CN1164766A - 功率半导体器件及其制造方法 - Google Patents
功率半导体器件及其制造方法 Download PDFInfo
- Publication number
- CN1164766A CN1164766A CN97111663A CN97111663A CN1164766A CN 1164766 A CN1164766 A CN 1164766A CN 97111663 A CN97111663 A CN 97111663A CN 97111663 A CN97111663 A CN 97111663A CN 1164766 A CN1164766 A CN 1164766A
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- CN
- China
- Prior art keywords
- trap
- layer
- conduction type
- region
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 131
- 238000004519 manufacturing process Methods 0.000 title claims description 14
- 238000000034 method Methods 0.000 claims abstract description 24
- 239000010410 layer Substances 0.000 claims description 170
- 239000012535 impurity Substances 0.000 claims description 62
- 238000009792 diffusion process Methods 0.000 claims description 51
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 51
- 229920005591 polysilicon Polymers 0.000 claims description 49
- 239000000758 substrate Substances 0.000 claims description 22
- 239000011248 coating agent Substances 0.000 claims description 19
- 238000000576 coating method Methods 0.000 claims description 19
- 206010033307 Overweight Diseases 0.000 claims description 16
- 235000020825 overweight Nutrition 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 15
- 229920002120 photoresistant polymer Polymers 0.000 claims description 14
- 238000002347 injection Methods 0.000 claims description 11
- 239000007924 injection Substances 0.000 claims description 11
- 230000015572 biosynthetic process Effects 0.000 claims description 10
- 239000011229 interlayer Substances 0.000 claims description 4
- 230000004888 barrier function Effects 0.000 claims description 3
- 150000004767 nitrides Chemical class 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 5
- 150000002500 ions Chemical class 0.000 description 29
- 239000000203 mixture Substances 0.000 description 12
- 230000007717 exclusion Effects 0.000 description 10
- 239000002019 doping agent Substances 0.000 description 9
- GOLXNESZZPUPJE-UHFFFAOYSA-N spiromesifen Chemical compound CC1=CC(C)=CC(C)=C1C(C(O1)=O)=C(OC(=O)CC(C)(C)C)C11CCCC1 GOLXNESZZPUPJE-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 230000009467 reduction Effects 0.000 description 5
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 230000003071 parasitic effect Effects 0.000 description 4
- 229910052698 phosphorus Inorganic materials 0.000 description 4
- 239000011574 phosphorus Substances 0.000 description 4
- 238000005520 cutting process Methods 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 3
- 238000006396 nitration reaction Methods 0.000 description 3
- 230000005611 electricity Effects 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 230000002035 prolonged effect Effects 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000002242 deionisation method Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66234—Bipolar junction transistors [BJT]
- H01L29/66325—Bipolar junction transistors [BJT] controlled by field-effect, e.g. insulated gate bipolar transistors [IGBT]
- H01L29/66333—Vertical insulated gate bipolar transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/1095—Body region, i.e. base region, of DMOS transistors or IGBTs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/739—Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Thyristors (AREA)
- Electrodes Of Semiconductors (AREA)
Abstract
Description
Claims (6)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960006994A KR100206193B1 (ko) | 1996-03-15 | 1996-03-15 | 전력반도체장치 및 그의 제조방법 |
KR6994/96 | 1996-03-15 | ||
KR1019960010830A KR0173964B1 (ko) | 1996-04-10 | 1996-04-10 | 래치업 제어구조를 갖는 전력반도체장치의 제조방법 |
KR10830/96 | 1996-04-10 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1164766A true CN1164766A (zh) | 1997-11-12 |
CN1094658C CN1094658C (zh) | 2002-11-20 |
Family
ID=26631679
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN 97111663 Expired - Fee Related CN1094658C (zh) | 1996-03-15 | 1997-03-15 | 功率半导体器件及其制造方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4030148B2 (zh) |
CN (1) | CN1094658C (zh) |
DE (1) | DE19710731B4 (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101901830B (zh) * | 2009-11-09 | 2012-02-22 | 苏州博创集成电路设计有限公司 | 绝缘体上硅的正反导通横向绝缘栅双极晶体管 |
CN102842502A (zh) * | 2011-06-22 | 2012-12-26 | 中国科学院微电子研究所 | 绝缘栅双极晶体管及其制作方法 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19750413A1 (de) * | 1997-11-14 | 1999-05-20 | Asea Brown Boveri | Bipolartransistor mit isolierter Steuerelektrode (IGBT) |
DE19945639A1 (de) * | 1999-09-23 | 2001-04-05 | Abb Semiconductors Ag | Bipolartransistor mit isolierter Gateelektrode (IGBT) |
JP3727827B2 (ja) | 2000-05-15 | 2005-12-21 | 株式会社東芝 | 半導体装置 |
GB0126215D0 (en) * | 2001-11-01 | 2002-01-02 | Koninkl Philips Electronics Nv | Field effect transistor on insulating layer and manufacturing method |
KR100964400B1 (ko) * | 2003-10-01 | 2010-06-17 | 삼성전자주식회사 | 반도체 소자의 콘택 구조체 |
JP5317560B2 (ja) * | 2008-07-16 | 2013-10-16 | 株式会社東芝 | 電力用半導体装置 |
CN102856353B (zh) * | 2011-06-27 | 2015-08-26 | 中国科学院微电子研究所 | 微穿通型igbt器件及其制作方法 |
-
1997
- 1997-03-14 DE DE1997110731 patent/DE19710731B4/de not_active Expired - Fee Related
- 1997-03-15 CN CN 97111663 patent/CN1094658C/zh not_active Expired - Fee Related
- 1997-03-17 JP JP06363997A patent/JP4030148B2/ja not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101901830B (zh) * | 2009-11-09 | 2012-02-22 | 苏州博创集成电路设计有限公司 | 绝缘体上硅的正反导通横向绝缘栅双极晶体管 |
CN102842502A (zh) * | 2011-06-22 | 2012-12-26 | 中国科学院微电子研究所 | 绝缘栅双极晶体管及其制作方法 |
CN102842502B (zh) * | 2011-06-22 | 2015-05-13 | 中国科学院微电子研究所 | 绝缘栅双极晶体管及其制作方法 |
Also Published As
Publication number | Publication date |
---|---|
DE19710731B4 (de) | 2006-02-16 |
CN1094658C (zh) | 2002-11-20 |
JP4030148B2 (ja) | 2008-01-09 |
DE19710731A1 (de) | 1997-10-30 |
JPH104187A (ja) | 1998-01-06 |
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Legal Events
Date | Code | Title | Description |
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C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C06 | Publication | ||
PB01 | Publication | ||
ASS | Succession or assignment of patent right |
Owner name: FAST (COREA) SEMICONDUCTORS CO., LTD. Free format text: FORMER OWNER: SAMSUNG ELECTRONICS CO., LTD Effective date: 20011130 Owner name: FAST (COREA) SEMICONDUCTORS CO., LTD. Free format text: FORMER OWNER: SAMSUNG ELECTRONICS CO., LTD Effective date: 20011120 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20011130 Applicant after: FAIRCHILD KOREA SEMICONDUCTOR Ltd. Applicant before: Samsung Electronics Co.,Ltd. Effective date of registration: 20011120 Applicant after: FAIRCHILD KOREA SEMICONDUCTOR Ltd. Applicant before: Samsung Electronics Co.,Ltd. |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20021120 Termination date: 20150315 |
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EXPY | Termination of patent right or utility model |