BE813020A - Support pour resine photosensible liquide - Google Patents

Support pour resine photosensible liquide

Info

Publication number
BE813020A
BE813020A BE142607A BE142607A BE813020A BE 813020 A BE813020 A BE 813020A BE 142607 A BE142607 A BE 142607A BE 142607 A BE142607 A BE 142607A BE 813020 A BE813020 A BE 813020A
Authority
BE
Belgium
Prior art keywords
support
photosensitive resin
liquid photosensitive
liquid
resin
Prior art date
Application number
BE142607A
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE813020A publication Critical patent/BE813020A/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/91—Photosensitive materials characterised by the base or auxiliary layers characterised by subbing layers or subbing means
    • G03C1/93—Macromolecular substances therefor

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Laminated Bodies (AREA)
BE142607A 1973-04-02 1974-03-29 Support pour resine photosensible liquide BE813020A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3754673A JPS5837532B2 (ja) 1973-04-02 1973-04-02 カンコウセイジユシヨウシジバン

Publications (1)

Publication Number Publication Date
BE813020A true BE813020A (fr) 1974-07-15

Family

ID=12500512

Family Applications (1)

Application Number Title Priority Date Filing Date
BE142607A BE813020A (fr) 1973-04-02 1974-03-29 Support pour resine photosensible liquide

Country Status (10)

Country Link
JP (1) JPS5837532B2 (fr)
BE (1) BE813020A (fr)
CA (1) CA1045880A (fr)
CH (1) CH597623A5 (fr)
DD (1) DD110705A5 (fr)
DE (1) DE2414596C3 (fr)
FR (1) FR2223197B1 (fr)
GB (1) GB1463616A (fr)
IT (1) IT1007425B (fr)
NL (1) NL161711C (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5492402A (en) * 1977-12-28 1979-07-21 Asahi Chemical Ind Photosensitive resin relief printing and fabrication
EP1129390A1 (fr) * 1998-11-12 2001-09-05 Andrew Michael Thompson Composition d'appret permettant de coller des photoresines sur des substrats
DE10040929A1 (de) 2000-08-18 2002-02-28 Basf Drucksysteme Gmbh Verfahren zur Herstellung organisch entwickelbarer, fotopolymerisierbarer Flexodruckelemente auf flexiblen metallischen Trägern
JP5548494B2 (ja) * 2010-03-19 2014-07-16 東京応化工業株式会社 表面改質材料、レジストパターン形成方法及びパターン形成方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE623613A (fr) * 1961-10-16

Also Published As

Publication number Publication date
FR2223197B1 (fr) 1979-07-06
DE2414596B2 (de) 1980-11-13
NL7404486A (fr) 1974-10-04
CH597623A5 (fr) 1978-04-14
NL161711C (nl) 1980-03-17
NL161711B (nl) 1979-10-15
DE2414596A1 (de) 1974-10-03
JPS5837532B2 (ja) 1983-08-17
DD110705A5 (fr) 1975-01-05
IT1007425B (it) 1976-10-30
AU6715274A (en) 1975-10-02
CA1045880A (fr) 1979-01-09
DE2414596C3 (de) 1981-07-23
GB1463616A (en) 1977-02-02
JPS49132167A (fr) 1974-12-18
FR2223197A1 (fr) 1974-10-25

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