ind Science & Technol | バイポ−ラ半導体装置 |
JPH0652055A (ja) * | 1990-04-30 | 1994-02-25 | Texas Instr Inc <Ti> | キャッシュ・メモリとその性能を改善する方法 |
JP3068339B2 (ja) * | 1992-07-15 | 2000-07-24 | 日清製粉株式会社 | 冷凍ベーカリー製品 |
JPH0650956A (ja) * | 1992-07-29 | 1994-02-25 | Shimadzu Corp | 全有機体炭素測定装置 |
-
1986
- 1986-07-23 EP EP86904403A patent/EP0240567B1/de not_active Expired - Lifetime
- 1986-07-23 WO PCT/JP1986/000391 patent/WO1987000692A1/ja active IP Right Grant
- 1986-07-23 DE DE8686904403T patent/DE3686944T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0240567A4 (de) | 1988-01-11 |
EP0240567B1 (de) | 1992-10-07 |
EP0240567A1 (de) | 1987-10-14 |
WO1987000692A1 (en) | 1987-01-29 |
DE3686944T2 (de) | 1993-04-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE3684557D1 (de) | Waferintegrierte halbleiteranordnung. | |
DE3683316D1 (de) | Halbleiteranordnung. | |
DE3481957D1 (de) | Halbleiteranordnung. | |
DE3583302D1 (de) | Halbleiteranordnung. | |
DE3679108D1 (de) | Halbleiteranordnungen. | |
DE3671570D1 (de) | Soi-typ-halbleiteranordnung. | |
DE3650613D1 (de) | Halbleiteranordnung | |
DE3650012D1 (de) | Halbleitervorrichtung. | |
DE3685612D1 (de) | Mehrschicht-halbleiteranordnung. | |
NL189326C (nl) | Halfgeleiderinrichting. | |
DE3683492D1 (de) | Reinraum. | |
DE3686994D1 (de) | Halbleiterspeicher. | |
DE3687322D1 (de) | Halbleiterspeicheranordnung. | |
DE3688064D1 (de) | Halbleitervorrichtung. | |
DE3667879D1 (de) | Halbleiteranordnung. | |
DE3582653D1 (de) | Halbleiteranordnung. | |
DE3684184D1 (de) | Verkapselte halbleiteranordnung. | |
DE3682421D1 (de) | Feldeffekt-halbleiteranordnung. | |
DE3680774D1 (de) | Integriertes halbleiterbauelement. | |
DE3680562D1 (de) | Halbleiterspeicheranordnung. | |
DE3675445D1 (de) | Halbleiterspeicheranordnung. | |
DE3680265D1 (de) | Halbleiterschaltungsanordnung. | |
DE3686490D1 (de) | Halbleiterstruktur. | |
DE3687025D1 (de) | Halbleiterschalter. | |
DE3683783D1 (de) | Halbleiterspeicheranordnung. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |