CN100341113C - 涂布方法和涂布装置 - Google Patents

涂布方法和涂布装置 Download PDF

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Publication number
CN100341113C
CN100341113C CNB2004100684619A CN200410068461A CN100341113C CN 100341113 C CN100341113 C CN 100341113C CN B2004100684619 A CNB2004100684619 A CN B2004100684619A CN 200410068461 A CN200410068461 A CN 200410068461A CN 100341113 C CN100341113 C CN 100341113C
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CN
China
Prior art keywords
substrate
nozzle
coating
described substrate
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CNB2004100684619A
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English (en)
Chinese (zh)
Other versions
CN1577739A (zh
Inventor
河野幸弘
田中志信
大塚庆崇
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of CN1577739A publication Critical patent/CN1577739A/zh
Application granted granted Critical
Publication of CN100341113C publication Critical patent/CN100341113C/zh
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C13/00—Means for manipulating or holding work, e.g. for separate articles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Coating Apparatus (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
CNB2004100684619A 2003-07-23 2004-07-23 涂布方法和涂布装置 Expired - Lifetime CN100341113C (zh)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2003278294 2003-07-23
JP278294/2003 2003-07-23
JP278294/03 2003-07-23
JP147767/04 2004-05-18
JP147767/2004 2004-05-18
JP2004147767A JP4398786B2 (ja) 2003-07-23 2004-05-18 塗布方法及び塗布装置

Publications (2)

Publication Number Publication Date
CN1577739A CN1577739A (zh) 2005-02-09
CN100341113C true CN100341113C (zh) 2007-10-03

Family

ID=34380034

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2004100684619A Expired - Lifetime CN100341113C (zh) 2003-07-23 2004-07-23 涂布方法和涂布装置

Country Status (4)

Country Link
JP (1) JP4398786B2 (ja)
KR (1) KR101057527B1 (ja)
CN (1) CN100341113C (ja)
TW (1) TWI272657B (ja)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101146437B1 (ko) 2005-06-30 2012-05-21 엘지디스플레이 주식회사 코팅장비 및 그 운용방법
JP4553376B2 (ja) 2005-07-19 2010-09-29 東京エレクトロン株式会社 浮上式基板搬送処理装置及び浮上式基板搬送処理方法
JP4523516B2 (ja) * 2005-08-08 2010-08-11 東京エレクトロン株式会社 塗布膜のむら検出方法、塗布膜のむら検出用プログラム、基板処理方法および基板処理装置
JP4657855B2 (ja) * 2005-08-23 2011-03-23 東京応化工業株式会社 塗布装置
JP2007176150A (ja) * 2005-11-29 2007-07-12 Seiko Epson Corp 液滴吐出装置
KR100838431B1 (ko) * 2005-12-20 2008-06-16 다이니폰 스크린 세이조우 가부시키가이샤 기판 처리 장치
JP4587950B2 (ja) * 2005-12-22 2010-11-24 大日本スクリーン製造株式会社 基板処理装置
JP4564454B2 (ja) * 2006-01-19 2010-10-20 東京エレクトロン株式会社 塗布方法及び塗布装置及び塗布処理プログラム
JP4832142B2 (ja) * 2006-03-31 2011-12-07 株式会社Ｓｏｋｕｄｏ 基板処理装置
KR100822279B1 (ko) * 2006-06-21 2008-04-15 주식회사 에스에프에이 도포장치
KR100752237B1 (ko) * 2006-09-20 2007-08-28 주식회사 탑 엔지니어링 페이스트 디스펜서의 노즐과 갭 센서 사이의 거리 측정방법
JP2008086909A (ja) * 2006-10-02 2008-04-17 Ulvac Japan Ltd 塗布装置及び塗布方法
JP4520975B2 (ja) 2006-12-06 2010-08-11 東京エレクトロン株式会社 塗布方法及び塗布装置
JP5186161B2 (ja) * 2007-09-06 2013-04-17 東京応化工業株式会社 塗布装置及び塗布装置のクリーニング方法
KR101000944B1 (ko) * 2008-10-09 2010-12-13 세메스 주식회사 처리액 공급 유닛과 이를 이용한 기판 처리 장치 및 방법
KR101007682B1 (ko) * 2008-11-18 2011-01-13 세메스 주식회사 평판 디스플레이 소자 제조에서의 코팅 박막 형성 방법 및 장치
JP2010232326A (ja) * 2009-03-26 2010-10-14 Toray Eng Co Ltd 塗布装置
KR102096956B1 (ko) * 2011-12-22 2020-04-06 세메스 주식회사 기판 처리 장치 및 방법
CN104475303B (zh) * 2014-12-30 2016-08-17 合肥京东方光电科技有限公司 一种涂布装置
CN104815785B (zh) * 2015-04-29 2017-04-19 深圳市智立方自动化设备有限公司 针头自动校位装置及针头自动校位方法
JP6737693B2 (ja) 2016-01-13 2020-08-12 Ntn株式会社 微小突起の体積測定方法および液状材料の塗布方法
KR102571644B1 (ko) * 2016-03-28 2023-08-28 삼성디스플레이 주식회사 디스플레이 제조 장치
CN106681105A (zh) * 2017-02-09 2017-05-17 深圳市华星光电技术有限公司 光阻涂布装置检测机构及光阻涂布机
JP6658617B2 (ja) * 2017-02-28 2020-03-04 Ｊｆｅスチール株式会社 スラリー塗布方法および塗布装置
IT201700065691A1 (it) 2017-06-14 2018-12-14 Gd Spa Dispositivo e metodo per applicare un adesivo su un nastro di incarto per un articolo da fumo
CN109701960B (zh) * 2018-12-28 2021-07-27 惠科股份有限公司 基板清洗设备和清洗方法
IT201900017288A1 (it) * 2019-09-26 2021-03-26 Cefla Deutschland Gmbh Processo per preparare bordi di pannelli a prova di acqua, rinforzati e/o a fiamma ritardata
CN115350877B (zh) * 2022-09-19 2024-07-19 无锡极电光能科技有限公司 涂布机及利用其对基片进行涂布的方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4804556A (en) * 1984-08-30 1989-02-14 E. I. Du Pont De Nemours And Company Edge thickness control system
JPH0724387A (ja) * 1993-07-08 1995-01-27 Matsushita Electric Ind Co Ltd 接着剤塗布装置
JPH08138991A (ja) * 1994-11-04 1996-05-31 Dainippon Screen Mfg Co Ltd 基板保持装置
US5919520A (en) * 1996-08-30 1999-07-06 Tokyo Electron Limited Coating method and apparatus for semiconductor process
JP2003053237A (ja) * 2001-08-21 2003-02-25 Hitachi Industries Co Ltd ペースト塗布方法及びペースト塗布機

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4804556A (en) * 1984-08-30 1989-02-14 E. I. Du Pont De Nemours And Company Edge thickness control system
JPH0724387A (ja) * 1993-07-08 1995-01-27 Matsushita Electric Ind Co Ltd 接着剤塗布装置
JPH08138991A (ja) * 1994-11-04 1996-05-31 Dainippon Screen Mfg Co Ltd 基板保持装置
US5919520A (en) * 1996-08-30 1999-07-06 Tokyo Electron Limited Coating method and apparatus for semiconductor process
JP2003053237A (ja) * 2001-08-21 2003-02-25 Hitachi Industries Co Ltd ペースト塗布方法及びペースト塗布機

Also Published As

Publication number Publication date
KR20050011708A (ko) 2005-01-29
TWI272657B (en) 2007-02-01
TW200509211A (en) 2005-03-01
CN1577739A (zh) 2005-02-09
KR101057527B1 (ko) 2011-08-17
JP4398786B2 (ja) 2010-01-13
JP2005052821A (ja) 2005-03-03

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