CA1045880A - Support for liquid photosensitive resin - Google Patents

Support for liquid photosensitive resin

Info

Publication number
CA1045880A
CA1045880A CA196,445A CA196445A CA1045880A CA 1045880 A CA1045880 A CA 1045880A CA 196445 A CA196445 A CA 196445A CA 1045880 A CA1045880 A CA 1045880A
Authority
CA
Canada
Prior art keywords
weight
support
adhesive layer
photosensitive resin
component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA196,445A
Other languages
English (en)
French (fr)
Other versions
CA196445S (en
Inventor
Kiyomi Naka
Teruo Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Application granted granted Critical
Publication of CA1045880A publication Critical patent/CA1045880A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/91—Photosensitive materials characterised by the base or auxiliary layers characterised by subbing layers or subbing means
    • G03C1/93—Macromolecular substances therefor

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Laminated Bodies (AREA)
CA196,445A 1973-04-02 1974-04-01 Support for liquid photosensitive resin Expired CA1045880A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3754673A JPS5837532B2 (ja) 1973-04-02 1973-04-02 カンコウセイジユシヨウシジバン

Publications (1)

Publication Number Publication Date
CA1045880A true CA1045880A (en) 1979-01-09

Family

ID=12500512

Family Applications (1)

Application Number Title Priority Date Filing Date
CA196,445A Expired CA1045880A (en) 1973-04-02 1974-04-01 Support for liquid photosensitive resin

Country Status (10)

Country Link
JP (1) JPS5837532B2 (ja)
BE (1) BE813020A (ja)
CA (1) CA1045880A (ja)
CH (1) CH597623A5 (ja)
DD (1) DD110705A5 (ja)
DE (1) DE2414596C3 (ja)
FR (1) FR2223197B1 (ja)
GB (1) GB1463616A (ja)
IT (1) IT1007425B (ja)
NL (1) NL161711C (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5492402A (en) * 1977-12-28 1979-07-21 Asahi Chemical Ind Photosensitive resin relief printing and fabrication
EP1129390A1 (en) * 1998-11-12 2001-09-05 Andrew Michael Thompson Priming composition for bonding photoresists on substrates
DE10040929A1 (de) 2000-08-18 2002-02-28 Basf Drucksysteme Gmbh Verfahren zur Herstellung organisch entwickelbarer, fotopolymerisierbarer Flexodruckelemente auf flexiblen metallischen Trägern
JP5548494B2 (ja) * 2010-03-19 2014-07-16 東京応化工業株式会社 表面改質材料、レジストパターン形成方法及びパターン形成方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE623613A (ja) * 1961-10-16

Also Published As

Publication number Publication date
FR2223197B1 (ja) 1979-07-06
DE2414596B2 (de) 1980-11-13
NL7404486A (ja) 1974-10-04
CH597623A5 (ja) 1978-04-14
NL161711C (nl) 1980-03-17
NL161711B (nl) 1979-10-15
DE2414596A1 (de) 1974-10-03
JPS5837532B2 (ja) 1983-08-17
DD110705A5 (ja) 1975-01-05
IT1007425B (it) 1976-10-30
AU6715274A (en) 1975-10-02
DE2414596C3 (de) 1981-07-23
GB1463616A (en) 1977-02-02
JPS49132167A (ja) 1974-12-18
FR2223197A1 (ja) 1974-10-25
BE813020A (fr) 1974-07-15

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