WO2013008639A1 - Processus de production d'un produit de verre - Google Patents

Processus de production d'un produit de verre Download PDF

Info

Publication number
WO2013008639A1
WO2013008639A1 PCT/JP2012/066598 JP2012066598W WO2013008639A1 WO 2013008639 A1 WO2013008639 A1 WO 2013008639A1 JP 2012066598 W JP2012066598 W JP 2012066598W WO 2013008639 A1 WO2013008639 A1 WO 2013008639A1
Authority
WO
WIPO (PCT)
Prior art keywords
glass
manganese
abrasive grains
polishing
cleaning
Prior art date
Application number
PCT/JP2012/066598
Other languages
English (en)
Japanese (ja)
Inventor
宮谷　克明
Original Assignee
旭硝子株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 旭硝子株式会社 filed Critical 旭硝子株式会社
Priority to CN201280034544.9A priority Critical patent/CN103747917B/zh
Publication of WO2013008639A1 publication Critical patent/WO2013008639A1/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0075—Cleaning of glass
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se

Definitions

  • the present invention relates to a method for manufacturing a glass product.
  • Polishing abrasive grains mainly composed of cerium oxide have been widely used as polishing agents for glass polishing.
  • ceria abrasive grains due to the recent rise in rare earth oxides, ceria abrasive grains cannot be obtained at conventional costs, and alternative materials are being actively studied.
  • various oxides such as zirconia or alumina have been studied.
  • Non-Patent Document 1 Manganese oxides include manganese dioxide, manganese dioxide, and manganese oxide.
  • Non-Patent Document 2 discloses that manganese dioxide abrasive grains and trioxide 2 manganese abrasive grains used as abrasives in a CMP process in a semiconductor process can be cleaned with a cleaning solution containing hydrogen peroxide. Yes.
  • the average particle size used for semiconductor CMP is usually 30 to 40 nm in the cleaning of manganese dioxide abrasive grains and trioxide 2 manganese abrasive grains with a cleaning liquid containing hydrogen peroxide described in Non-Patent Document 2.
  • 3 manganese dioxide abrasive grains used for polishing glass having an average particle diameter large and stable compared with these abrasive grains are effective for the manganese dioxide oxide grains of about 3 and 2 manganese oxide abrasive grains. It has been found that the cleaning effect is low depending on the cleaning liquid containing hydrogen peroxide solution.
  • the cleaning liquid containing hydrogen peroxide solution is resistant to acid resistance because the trimanganese 2 manganese abrasive grains are difficult to dissolve when the pH of the cleaning liquid becomes high, and the trimanganese 2 manganese abrasive grains hardly dissolve when the pH of the cleaning liquid exceeds 4. It is considered difficult to apply to weak glass.
  • trimanganese 2 manganese abrasive grains is also desired for cleaning after polishing.
  • the present invention has been made in view of such problems, and after the polishing step of polishing the glass using a polishing agent containing 2 manganese oxide abrasive grains, the 3 oxide 2 adhered to the glass using a cleaning liquid. It aims at providing the manufacturing method of the glass product including the process of wash
  • the aqueous solution containing at least one of ascorbic acid and erythorbic acid is a trioxide 2 manganese abrasive having a large average particle size used for polishing glass. Based on this finding, the present invention has been completed.
  • the gist of the present invention is as follows.
  • a method for producing a glass product comprising: a polishing step of polishing glass using a polishing agent containing trioxide 2 manganese abrasive grains; and a cleaning step of cleaning the glass using a cleaning liquid thereafter,
  • a method for producing a glass product wherein the cleaning liquid is a cleaning liquid containing at least one of ascorbic acid and erythorbic acid.
  • the method for producing a glass product of the present invention after polishing glass with an abrasive containing trimanganese 2 manganese abrasive grains, by washing the glass with a cleaning liquid containing at least one of ascorbic acid and erythorbic acid, It is possible to wash effectively while melting the trioxide 2 manganese abrasive grains adhering to the glass.
  • the method for producing a glass product of the present invention is applied to a glass having weak acid resistance. It is possible to apply.
  • the manufacturing method of the glass product of this invention includes the grinding
  • Trioxide 2 manganese abrasive grains can be used for polishing glass as an alternative material for ceria abrasive grains.
  • the concentration of the trioxide 2 manganese abrasive grains in the polishing agent is usually preferably 1% by mass or more and 20% by mass or less, and more preferably 3% by mass or more and 15% by mass or less.
  • concentration of the trioxide 2 manganese abrasive grains in the abrasive is usually preferably 1% by mass or more and 20% by mass or less, and more preferably 3% by mass or more and 15% by mass or less.
  • the abrasive may contain a surfactant, a dispersant and the like.
  • the surfactant include non-foaming surfactants such as alkylene diols.
  • the content of the surfactant in the abrasive is preferably 0.01 to 1% by mass.
  • examples of the dispersing agent include sodium polyacrylate, sodium phosphate, sodium phosphonate and sodium citrate.
  • the content of the dispersant in the abrasive is preferably 0.5 to 2% by mass.
  • the polishing method in the present invention is not particularly limited.
  • the polishing cloth and the glass are relatively moved while the glass and the polishing cloth are brought into contact with each other while supplying the polishing agent containing the trimanganese 2 manganese abrasive grains.
  • the glass is preferably polished into a mirror surface.
  • a urethane polishing pad can be used as the polishing cloth.
  • the method for producing a glass product of the present invention comprises a polishing agent containing trimanganese 2 manganese abrasive grains adhering to glass using a cleaning solution containing at least one of ascorbic acid and erythorbic acid (hereinafter also referred to as a cleaning solution used in the present invention).
  • a cleaning solution used in the present invention a cleaning solution used in the present invention.
  • Ascorbic acid and erythorbic acid have a high dissolving power with respect to trimanganese 2 manganese abrasive grains and also play a role as a pH adjuster.
  • the total content of ascorbic acid and erythorbic acid in the cleaning liquid used in the present invention is preferably 0.1 to 1% by mass, and more preferably 0.25 to 0.75% by mass.
  • the cleaning liquid used in the present invention preferably contains a cleaning auxiliary.
  • the cleaning aid include a surfactant for lowering the surface tension, and an acid having a buffering effect for stably maintaining pH.
  • the surfactant include nonionic surfactants such as acetylene diol and anionic surfactants such as sodium polyacrylate.
  • an acid having a buffering effect for stably maintaining pH for example, an acid having a pKa of 2 to 5 and having one or more carboxylic acids can be mentioned.
  • citric acid can be cited as an acid that can be expected to have a buffering effect, but many other organic acids can be used.
  • the cleaning liquid used in the present invention preferably contains water as a solvent.
  • water examples include deionized water, ultrapure water, charged ion water, hydrogen water, and ozone water. Since water has a function of controlling the fluidity of the cleaning liquid used in the present invention, its content can be appropriately set according to the target cleaning characteristics such as the cleaning speed, but usually 55 to 98 mass. % Is preferable.
  • the cleaning liquid containing at least one of ascorbic acid and erythorbic acid used in the present invention has a certain solubility or higher with respect to trimanganese 2 manganese abrasive grains in a wide pH range, but the pH of the cleaning liquid is preferably 2 or more and 5 or less. .
  • the pH of the cleaning liquid is preferably 2 or more and 5 or less.
  • Ascorbic acid or erythorbic acid is easily dissolved, which is preferable from the viewpoint of operation and safety.
  • cleaning liquid with respect to trioxide 2 manganese abrasive grain can be improved by making pH of a washing
  • the cleaning liquid used in the present invention has a builder effect.
  • Zeolite and the like may be included.
  • the content of zeolite in the cleaning liquid is not particularly limited, but is preferably 1% by mass or less.
  • the cleaning step it is preferable to perform cleaning by bringing the cleaning liquid into direct contact with glass.
  • the method of bringing the cleaning liquid into direct contact with the glass include, for example, dip cleaning in which the cleaning liquid is filled in a cleaning tank, and glass is placed in the cleaning tank, a method of spraying the cleaning liquid onto the glass from a nozzle, and scrub cleaning using a sponge made of polyvinyl alcohol Etc.
  • the cleaning liquid used in the present invention can be applied to any of the above methods, but dip cleaning using ultrasonic cleaning is preferred because more efficient cleaning can be performed.
  • the temperature of the washing solution may be room temperature, and may be used after being heated to about 40 to 80 ° C., but is preferably 80 ° C. or less.
  • the temperature of the cleaning liquid By setting the temperature of the cleaning liquid to 80 ° C. or lower, it is possible to prevent thermal decomposition of ascorbic acid. Further, because of the configuration of the apparatus, when the cleaning liquid reaches a temperature close to 100 ° C., it becomes difficult to control pH by evaporation of water, and therefore, the temperature is preferably 80 ° C. or lower.
  • the glass product is a glass substrate for a magnetic disk or a high-quality glass substrate for a liquid crystal display
  • the main surface of the glass is subjected to colloidal silica polishing after the cleaning step. It is preferable to include a final polishing step of polishing using a slurry containing grains.
  • glass products produced by the production method of the present invention include glass substrates for magnetic disks, glass substrates such as photomask substrates and display substrates, lenses, and blue filter glass and cover glass for CCDs.
  • a magnetic disk can be manufactured by forming a magnetic recording layer on the main surface of a glass substrate for a magnetic disk manufactured by the manufacturing method of the present invention.
  • the aqueous solution containing the ascorbic acid derivative was also evaluated for the elution amount of the trimanganese 2 manganese abrasive grains, but the effect of promoting the elution of the trioxide 2 manganese abrasive grains was not observed.
  • ascorbic acid derivatives such as magnesium ascorbyl phosphate and glucoside ascorbic acid have a structure that suppresses oxidation of ascorbic acid, and thus cannot reduce dimanganese trioxide. It is considered that the elution of oxidized 2 manganese abrasive grains is not promoted.
  • Method 1 After drying, the trioxide 2 manganese abrasive grains remaining on the glass plate were visually examined. When the residue was confirmed, it was set as x, and when it was not confirmed, it was marked as ⁇ .
  • Method 2 After drying, the trioxide 2 manganese abrasive grains remaining on the glass plate were examined while irradiating the glass plate with a high-intensity light source. When the residue was confirmed, it was marked as “X”, and when it was not confirmed, it was marked as “ ⁇ ”.
  • the step of polishing the glass with a cleaning liquid containing at least one of ascorbic acid and erythorbic acid after the step of polishing the glass with an abrasive containing trimanganese 2 manganese abrasive grains is included. According to the method, it was found that trimanganese 2 manganese abrasive grains can be effectively removed from the surface of the glass.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Detergent Compositions (AREA)
  • Mechanical Engineering (AREA)
  • Cleaning In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

L'objet de la présente invention est de fournir un processus destiné à la production d'un produit de verre, lequel processus inclut, après l'étape consistant à polir un verre à l'aide d'un agent de polissage qui contient des grains abrasifs de trioxyde de dimanganèse, l'étape consistant à retirer de façon efficace l'agent de polissage qui contient les grains abrasifs de trioxyde de dimanganèse et qui s'est collé au verre. Le processus de production d'un produit de verre comprend une étape de polissage au cours de laquelle un verre est poli à l'aide d'un agent de polissage qui contient des grains abrasifs de trioxyde de dimanganèse et une étape de nettoyage au cours de laquelle le verre est par la suite nettoyé à l'aide d'un fluide de nettoyage, lequel fluide de nettoyage est un fluide de nettoyage qui contient de l'acide ascorbique et/ou de l'acide érythorbique.
PCT/JP2012/066598 2011-07-12 2012-06-28 Processus de production d'un produit de verre WO2013008639A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201280034544.9A CN103747917B (zh) 2011-07-12 2012-06-28 玻璃制品的制造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011-154312 2011-07-12
JP2011154312 2011-07-12

Publications (1)

Publication Number Publication Date
WO2013008639A1 true WO2013008639A1 (fr) 2013-01-17

Family

ID=47505935

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2012/066598 WO2013008639A1 (fr) 2011-07-12 2012-06-28 Processus de production d'un produit de verre

Country Status (3)

Country Link
JP (1) JPWO2013008639A1 (fr)
TW (1) TW201309786A (fr)
WO (1) WO2013008639A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6822219B2 (ja) * 2017-03-01 2021-01-27 Ａｇｃ株式会社 ディスプレイ用ガラス基板

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000268348A (ja) * 1999-03-18 2000-09-29 Nippon Sheet Glass Co Ltd 情報記録媒体用ガラス基板及びその製造方法
WO2002098812A1 (fr) * 2001-06-04 2002-12-12 Nippon Sheet Glass Co., Ltd. Procede de production de substrat transparent, substrat transparent et element electroluminescent organique presentant ledit substrat transparent
JP2004335896A (ja) * 2003-05-09 2004-11-25 Jsr Corp 非化学機械研磨用水溶液、研磨剤セット及び化学機械研磨方法
JP2006099847A (ja) * 2004-09-29 2006-04-13 Hoya Corp 磁気ディスク用ガラス基板の製造方法及び磁気ディスクの製造方法
JP2009215093A (ja) * 2008-03-07 2009-09-24 Asahi Glass Co Ltd ガラス基板用洗浄剤及びガラス基板の製造方法
JP2009295914A (ja) * 2008-06-09 2009-12-17 Ebara Corp 研磨パッド、並びに電解複合研磨装置及び電解複合研磨方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000268348A (ja) * 1999-03-18 2000-09-29 Nippon Sheet Glass Co Ltd 情報記録媒体用ガラス基板及びその製造方法
WO2002098812A1 (fr) * 2001-06-04 2002-12-12 Nippon Sheet Glass Co., Ltd. Procede de production de substrat transparent, substrat transparent et element electroluminescent organique presentant ledit substrat transparent
JP2004335896A (ja) * 2003-05-09 2004-11-25 Jsr Corp 非化学機械研磨用水溶液、研磨剤セット及び化学機械研磨方法
JP2006099847A (ja) * 2004-09-29 2006-04-13 Hoya Corp 磁気ディスク用ガラス基板の製造方法及び磁気ディスクの製造方法
JP2009215093A (ja) * 2008-03-07 2009-09-24 Asahi Glass Co Ltd ガラス基板用洗浄剤及びガラス基板の製造方法
JP2009295914A (ja) * 2008-06-09 2009-12-17 Ebara Corp 研磨パッド、並びに電解複合研磨装置及び電解複合研磨方法

Also Published As

Publication number Publication date
CN103747917A (zh) 2014-04-23
TW201309786A (zh) 2013-03-01
JPWO2013008639A1 (ja) 2015-02-23

Similar Documents

Publication Publication Date Title
TWI418618B (zh) 用於具有金屬離子氧化劑之化學機械拋光組成物中的二羥基烯醇類化合物
KR102150403B1 (ko) 연마용 조성물
EP2289667B1 (fr) Agent de polissage pour substrat de verre de quartz synthétique
JP2012084895A (ja) 銅の化学的機械的平滑化のためのスラリー及び方法
TWI464125B (zh) 合成石英玻璃基板之製造方法
WO2013088928A1 (fr) Agent de nettoyage et procédé de préparation d'un substrat monocristallin de carbure de silicium
WO2013035545A1 (fr) Grains abrasifs, leur procédé de fabrication, bouillie de polissage et procédé de fabrication de produits verriers
JP2008527728A (ja) 化学的機械的研磨用研磨スラリー及び方法
JP5417095B2 (ja) 洗浄剤組成物、およびガラス製ハードディスク基板の洗浄方法
JP4831096B2 (ja) ガラス基板用洗浄剤及びガラス基板の製造方法
JP2003205460A (ja) 酸化セリウム系研磨剤再生方法
JP2873310B2 (ja) 半導体ウェーハの研摩方法
WO2013008639A1 (fr) Processus de production d'un produit de verre
JP6393228B2 (ja) 研磨用組成物および研磨物の製造方法
JP4954338B1 (ja) ガラス製品の製造方法
JP6806085B2 (ja) 研磨材スラリーの再生方法
US10570355B2 (en) Cleaning agent composition for glass hard disk substrate
JP5533355B2 (ja) 磁気記録媒体用ガラス基板、両面研磨装置、ガラス基板の研磨方法及びガラス基板の製造方法
JP2006315160A (ja) 磁気ディスク用ガラス基板の仕上げ研磨方法
JPWO2013118648A1 (ja) ガラス製品の製造方法および磁気ディスクの製造方法
JP6552245B2 (ja) 研磨用組成物および研磨物の製造方法
JP2016059973A (ja) 研磨スラリーの再生方法、基板の製造方法
CN103747917B (zh) 玻璃制品的制造方法
JP2015155139A (ja) 合成石英ガラス基板の製造方法
JP2010132748A (ja) 洗浄剤組成物およびハードディスク基板の洗浄方法

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 12810582

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2013523885

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 12810582

Country of ref document: EP

Kind code of ref document: A1