GB1463616A - Supports for photosensitive polymer coatings - Google Patents

Supports for photosensitive polymer coatings

Info

Publication number
GB1463616A
GB1463616A GB1461274A GB1461274A GB1463616A GB 1463616 A GB1463616 A GB 1463616A GB 1461274 A GB1461274 A GB 1461274A GB 1461274 A GB1461274 A GB 1461274A GB 1463616 A GB1463616 A GB 1463616A
Authority
GB
United Kingdom
Prior art keywords
compound
epoxy
supports
group
hydroquinone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1461274A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Publication of GB1463616A publication Critical patent/GB1463616A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/91—Photosensitive materials characterised by the base or auxiliary layers characterised by subbing layers or subbing means
    • G03C1/93—Macromolecular substances therefor

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Laminated Bodies (AREA)
GB1461274A 1973-04-02 1974-04-02 Supports for photosensitive polymer coatings Expired GB1463616A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3754673A JPS5837532B2 (ja) 1973-04-02 1973-04-02 カンコウセイジユシヨウシジバン

Publications (1)

Publication Number Publication Date
GB1463616A true GB1463616A (en) 1977-02-02

Family

ID=12500512

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1461274A Expired GB1463616A (en) 1973-04-02 1974-04-02 Supports for photosensitive polymer coatings

Country Status (10)

Country Link
JP (1) JPS5837532B2 (ja)
BE (1) BE813020A (ja)
CA (1) CA1045880A (ja)
CH (1) CH597623A5 (ja)
DD (1) DD110705A5 (ja)
DE (1) DE2414596C3 (ja)
FR (1) FR2223197B1 (ja)
GB (1) GB1463616A (ja)
IT (1) IT1007425B (ja)
NL (1) NL161711C (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5492402A (en) * 1977-12-28 1979-07-21 Asahi Chemical Ind Photosensitive resin relief printing and fabrication
EP1129390A1 (en) * 1998-11-12 2001-09-05 Andrew Michael Thompson Priming composition for bonding photoresists on substrates
DE10040929A1 (de) 2000-08-18 2002-02-28 Basf Drucksysteme Gmbh Verfahren zur Herstellung organisch entwickelbarer, fotopolymerisierbarer Flexodruckelemente auf flexiblen metallischen Trägern
JP5548494B2 (ja) * 2010-03-19 2014-07-16 東京応化工業株式会社 表面改質材料、レジストパターン形成方法及びパターン形成方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE623613A (ja) * 1961-10-16

Also Published As

Publication number Publication date
FR2223197B1 (ja) 1979-07-06
DE2414596B2 (de) 1980-11-13
NL7404486A (ja) 1974-10-04
CH597623A5 (ja) 1978-04-14
NL161711C (nl) 1980-03-17
NL161711B (nl) 1979-10-15
DE2414596A1 (de) 1974-10-03
JPS5837532B2 (ja) 1983-08-17
DD110705A5 (ja) 1975-01-05
IT1007425B (it) 1976-10-30
AU6715274A (en) 1975-10-02
CA1045880A (en) 1979-01-09
DE2414596C3 (de) 1981-07-23
JPS49132167A (ja) 1974-12-18
FR2223197A1 (ja) 1974-10-25
BE813020A (fr) 1974-07-15

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee