JPS49132167A - - Google Patents

Info

Publication number
JPS49132167A
JPS49132167A JP3754673A JP3754673A JPS49132167A JP S49132167 A JPS49132167 A JP S49132167A JP 3754673 A JP3754673 A JP 3754673A JP 3754673 A JP3754673 A JP 3754673A JP S49132167 A JPS49132167 A JP S49132167A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3754673A
Other versions
JPS5837532B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP3754673A priority Critical patent/JPS5837532B2/ja
Priority to AU67152/74A priority patent/AU483122B2/en
Priority to DE19742414596 priority patent/DE2414596C3/de
Priority to BE142607A priority patent/BE813020A/xx
Priority to FR7411264A priority patent/FR2223197B1/fr
Priority to CH453174A priority patent/CH597623A5/xx
Priority to CA196,445A priority patent/CA1045880A/en
Priority to DD17762674A priority patent/DD110705A5/xx
Priority to GB1461274A priority patent/GB1463616A/en
Priority to NL7404486A priority patent/NL161711C/xx
Priority to IT2061074A priority patent/IT1007425B/it
Publication of JPS49132167A publication Critical patent/JPS49132167A/ja
Priority to US05/596,189 priority patent/US4060656A/en
Publication of JPS5837532B2 publication Critical patent/JPS5837532B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/91—Photosensitive materials characterised by the base or auxiliary layers characterised by subbing layers or subbing means
    • G03C1/93—Macromolecular substances therefor

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Laminated Bodies (AREA)
JP3754673A 1973-04-02 1973-04-02 カンコウセイジユシヨウシジバン Expired JPS5837532B2 (ja)

Priority Applications (12)

Application Number Priority Date Filing Date Title
JP3754673A JPS5837532B2 (ja) 1973-04-02 1973-04-02 カンコウセイジユシヨウシジバン
AU67152/74A AU483122B2 (en) 1974-03-26 Support for liquid photosensitive resin
DE19742414596 DE2414596C3 (de) 1973-04-02 1974-03-26 Verfahren zur Herstellung einer vorsensibilisierten Druckplatte
BE142607A BE813020A (fr) 1973-04-02 1974-03-29 Support pour resine photosensible liquide
FR7411264A FR2223197B1 (ja) 1973-04-02 1974-03-29
CH453174A CH597623A5 (ja) 1973-04-02 1974-04-01
CA196,445A CA1045880A (en) 1973-04-02 1974-04-01 Support for liquid photosensitive resin
DD17762674A DD110705A5 (ja) 1973-04-02 1974-04-02
GB1461274A GB1463616A (en) 1973-04-02 1974-04-02 Supports for photosensitive polymer coatings
NL7404486A NL161711C (nl) 1973-04-02 1974-04-02 Werkwijze voor het vervaardigen van een drager voor drukplaten.
IT2061074A IT1007425B (it) 1973-04-02 1974-04-08 Supporto per resina fotosensibi le liquida
US05/596,189 US4060656A (en) 1973-04-02 1975-07-15 Support for photosensitive resin

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3754673A JPS5837532B2 (ja) 1973-04-02 1973-04-02 カンコウセイジユシヨウシジバン

Publications (2)

Publication Number Publication Date
JPS49132167A true JPS49132167A (ja) 1974-12-18
JPS5837532B2 JPS5837532B2 (ja) 1983-08-17

Family

ID=12500512

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3754673A Expired JPS5837532B2 (ja) 1973-04-02 1973-04-02 カンコウセイジユシヨウシジバン

Country Status (10)

Country Link
JP (1) JPS5837532B2 (ja)
BE (1) BE813020A (ja)
CA (1) CA1045880A (ja)
CH (1) CH597623A5 (ja)
DD (1) DD110705A5 (ja)
DE (1) DE2414596C3 (ja)
FR (1) FR2223197B1 (ja)
GB (1) GB1463616A (ja)
IT (1) IT1007425B (ja)
NL (1) NL161711C (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002530697A (ja) * 1998-11-12 2002-09-17 トンプソン、アンドリュー、マイケル 基体上にホトレジストを結合するための下塗り組成物

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5492402A (en) * 1977-12-28 1979-07-21 Asahi Chemical Ind Photosensitive resin relief printing and fabrication
DE10040929A1 (de) 2000-08-18 2002-02-28 Basf Drucksysteme Gmbh Verfahren zur Herstellung organisch entwickelbarer, fotopolymerisierbarer Flexodruckelemente auf flexiblen metallischen Trägern
JP5548494B2 (ja) * 2010-03-19 2014-07-16 東京応化工業株式会社 表面改質材料、レジストパターン形成方法及びパターン形成方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE623613A (ja) * 1961-10-16

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002530697A (ja) * 1998-11-12 2002-09-17 トンプソン、アンドリュー、マイケル 基体上にホトレジストを結合するための下塗り組成物

Also Published As

Publication number Publication date
FR2223197B1 (ja) 1979-07-06
DE2414596B2 (de) 1980-11-13
NL7404486A (ja) 1974-10-04
CH597623A5 (ja) 1978-04-14
NL161711C (nl) 1980-03-17
NL161711B (nl) 1979-10-15
DE2414596A1 (de) 1974-10-03
JPS5837532B2 (ja) 1983-08-17
DD110705A5 (ja) 1975-01-05
IT1007425B (it) 1976-10-30
AU6715274A (en) 1975-10-02
CA1045880A (en) 1979-01-09
DE2414596C3 (de) 1981-07-23
GB1463616A (en) 1977-02-02
FR2223197A1 (ja) 1974-10-25
BE813020A (fr) 1974-07-15

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